JP6342998B2 - 可溶性金属酸化物カルボキシレートのスピンオン組成物及びそれらの使用方法 - Google Patents

可溶性金属酸化物カルボキシレートのスピンオン組成物及びそれらの使用方法 Download PDF

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JP6342998B2
JP6342998B2 JP2016522511A JP2016522511A JP6342998B2 JP 6342998 B2 JP6342998 B2 JP 6342998B2 JP 2016522511 A JP2016522511 A JP 2016522511A JP 2016522511 A JP2016522511 A JP 2016522511A JP 6342998 B2 JP6342998 B2 JP 6342998B2
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metal oxide
dicarboxylate
composition
ester
group
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JP2016532739A (ja
JP2016532739A5 (enExample
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ラーマン・エム・ダリル
チャダ・ヴェンカタ・ゴーパル・レッディー
ヤオ・フェイロン
アニャディグヴ・クレメント
マッケンジー・ダグラス
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AZ Electronic Materials Luxembourg SARL
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/06—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
    • C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0276—Photolithographic processes using an anti-reflective coating

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Thermal Sciences (AREA)
  • Power Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Ceramic Engineering (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2016522511A 2013-06-28 2014-06-26 可溶性金属酸化物カルボキシレートのスピンオン組成物及びそれらの使用方法 Active JP6342998B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/930,711 2013-06-28
US13/930,711 US9201305B2 (en) 2013-06-28 2013-06-28 Spin-on compositions of soluble metal oxide carboxylates and methods of their use
PCT/EP2014/063593 WO2014207142A1 (en) 2013-06-28 2014-06-26 Spin-on compositions of soluble metal oxide carboxylates and methods of their use

Publications (3)

Publication Number Publication Date
JP2016532739A JP2016532739A (ja) 2016-10-20
JP2016532739A5 JP2016532739A5 (enExample) 2017-03-23
JP6342998B2 true JP6342998B2 (ja) 2018-06-13

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Country Status (8)

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US (1) US9201305B2 (enExample)
EP (1) EP3014358B1 (enExample)
JP (1) JP6342998B2 (enExample)
KR (1) KR102128141B1 (enExample)
CN (1) CN105209973B (enExample)
SG (1) SG11201507487TA (enExample)
TW (1) TWI606098B (enExample)
WO (1) WO2014207142A1 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4239409A1 (en) 2022-03-03 2023-09-06 Shin-Etsu Chemical Co., Ltd. Composition for forming metal oxide film, patterning process, and method for forming metal oxide film
EP4276535A1 (en) 2022-05-10 2023-11-15 Shin-Etsu Chemical Co., Ltd. Composition for forming metal oxide film, patterning process, and method for forming metal oxide film
EP4592753A2 (en) 2024-01-23 2025-07-30 Shin-Etsu Chemical Co., Ltd. Composition for forming metal-containing film and patterning process
EP4606882A1 (en) 2024-02-20 2025-08-27 Shin-Etsu Chemical Co., Ltd. Cleaning solution, method for cleaning substrate, and method for forming metal-containing film

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5889568B2 (ja) 2011-08-11 2016-03-22 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ 酸化タングステン膜形成用組成物およびそれを用いた酸化タングステン膜の製造法
US9315636B2 (en) 2012-12-07 2016-04-19 Az Electronic Materials (Luxembourg) S.A.R.L. Stable metal compounds, their compositions and methods
US9296922B2 (en) * 2013-08-30 2016-03-29 Az Electronic Materials (Luxembourg) S.A.R.L. Stable metal compounds as hardmasks and filling materials, their compositions and methods of use
US9418836B2 (en) 2014-01-14 2016-08-16 Az Electronic Materials (Luxembourg) S.A.R.L. Polyoxometalate and heteropolyoxometalate compositions and methods for their use
US9409793B2 (en) 2014-01-14 2016-08-09 Az Electronic Materials (Luxembourg) S.A.R.L. Spin coatable metallic hard mask compositions and processes thereof
US9499698B2 (en) * 2015-02-11 2016-11-22 Az Electronic Materials (Luxembourg)S.A.R.L. Metal hardmask composition and processes for forming fine patterns on semiconductor substrates
TW201741766A (zh) * 2015-12-17 2017-12-01 陶氏全球科技責任有限公司 具有高介電常數之光可成像薄膜
US10241409B2 (en) * 2015-12-22 2019-03-26 AZ Electronic Materials (Luxembourg) S.à.r.l. Materials containing metal oxides, processes for making same, and processes for using same
JP6591058B2 (ja) * 2016-05-19 2019-10-16 三井化学株式会社 金属含有膜形成用組成物、金属含有膜形成用組成物の製造方法、半導体装置、及び半導体装置の製造方法
EP3559746B1 (en) * 2016-12-21 2021-03-31 Merck Patent GmbH Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer
US20200002568A1 (en) 2017-03-16 2020-01-02 Merck Patent Gmbh Lithographic compositions and methods of use thereof
WO2019048393A1 (en) * 2017-09-06 2019-03-14 AZ Electronic Materials (Luxembourg) S.à.r.l. AN INORGANIC OXIDE-CONTAINING VINYL DEPOSITION COMPOSITION USEFUL AS HARD MASKS AND FILLING MATERIALS HAVING ENHANCED THERMAL STABILITY
US11276572B2 (en) * 2017-12-08 2022-03-15 Tokyo Electron Limited Technique for multi-patterning substrates
US10354922B1 (en) 2017-12-27 2019-07-16 International Business Machines Corporation Simplified block patterning with wet strippable hardmask for high-energy implantation
US12099305B2 (en) 2019-07-08 2024-09-24 Merck Patent Gmbh Rinse and method of use thereof for removing edge protection layers and residual metal hardmask components
US20210389670A1 (en) * 2020-06-12 2021-12-16 Taiwan Semiconductor Manufacturing Co., Ltd. Photoresist composition and method of manufacturing a semiconductor device
US20240027889A1 (en) * 2020-12-24 2024-01-25 Tokyo Ohka Kogyo Co., Ltd. Metal oxide film-forming composition, method for producing metal oxide films using same, and method for reducing volume shrinkage ratio of metal oxide films
KR20240004768A (ko) 2021-05-06 2024-01-11 메르크 파텐트 게엠베하 스핀 온 금속 유기 제제
KR20240037974A (ko) * 2021-07-28 2024-03-22 제이에스알 가부시끼가이샤 레지스트 하층막 형성용 조성물, 반도체 기판의 제조 방법 및 레지스트 하층막의 형성 방법
CN118435121A (zh) * 2022-01-14 2024-08-02 Jsr株式会社 半导体基板的制造方法、抗蚀剂底层膜的形成方法及清洗液

Family Cites Families (108)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3035071A (en) 1957-06-24 1962-05-15 Du Pont Titanium acylate silicone copolymers
US3474054A (en) 1966-09-13 1969-10-21 Permalac Corp The Surface coating compositions containing pyridine salts or aromatic sulfonic acids
US3625934A (en) 1968-07-02 1971-12-07 Jacobus Rinse Oligomers of mixed tetravalent element oxides
US3758269A (en) 1971-10-12 1973-09-11 Sybron Corp Anionically modified nylon in a jute backed carpet cation dyes and long chain alkyl quaternary ammonium salt applied to
US4251665A (en) 1978-05-22 1981-02-17 King Industries, Inc. Aromatic sulfonic acid oxa-azacyclopentane adducts
US4200729A (en) 1978-05-22 1980-04-29 King Industries, Inc Curing amino resins with aromatic sulfonic acid oxa-azacyclopentane adducts
US4347347A (en) 1979-06-28 1982-08-31 Ube Industries, Ltd. Crosslinked organometallic block copolymers and process for production thereof
JPS5694651A (en) * 1979-12-28 1981-07-31 Tokyo Denshi Kagaku Kabushiki Manufacture of material for electronic parts
JPS56119774A (en) * 1980-02-22 1981-09-19 Tokyo Denshi Kagaku Kabushiki Liquid composition for forming metal oxide coat
JPS56159223A (en) 1980-05-13 1981-12-08 Seishi Yajima Production of heat-resistant compound
US4416789A (en) 1982-02-01 1983-11-22 Rca Corporation High density information disc lubricants
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4526766A (en) 1983-12-13 1985-07-02 Erco Industries Limited Production of red phosphorus
US4529766A (en) 1984-06-08 1985-07-16 The B. F. Goodrich Company Carboxylated rubber composition containing scorch inhibitor
JPS61136683A (ja) * 1984-12-07 1986-06-24 Fuji Photo Film Co Ltd 六方晶系フエライト薄膜の製法
JPS6229016A (ja) * 1985-07-31 1987-02-07 双葉電子工業株式会社 透明導電膜形成液
JPH0610353B2 (ja) * 1986-02-07 1994-02-09 富士写真フイルム株式会社 六方晶系フエライト薄膜の製造法
JPS6356529A (ja) 1986-08-27 1988-03-11 Nissan Chem Ind Ltd 新規チタノシロキサン重合体の製造法
JP2565501B2 (ja) * 1987-02-06 1996-12-18 白水化学工業株式会社 金属材料の高温酸化防止用金属含有組成物の製法
JPS63293178A (ja) * 1987-05-25 1988-11-30 Hakusui Kagaku Kogyo Kk 金属材料の高温酸化防止用金属含有組成物およびその製造法
JPS6452074A (en) * 1987-08-24 1989-02-28 Mitsubishi Electric Corp Coating agent for forming oxide-based superconducting film
JPH0250973A (ja) * 1988-08-10 1990-02-20 Osaka City 黄金色製品およびその製造方法
US5178989A (en) 1989-07-21 1993-01-12 Board Of Regents, The University Of Texas System Pattern forming and transferring processes
JPH03138922A (ja) 1989-10-24 1991-06-13 Matsushita Electric Ind Co Ltd 微細パターン形成方法
EP0440374B1 (en) 1990-01-30 1997-04-16 Wako Pure Chemical Industries Ltd Chemical amplified resist material
US5187019A (en) 1991-09-06 1993-02-16 King Industries, Inc. Latent catalysts
JPH0570717A (ja) * 1991-09-10 1993-03-23 Japan Synthetic Rubber Co Ltd 透明な導電性膜形成用塗布液
JPH0632756A (ja) 1992-07-14 1994-02-08 Ube Ind Ltd ビス（ヒドロキシフェニル）メタン類の製造方法
JP3542156B2 (ja) 1994-02-25 2004-07-14 ダウ コーニング アジア株式会社 有機溶媒に可溶なポリチタノシロキサンの製造方法
US5563228A (en) 1994-02-25 1996-10-08 Dow Corning Asia, Ltd. Method for the preparation of polyheterosiloxanes
DE69528423T2 (de) * 1994-08-11 2003-06-26 Canon K.K., Tokio/Tokyo Verwendung einer Lösung für die Herstellung einer elektroemittierenden Vorrichtung und Methode zur Herstellung von elektroemittierenden Vorrichtungen
JP3230395B2 (ja) * 1994-11-17 2001-11-19 三菱マテリアル株式会社 導電膜形成用組成物と導電膜の形成方法
US5843624A (en) 1996-03-08 1998-12-01 Lucent Technologies Inc. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
US5772978A (en) 1996-04-24 1998-06-30 Minnesota Mining And Manufacturing Company Process for producing tungsten oxide
US6808859B1 (en) 1996-12-31 2004-10-26 Hyundai Electronics Industries Co., Ltd. ArF photoresist copolymers
US5879859A (en) 1997-07-16 1999-03-09 International Business Machines Corporation Strippable photoimageable compositions
JPH11258813A (ja) * 1998-03-13 1999-09-24 Jsr Corp 反射防止膜形成用組成物および反射防止膜
JP2000010293A (ja) 1998-06-17 2000-01-14 Jsr Corp 反射防止膜形成用組成物および反射防止膜
US6849377B2 (en) 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
US6790587B1 (en) 1999-05-04 2004-09-14 E. I. Du Pont De Nemours And Company Fluorinated polymers, photoresists and processes for microlithography
US6348299B1 (en) 1999-07-12 2002-02-19 International Business Machines Corporation RIE etch resistant nonchemically amplified resist composition and use thereof
WO2001098834A1 (en) 2000-06-21 2001-12-27 Asahi Glass Company, Limited Resist composition
US6242156B1 (en) 2000-06-28 2001-06-05 Gary Ganghui Teng Lithographic plate having a conformal radiation-sensitive layer on a rough substrate
US6447980B1 (en) 2000-07-19 2002-09-10 Clariant Finance (Bvi) Limited Photoresist composition for deep UV and process thereof
US20020155389A1 (en) 2000-10-24 2002-10-24 Bharath Rangarajan Inverse resist coating process
KR100776551B1 (ko) 2001-02-09 2007-11-16 아사히 가라스 가부시키가이샤 레지스트 조성물
JP2002363490A (ja) * 2001-06-11 2002-12-18 Jsr Corp 絶縁膜形成用組成物、膜の形成方法およびシリカ系絶縁膜
US6723488B2 (en) 2001-11-07 2004-04-20 Clariant Finance (Bvi) Ltd Photoresist composition for deep UV radiation containing an additive
US7455955B2 (en) 2002-02-27 2008-11-25 Brewer Science Inc. Planarization method for multi-layer lithography processing
US6740469B2 (en) 2002-06-25 2004-05-25 Brewer Science Inc. Developer-soluble metal alkoxide coatings for microelectronic applications
US6872506B2 (en) 2002-06-25 2005-03-29 Brewer Science Inc. Wet-developable anti-reflective compositions
JP3580547B2 (ja) * 2002-09-30 2004-10-27 三井金属鉱業株式会社 アルコール濃度検出装置およびそれを用いたアルコール濃度検出方法、ならびにアルコール濃度検出センサーの製造方法
JP2004179254A (ja) 2002-11-25 2004-06-24 Renesas Technology Corp 半導体装置の製造方法
JP2004179391A (ja) * 2002-11-27 2004-06-24 Tokyo Ohka Kogyo Co Ltd 半導体多層配線形成方法
US20040171743A1 (en) 2003-01-21 2004-09-02 Terry Brewer, Ph.D. Hybrid organic-inorganic polymer coatings with high refractive indices
EP1832621B1 (en) 2003-03-14 2017-03-08 Nippon Shokubai Co.,Ltd. Method of surface crosslinking a water-absorbing resin powder
DE602004001268T2 (de) 2003-04-25 2007-06-06 Jsr Corp. Polierkissen und chemisch-mechanisches Polierverfahren
DE10352139A1 (de) 2003-11-04 2005-06-09 Basell Polyolefine Gmbh Organoübergangsmetallverbindung, Biscyclopentadienylligandsystem und Verfahren zur Herstellung von Polyolefinen
JP4131864B2 (ja) 2003-11-25 2008-08-13 東京応化工業株式会社 化学増幅型ポジ型感光性熱硬化性樹脂組成物、硬化物の形成方法、及び機能素子の製造方法
DE602004026635D1 (de) 2003-12-26 2010-05-27 Nissan Chemical Ind Ltd Zusammensetzung zur bildung eines nitridbeschichtungsfilms für eine hartmaske
JP4602971B2 (ja) * 2004-02-20 2010-12-22 日本曹達株式会社 光感応性基体及びパターニング方法
JP4620967B2 (ja) 2004-04-26 2011-01-26 太陽ホールディングス株式会社 永久穴埋め用熱硬化性樹脂組成物
ITPG20040013A1 (it) * 2004-04-30 2004-07-30 Fuma Tech Gmbh Soluzioni organiche di precursori di fosfati e pirofosfati di metalli tetravalenti e loro impiego per la modificazione di elettrodi e per la preparazione di membrane composite per celle a combustibile operanti a temperature >900 centigradi e/o a bass
JP4461901B2 (ja) 2004-05-11 2010-05-12 Ｔｄｋ株式会社 ホログラム記録材料及びホログラム記録媒体
KR101001441B1 (ko) 2004-08-17 2010-12-14 삼성전자주식회사 유무기 금속 하이브리드 물질 및 이를 포함하는 유기절연체 조성물
JP4811757B2 (ja) 2004-09-30 2011-11-09 独立行政法人産業技術総合研究所 メソポーラス金属酸化物複合光導波路センサー、その製造方法及びそれを用いたガスセンサー
US7563549B2 (en) 2005-05-20 2009-07-21 Xerox Corporation Imaging member
CA2610461A1 (en) 2005-06-03 2006-12-07 Kuraray Co., Ltd. Gas barrier laminate, method for producing same and package body using same
KR100666477B1 (ko) 2005-06-16 2007-01-11 한국과학기술연구원 산화티타늄 나노로드 및 그의 제조방법
US7326442B2 (en) 2005-07-14 2008-02-05 International Business Machines Corporation Antireflective composition and process of making a lithographic structure
JP4437226B2 (ja) 2005-08-30 2010-03-24 国立大学法人 新潟大学 光触媒膜の製造方法
KR101038377B1 (ko) 2005-09-13 2011-06-01 신닛테츠가가쿠 가부시키가이샤 열경화성 수지 조성물
CN101300289B (zh) * 2005-10-28 2012-07-25 陶氏环球技术有限责任公司 倍半硅氧烷-二氧化钛杂化聚合物
JP4553835B2 (ja) 2005-12-14 2010-09-29 信越化学工業株式会社 反射防止膜材料、及びこれを用いたパターン形成方法、基板
JP5117002B2 (ja) * 2006-07-10 2013-01-09 富士フイルム株式会社 光硬化性組成物およびそれを用いたパターン形成方法
KR20090055025A (ko) 2006-08-29 2009-06-01 제이에스알 가부시끼가이샤 감광성 절연 수지 조성물 및 그의 경화물
US8168372B2 (en) 2006-09-25 2012-05-01 Brewer Science Inc. Method of creating photolithographic structures with developer-trimmed hard mask
JP4204611B2 (ja) 2006-09-25 2009-01-07 信越化学工業株式会社 フォトマスクブランクの製造方法
US7416834B2 (en) 2006-09-27 2008-08-26 Az Electronic Materials Usa Corp. Antireflective coating compositions
FR2916199B1 (fr) 2007-05-14 2012-10-19 Inst Francais Du Petrole Procede d'oligomerisation des olefines utilisant une composition catalytique comprenant un complexe organometallique contenant un ligand phenoxy fonctionnalise par un hetero-atome
US8039201B2 (en) 2007-11-21 2011-10-18 Az Electronic Materials Usa Corp. Antireflective coating composition and process thereof
JP5625210B2 (ja) 2007-12-27 2014-11-19 ナガセケムテックス株式会社 硬化性組成物
JP5512934B2 (ja) * 2008-05-09 2014-06-04 住友化学株式会社 非晶質のＺｒ−Ｏ系粒子を分散質とするゾル、その製造方法、このゾルをバインダーとする光触媒体コーティング液、およびその光触媒体コーティング液を塗布した光触媒機能製品の製造方法
JP5101541B2 (ja) 2008-05-15 2012-12-19 信越化学工業株式会社 パターン形成方法
JP5503916B2 (ja) 2008-08-04 2014-05-28 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
WO2010021030A1 (ja) 2008-08-20 2010-02-25 富士通株式会社 レジスト増感膜形成用材料、半導体装置の製造方法、半導体装置、及び磁気ヘッド
JP5336306B2 (ja) 2008-10-20 2013-11-06 信越化学工業株式会社 レジスト下層膜形成方法、これを用いたパターン形成方法、及びレジスト下層膜材料
WO2010047109A1 (ja) 2008-10-23 2010-04-29 国立大学法人三重大学 ポリオルガノシロキサン組成物およびその硬化体
EP2477738B1 (en) 2009-09-15 2019-01-23 Basf Se Photo-latent titanium-chelate catalysts
JP5534250B2 (ja) 2009-09-16 2014-06-25 日産化学工業株式会社 スルホンアミド基を有するシリコン含有レジスト下層膜形成組成物
JP5721992B2 (ja) 2009-10-14 2015-05-20 富士フイルム株式会社 着色硬化性組成物、レジスト液、インクジェット用インク、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、液晶ディスプレイ、有機ｅｌディスプレイ、画像表示デバイス、及び色素化合物
US9243347B2 (en) 2010-02-15 2016-01-26 Cornell University Process of making nanofibers
EP2400304A1 (en) 2010-06-22 2011-12-28 Centro de Investigación Cooperativa En Biomateriales ( CIC biomaGUNE) Method for the characterization of intermolecular interactions
JP5266294B2 (ja) 2010-11-01 2013-08-21 信越化学工業株式会社 レジスト下層膜材料及びこれを用いたパターン形成方法
KR102138449B1 (ko) 2011-01-18 2020-07-27 히타치가세이가부시끼가이샤 수지 조성물, 이것을 이용한 프리프레그, 적층판 및 인쇄 배선판
WO2012118847A2 (en) 2011-02-28 2012-09-07 Inpria Corportion Solution processible hardmarks for high resolusion lithography
JP5938989B2 (ja) * 2011-03-30 2016-06-22 Jsr株式会社 多層レジストプロセス用無機膜形成組成物及びパターン形成方法
JP2012237823A (ja) 2011-05-10 2012-12-06 Konica Minolta Business Technologies Inc 電子写真感光体、それを含むプロセスカートリッジおよび画像形成装置
CA2834809A1 (en) 2011-05-13 2012-11-22 Greencentre Canada Group 11 mono-metallic precursor compounds and use thereof in metal deposition
US8568958B2 (en) 2011-06-21 2013-10-29 Az Electronic Materials Usa Corp. Underlayer composition and process thereof
US8647809B2 (en) * 2011-07-07 2014-02-11 Brewer Science Inc. Metal-oxide films from small molecules for lithographic applications
JP5889568B2 (ja) 2011-08-11 2016-03-22 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ 酸化タングステン膜形成用組成物およびそれを用いた酸化タングステン膜の製造法
US9315636B2 (en) 2012-12-07 2016-04-19 Az Electronic Materials (Luxembourg) S.A.R.L. Stable metal compounds, their compositions and methods
JP5830048B2 (ja) 2013-03-15 2015-12-09 信越化学工業株式会社 チタン含有レジスト下層膜形成用組成物及びパターン形成方法
US20150024522A1 (en) 2013-07-22 2015-01-22 Rohm And Haas Electronic Materials Llc Organometal materials and process
US9296922B2 (en) 2013-08-30 2016-03-29 Az Electronic Materials (Luxembourg) S.A.R.L. Stable metal compounds as hardmasks and filling materials, their compositions and methods of use
US9418836B2 (en) 2014-01-14 2016-08-16 Az Electronic Materials (Luxembourg) S.A.R.L. Polyoxometalate and heteropolyoxometalate compositions and methods for their use
US9409793B2 (en) 2014-01-14 2016-08-09 Az Electronic Materials (Luxembourg) S.A.R.L. Spin coatable metallic hard mask compositions and processes thereof

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4239409A1 (en) 2022-03-03 2023-09-06 Shin-Etsu Chemical Co., Ltd. Composition for forming metal oxide film, patterning process, and method for forming metal oxide film
KR20230130557A (ko) 2022-03-03 2023-09-12 신에쓰 가가꾸 고교 가부시끼가이샤 금속 산화막 형성용 조성물, 패턴 형성 방법 및 금속 산화막 형성 방법
EP4276535A1 (en) 2022-05-10 2023-11-15 Shin-Etsu Chemical Co., Ltd. Composition for forming metal oxide film, patterning process, and method for forming metal oxide film
KR20230157882A (ko) 2022-05-10 2023-11-17 신에쓰 가가꾸 고교 가부시끼가이샤 금속 산화막 형성용 조성물, 패턴 형성 방법 및 금속 산화막 형성 방법
EP4592753A2 (en) 2024-01-23 2025-07-30 Shin-Etsu Chemical Co., Ltd. Composition for forming metal-containing film and patterning process
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EP4606882A1 (en) 2024-02-20 2025-08-27 Shin-Etsu Chemical Co., Ltd. Cleaning solution, method for cleaning substrate, and method for forming metal-containing film
KR20250128245A (ko) 2024-02-20 2025-08-27 신에쓰 가가꾸 고교 가부시끼가이샤 세정액, 기판의 세정 방법 및 금속 함유막의 형성 방법

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EP3014358A1 (en) 2016-05-04
US20150004801A1 (en) 2015-01-01
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KR102128141B1 (ko) 2020-06-30
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US9201305B2 (en) 2015-12-01

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