JP2015144232A - 半導体装置とその製造方法 - Google Patents
半導体装置とその製造方法 Download PDFInfo
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- JP2015144232A JP2015144232A JP2014161668A JP2014161668A JP2015144232A JP 2015144232 A JP2015144232 A JP 2015144232A JP 2014161668 A JP2014161668 A JP 2014161668A JP 2014161668 A JP2014161668 A JP 2014161668A JP 2015144232 A JP2015144232 A JP 2015144232A
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- H01L29/7397—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions and a gate structure lying on a slanted or vertical surface or formed in a groove, e.g. trench gate IGBT
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Abstract
【解決手段】IGBT領域は、コレクタ層と、第1ドリフト層と、第1ボディ層と、エミッタ層と、半導体基板の表面側から第1ボディ層を貫通して第1ドリフト層に達するトレンチゲートとを備えている。ダイオード領域は、カソード層と、第2ドリフト層と、第2ボディ層とを備えている。トレンチゲートの下端の深さと、第1ドリフト層および第2ドリフト層の表面の間に位置する第1ドリフト層および第2ドリフト層に、結晶欠陥密度のピークを含むライフタイム制御領域が形成されている。半導体基板の表面側のトレンチゲートの上方に、シリコン窒化膜層がさらに設けられている。
【選択図】 図1
Description
バリアメタル層のさらに表面側にAl系電極層を形成し、バリアメタル層およびAl系電極層が存在する状態で、トレンチゲートの下端の深さから、第1ドリフト層および第2ドリフト層の表面の間に位置する領域に荷電粒子を照射し、荷電粒子を照射した後に、バリアメタル層およびAl系電極層が存在する状態で半導体基板をアニールする。
実施例1においては、結晶欠陥を安定化させるためのアニールを行った後で、シリコン窒化膜層943を一部除去する製造方法について説明したが、シリコン窒化膜層943を全部除去しても、シリコン窒化膜層943から供給された水素原子による界面準位の低減の効果を得ることはできる。この場合、図1−図3に示す半導体装置10から、シリコン窒化膜層143を除去した構成を有する半導体装置が製造される。また、実施例1では、表面電極121がバリアメタル層を含まない複合電極である場合を例示して説明したが、これに限定されない。表面電極121に替えて、半導体基板100との境界面の全体もしくは一部に形成されたバリアメタル層を含む複合電極層を用いることもできる。水素原子を吸着し易いバリアメタル層を用いた場合であっても、シリコン窒化膜層から水素原子が供給されて補われるため、トレンチゲートの閾値電圧のばらつきを抑制できる。
まず、実施例1と同様の方法で、図4に示す原料ウェハ90を準備する。これに、図13に示すように、スパッタリング等によってバリアメタル層244を形成する。バリアメタル層244は、アノード層106の表面およびボディコンタクト層109の表面に接するとともに、トレンチゲート130の表面側において開口するようにパターニングされる。
次に、図15に示すように、原料ウェハ90の裏面を切削して、その厚さを薄くした後に、裏面に対してイオン注入を行う。これによって、原料ウェハ90の裏面側に、p型のイオン注入層901、n型のイオン注入層902、n型のイオン注入層903を形成する。
なお、半導体装置20に、実施例1で説明したシリコン窒化膜層143をさらに設けることもできる。シリコン窒化膜143によってから供給された水素原子によっても界面準位が終端化され、より効果的に界面準位を低減することができる。
11 :IGBT領域
12 :ダイオード領域
100,100c :半導体基板
101 :コレクタ層
102 :カソード層
103 :バッファ層
104 :ドリフト層
105 :ボディ層
106 :アノード層
107,167 :エミッタ層
109,169 :ボディコンタクト層
120 :裏面電極
121 :表面電極
130 :トレンチゲート
131 :トレンチ
132 :ゲート絶縁膜
133 :ゲート電極
135 :層間絶縁膜
143,143a,143c,943 :シリコン窒化膜層
145,145a,145c :開口部
150 :ライフタイム制御領域
157 :ダイオードエミッタ層
159 :ダイオードボディコンタクト層
221 :Al系電極層
244,224a :バリアメタル層
254 :コンタクトプラグ層
Claims (5)
- IGBT領域と、ダイオード領域とが形成されている半導体基板と、
前記半導体基板の表面に形成された層間絶縁膜および表面電極と、
前記半導体基板の裏面に形成された裏面電極とを備えた半導体装置であって、
前記IGBT領域は、
第1導電型のコレクタ層と、
前記コレクタ層に対して前記半導体基板の表面側に設けられた第2導電型の第1ドリフト層と、
前記第1ドリフト層に対して前記半導体基板の表面側に設けられ、その一部が前記半導体基板の表面に露出する第1導電型の第1ボディ層と、
前記第1ボディ層の表面に設けられ、前記半導体基板の表面に露出する第2導電型のエミッタ層と、
前記半導体基板の表面側から前記第1ボディ層を貫通して前記第1ドリフト層に達するトレンチゲートとを備えており、
前記ダイオード領域は、
第2導電型のカソード層と、
前記カソード層に対して前記半導体基板の表面側に設けられており、前記カソード層よりも第2導電型の不純物濃度が低い第2導電型の第2ドリフト層と、
前記第2ドリフト領域に対して前記半導体基板の表面側に設けられた第1導電型の第2ボディ層とを備えており、
前記層間絶縁膜は、前記トレンチゲートと前記表面電極とを絶縁しており、
前記トレンチゲートの下端の深さと、前記第1ドリフト層および前記第2ドリフト層の表面の間に位置する前記第1ドリフト層および前記第2ドリフト層に、結晶欠陥密度のピークを含むライフタイム制御領域が形成されており、
前記半導体基板の表面側の前記トレンチゲートの上方に、シリコン窒化膜層がさらに設けられている、半導体装置。 - 前記シリコン窒化膜層は、前記エミッタ層の上方に設けられており、
前記シリコン窒化膜層は、前記第1ボディ層の上方において開口する開口部を備えている請求項1に記載の半導体装置。 - IGBT領域と、ダイオード領域とが形成されている半導体基板と、
前記半導体基板の表面に形成された層間絶縁膜および表面電極と、
前記半導体基板の裏面に形成された裏面電極とを備えた半導体装置であって、
前記IGBT領域は、
第1導電型のコレクタ層と、
前記コレクタ層に対して前記半導体基板の表面側に設けられた第2導電型の第1ドリフト層と、
前記第1ドリフト層に対して前記半導体基板の表面側に設けられ、その一部が前記半導体基板の表面に露出する第1導電型の第1ボディ層と、
前記第1ボディ層の表面に設けられ、前記半導体基板の表面に露出する第2導電型のエミッタ層と、
前記半導体基板の表面側から前記第1ボディ層を貫通して前記第1ドリフト層に達するトレンチゲートとを備えており、
前記ダイオード領域は、
第2導電型のカソード層と、
前記カソード層に対して前記半導体基板の表面側に設けられており、前記カソード層よりも第2導電型の不純物濃度が低い第2導電型の第2ドリフト層と、
前記第2ドリフト領域に対して前記半導体基板の表面側に設けられた第1導電型の第2ボディ層とを備えており、
前記層間絶縁膜は、前記トレンチゲートと前記表面電極とを絶縁しており、
前記トレンチゲートの下端の深さと、前記第1ドリフト層および前記第2ドリフト層の表面の間に位置する前記第1ドリフト層および前記第2ドリフト層に、結晶欠陥密度のピークを含むライフタイム制御領域が形成されており、
前記表面電極は、Al系電極層と、バリアメタル層と、を含んでおり、
前記バリアメタル層は、前記第1ボディ層の前記半導体基板の表面に露出する部分と前記Al系電極層との間に設けられ、かつ、前記トレンチゲートと前記Al系電極層との間に設けられていない、半導体装置。 - IGBT領域と、ダイオード領域とが形成されている半導体基板と、
前記半導体基板の表面に形成された層間絶縁膜および表面電極と、
前記半導体基板の裏面に形成された裏面電極とを備えた半導体装置の製造方法であって、
前記IGBT領域は、
第1導電型のコレクタ層と、
前記コレクタ層に対して前記半導体基板の表面側に設けられた第2導電型の第1ドリフト層と、
前記第1ドリフト層に対して前記半導体基板の表面側に設けられ、その一部が前記半導体基板の表面に露出する第1導電型の第1ボディ層と、
前記第1ボディ層の表面に設けられ、前記半導体基板の表面に露出する第2導電型のエミッタ層と、
前記半導体基板の表面側から前記第1ボディ層を貫通して前記第1ドリフト層に達するトレンチゲートとを備えており、
前記ダイオード領域は、
第2導電型のカソード層と、
前記カソード層に対して前記半導体基板の表面側に設けられており、前記カソード層よりも第2導電型の不純物濃度が低い第2導電型の第2ドリフト層と、
前記第2ドリフト領域に対して前記半導体基板の表面側に設けられた第1導電型の第2ボディ層とを備えており、
前記層間絶縁膜は、前記トレンチゲートと前記表面電極とを絶縁しており、
前記トレンチゲートの下端の深さから、前記第1ドリフト層および前記第2ドリフト層の表面の間に位置する前記第1ドリフト層および前記第2ドリフト層に、結晶欠陥密度のピークを含むライフタイム制御領域が形成されており、
前記半導体装置の製造方法は、
前記半導体基板に前記トレンチゲートを形成し、
前記トレンチゲートの表面側にシリコン窒化膜層を形成し、
前記シリコン窒化膜層が存在する状態で、前記トレンチゲートの下端の深さから、前記第1ドリフト層および前記第2ドリフト層の表面の間に位置する領域に荷電粒子を照射し、
前記荷電粒子を照射した後に、前記シリコン窒化膜層が存在する状態で前記半導体基板をアニールする、
半導体装置の製造方法。 - IGBT領域と、ダイオード領域とが形成されている半導体基板と、
前記半導体基板の表面に形成された層間絶縁膜および表面電極と、
前記半導体基板の裏面に形成された裏面電極とを備えた半導体装置の製造方法であって、
前記IGBT領域は、
第1導電型のコレクタ層と、
前記コレクタ層に対して前記半導体基板の表面側に設けられた第2導電型の第1ドリフト層と、
前記第1ドリフト層に対して前記半導体基板の表面側に設けられ、その一部が前記半導体基板の表面に露出する第1導電型の第1ボディ層と、
前記第1ボディ層の表面に設けられ、前記半導体基板の表面に露出する第2導電型のエミッタ層と、
前記半導体基板の表面側から前記第1ボディ層を貫通して前記第1ドリフト層に達するトレンチゲートとを備えており、
前記ダイオード領域は、
第2導電型のカソード層と、
前記カソード層に対して前記半導体基板の表面側に設けられており、前記カソード層よりも第2導電型の不純物濃度が低い第2導電型の第2ドリフト層と、
前記第2ドリフト領域に対して前記半導体基板の表面側に設けられた第1導電型の第2ボディ層とを備えており、
前記層間絶縁膜は、前記トレンチゲートと前記表面電極とを絶縁しており、
前記トレンチゲートの下端の深さと、前記第1ドリフト層および前記第2ドリフト層の表面の間に位置する前記第1ドリフト層および前記第2ドリフト層に、結晶欠陥密度のピークを含むライフタイム制御領域が形成されており、
前記表面電極は、Al系電極層と、バリアメタル層と、を含んでおり、
前記半導体装置の製造方法は、
前記半導体基板に前記トレンチゲートを形成し、
前記半導体基板の表面側に、少なくとも前記第1ボディ層の前記半導体基板の表面に露出する部分に設けられ、かつ、前記トレンチゲートの表面側において開口する、バリアメタル層を形成し、
前記バリアメタル層のさらに表面側にAl系電極層を形成し、
前記バリアメタル層および前記Al系電極層が存在する状態で、前記トレンチゲートの下端の深さから、前記第1ドリフト層および前記第2ドリフト層の表面の間に位置する領域に荷電粒子を照射し、
前記荷電粒子を照射した後に、前記バリアメタル層および前記Al系電極層が存在する状態で前記半導体基板をアニールする、
半導体装置の製造方法。
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JP2018067624A (ja) * | 2016-10-19 | 2018-04-26 | トヨタ自動車株式会社 | 半導体装置およびその製造方法 |
JP2019129250A (ja) * | 2018-01-25 | 2019-08-01 | トヨタ自動車株式会社 | 半導体装置及びその製造方法 |
WO2023084939A1 (ja) * | 2021-11-10 | 2023-05-19 | 富士電機株式会社 | 半導体装置の製造方法および半導体装置 |
US11869970B2 (en) | 2021-03-19 | 2024-01-09 | Kabushiki Kaisha Toshiba | Semiconductor device including energy level in drift layer |
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TWI675404B (zh) | 2019-10-21 |
KR20160102064A (ko) | 2016-08-26 |
CN105849912A (zh) | 2016-08-10 |
CN105849912B (zh) | 2019-03-01 |
DE112014006069T5 (de) | 2016-09-15 |
JP6107767B2 (ja) | 2017-04-05 |
TW201537627A (zh) | 2015-10-01 |
US10014368B2 (en) | 2018-07-03 |
US20160315140A1 (en) | 2016-10-27 |
WO2015098377A1 (ja) | 2015-07-02 |
KR101780619B1 (ko) | 2017-09-21 |
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