JP5645404B2 - 高電力絶縁ゲート・バイポーラ・トランジスタ - Google Patents
高電力絶縁ゲート・バイポーラ・トランジスタ Download PDFInfo
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- 239000010410 layer Substances 0.000 claims description 141
- 108091006146 Channels Proteins 0.000 claims description 53
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 43
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 38
- 239000000758 substrate Substances 0.000 claims description 16
- 239000002019 doping agent Substances 0.000 claims description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 239000011229 interlayer Substances 0.000 claims description 8
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- 108010075750 P-Type Calcium Channels Proteins 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- 239000004020 conductor Substances 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 230000003750 conditioning effect Effects 0.000 claims description 4
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 16
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 238000002513 implantation Methods 0.000 description 7
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
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- 235000012239 silicon dioxide Nutrition 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 229910001882 dioxygen Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
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- 229910052710 silicon Inorganic materials 0.000 description 3
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- 239000000377 silicon dioxide Substances 0.000 description 3
- 229910000789 Aluminium-silicon alloy Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
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- 238000009279 wet oxidation reaction Methods 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 241000408659 Darpa Species 0.000 description 1
- 229910000807 Ga alloy Inorganic materials 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 229910005883 NiSi Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
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- 238000010586 diagram Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
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- 230000035515 penetration Effects 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
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- 230000009467 reduction Effects 0.000 description 1
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Description
本発明は、ONR/DARPAによって与えられた契約番号第N00014−05−C−0202号の下、米国政府の支援によってなされたものである。米国政府は本発明に関して一定の権利を有する。
本出願は、2006年8月17日に出願された「High Power Insulated Gate Bipolar Transistors」という名称の米国仮特許出願第60/838,249号に基づく利益および優先権を主張するものである。この仮出願の開示は、その全体が本明細書に記載されているかのように、参照によって本明細書に組み込まれる。
Claims (5)
- 第1の導電型を有する基板と、
前記第1の導電型とは反対の第2の導電型を有するドリフト層と、
前記ドリフト層内にあって前記第1の導電型を有するウェル領域と、
前記ドリフト層上にあって前記第2の導電型を有するエピタキシャル・チャネル調整層と、
前記エピタキシャル・チャネル調整層から前記ウェル領域内へ延びるエミッタ領域であって、前記第2の導電型を有し、該エミッタ領域に隣接した前記ウェル領域内にチャネル領域を少なくとも部分的に画定するエミッタ領域と、
前記チャネル領域上のゲート酸化物層と、
前記ゲート酸化物層上のゲートと
前記チャネル調整層から前記ウェル領域内へ延びる前記第1の導電型のコネクタ領域と、
前記コネクタ領域上の第1のオーミック・コンタクトと、
前記エミッタ領域上にあって、前記第1のオーミック・コンタクトとは異なる材料を含む第2のオーミック・コンタクトと、
前記第1のオーミック・コンタクトと前記第2のオーミック・コンタクトとを電気的に接続した金属オーバレイヤと
を含み、
前記第1の導電型はn型であり、前記第2の導電型はp型であり、
前記ドリフト層は前記ウェル領域に隣接したJFET領域を含み、及び、前記エミッタ領域は、前記JFET領域から間隔を置いて配置され、かつ、該エミッタ領域と前記JFET領域との間に前記チャネル領域を画定し、及び、前記JFET領域は前記ドリフト層の残りの部分よりも高いドーパント濃度を有し、
前記チャネル調整層は、0.1μmから0.5μmの厚さ、および1×10 16 cm −3 から5×10 18 cm −3 の正味ドーピング濃度を有する、
絶縁ゲート・バイポーラ・トランジスタ。 - 前記第1のオーミック・コンタクトはニッケル・ベースの導電材料を含み、前記第2のオーミック・コンタクトはアルミニウム・ベースの導電材料を含む、請求項1に記載の絶縁ゲート・バイポーラ・トランジスタ。
- 前記エミッタ領域の底面から前記ウェル領域の底面までの距離は0.45μm以上である、請求項1に記載の絶縁ゲート・バイポーラ・トランジスタ。
- 前記基板は炭化シリコン基板を含み、前記ドリフト層は、前記基板上の炭化シリコン・エピタキシャル層を含む、請求項1に記載の絶縁ゲート・バイポーラ・トランジスタ。
- n型基板と、
p型ドリフト層と、
前記ドリフト層内のn型ウェルと、
前記ドリフト層上のp型チャネル調整層と、
前記チャネル調整層から前記n型ウェル内へ延びるp型エミッタ領域であって、該p型エミッタ領域に隣接した前記n型ウェル内にチャネル領域を少なくとも部分的に画定するp型エミッタ領域と、
前記チャネル調整層から前記n型ウェル内へ延びるn型コネクタ領域と、
前記p型エミッタ領域上の第1のオーミック・コンタクトと、
前記n型コネクタ領域上の第2のオーミック・コンタクトと、
前記チャネル領域上のゲート酸化物層と、
前記ゲート酸化物層上のゲートと、
前記ゲート上にあって、前記第1のオーミック・コンタクトを露出させる第1の開口と、前記第2のオーミック・コンタクトを露出させる第2の開口とを含む層間誘電体層と、
前記層間誘電体層上にあって、前記第1のオーミック・コンタクトと前記第2のオーミック・コンタクトとを電気的に接続する金属オーバレイヤと
を含み、
前記ドリフト層は前記ウェル領域に隣接したJFET領域を含み、及び、前記エミッタ領域は、前記JFET領域から間隔を置いて配置され、かつ、該エミッタ領域と前記JFET領域との間に前記チャネル領域を画定し、及び、前記JFET領域は前記ドリフト層の残りの部分よりも高いドーパント濃度を有し、
前記チャネル調整層は、0.1μmから0.5μmの厚さ、および1×10 16 cm −3 から5×10 18 cm −3 の正味ドーピング濃度を有する、
トランジスタ。
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