JP3732250B2 - インライン式成膜装置 - Google Patents

インライン式成膜装置 Download PDF

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Publication number
JP3732250B2
JP3732250B2 JP09964895A JP9964895A JP3732250B2 JP 3732250 B2 JP3732250 B2 JP 3732250B2 JP 09964895 A JP09964895 A JP 09964895A JP 9964895 A JP9964895 A JP 9964895A JP 3732250 B2 JP3732250 B2 JP 3732250B2
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JP
Japan
Prior art keywords
chamber
substrate
carrier
vacuum
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP09964895A
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English (en)
Japanese (ja)
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JPH08274142A (ja
Inventor
洋 神倉
芳樹 有賀
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Canon Anelva Corp
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Canon Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp filed Critical Canon Anelva Corp
Priority to JP09964895A priority Critical patent/JP3732250B2/ja
Priority to TW084113505A priority patent/TW311105B/zh
Priority to US08/606,038 priority patent/US5846328A/en
Priority to KR1019960008513A priority patent/KR100221259B1/ko
Publication of JPH08274142A publication Critical patent/JPH08274142A/ja
Priority to US08/957,767 priority patent/US6027618A/en
Application granted granted Critical
Publication of JP3732250B2 publication Critical patent/JP3732250B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/137Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/139Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Tunnel Furnaces (AREA)
JP09964895A 1995-03-30 1995-03-30 インライン式成膜装置 Expired - Lifetime JP3732250B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP09964895A JP3732250B2 (ja) 1995-03-30 1995-03-30 インライン式成膜装置
TW084113505A TW311105B (https=) 1995-03-30 1995-12-18
US08/606,038 US5846328A (en) 1995-03-30 1996-02-22 In-line film deposition system
KR1019960008513A KR100221259B1 (ko) 1995-03-30 1996-03-27 인라인식 성막장치
US08/957,767 US6027618A (en) 1995-03-30 1997-10-24 Compact in-line film deposition system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09964895A JP3732250B2 (ja) 1995-03-30 1995-03-30 インライン式成膜装置

Publications (2)

Publication Number Publication Date
JPH08274142A JPH08274142A (ja) 1996-10-18
JP3732250B2 true JP3732250B2 (ja) 2006-01-05

Family

ID=14252882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP09964895A Expired - Lifetime JP3732250B2 (ja) 1995-03-30 1995-03-30 インライン式成膜装置

Country Status (4)

Country Link
US (2) US5846328A (https=)
JP (1) JP3732250B2 (https=)
KR (1) KR100221259B1 (https=)
TW (1) TW311105B (https=)

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