JPS5694651A - Manufacture of material for electronic parts - Google Patents

Manufacture of material for electronic parts

Info

Publication number
JPS5694651A
JPS5694651A JP17028679A JP17028679A JPS5694651A JP S5694651 A JPS5694651 A JP S5694651A JP 17028679 A JP17028679 A JP 17028679A JP 17028679 A JP17028679 A JP 17028679A JP S5694651 A JPS5694651 A JP S5694651A
Authority
JP
Japan
Prior art keywords
titanic
alcohol
substrate
alkoxide
carboxylic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17028679A
Other languages
Japanese (ja)
Other versions
JPS6366903B2 (en
Inventor
Mitsuaki Minato
Muneo Nakayama
Akira Hashimoto
Toshihiro Nishimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO DENSHI KAGAKU KABUSHIKI
Tokyo Denshi Kagaku KK
Original Assignee
TOKYO DENSHI KAGAKU KABUSHIKI
Tokyo Denshi Kagaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO DENSHI KAGAKU KABUSHIKI, Tokyo Denshi Kagaku KK filed Critical TOKYO DENSHI KAGAKU KABUSHIKI
Priority to JP17028679A priority Critical patent/JPS5694651A/en
Publication of JPS5694651A publication Critical patent/JPS5694651A/en
Publication of JPS6366903B2 publication Critical patent/JPS6366903B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate

Abstract

PURPOSE:To simply obtain a coating film having a flat and uniform surface without any pinholes by using a substance produced by reaction of titanic alkoxide on carboxylic acid and alcohol on the occasion that an oxidized titanic film is formed on a substrate of semiconductor, glass, ceramic or the like. CONSTITUTION:The substrate produced by the reaction of titanic alkoxide on carboxylic acid and alcohol, which is expressed by a general formula R1mTi(OR2)4- m(where R1 and R2 are alkyl and allyl respectively), is applied on to a substrate of silicon, germanium, glass, ceramic or the like by a rotating spinner and baked for one hour at the temperature of 500 deg.C, whereby the continuous layer of the oxidized titanic coating film. In this case, titanic tetramethoxide, titanic tetraethoxide or the like is used as the titanic alkoxide, while glacial acetic acid, acetic anhydride or the like is used as the carboxylic acid, and methyl alcohol, ethyl alcohol or the like is used as the alcohol. By this method, the coating 0.05-1mum thick is obtained, and the surface can be made smooth even when there is unevenness on the substrate.
JP17028679A 1979-12-28 1979-12-28 Manufacture of material for electronic parts Granted JPS5694651A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17028679A JPS5694651A (en) 1979-12-28 1979-12-28 Manufacture of material for electronic parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17028679A JPS5694651A (en) 1979-12-28 1979-12-28 Manufacture of material for electronic parts

Publications (2)

Publication Number Publication Date
JPS5694651A true JPS5694651A (en) 1981-07-31
JPS6366903B2 JPS6366903B2 (en) 1988-12-22

Family

ID=15902124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17028679A Granted JPS5694651A (en) 1979-12-28 1979-12-28 Manufacture of material for electronic parts

Country Status (1)

Country Link
JP (1) JPS5694651A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6325930A (en) * 1986-07-18 1988-02-03 Toshiba Components Kk Semiconductor device
JP2016532739A (en) * 2013-06-28 2016-10-20 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ Spin-on compositions of soluble metal oxide carboxylates and methods for their use

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5314699A (en) * 1976-07-23 1978-02-09 Pechiney Aluminium Alumina mass having good mechanical strength and method of making same
JPS55167130A (en) * 1979-06-12 1980-12-26 Hitachi Ltd Metal oxide thin film forming method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5314699A (en) * 1976-07-23 1978-02-09 Pechiney Aluminium Alumina mass having good mechanical strength and method of making same
JPS55167130A (en) * 1979-06-12 1980-12-26 Hitachi Ltd Metal oxide thin film forming method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6325930A (en) * 1986-07-18 1988-02-03 Toshiba Components Kk Semiconductor device
JP2016532739A (en) * 2013-06-28 2016-10-20 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ Spin-on compositions of soluble metal oxide carboxylates and methods for their use

Also Published As

Publication number Publication date
JPS6366903B2 (en) 1988-12-22

Similar Documents

Publication Publication Date Title
ES8105042A1 (en) method of preparing alkoxyde coatings on substrates, such as solar cells, and product so obtained.
JPH0411931B2 (en)
JPS5694651A (en) Manufacture of material for electronic parts
JPS5461933A (en) Coating film baking method of drum for printer
FR2672044B1 (en) PROCESS FOR ENAMELLING A GLASS SUBSTRATE AND ENAMEL COMPOSITION USED.
JPS55140703A (en) Thin film element
JPS57164454A (en) Treating method for surface of glass substrate for optical recording medium
GB828338A (en) A method of forming films of chromium oxide
JPS551109A (en) Manufacture of semiconductor device
JPS5214600A (en) Process for the production of a thin film of silicon carbide
JPS5923403B2 (en) Method for manufacturing transparent conductive film
JPS55165637A (en) Manufacture of semiconductor integrated circuit
JPS5499449A (en) Roduction of liquid crystal display element
JPS55167130A (en) Metal oxide thin film forming method
JPS5756819A (en) Liquid crystal display element
JPS5655910A (en) Production of optical multilayer film
JPS55140142A (en) Field-effect semiconductor sensor and its manufacture
JPS6058180B2 (en) Silica glass thin film manufacturing method
JPS5578069A (en) Prevention of exudation of component to solid surface
JPS5436179A (en) Forming method of nitride film
JPS57114291A (en) Manufacture of reflection preventive film
JPH0570122A (en) Production of thin film from transparent aluminum oxide precursor gel
JPS5552265A (en) Manufacturing of metal oxide semiconductor integrated circuit
JPS63156040A (en) Production of amorphous thin film
JPS6453415A (en) Diffusion of impurity