JP5504627B2 - 着色感光性樹脂組成物 - Google Patents

着色感光性樹脂組成物 Download PDF

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Publication number
JP5504627B2
JP5504627B2 JP2008331131A JP2008331131A JP5504627B2 JP 5504627 B2 JP5504627 B2 JP 5504627B2 JP 2008331131 A JP2008331131 A JP 2008331131A JP 2008331131 A JP2008331131 A JP 2008331131A JP 5504627 B2 JP5504627 B2 JP 5504627B2
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Japan
Prior art keywords
formula
carbon atoms
resin composition
photosensitive resin
colored photosensitive
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Application number
JP2008331131A
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English (en)
Japanese (ja)
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JP2010032999A (ja
Inventor
由子 城内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP2008331131A priority Critical patent/JP5504627B2/ja
Priority to TW98120135A priority patent/TWI450033B/zh
Priority to KR20090057409A priority patent/KR101461636B1/ko
Priority to CN201610213574.6A priority patent/CN105652596B/zh
Publication of JP2010032999A publication Critical patent/JP2010032999A/ja
Application granted granted Critical
Publication of JP5504627B2 publication Critical patent/JP5504627B2/ja
Priority to KR1020140140704A priority patent/KR20140141543A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/28—Pyronines ; Xanthon, thioxanthon, selenoxanthan, telluroxanthon dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
JP2008331131A 2008-07-01 2008-12-25 着色感光性樹脂組成物 Active JP5504627B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2008331131A JP5504627B2 (ja) 2008-07-01 2008-12-25 着色感光性樹脂組成物
TW98120135A TWI450033B (zh) 2008-07-01 2009-06-16 著色感光性樹脂組成物
KR20090057409A KR101461636B1 (ko) 2008-07-01 2009-06-26 착색 감광성 수지 조성물
CN201610213574.6A CN105652596B (zh) 2008-07-01 2009-06-29 着色感光性树脂组合物
KR1020140140704A KR20140141543A (ko) 2008-07-01 2014-10-17 착색 감광성 수지 조성물

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008172136 2008-07-01
JP2008172136 2008-07-01
JP2008331131A JP5504627B2 (ja) 2008-07-01 2008-12-25 着色感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JP2010032999A JP2010032999A (ja) 2010-02-12
JP5504627B2 true JP5504627B2 (ja) 2014-05-28

Family

ID=41513671

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008331131A Active JP5504627B2 (ja) 2008-07-01 2008-12-25 着色感光性樹脂組成物

Country Status (4)

Country Link
JP (1) JP5504627B2 (zh)
KR (2) KR101461636B1 (zh)
CN (2) CN105652596B (zh)
TW (1) TWI450033B (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10295444B2 (en) 2011-09-21 2019-05-21 Sakura Finetek U.S.A., Inc. Automated staining system and reaction chamber
US10900982B2 (en) 2005-04-27 2021-01-26 Ventana Medical Systems, Inc. Automated high volume slide processing system
US11249095B2 (en) 2002-04-15 2022-02-15 Ventana Medical Systems, Inc. Automated high volume slide processing system

Families Citing this family (80)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI475320B (zh) * 2009-02-13 2015-03-01 Sumitomo Chemical Co 著色感光性樹脂組成物及彩色濾光片
JP5381286B2 (ja) * 2009-04-27 2014-01-08 東洋インキＳｃホールディングス株式会社 カラーフィルタ用青色着色組成物およびカラーフィルタ
TWI512397B (zh) * 2009-06-24 2015-12-11 Sumitomo Chemical Co Coloring the photosensitive composition
CN102472849B (zh) * 2009-08-12 2014-12-03 住友化学株式会社 显示装置
JP4492760B1 (ja) * 2009-12-01 2010-06-30 東洋インキ製造株式会社 カラーフィルタ用青色着色組成物、およびカラーフィルタ
JP5482687B2 (ja) 2010-02-17 2014-05-07 三菱マテリアル株式会社 トリクロロシラン製造装置および製造方法
JP5510152B2 (ja) * 2010-03-15 2014-06-04 住友化学株式会社 着色感光性樹脂組成物
CN102193315B (zh) * 2010-03-15 2015-01-14 住友化学株式会社 着色感光性树脂组合物
JP5866787B2 (ja) * 2010-03-31 2016-02-17 東洋インキＳｃホールディングス株式会社 カラーフィルタ用青色着色組成物、およびカラーフィルタ
KR101344790B1 (ko) * 2010-06-10 2013-12-24 제일모직주식회사 컬러필터용 청색 수지 조성물 및 이를 이용한 컬러필터
JPWO2011158794A1 (ja) * 2010-06-15 2013-08-19 日本化薬株式会社 着色樹脂組成物、着色硬化膜、カラーフィルター、表示装置及び固体撮像素子
SG178204A1 (en) * 2010-06-15 2012-04-27 Nippon Kayaku Kk Colored resin composition
CN102472852A (zh) * 2010-06-15 2012-05-23 日本化药株式会社 着色树脂组合物、着色固化膜、滤色器、显示装置和固态图像传感器
JP5715380B2 (ja) * 2010-06-30 2015-05-07 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、その製造方法、固体撮像素子、液晶表示装置、および色素多量体
JP5772263B2 (ja) * 2010-07-30 2015-09-02 Jsr株式会社 着色組成物、カラーフィルタ及び表示素子
JP5842463B2 (ja) * 2010-09-15 2016-01-13 Jsr株式会社 塩基性着色剤、着色組成物、カラーフィルタ及び表示素子
TWI541294B (zh) * 2010-10-06 2016-07-11 富士軟片股份有限公司 彩色濾光片用著色組成物、彩色濾光片及其製造方法、液晶顯示裝置、有機ｅｌ顯示裝置及固體攝像元件
KR20130132688A (ko) * 2010-10-21 2013-12-05 니폰 가야꾸 가부시끼가이샤 컬러 필터용 착색 수지 조성물, 컬러 필터, 표시 장치 및 고체 촬상 소자
KR20140001731A (ko) * 2010-10-21 2014-01-07 니폰 가야꾸 가부시끼가이샤 컬러필터용 착색 수지 조성물, 컬러필터, 표시장치 및 고체 촬상소자
JP5919830B2 (ja) * 2011-02-08 2016-05-18 住友化学株式会社 着色感光性樹脂組成物
TWI542644B (zh) * 2011-02-09 2016-07-21 Sumitomo Chemical Co Coloring the photosensitive resin composition
JP5962042B2 (ja) * 2011-02-28 2016-08-03 住友化学株式会社 着色硬化性樹脂組成物
JP6115005B2 (ja) * 2011-03-08 2017-04-19 住友化学株式会社 着色感光性樹脂組成物
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TWI524143B (zh) * 2011-04-18 2016-03-01 Sumitomo Chemical Co Coloring hardening resin composition
JP4911253B1 (ja) 2011-04-28 2012-04-04 大日本印刷株式会社 染料分散液、カラーフィルター用感光性樹脂組成物、カラーフィルター、液晶表示装置及び、有機発光表示装置
JP2012233033A (ja) * 2011-04-28 2012-11-29 Sumitomo Chemical Co Ltd 染料用塩
TWI624726B (zh) * 2011-05-23 2018-05-21 Sumitomo Chemical Co Colored curable resin composition
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JP6028326B2 (ja) * 2011-08-04 2016-11-16 住友化学株式会社 着色硬化性樹脂組成物
JP2013061619A (ja) * 2011-08-24 2013-04-04 Toray Ind Inc カラーフィルター用青色着色剤組成物およびそれを用いたカラーフィルター基板。
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JP6155076B2 (ja) * 2012-04-10 2017-06-28 住友化学株式会社 着色剤分散液
JP6192968B2 (ja) * 2012-04-10 2017-09-06 住友化学株式会社 着色剤分散液
CN103454859A (zh) * 2012-05-29 2013-12-18 住友化学株式会社 着色固化性树脂组合物
JP5836200B2 (ja) * 2012-05-30 2015-12-24 富士フイルム株式会社 キサンテン骨格を有する化合物、着色組成物、インクジェット記録用インク、及びインクジェット記録方法
WO2013187493A1 (ja) * 2012-06-11 2013-12-19 住友化学株式会社 着色感光性樹脂組成物
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JP2014109017A (ja) * 2012-12-04 2014-06-12 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
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JP6372243B2 (ja) * 2014-08-20 2018-08-15 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
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