JPS5655910A - Production of optical multilayer film - Google Patents
Production of optical multilayer filmInfo
- Publication number
- JPS5655910A JPS5655910A JP13215279A JP13215279A JPS5655910A JP S5655910 A JPS5655910 A JP S5655910A JP 13215279 A JP13215279 A JP 13215279A JP 13215279 A JP13215279 A JP 13215279A JP S5655910 A JPS5655910 A JP S5655910A
- Authority
- JP
- Japan
- Prior art keywords
- film
- reactive
- forming method
- optical multilayer
- multilayer film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
Abstract
PURPOSE: To produce optical multilayer film at low costs by repeating the process of forming a semiconductor film or metal film on a substrate and the process of oxidizing or nitriding this film.
CONSTITUTION: A semiconductor film of Si etc. or a metal film of Ti, Cr, etc. is formed on a substrate 2 of glass etc. by a vapor deposition film forming method, thence an O2 gas of oxide of reactive zero atmosphere is admitted to these films to form the film of oxide such as SiO2 etc. by a reactive film forming method. Or an N2 gas of nitride of reactive atmosphere is admitted to form the film of nitride such as Si3N4. In this way, the optical multilayer film material is formed with one kind of material by repeating an ordinary film forming method and a reactive film forming method in periodically changing atmospheres.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13215279A JPS5655910A (en) | 1979-10-13 | 1979-10-13 | Production of optical multilayer film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13215279A JPS5655910A (en) | 1979-10-13 | 1979-10-13 | Production of optical multilayer film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5655910A true JPS5655910A (en) | 1981-05-16 |
JPH027042B2 JPH027042B2 (en) | 1990-02-15 |
Family
ID=15074567
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13215279A Granted JPS5655910A (en) | 1979-10-13 | 1979-10-13 | Production of optical multilayer film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5655910A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59127003A (en) * | 1983-01-12 | 1984-07-21 | Oki Electric Ind Co Ltd | Optical attenuator |
JPS60186804A (en) * | 1984-03-06 | 1985-09-24 | Hisanori Bando | Film having periodic multi-layered structure |
JPS61219004A (en) * | 1985-03-25 | 1986-09-29 | Canon Inc | Multilayer film reflecting mirror |
JP2007206136A (en) * | 2006-01-31 | 2007-08-16 | Canon Electronics Inc | Nd filter, manufacturing method therefor and light quantity control diaphragm |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5326147A (en) * | 1976-08-20 | 1978-03-10 | Siemens Ag | Filter for light detector |
-
1979
- 1979-10-13 JP JP13215279A patent/JPS5655910A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5326147A (en) * | 1976-08-20 | 1978-03-10 | Siemens Ag | Filter for light detector |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59127003A (en) * | 1983-01-12 | 1984-07-21 | Oki Electric Ind Co Ltd | Optical attenuator |
JPS60186804A (en) * | 1984-03-06 | 1985-09-24 | Hisanori Bando | Film having periodic multi-layered structure |
JPH0441670B2 (en) * | 1984-03-06 | 1992-07-09 | Hisanori Bando | |
JPS61219004A (en) * | 1985-03-25 | 1986-09-29 | Canon Inc | Multilayer film reflecting mirror |
JP2007206136A (en) * | 2006-01-31 | 2007-08-16 | Canon Electronics Inc | Nd filter, manufacturing method therefor and light quantity control diaphragm |
Also Published As
Publication number | Publication date |
---|---|
JPH027042B2 (en) | 1990-02-15 |
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