KR100367859B1 - 적층 커패시터와 감결합 커패시터의 배선접속구조, 및배선기판 - Google Patents
적층 커패시터와 감결합 커패시터의 배선접속구조, 및배선기판 Download PDFInfo
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- KR100367859B1 KR100367859B1 KR10-2000-0031118A KR20000031118A KR100367859B1 KR 100367859 B1 KR100367859 B1 KR 100367859B1 KR 20000031118 A KR20000031118 A KR 20000031118A KR 100367859 B1 KR100367859 B1 KR 100367859B1
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- conductors
- capacitor
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- external terminal
- conductor
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- 239000003990 capacitor Substances 0.000 title claims abstract description 206
- 239000004020 conductor Substances 0.000 claims abstract description 152
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 230000000149 penetrating effect Effects 0.000 claims description 15
- 229910000679 solder Inorganic materials 0.000 claims description 7
- 241000255925 Diptera Species 0.000 abstract 1
- 238000004806 packaging method and process Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 230000006870 function Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000009774 resonance method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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Abstract
Description
직경(㎛) | 단면적(㎜2) | ESL(pH) | 전류용량(A) |
30 | 7.1×10-4 | 57.4 | 7.3 |
50 | 2.0×10-3 | 37.2 | 12.4 |
100 | 7.9×10-3 | 22.6 | 24.4 |
150 | 1.8×10-2 | 16.8 | 36.7 |
Claims (24)
- 제 1 및 제 2 주면을 갖고, 또한 복수개의 유전체층이 적층된 스택(stack) 및 상기 유전체층들 중에서 적어도 한 개의 유전체층을 사이에 두고 서로 대향하는 적어도 한 쌍의 제 1 내부전극 및 제 2 내부전극을 포함하는 커패시터 본체;제 2 내부전극과 전기적으로 절연되고 제 1 내부전극에 전기적으로 접속되면서, 상기 커패시터 본체 안에 형성된 유전체층들 중에서 적어도 한 개를 관통하는 복수개의 제 1 관통도체;제 1 내부전극과 전기적으로 절연되고 제 2 내부전극에 전기적으로 접속되며, 상기 커패시터 본체 안에 형성되고 상기 커패시터 본체를 관통하며, 제 1 및 제 2 관통도체는 상기 내부전극들을 통하여 흐르는 전류에 의해 유도된 자기장을 상쇄하도록 배열된, 복수개의 제 2 관통도체;각각 제 1 관통도체에 대응하도록 배열되고 제 1 관통도체에 각각 전기적으로 접속된 복수개의 제 1 외부단자전극; 및각각 제 2 관통도체에 대응하도록 배열되고 제 2 관통도체에 각각 전기적으로 접속된 복수개의 제 2 외부단자전극을 포함하고, 또한제 1 외부단자전극은 상기 커패시터 본체의 적어도 제 1 주면에 위치하고 상기 내부전극과 실질적으로 평행하게 연장되며, 제 2 외부단자전극은 제 1 주면 및 제 1 주면에 대향하는 제 2 주면에 위치하는 것을 특징으로 하는 적층 커패시터.
- 제 1 항에 있어서, 제 2 관통도체 중에서 적어도 한 개는 단면적이 적어도 약 2 ×10-3mm2인 것을 특징으로 하는 적층 커패시터.
- 제 1 항에 있어서, 제 2 관통도체 중에서 적어도 한 개는 단면적이 적어도 약 7 ×10-3mm2인 것을 특징으로 하는 적층 커패시터.
- 제 1 항에 있어서, 제 2 관통도체 중에서 적어도 한 개는 단면적이 적어도 약 1.5 ×10-2mm2인 것을 특징으로 하는 적층 커패시터.
- 제 1 항에 있어서, 제 1 외부단자전극은 커패시터 본체의 제 1 주면 및 제 2 주면 양쪽에 설치되는 것을 특징으로 하는 적층 커패시터.
- 제 5 항에 있어서, 제 1 관통도체 중에서 적어도 한 개는 단면적이 적어도 약 2 ×10-3mm2인 것을 특징으로 하는 적층 커패시터.
- 제 5 항에 있어서, 제 1 관통도체 중에서 적어도 한 개는 단면적이 적어도약 7 ×10-3mm2인 것을 특징으로 하는 적층 커패시터.
- 제 5 항에 있어서, 제 1 관통도체 중에서 적어도 한 개는 단면적이 적어도 약 1.5 ×10-2mm2인 것을 특징으로 하는 적층 커패시터.
- 제 1 항에 있어서, 땜납 범프는 제 1 및 제 2 외부단자전극에 형성되는 것을 특징으로 하는 적층 커패시터.
- 제 1 항에 있어서, 적층 커패시터는 감결합 커패시터가 되는 것을 특징으로 하는 적층 커패시터.
- 마이크로 프로세싱 유닛에 설치되는 MPU 칩을 위한 전원회로에 접속되는 감결합 커패시터의 배선접속구조에 있어서, 상기 감결합 커패시터는서로 대향하는 제 1 주면과 제 2 주면을 갖는 커패시터 본체; 및커패시터 본체 내부에 설치되고 제 1 주면으로부터 제 2 주면까지 관통하도록 배열되는 관통도체를 포함하며, 또한MPU 칩에 접속되는 전원라인 및 신호라인 중에서 적어도 한 개는 관통도체를 통하여 모기판(mother board)에 접지되는 것을 특징으로 하는 감결합 커패시터의 배선접속구조.
- 제 11 항에 있어서, 감결합 커패시터는제 1 및 제 2 주면을 갖고, 또한 복수개의 유전체층이 적층된 스택(stack), 및 상기 유전체층들 중에서 적어도 한 개의 유전체층을 사이에 두고 서로 대향하는 적어도 한 쌍의 제 1 내부전극 및 제 2 내부전극을 포함하는 커패시터 본체;제 2 내부전극과 전기적으로 절연되고 제 1 내부전극에 전기적으로 접속되면서, 상기 커패시터 본체 안에 형성된 유전체층들 중에서 적어도 한 개를 관통하는 복수개의 제 1 관통도체;제 1 내부전극과 전기적으로 절연되고 제 2 내부전극에 전기적으로 접속되며, 상기 커패시터 본체 안에 형성되고 상기 커패시터 본체를 관통하며, 제 1 및 제 2 관통도체는 상기 내부전극들을 통하여 흐르는 전류에 의해 유도된 자기장을 상쇄하도록 배열된, 복수개의 제 2 관통도체;각각 제 1 관통도체에 대응하도록 배열되고 제 1 관통도체에 각각 전기적으로 접속된 복수개의 제 1 외부단자전극; 및각각 제 2 관통도체에 대응하도록 배열되고 제 2 관통도체에 각각 전기적으로 접속된 복수개의 제 2 외부단자전극을 포함하고, 또한제 1 외부단자전극은 상기 커패시터 본체의 적어도 제 1 주면에 위치하고 상기 내부전극과 실질적으로 평행하게 연장되며, 제 2 외부단자전극은 제 1 주면 및 제 1 주면에 대향하는 제 2 주면에 위치하는 것을 특징으로 하는 감결합 커패시터의 배선접속구조.
- 제 12 항에 있어서, 제 2 관통도체 중에서 적어도 한 개는 단면적이 적어도 약 2 ×10-3mm2인 것을 특징으로 하는 감결합 커패시터의 배선접속구조.
- 제 12 항에 있어서, 제 2 관통도체 중에서 적어도 한 개는 단면적이 적어도 약 7 ×10-3mm2인 것을 특징으로 하는 감결합 커패시터의 배선접속구조.
- 제 12 항에 있어서, 제 2 관통도체 중에서 적어도 한 개는 단면적이 적어도 약 1.5 ×10-2mm2인 것을 특징으로 하는 감결합 커패시터의 배선접속구조.
- 제 12 항에 있어서, 제 1 외부단자전극은 커패시터 본체의 제 1 주면과 제 2 주면 양쪽에 설치되는 것을 특징으로 하는 감결합 커패시터의 배선접속구조.
- 제 16 항에 있어서, 제 1 관통도체 중에서 적어도 한 개는 단면적이 적어도 약 2 ×10-3mm2인 것을 특징으로 하는 감결합 커패시터의 배선접속구조.
- 제 16 항에 있어서, 제 1 관통도체 중에서 적어도 한 개는 단면적이 적어도약 7 ×10-3mm2인 것을 특징으로 하는 감결합 커패시터의 배선접속구조.
- 제 16 항에 있어서, 제 1 관통도체 중에서 적어도 한 개는 단면적이 적어도 약 1.5 ×10-2mm2인 것을 특징으로 하는 감결합 커패시터의 배선접속구조.
- 제 12 항에 있어서, 땜납 범프는 제 1 및 제 2 외부단자전극에 형성되는 것을 특징으로 하는 감결합 커패시터의 배선접속구조.
- 제 11 항에 있어서, 전원회로의 고온측은 제 1 외부단자전극에 접속되는 것을 특징으로 하는 감결합 커패시터의 배선접속구조.
- 배선기판;상기 배선기판에 실장되는 마이크로 프로세싱 유닛의 MPU 칩;상기 MPU 칩에 전원을 공급하도록 배열되는 전원용 고온측 배선도체 및 접지측 배선도체; 및적층 커패시터를 포함하는 배선기판 패키지 장치에 있어서,상기 적층 커패시터는제 1 및 제 2 주면을 갖고; 복수개의 유전체층이 적층된 스택 및 상기 유전체층들 중에서 적어도 한 개의 유전체층을 사이에 두고 서로 대향하는 적어도 한 쌍의 제 1 내부전극과 제 2 내부전극을 포함하는 커패시터 본체; 제 2 내부전극과 전기적으로 절연되고 제 1 내부전극에 전기적으로 접속되면서, 상기 커패시터 본체 안에 형성된 유전체층들 중에서 적어도 한 개를 관통하는 복수개의 제 1 관통도체; 제 1 내부전극과 전기적으로 절연되고 제 2 내부전극에 전기적으로 접속되며, 상기 커패시터 본체 안에 형성되고 상기 커패시터 본체를 관통하며, 제 1 및 제 2 관통도체는 상기 내부전극들을 통하여 흐르는 전류에 의해 유도된 자기장을 상쇄하도록 배열된, 복수개의 제 2 관통도체; 각각 제 1 관통도체에 대응하도록 배열되고 제 1 관통도체에 각각 전기적으로 접속된 복수개의 제 1 외부단자전극; 및 각각 제 2 관통도체에 대응하도록 배열되고 제 2 관통도체에 각각 전기적으로 접속된 복수개의 제 2 외부단자전극을 포함하고; 또한 제 1 외부단자전극은 상기 커패시터 본체의 적어도 제 1 주면에 위치하고 상기 내부전극과 실질적으로 평행하게 연장되며, 또한 제 2 외부단자전극은 제 1 주면 및 제 1 주면과 대향하는 제 2 주면에 위치하며; 상기 적층 커패시터는 제 1 주면이 배선기판측으로 향하고 제 2 주면이 패키지의 바깥쪽으로 향하도록 배선기판에 배열되고, 제 1 주면측의 제 1 외부단자전극은 전원용 고온측의 배선도체에 전기적으로 접속되며, 제 1 주면측의 제 2 외부단자전극은 접지측 배선도체에 전기적으로 접속되는 것을 특징으로 하는 배선기판 패키지 장치.
- 제 22 항에 있어서, MPU 칩은 배선기판의 제 1 기판면 위에 실장되고, 상기배선기판에는 제 1 기판면과 대향하는 제 2 기판면을 따라 개구를 갖는 공동이 설치되며, 제 2 주면은 상기 공동의 개구측을 향하고, 또한 상기 제 2 주면은 상기 제 2 기판면과 동일한 높이인 것을 특징으로 하는 배선기판 패키지 장치.
- 제 22 항에 있어서, MPU 칩은, 적층 커패시터의 제 1 및 제 2 외부단자전극의 배열피치와 실질적으로 같은 피치를 갖도록 배열된 복수개의 단자를 포함하는 것을 특징으로 하는 배선기판.
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101160363B1 (ko) * | 2005-02-09 | 2012-06-26 | 니혼도꾸슈도교 가부시키가이샤 | 배선기판 및 배선기판 내장용 콘덴서 |
Families Citing this family (71)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001189234A (ja) * | 1999-12-28 | 2001-07-10 | Tdk Corp | 積層コンデンサ |
US20020173072A1 (en) * | 2001-05-18 | 2002-11-21 | Larson Thane M. | Data capture plate for substrate components |
KR20030023125A (ko) * | 2001-09-12 | 2003-03-19 | 주식회사 글로텍 | 멀티플 라인 그리드를 이용한 반도체 패키지 |
JP2003110049A (ja) * | 2001-09-28 | 2003-04-11 | Fujitsu Ten Ltd | 高周波icパッケージ、高周波icパッケージを使用する高周波ユニット及び、その製造方法 |
JP3967108B2 (ja) * | 2001-10-26 | 2007-08-29 | 富士通株式会社 | 半導体装置およびその製造方法 |
US6900991B2 (en) * | 2001-12-03 | 2005-05-31 | Intel Corporation | Electronic assembly with sandwiched capacitors and methods of manufacture |
US6888432B2 (en) * | 2002-02-15 | 2005-05-03 | Murata Manufacturing Co., Ltd. | Laminated substrate, method of producing the same, nonreciprocal circuit element, and communication device |
JP3948321B2 (ja) * | 2002-03-26 | 2007-07-25 | 株式会社村田製作所 | 3端子コンデンサの実装構造 |
US6606237B1 (en) * | 2002-06-27 | 2003-08-12 | Murata Manufacturing Co., Ltd. | Multilayer capacitor, wiring board, decoupling circuit, and high frequency circuit incorporating the same |
JP2006179956A (ja) * | 2002-10-30 | 2006-07-06 | Kyocera Corp | コンデンサの製造方法 |
JP2006222442A (ja) * | 2002-10-30 | 2006-08-24 | Kyocera Corp | コンデンサ、及び配線基板 |
US7317622B2 (en) * | 2002-12-31 | 2008-01-08 | Intel Corporation | Method and apparatus for supplying power to a semiconductor device using a capacitor DC shunt |
DE10313891A1 (de) * | 2003-03-27 | 2004-10-14 | Epcos Ag | Elektrisches Vielschichtbauelement |
US6911941B2 (en) * | 2003-06-19 | 2005-06-28 | Harris Corporation | Dielectric substrate with selectively controlled effective permittivity and loss tangent |
EP1538639B1 (en) * | 2003-12-05 | 2007-02-28 | NGK Spark Plug Co., Ltd. | Capacitor and method for manufacturing the same |
US7265995B2 (en) * | 2003-12-29 | 2007-09-04 | Intel Corporation | Array capacitors with voids to enable a full-grid socket |
JP2005212016A (ja) * | 2004-01-28 | 2005-08-11 | Kyocera Corp | 電子部品封止用基板および多数個取り用電子部品封止用基板ならびに電子装置の製造方法 |
DE102004010001A1 (de) * | 2004-03-01 | 2005-09-22 | Epcos Ag | Elektrisches Bauelement und schaltungsanordnung mit dem Bauelement |
JP2005262382A (ja) * | 2004-03-18 | 2005-09-29 | Kyocera Corp | 電子装置およびその製造方法 |
JP4597585B2 (ja) * | 2004-06-04 | 2010-12-15 | 日本特殊陶業株式会社 | 積層電子部品及びその製造方法 |
JP4079120B2 (ja) * | 2004-06-04 | 2008-04-23 | 株式会社村田製作所 | 積層型セラミックコンデンサの製造方法 |
EP1768138A4 (en) | 2004-07-15 | 2010-09-22 | Panasonic Corp | CAPACITOR |
JP4224438B2 (ja) * | 2004-07-16 | 2009-02-12 | 日信工業株式会社 | 炭素繊維複合金属材料の製造方法 |
US7290315B2 (en) * | 2004-10-21 | 2007-11-06 | Intel Corporation | Method for making a passive device structure |
US20060158828A1 (en) * | 2004-12-21 | 2006-07-20 | Amey Daniel I Jr | Power core devices and methods of making thereof |
US7613007B2 (en) * | 2004-12-21 | 2009-11-03 | E. I. Du Pont De Nemours And Company | Power core devices |
US7548432B2 (en) * | 2005-03-24 | 2009-06-16 | Agency For Science, Technology And Research | Embedded capacitor structure |
US7629269B2 (en) * | 2005-03-31 | 2009-12-08 | Intel Corporation | High-k thin film grain size control |
US7375412B1 (en) * | 2005-03-31 | 2008-05-20 | Intel Corporation | iTFC with optimized C(T) |
US20060220177A1 (en) * | 2005-03-31 | 2006-10-05 | Palanduz Cengiz A | Reduced porosity high-k thin film mixed grains for thin film capacitor applications |
JP2006295076A (ja) * | 2005-04-14 | 2006-10-26 | Rohm Co Ltd | セラミック製チップ型電子部品とその製造方法 |
TWI396481B (zh) * | 2005-06-03 | 2013-05-11 | Ngk Spark Plug Co | 配線基板及其製造方法 |
US7453144B2 (en) * | 2005-06-29 | 2008-11-18 | Intel Corporation | Thin film capacitors and methods of making the same |
JP2007059708A (ja) * | 2005-08-25 | 2007-03-08 | Tdk Corp | 積層コンデンサの製造方法 |
CN1925720B (zh) * | 2005-09-01 | 2010-04-14 | 日本特殊陶业株式会社 | 布线基板、电容器 |
US7742314B2 (en) * | 2005-09-01 | 2010-06-22 | Ngk Spark Plug Co., Ltd. | Wiring board and capacitor |
US7697262B2 (en) * | 2005-10-31 | 2010-04-13 | Avx Corporation | Multilayer ceramic capacitor with internal current cancellation and bottom terminals |
US7728362B2 (en) * | 2006-01-20 | 2010-06-01 | International Business Machines Corporation | Creating integrated circuit capacitance from gate array structures |
TWI294681B (en) * | 2006-01-25 | 2008-03-11 | Ind Tech Res Inst | Image ground shielding structure |
US7825522B2 (en) * | 2006-07-18 | 2010-11-02 | Lsi Corporation | Hybrid bump capacitor |
JP5003082B2 (ja) * | 2006-09-26 | 2012-08-15 | 富士通株式会社 | インターポーザ及びその製造方法 |
JP4404089B2 (ja) * | 2006-12-13 | 2010-01-27 | Tdk株式会社 | 貫通コンデンサアレイ |
US7742276B2 (en) * | 2007-03-30 | 2010-06-22 | Industrial Technology Research Institute | Wiring structure of laminated capacitors |
US7969712B2 (en) * | 2007-04-19 | 2011-06-28 | Oracle America, Inc. | Power integrity circuits with EMI benefits |
JP2009027044A (ja) * | 2007-07-20 | 2009-02-05 | Taiyo Yuden Co Ltd | 積層コンデンサ及びコンデンサ内蔵配線基板 |
KR100867505B1 (ko) * | 2007-09-19 | 2008-11-07 | 삼성전기주식회사 | 적층형 칩 커패시터 실장용 회로기판 및 적층형 칩커패시터를 구비한 회로기판 장치 |
TWI341152B (en) * | 2007-10-26 | 2011-04-21 | Ind Tech Res Inst | Conductive connection structure of printed circuit board (pcb) |
KR100926619B1 (ko) * | 2007-12-05 | 2009-11-11 | 삼성모바일디스플레이주식회사 | 적층 세라믹 커패시터를 실장한 인쇄회로기판 및 이를이용한 평판 표시장치 |
JP2009158690A (ja) * | 2007-12-26 | 2009-07-16 | Ngk Spark Plug Co Ltd | ビアアレイ型積層セラミックコンデンサ及びその製造方法、コンデンサ内蔵配線基板 |
JP4438864B2 (ja) * | 2007-12-28 | 2010-03-24 | 株式会社村田製作所 | 基板及びこれを備えた電子装置 |
US8125761B2 (en) * | 2008-02-22 | 2012-02-28 | Industrial Technology Research Institute | Capacitor devices with co-coupling electrode planes |
US20090296310A1 (en) * | 2008-06-03 | 2009-12-03 | Azuma Chikara | Chip capacitor precursors, packaged semiconductors, and assembly method for converting the precursors to capacitors |
US8107254B2 (en) * | 2008-11-20 | 2012-01-31 | International Business Machines Corporation | Integrating capacitors into vias of printed circuit boards |
JP2010212595A (ja) * | 2009-03-12 | 2010-09-24 | Murata Mfg Co Ltd | パッケージ基板 |
US8242384B2 (en) | 2009-09-30 | 2012-08-14 | International Business Machines Corporation | Through hole-vias in multi-layer printed circuit boards |
US8432027B2 (en) * | 2009-11-11 | 2013-04-30 | International Business Machines Corporation | Integrated circuit die stacks with rotationally symmetric vias |
US8315068B2 (en) | 2009-11-12 | 2012-11-20 | International Business Machines Corporation | Integrated circuit die stacks having initially identical dies personalized with fuses and methods of manufacturing the same |
US8258619B2 (en) * | 2009-11-12 | 2012-09-04 | International Business Machines Corporation | Integrated circuit die stacks with translationally compatible vias |
US8310841B2 (en) * | 2009-11-12 | 2012-11-13 | International Business Machines Corporation | Integrated circuit die stacks having initially identical dies personalized with switches and methods of making the same |
US8664537B2 (en) * | 2009-12-21 | 2014-03-04 | Trw Automotive U.S. Llc | Method and apparatus for reducing signal noise |
US9646947B2 (en) * | 2009-12-22 | 2017-05-09 | Lenovo Enterprise Solutions (Singapore) Pte. Ltd. | Integrated circuit with inductive bond wires |
KR20110072938A (ko) * | 2009-12-23 | 2011-06-29 | 삼성전기주식회사 | 적층 세라믹 커패시터 및 그 제조방법 |
US20130334657A1 (en) * | 2012-06-15 | 2013-12-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Planar interdigitated capacitor structures and methods of forming the same |
US9076698B2 (en) * | 2012-10-23 | 2015-07-07 | Intel Corporation | Flexible package-to-socket interposer |
US9035194B2 (en) * | 2012-10-30 | 2015-05-19 | Intel Corporation | Circuit board with integrated passive devices |
KR20140072247A (ko) * | 2012-11-29 | 2014-06-13 | 삼성전자주식회사 | 인쇄회로기판 및 이를 포함하는 장치 |
JP6136061B2 (ja) * | 2012-12-13 | 2017-05-31 | 株式会社村田製作所 | 半導体装置 |
US20140167900A1 (en) | 2012-12-14 | 2014-06-19 | Gregorio R. Murtagian | Surface-mount inductor structures for forming one or more inductors with substrate traces |
US10128317B2 (en) * | 2014-12-22 | 2018-11-13 | Emagin Corporation | Method for eliminating electrical cross-talk in OLED microdisplays |
WO2018063279A1 (en) * | 2016-09-30 | 2018-04-05 | Intel Corporation | Vertical embedded component in a printed circuit board blind hole |
WO2023272644A1 (zh) | 2021-06-30 | 2023-01-05 | 深南电路股份有限公司 | 一种电子组件、电压调节模块以及稳压器件 |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3370010A (en) * | 1966-05-03 | 1968-02-20 | Sinclair Research Inc | Mineral lubricating oil containing polymer having anti-wear properties |
US4328530A (en) * | 1980-06-30 | 1982-05-04 | International Business Machines Corporation | Multiple layer, ceramic carrier for high switching speed VLSI chips |
US4349862A (en) * | 1980-08-11 | 1982-09-14 | International Business Machines Corporation | Capacitive chip carrier and multilayer ceramic capacitors |
JPS60158612A (ja) | 1984-01-27 | 1985-08-20 | 富士通株式会社 | 多層セラミツクコンデンサ |
US4916576A (en) * | 1989-02-27 | 1990-04-10 | Fmtt, Inc. | Matrix capacitor |
JP2534134B2 (ja) | 1989-07-03 | 1996-09-11 | 富士写真フイルム株式会社 | 給紙カセット及び治具 |
US5177670A (en) * | 1991-02-08 | 1993-01-05 | Hitachi, Ltd. | Capacitor-carrying semiconductor module |
JPH05205966A (ja) | 1992-01-24 | 1993-08-13 | Murata Mfg Co Ltd | 積層コンデンサ |
JPH0722728A (ja) | 1993-07-06 | 1995-01-24 | Ibiden Co Ltd | 電子部品搭載用基板 |
JPH07142283A (ja) | 1993-11-17 | 1995-06-02 | Fujitsu Ltd | コンデンサ及びこれを用いた実装構造 |
JPH07201651A (ja) | 1993-12-28 | 1995-08-04 | Sumitomo Metal Ind Ltd | 積層コンデンサ |
JPH07235632A (ja) | 1994-02-21 | 1995-09-05 | Hitachi Ltd | コンデンサユニットおよびコンデンサユニット内蔵電子回路装置 |
JP3651925B2 (ja) | 1994-04-27 | 2005-05-25 | 京セラ株式会社 | 積層コンデンサ基板の製造方法 |
JPH07307412A (ja) * | 1994-05-10 | 1995-11-21 | Sumitomo Metal Ind Ltd | バイパス用コンデンサ搭載積層パッケージ |
JPH07326536A (ja) | 1994-05-31 | 1995-12-12 | Kyocera Corp | セラミックコンデンサ |
JPH0935998A (ja) * | 1995-07-21 | 1997-02-07 | Matsushita Electric Ind Co Ltd | 積層貫通コンデンサー |
JPH11317490A (ja) | 1997-10-16 | 1999-11-16 | Hitachi Ltd | 半導体素子搭載基板 |
JP2991175B2 (ja) | 1997-11-10 | 1999-12-20 | 株式会社村田製作所 | 積層コンデンサ |
US6549395B1 (en) * | 1997-11-14 | 2003-04-15 | Murata Manufacturing Co., Ltd | Multilayer capacitor |
JPH11204372A (ja) | 1997-11-14 | 1999-07-30 | Murata Mfg Co Ltd | 積層コンデンサ |
DE69837516T2 (de) * | 1997-11-14 | 2007-12-27 | Murata Mfg. Co., Ltd., Nagaokakyo | Vielschichtkondensator |
US6327134B1 (en) * | 1999-10-18 | 2001-12-04 | Murata Manufacturing Co., Ltd. | Multi-layer capacitor, wiring board, and high-frequency circuit |
JP3489728B2 (ja) | 1999-10-18 | 2004-01-26 | 株式会社村田製作所 | 積層コンデンサ、配線基板および高周波回路 |
JP3337018B2 (ja) * | 1999-11-19 | 2002-10-21 | 株式会社村田製作所 | 積層コンデンサ、配線基板、デカップリング回路および高周波回路 |
JP3489729B2 (ja) * | 1999-11-19 | 2004-01-26 | 株式会社村田製作所 | 積層コンデンサ、配線基板、デカップリング回路および高周波回路 |
JP2001167969A (ja) * | 1999-12-06 | 2001-06-22 | Tdk Corp | 三次元搭載用多端子積層セラミックコンデンサ |
JP2001189234A (ja) * | 1999-12-28 | 2001-07-10 | Tdk Corp | 積層コンデンサ |
JP4332634B2 (ja) * | 2000-10-06 | 2009-09-16 | Tdk株式会社 | 積層型電子部品 |
-
1999
- 1999-12-27 JP JP37080299A patent/JP2001185442A/ja active Pending
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2000
- 2000-05-31 US US09/584,838 patent/US6556420B1/en not_active Expired - Lifetime
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- 2000-06-06 DE DE10027870A patent/DE10027870B4/de not_active Expired - Lifetime
- 2000-06-07 KR KR10-2000-0031118A patent/KR100367859B1/ko active IP Right Grant
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- 2001-10-23 US US09/983,187 patent/US6721153B2/en not_active Expired - Lifetime
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- 2004-01-08 US US10/753,004 patent/US7215531B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101160363B1 (ko) * | 2005-02-09 | 2012-06-26 | 니혼도꾸슈도교 가부시키가이샤 | 배선기판 및 배선기판 내장용 콘덴서 |
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TW507226B (en) | 2002-10-21 |
US20030142460A1 (en) | 2003-07-31 |
US6678145B2 (en) | 2004-01-13 |
KR20010066819A (ko) | 2001-07-11 |
US20040140553A1 (en) | 2004-07-22 |
US6721153B2 (en) | 2004-04-13 |
JP2001185442A (ja) | 2001-07-06 |
US7215531B2 (en) | 2007-05-08 |
DE10027870B4 (de) | 2009-08-06 |
DE10027870A1 (de) | 2001-07-26 |
US20020191366A1 (en) | 2002-12-19 |
US6556420B1 (en) | 2003-04-29 |
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