SG11201403609QA - System architecture for combined static and pass-by processing - Google Patents

System architecture for combined static and pass-by processing

Info

Publication number
SG11201403609QA
SG11201403609QA SG11201403609QA SG11201403609QA SG11201403609QA SG 11201403609Q A SG11201403609Q A SG 11201403609QA SG 11201403609Q A SG11201403609Q A SG 11201403609QA SG 11201403609Q A SG11201403609Q A SG 11201403609QA SG 11201403609Q A SG11201403609Q A SG 11201403609QA
Authority
SG
Singapore
Prior art keywords
pass
processing
system architecture
combined static
static
Prior art date
Application number
SG11201403609QA
Inventor
Patrick Leahey
Eric Lawson
Charles Liu
Terry Bluck
Kevin P Fairbairn
Robert L Ruck
Iv Samuel D Harkness
Original Assignee
Intevac Inc
Patrick Leahey
Eric Lawson
Charles Liu
Terry Bluck
Kevin P Fairbairn
Robert L Ruck
Iv Samuel D Harkness
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intevac Inc, Patrick Leahey, Eric Lawson, Charles Liu, Terry Bluck, Kevin P Fairbairn, Robert L Ruck, Iv Samuel D Harkness filed Critical Intevac Inc
Publication of SG11201403609QA publication Critical patent/SG11201403609QA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32889—Connection or combination with other apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32899—Multiple chambers, e.g. cluster tools
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
SG11201403609QA 2011-12-27 2012-12-26 System architecture for combined static and pass-by processing SG11201403609QA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161580642P 2011-12-27 2011-12-27
PCT/US2012/071684 WO2013101851A1 (en) 2011-12-27 2012-12-26 System architecture for combined static and pass-by processing

Publications (1)

Publication Number Publication Date
SG11201403609QA true SG11201403609QA (en) 2014-07-30

Family

ID=48653485

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201403609QA SG11201403609QA (en) 2011-12-27 2012-12-26 System architecture for combined static and pass-by processing

Country Status (7)

Country Link
US (2) US9914994B2 (en)
JP (1) JP6205368B2 (en)
CN (1) CN104471697B (en)
MY (1) MY171044A (en)
SG (1) SG11201403609QA (en)
TW (1) TWI499685B (en)
WO (1) WO2013101851A1 (en)

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WO2013101851A1 (en) 2011-12-27 2013-07-04 Intevac, Inc. System architecture for combined static and pass-by processing
US9899635B2 (en) * 2014-02-04 2018-02-20 Applied Materials, Inc. System for depositing one or more layers on a substrate supported by a carrier and method using the same
JP6522667B2 (en) * 2014-02-20 2019-05-29 インテヴァック インコーポレイテッド Substrate double sided processing system and method
CN109661366B (en) 2016-09-09 2022-01-14 宝洁公司 System and method for independently guiding a carrier and delivering containers and closures to a unit operation station
US10643875B2 (en) 2016-09-09 2020-05-05 The Procter & Gamble Company System and method for simultaneously filling containers with different fluent compositions
JP6820408B2 (en) 2016-09-09 2021-01-27 ザ プロクター アンド ギャンブル カンパニーＴｈｅ Ｐｒｏｃｔｅｒ ＆ Ｇａｍｂｌｅ Ｃｏｍｐａｎｙ Systems and methods for simultaneously filling containers of different shapes and / or sizes
WO2018049123A2 (en) 2016-09-09 2018-03-15 The Procter & Gamble Company System and method for independently routing container-loaded vehicles to create different finished products
CN109661623A (en) 2016-09-09 2019-04-19 宝洁公司 Method for producing different product simultaneously on single production line
EP3509794B1 (en) 2016-09-09 2020-08-12 The Procter and Gamble Company Vacuum holder and carrier with autonomous vacuum
WO2018049102A1 (en) 2016-09-09 2018-03-15 The Procter & Gamble Company Weigh-in-motion scale system and method for linear synchronous motor conveyor
US10558201B2 (en) 2016-09-09 2020-02-11 The Procter & Gamble Company System and method for producing products based upon demand
CN109496348B (en) * 2016-09-12 2022-01-18 应用材料公司 Semiconductor processing equipment
CN112166208B (en) 2017-07-19 2023-12-12 因特瓦克公司 System for forming nanolaminated optical coatings
IT201800007519A1 (en) * 2018-07-26 2020-01-26 Tapematic Spa APPARATUS FOR THE SURFACE TREATMENT OF ARTICLES, AND PROCESS OF TREATMENT IMPLEMENTABLE BY THIS APPARATUS
US11414748B2 (en) * 2019-09-25 2022-08-16 Intevac, Inc. System with dual-motion substrate carriers
US11694913B2 (en) 2018-12-18 2023-07-04 Intevac, Inc. Hybrid system architecture for thin film deposition
SG11202106434VA (en) * 2018-12-18 2021-07-29 Intevac Inc Hybrid system architecture for thin film deposition
CN110029323B (en) * 2019-05-14 2020-12-29 枣庄睿诺电子科技有限公司 Vacuum coating equipment
JP7290509B2 (en) 2019-08-15 2023-06-13 株式会社アルバック Vacuum processing equipment
CN114641435A (en) * 2020-05-13 2022-06-17 应用材料公司 Roller transport system carrier, roller transport system and vacuum treatment device
TW202340498A (en) * 2022-02-15 2023-10-16 美商因特瓦克公司 System and method for making thick-multilayer dielectric films

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Also Published As

Publication number Publication date
US20130161183A1 (en) 2013-06-27
US20180171463A1 (en) 2018-06-21
US9914994B2 (en) 2018-03-13
JP6205368B2 (en) 2017-09-27
TW201335413A (en) 2013-09-01
JP2015504248A (en) 2015-02-05
CN104471697B (en) 2018-03-16
CN104471697A (en) 2015-03-25
US10752987B2 (en) 2020-08-25
TWI499685B (en) 2015-09-11
MY171044A (en) 2019-09-23
WO2013101851A1 (en) 2013-07-04

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