JP2011158921A - ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 - Google Patents
ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 Download PDFInfo
- Publication number
- JP2011158921A JP2011158921A JP2011095992A JP2011095992A JP2011158921A JP 2011158921 A JP2011158921 A JP 2011158921A JP 2011095992 A JP2011095992 A JP 2011095992A JP 2011095992 A JP2011095992 A JP 2011095992A JP 2011158921 A JP2011158921 A JP 2011158921A
- Authority
- JP
- Japan
- Prior art keywords
- component
- photosensitive resin
- acid
- resin composition
- positive photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 66
- 238000000034 method Methods 0.000 title description 35
- 239000002243 precursor Substances 0.000 claims abstract description 41
- 239000002253 acid Substances 0.000 claims abstract description 40
- 239000004952 Polyamide Substances 0.000 claims abstract description 30
- 229920002647 polyamide Polymers 0.000 claims abstract description 30
- 150000001875 compounds Chemical class 0.000 claims abstract description 21
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 claims abstract description 17
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims abstract description 12
- XOYZYOURGXJJOC-UHFFFAOYSA-N bis(2-tert-butylphenyl)iodanium Chemical class CC(C)(C)C1=CC=CC=C1[I+]C1=CC=CC=C1C(C)(C)C XOYZYOURGXJJOC-UHFFFAOYSA-N 0.000 claims abstract description 11
- ORKZATPRQQSLDT-UHFFFAOYSA-N diphenylmethanethiol Chemical class C=1C=CC=CC=1C(S)C1=CC=CC=C1 ORKZATPRQQSLDT-UHFFFAOYSA-N 0.000 claims abstract description 8
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229940092714 benzenesulfonic acid Drugs 0.000 claims abstract description 6
- GMEXDATVSHAMEP-UHFFFAOYSA-N dimethyl(phenyl)sulfanium Chemical class C[S+](C)C1=CC=CC=C1 GMEXDATVSHAMEP-UHFFFAOYSA-N 0.000 claims abstract description 6
- JGTNAGYHADQMCM-UHFFFAOYSA-N perfluorobutanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-N 0.000 claims abstract description 5
- NRZWQKGABZFFKE-UHFFFAOYSA-N trimethylsulfonium Chemical class C[S+](C)C NRZWQKGABZFFKE-UHFFFAOYSA-N 0.000 claims abstract description 5
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000011347 resin Substances 0.000 claims description 27
- 229920005989 resin Polymers 0.000 claims description 27
- 239000010410 layer Substances 0.000 claims description 26
- 238000004519 manufacturing process Methods 0.000 claims description 26
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 22
- 238000010438 heat treatment Methods 0.000 claims description 20
- 125000000962 organic group Chemical group 0.000 claims description 20
- 125000004432 carbon atom Chemical group C* 0.000 claims description 17
- 230000001681 protective effect Effects 0.000 claims description 16
- 239000007864 aqueous solution Substances 0.000 claims description 15
- 239000011229 interlayer Substances 0.000 claims description 13
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 11
- 238000002156 mixing Methods 0.000 claims description 11
- 230000001678 irradiating effect Effects 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 238000000354 decomposition reaction Methods 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- 125000001153 fluoro group Chemical group F* 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 3
- CYQUIWZGOBANMJ-UHFFFAOYSA-M dimethyl(phenyl)sulfanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C[S+](C)C1=CC=CC=C1 CYQUIWZGOBANMJ-UHFFFAOYSA-M 0.000 claims description 2
- 238000013035 low temperature curing Methods 0.000 abstract description 4
- 239000003513 alkali Substances 0.000 abstract description 3
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract 1
- 239000010408 film Substances 0.000 description 84
- -1 methacryloyl group Chemical group 0.000 description 30
- 230000004580 weight loss Effects 0.000 description 27
- 229920001721 polyimide Polymers 0.000 description 26
- 239000000243 solution Substances 0.000 description 24
- 239000004642 Polyimide Substances 0.000 description 21
- 150000004985 diamines Chemical class 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 20
- 238000003786 synthesis reaction Methods 0.000 description 20
- 238000006297 dehydration reaction Methods 0.000 description 19
- 125000003118 aryl group Chemical group 0.000 description 18
- 239000003795 chemical substances by application Substances 0.000 description 18
- 229920002577 polybenzoxazole Polymers 0.000 description 18
- 238000001723 curing Methods 0.000 description 17
- 239000000463 material Substances 0.000 description 17
- 230000008569 process Effects 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 239000004065 semiconductor Substances 0.000 description 15
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 13
- 150000003839 salts Chemical class 0.000 description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 229920000642 polymer Polymers 0.000 description 12
- 238000007363 ring formation reaction Methods 0.000 description 12
- 230000035945 sensitivity Effects 0.000 description 12
- 230000018109 developmental process Effects 0.000 description 11
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 10
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 9
- 230000018044 dehydration Effects 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 230000006378 damage Effects 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 230000000704 physical effect Effects 0.000 description 8
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 7
- 239000004020 conductor Substances 0.000 description 7
- 238000004090 dissolution Methods 0.000 description 7
- 230000015654 memory Effects 0.000 description 7
- 238000006798 ring closing metathesis reaction Methods 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 230000002140 halogenating effect Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000013585 weight reducing agent Substances 0.000 description 6
- WVDRSXGPQWNUBN-UHFFFAOYSA-N 4-(4-carboxyphenoxy)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C=C1 WVDRSXGPQWNUBN-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 150000008065 acid anhydrides Chemical class 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 description 5
- 239000009719 polyimide resin Substances 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 description 4
- MSTZGVRUOMBULC-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phenol Chemical compound C1=C(O)C(N)=CC(C(C=2C=C(N)C(O)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 MSTZGVRUOMBULC-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 4
- 229920005575 poly(amic acid) Polymers 0.000 description 4
- 238000006722 reduction reaction Methods 0.000 description 4
- 230000007261 regionalization Effects 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000002411 thermogravimetry Methods 0.000 description 4
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 4
- BWZVCCNYKMEVEX-UHFFFAOYSA-N 2,4,6-Trimethylpyridine Chemical compound CC1=CC(C)=NC(C)=C1 BWZVCCNYKMEVEX-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- 239000012670 alkaline solution Substances 0.000 description 3
- 150000001408 amides Chemical group 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical class C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 3
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 150000002440 hydroxy compounds Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 3
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- XQGWAPPLBJZCEV-UHFFFAOYSA-N triethoxy(propyl)silane;urea Chemical compound NC(N)=O.CCC[Si](OCC)(OCC)OCC XQGWAPPLBJZCEV-UHFFFAOYSA-N 0.000 description 3
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 2
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 2
- DVVGIUUJYPYENY-UHFFFAOYSA-N 1-methylpyridin-2-one Chemical compound CN1C=CC=CC1=O DVVGIUUJYPYENY-UHFFFAOYSA-N 0.000 description 2
- KZLDGFZCFRXUIB-UHFFFAOYSA-N 2-amino-4-(3-amino-4-hydroxyphenyl)phenol Chemical group C1=C(O)C(N)=CC(C=2C=C(N)C(O)=CC=2)=C1 KZLDGFZCFRXUIB-UHFFFAOYSA-N 0.000 description 2
- KECOIASOKMSRFT-UHFFFAOYSA-N 2-amino-4-(3-amino-4-hydroxyphenyl)sulfonylphenol Chemical compound C1=C(O)C(N)=CC(S(=O)(=O)C=2C=C(N)C(O)=CC=2)=C1 KECOIASOKMSRFT-UHFFFAOYSA-N 0.000 description 2
- ZGDMDBHLKNQPSD-UHFFFAOYSA-N 2-amino-5-(4-amino-3-hydroxyphenyl)phenol Chemical group C1=C(O)C(N)=CC=C1C1=CC=C(N)C(O)=C1 ZGDMDBHLKNQPSD-UHFFFAOYSA-N 0.000 description 2
- KHAFBBNQUOEYHB-UHFFFAOYSA-N 2-amino-5-(4-amino-3-hydroxyphenyl)sulfonylphenol Chemical compound C1=C(O)C(N)=CC=C1S(=O)(=O)C1=CC=C(N)C(O)=C1 KHAFBBNQUOEYHB-UHFFFAOYSA-N 0.000 description 2
- JDFAWEKPFLGRAK-UHFFFAOYSA-N 2-amino-5-[2-(4-amino-3-hydroxyphenyl)propan-2-yl]phenol Chemical compound C=1C=C(N)C(O)=CC=1C(C)(C)C1=CC=C(N)C(O)=C1 JDFAWEKPFLGRAK-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 2
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 2
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 125000002877 alkyl aryl group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 125000001118 alkylidene group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- QDHFHIQKOVNCNC-UHFFFAOYSA-N butane-1-sulfonic acid Chemical compound CCCCS(O)(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 125000005520 diaryliodonium group Chemical group 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229940018564 m-phenylenediamine Drugs 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- 238000011415 microwave curing Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 125000005246 nonafluorobutyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 2
- 125000002971 oxazolyl group Chemical group 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000011085 pressure filtration Methods 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical class C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 2
- XEDWWPGWIXPVRQ-UHFFFAOYSA-N (2,3,4-trihydroxyphenyl)-(3,4,5-trihydroxyphenyl)methanone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC(O)=C(O)C(O)=C1 XEDWWPGWIXPVRQ-UHFFFAOYSA-N 0.000 description 1
- SLKJWNJPOGWYLH-UHFFFAOYSA-N (2,3-dihydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound OC1=CC=CC(C(=O)C=2C(=C(O)C(O)=CC=2)O)=C1O SLKJWNJPOGWYLH-UHFFFAOYSA-N 0.000 description 1
- UIQNUSOZFPGNTG-UHFFFAOYSA-N (2-tert-butylphenyl) trifluoromethanesulfonate hydroiodide Chemical compound I.CC(C)(C)C1=CC=CC=C1OS(=O)(=O)C(F)(F)F UIQNUSOZFPGNTG-UHFFFAOYSA-N 0.000 description 1
- ZRDYULMDEGRWRC-UHFFFAOYSA-N (4-hydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C(O)=C1O ZRDYULMDEGRWRC-UHFFFAOYSA-N 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- 125000000355 1,3-benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- RZRQBRMLTFIIND-UHFFFAOYSA-N 1,4-dimethyl-2h-pyridine Chemical class CN1CC=C(C)C=C1 RZRQBRMLTFIIND-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- UHIDYCYNRPVZCK-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-hydroxyphenyl)propan-2-yl]phenol Chemical compound C=1C=C(O)C(N)=CC=1C(C)(C)C1=CC=C(O)C(N)=C1 UHIDYCYNRPVZCK-UHFFFAOYSA-N 0.000 description 1
- MVUFMTGHIRBEKR-UHFFFAOYSA-N 2-chloro-1-methyl-2h-pyridine Chemical compound CN1C=CC=CC1Cl MVUFMTGHIRBEKR-UHFFFAOYSA-N 0.000 description 1
- GVSTYPOYHNVKHY-UHFFFAOYSA-N 2-methoxybutanoic acid Chemical compound CCC(OC)C(O)=O GVSTYPOYHNVKHY-UHFFFAOYSA-N 0.000 description 1
- ILYSAKHOYBPSPC-UHFFFAOYSA-N 2-phenylbenzoic acid Chemical group OC(=O)C1=CC=CC=C1C1=CC=CC=C1 ILYSAKHOYBPSPC-UHFFFAOYSA-N 0.000 description 1
- XYJFAQCWRMHWFT-UHFFFAOYSA-N 2-sulfonylnaphthalene-1,4-dione Chemical class S(=O)(=O)=C1C(C2=CC=CC=C2C(C1)=O)=O XYJFAQCWRMHWFT-UHFFFAOYSA-N 0.000 description 1
- QMAQHCMFKOQWML-UHFFFAOYSA-N 3-[2-[2-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C(=CC=CC=2)S(=O)(=O)C=2C(=CC=CC=2)OC=2C=C(N)C=CC=2)=C1 QMAQHCMFKOQWML-UHFFFAOYSA-N 0.000 description 1
- XBIUWALDKXACEA-UHFFFAOYSA-N 3-[bis(2,4-dioxopentan-3-yl)alumanyl]pentane-2,4-dione Chemical compound CC(=O)C(C(C)=O)[Al](C(C(C)=O)C(C)=O)C(C(C)=O)C(C)=O XBIUWALDKXACEA-UHFFFAOYSA-N 0.000 description 1
- 229940018563 3-aminophenol Drugs 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- LKJWDWUXGCKFPN-UHFFFAOYSA-N 4-(1,1,1,3,3,3-hexafluoropropan-2-yl)phenol Chemical compound OC1=CC=C(C(C(F)(F)F)C(F)(F)F)C=C1 LKJWDWUXGCKFPN-UHFFFAOYSA-N 0.000 description 1
- SQJQLYOMPSJVQS-UHFFFAOYSA-N 4-(4-carboxyphenyl)sulfonylbenzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C=C1 SQJQLYOMPSJVQS-UHFFFAOYSA-N 0.000 description 1
- NZGQHKSLKRFZFL-UHFFFAOYSA-N 4-(4-hydroxyphenoxy)phenol Chemical compound C1=CC(O)=CC=C1OC1=CC=C(O)C=C1 NZGQHKSLKRFZFL-UHFFFAOYSA-N 0.000 description 1
- NBLFJUWXERDUEN-UHFFFAOYSA-N 4-[(2,3,4-trihydroxyphenyl)methyl]benzene-1,2,3-triol Chemical compound OC1=C(O)C(O)=CC=C1CC1=CC=C(O)C(O)=C1O NBLFJUWXERDUEN-UHFFFAOYSA-N 0.000 description 1
- BRPSWMCDEYMRPE-UHFFFAOYSA-N 4-[1,1-bis(4-hydroxyphenyl)ethyl]phenol Chemical compound C=1C=C(O)C=CC=1C(C=1C=CC(O)=CC=1)(C)C1=CC=C(O)C=C1 BRPSWMCDEYMRPE-UHFFFAOYSA-N 0.000 description 1
- NYIWTDSCYULDTJ-UHFFFAOYSA-N 4-[2-(2,3,4-trihydroxyphenyl)propan-2-yl]benzene-1,2,3-triol Chemical compound C=1C=C(O)C(O)=C(O)C=1C(C)(C)C1=CC=C(O)C(O)=C1O NYIWTDSCYULDTJ-UHFFFAOYSA-N 0.000 description 1
- PHQYMDAUTAXXFZ-UHFFFAOYSA-N 4-[2-(4-carboxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(C(O)=O)C=C1 PHQYMDAUTAXXFZ-UHFFFAOYSA-N 0.000 description 1
- XKACUVXWRVMXOE-UHFFFAOYSA-N 4-[2-(4-carboxyphenyl)propan-2-yl]benzoic acid Chemical compound C=1C=C(C(O)=O)C=CC=1C(C)(C)C1=CC=C(C(O)=O)C=C1 XKACUVXWRVMXOE-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- LDFYRFKAYFZVNH-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenoxy]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 LDFYRFKAYFZVNH-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- UTDAGHZGKXPRQI-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(S(=O)(=O)C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 UTDAGHZGKXPRQI-UHFFFAOYSA-N 0.000 description 1
- WFCQTAXSWSWIHS-UHFFFAOYSA-N 4-[bis(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 WFCQTAXSWSWIHS-UHFFFAOYSA-N 0.000 description 1
- 125000003143 4-hydroxybenzyl group Chemical group [H]C([*])([H])C1=C([H])C([H])=C(O[H])C([H])=C1[H] 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- SKDHHIUENRGTHK-UHFFFAOYSA-N 4-nitrobenzoyl chloride Chemical compound [O-][N+](=O)C1=CC=C(C(Cl)=O)C=C1 SKDHHIUENRGTHK-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- JATKASGNRMGFSW-UHFFFAOYSA-N 5-bromobenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC(Br)=CC(C(O)=O)=C1 JATKASGNRMGFSW-UHFFFAOYSA-N 0.000 description 1
- PLPFTLXIQQYOMW-UHFFFAOYSA-N 5-chlorobenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC(Cl)=CC(C(O)=O)=C1 PLPFTLXIQQYOMW-UHFFFAOYSA-N 0.000 description 1
- AUIOTTUHAZONIC-UHFFFAOYSA-N 5-fluorobenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC(F)=CC(C(O)=O)=C1 AUIOTTUHAZONIC-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- DEVXQDKRGJCZMV-UHFFFAOYSA-K Aluminum acetoacetate Chemical compound [Al+3].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O DEVXQDKRGJCZMV-UHFFFAOYSA-K 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical class OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- RZHFOGNSAQRATC-UHFFFAOYSA-N NC1=C(C=C(C=C1)C(C(F)(F)F)(C(F)(F)F)C1=CC(=C(C=C1)N)O)O.NC=1C=C(C=CC1O)C(C(F)(F)F)(C(F)(F)F)C1=CC(=C(C=C1)O)N Chemical compound NC1=C(C=C(C=C1)C(C(F)(F)F)(C(F)(F)F)C1=CC(=C(C=C1)N)O)O.NC=1C=C(C=CC1O)C(C(F)(F)F)(C(F)(F)F)C1=CC(=C(C=C1)O)N RZHFOGNSAQRATC-UHFFFAOYSA-N 0.000 description 1
- NSOZYORAHOAETH-UHFFFAOYSA-N Nc(cc1)ccc1C(Nc(cc(C(C(F)(F)F)(C(F)(F)F)c(cc1)cc(CNC(c(cc2)ccc2N)=O)c1O)cc1)c1O)=O Chemical compound Nc(cc1)ccc1C(Nc(cc(C(C(F)(F)F)(C(F)(F)F)c(cc1)cc(CNC(c(cc2)ccc2N)=O)c1O)cc1)c1O)=O NSOZYORAHOAETH-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- HLMUYZYLPUHSNV-NTISSMGPSA-N [(2s)-1,4-dioxo-1,4-bis(phenylmethoxy)butan-2-yl]azanium;4-methylbenzenesulfonate Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1.C([C@H](N)C(=O)OCC=1C=CC=CC=1)C(=O)OCC1=CC=CC=C1 HLMUYZYLPUHSNV-NTISSMGPSA-N 0.000 description 1
- IUBMTLKTDZQUBG-UHFFFAOYSA-N [4-[diethyl(hydroxy)silyl]phenyl]-diethyl-hydroxysilane Chemical compound CC[Si](O)(CC)C1=CC=C([Si](O)(CC)CC)C=C1 IUBMTLKTDZQUBG-UHFFFAOYSA-N 0.000 description 1
- XHWWBQNCFZGYKO-UHFFFAOYSA-N [4-[dihydroxy(methyl)silyl]phenyl]-dihydroxy-methylsilane Chemical compound C[Si](O)(O)C1=CC=C([Si](C)(O)O)C=C1 XHWWBQNCFZGYKO-UHFFFAOYSA-N 0.000 description 1
- ZWDBOXIZIUDKTL-UHFFFAOYSA-N [4-[dihydroxy(propyl)silyl]phenyl]-dihydroxy-propylsilane Chemical compound CCC[Si](O)(O)C1=CC=C([Si](O)(O)CCC)C=C1 ZWDBOXIZIUDKTL-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical group C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 description 1
- RXJOJBFXAIQIGT-UHFFFAOYSA-N bis(4-tert-butylphenyl)iodanium;nitrate Chemical compound [O-][N+]([O-])=O.C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 RXJOJBFXAIQIGT-UHFFFAOYSA-N 0.000 description 1
- ZFVMWEVVKGLCIJ-UHFFFAOYSA-N bisphenol AF Chemical compound C1=CC(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C=C1 ZFVMWEVVKGLCIJ-UHFFFAOYSA-N 0.000 description 1
- SXDBWCPKPHAZSM-UHFFFAOYSA-N bromic acid Chemical compound OBr(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-N 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- LDOKGSQCTMGUCO-UHFFFAOYSA-N butyl-ethyl-hydroxy-phenylsilane Chemical compound CCCC[Si](O)(CC)C1=CC=CC=C1 LDOKGSQCTMGUCO-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- SUSAGCZZQKACKE-UHFFFAOYSA-N cyclobutane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC1C(O)=O SUSAGCZZQKACKE-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- LNGJOYPCXLOTKL-UHFFFAOYSA-N cyclopentane-1,3-dicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)C1 LNGJOYPCXLOTKL-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007033 dehydrochlorination reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- OLLFKUHHDPMQFR-UHFFFAOYSA-N dihydroxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](O)(O)C1=CC=CC=C1 OLLFKUHHDPMQFR-UHFFFAOYSA-N 0.000 description 1
- XGUNOBQJSJSFLG-UHFFFAOYSA-N dihydroxy-(2-methylpropyl)-phenylsilane Chemical compound CC(C)C[Si](O)(O)C1=CC=CC=C1 XGUNOBQJSJSFLG-UHFFFAOYSA-N 0.000 description 1
- RBSBUSKLSKHTBA-UHFFFAOYSA-N dihydroxy-methyl-phenylsilane Chemical compound C[Si](O)(O)C1=CC=CC=C1 RBSBUSKLSKHTBA-UHFFFAOYSA-N 0.000 description 1
- BGGSHDAFUHWTJY-UHFFFAOYSA-N dihydroxy-phenyl-propan-2-ylsilane Chemical compound CC(C)[Si](O)(O)C1=CC=CC=C1 BGGSHDAFUHWTJY-UHFFFAOYSA-N 0.000 description 1
- VTOJOSYEOUXEDF-UHFFFAOYSA-N dihydroxy-phenyl-propylsilane Chemical compound CCC[Si](O)(O)C1=CC=CC=C1 VTOJOSYEOUXEDF-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LGPSGXJFQQZYMS-UHFFFAOYSA-M diphenyliodanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[I+]C1=CC=CC=C1 LGPSGXJFQQZYMS-UHFFFAOYSA-M 0.000 description 1
- RSJLWBUYLGJOBD-UHFFFAOYSA-M diphenyliodanium;chloride Chemical compound [Cl-].C=1C=CC=CC=1[I+]C1=CC=CC=C1 RSJLWBUYLGJOBD-UHFFFAOYSA-M 0.000 description 1
- WQIRVUAXANLUPO-UHFFFAOYSA-M diphenyliodanium;iodide Chemical compound [I-].C=1C=CC=CC=1[I+]C1=CC=CC=C1 WQIRVUAXANLUPO-UHFFFAOYSA-M 0.000 description 1
- CQZCVYWWRJDZBO-UHFFFAOYSA-N diphenyliodanium;nitrate Chemical compound [O-][N+]([O-])=O.C=1C=CC=CC=1[I+]C1=CC=CC=C1 CQZCVYWWRJDZBO-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- LRMHFDNWKCSEQU-UHFFFAOYSA-N ethoxyethane;phenol Chemical compound CCOCC.OC1=CC=CC=C1 LRMHFDNWKCSEQU-UHFFFAOYSA-N 0.000 description 1
- UHKJHMOIRYZSTH-UHFFFAOYSA-N ethyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OCC UHKJHMOIRYZSTH-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- HSFOEYCTUIQQES-UHFFFAOYSA-N ethyl-[4-[ethyl(dihydroxy)silyl]phenyl]-dihydroxysilane Chemical compound CC[Si](O)(O)C1=CC=C([Si](O)(O)CC)C=C1 HSFOEYCTUIQQES-UHFFFAOYSA-N 0.000 description 1
- AVHQYNBSFNOKCT-UHFFFAOYSA-N ethyl-dihydroxy-phenylsilane Chemical compound CC[Si](O)(O)C1=CC=CC=C1 AVHQYNBSFNOKCT-UHFFFAOYSA-N 0.000 description 1
- ZFERNGZLZDSUPH-UHFFFAOYSA-N ethyl-hydroxy-(2-methylpropyl)-phenylsilane Chemical compound CC(C)C[Si](O)(CC)C1=CC=CC=C1 ZFERNGZLZDSUPH-UHFFFAOYSA-N 0.000 description 1
- UFAHFMYBTCNZPM-UHFFFAOYSA-N ethyl-hydroxy-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](O)(CC)C1=CC=CC=C1 UFAHFMYBTCNZPM-UHFFFAOYSA-N 0.000 description 1
- JFBTVTLFBGJGPA-UHFFFAOYSA-N ethyl-hydroxy-methyl-phenylsilane Chemical compound CC[Si](C)(O)C1=CC=CC=C1 JFBTVTLFBGJGPA-UHFFFAOYSA-N 0.000 description 1
- MGLPUHWTRVIBKO-UHFFFAOYSA-N ethyl-hydroxy-phenyl-propan-2-ylsilane Chemical compound CC[Si](O)(C(C)C)C1=CC=CC=C1 MGLPUHWTRVIBKO-UHFFFAOYSA-N 0.000 description 1
- SOFJSIIYDIMYKZ-UHFFFAOYSA-N ethyl-hydroxy-phenyl-propylsilane Chemical compound CCC[Si](O)(CC)C1=CC=CC=C1 SOFJSIIYDIMYKZ-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000006355 external stress Effects 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- QFWPJPIVLCBXFJ-UHFFFAOYSA-N glymidine Chemical compound N1=CC(OCCOC)=CN=C1NS(=O)(=O)C1=CC=CC=C1 QFWPJPIVLCBXFJ-UHFFFAOYSA-N 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- CHAJJKUXTUIBMZ-UHFFFAOYSA-N hydroxy-(2-methylpropyl)-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](O)(CC(C)C)C1=CC=CC=C1 CHAJJKUXTUIBMZ-UHFFFAOYSA-N 0.000 description 1
- YBNBOGKRCOCJHH-UHFFFAOYSA-N hydroxy-[4-[hydroxy(dimethyl)silyl]phenyl]-dimethylsilane Chemical compound C[Si](C)(O)C1=CC=C([Si](C)(C)O)C=C1 YBNBOGKRCOCJHH-UHFFFAOYSA-N 0.000 description 1
- XPNHTKZQLZVYHZ-UHFFFAOYSA-N hydroxy-diphenyl-propan-2-ylsilane Chemical compound C=1C=CC=CC=1[Si](O)(C(C)C)C1=CC=CC=C1 XPNHTKZQLZVYHZ-UHFFFAOYSA-N 0.000 description 1
- ONVJULYGRCXHAY-UHFFFAOYSA-N hydroxy-diphenyl-propylsilane Chemical compound C=1C=CC=CC=1[Si](O)(CCC)C1=CC=CC=C1 ONVJULYGRCXHAY-UHFFFAOYSA-N 0.000 description 1
- YVHRVGSGHBWDOI-UHFFFAOYSA-N hydroxy-methyl-(2-methylpropyl)-phenylsilane Chemical compound CC(C)C[Si](C)(O)C1=CC=CC=C1 YVHRVGSGHBWDOI-UHFFFAOYSA-N 0.000 description 1
- MLPRTGXXQKWLDM-UHFFFAOYSA-N hydroxy-methyl-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](O)(C)C1=CC=CC=C1 MLPRTGXXQKWLDM-UHFFFAOYSA-N 0.000 description 1
- LLENFDWLUJBNFC-UHFFFAOYSA-N hydroxy-methyl-phenyl-propan-2-ylsilane Chemical compound CC(C)[Si](C)(O)C1=CC=CC=C1 LLENFDWLUJBNFC-UHFFFAOYSA-N 0.000 description 1
- FQQOMIXCGMRXEH-UHFFFAOYSA-N hydroxy-methyl-phenyl-propylsilane Chemical compound CCC[Si](C)(O)C1=CC=CC=C1 FQQOMIXCGMRXEH-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 1
- BJMDYNHSWAKAMX-UHFFFAOYSA-N methyl(diphenyl)sulfanium Chemical class C=1C=CC=CC=1[S+](C)C1=CC=CC=C1 BJMDYNHSWAKAMX-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- GOGZBMRXLADNEV-UHFFFAOYSA-N naphthalene-2,6-diamine Chemical compound C1=C(N)C=CC2=CC(N)=CC=C21 GOGZBMRXLADNEV-UHFFFAOYSA-N 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- 125000001038 naphthoyl group Chemical group C1(=CC=CC2=CC=CC=C12)C(=O)* 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- ZDYVRSLAEXCVBX-UHFFFAOYSA-N pyridinium p-toluenesulfonate Chemical compound C1=CC=[NH+]C=C1.CC1=CC=C(S([O-])(=O)=O)C=C1 ZDYVRSLAEXCVBX-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- SRWOQYHYUYGUCS-UHFFFAOYSA-N tert-butyl-dihydroxy-phenylsilane Chemical compound CC(C)(C)[Si](O)(O)C1=CC=CC=C1 SRWOQYHYUYGUCS-UHFFFAOYSA-N 0.000 description 1
- HAQMPJFWQWLQDO-UHFFFAOYSA-N tert-butyl-ethyl-hydroxy-phenylsilane Chemical compound CC[Si](O)(C(C)(C)C)C1=CC=CC=C1 HAQMPJFWQWLQDO-UHFFFAOYSA-N 0.000 description 1
- UNAYGNMKNYRIHL-UHFFFAOYSA-N tert-butyl-hydroxy-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](O)(C(C)(C)C)C1=CC=CC=C1 UNAYGNMKNYRIHL-UHFFFAOYSA-N 0.000 description 1
- VLKDZHUARIPFFA-UHFFFAOYSA-N tert-butyl-hydroxy-methyl-phenylsilane Chemical compound CC(C)(C)[Si](C)(O)C1=CC=CC=C1 VLKDZHUARIPFFA-UHFFFAOYSA-N 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical class SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- FCVNATXRSJMIDT-UHFFFAOYSA-N trihydroxy(phenyl)silane Chemical compound O[Si](O)(O)C1=CC=CC=C1 FCVNATXRSJMIDT-UHFFFAOYSA-N 0.000 description 1
- QQUBYBOFPPCWDM-UHFFFAOYSA-N trihydroxy-(4-trihydroxysilylphenyl)silane Chemical compound O[Si](O)(O)C1=CC=C([Si](O)(O)O)C=C1 QQUBYBOFPPCWDM-UHFFFAOYSA-N 0.000 description 1
- NJMOHBDCGXJLNJ-UHFFFAOYSA-N trimellitic anhydride chloride Chemical compound ClC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 NJMOHBDCGXJLNJ-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31144—Etching the insulating layers by chemical or physical means using masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
Abstract
【解決手段】本発明の樹脂組成物は、(a)ポリオキサゾール前駆体の構造を有するアルカリ水溶液可溶性のポリアミドと、(b)o−キノンジアジド化合物と、(c)加熱により酸を発生する熱潜在酸発生剤とを含んでなり、(c)成分が、パラトルエンスルホン酸のジ(t−ブチルフェニル)ヨードニウム塩、トリフルオロメタンスルホン酸のジ(t−ブチルフェニル)ヨードニウム塩、トリフルオロメタンスルホン酸のトリメチルスルホニウム塩、トリフルオロメタンスルホン酸のジメチルフェニルスルホニウム塩、トリフルオロメタンスルホン酸のジフェニルメチルスルホニウム塩、ノナフルオロブタンスルホン酸のジ(t−ブチルフェニル)ヨードニウム塩、ベンゼンスルホン酸のジメチルフェニルスルホニウム塩、トルエンスルホン酸のジフェニルメチルスルホニウム塩のいずれかである。
【選択図】図1
Description
また、280℃以下の低温硬化プロセスによって耐熱性に優れたパターンを得ることができる。
[1] (a)ポリオキサゾール前駆体の構造を有するアルカリ水溶液可溶性のポリアミドと、(b)o−キノンジアジド化合物と、(c)加熱により酸を発生する熱潜在酸発生剤とを含むポジ型感光性樹脂組成物であって、前記(c)成分が、パラトルエンスルホン酸のジ(t−ブチルフェニル)ヨードニウム塩、トリフルオロメタンスルホン酸のジ(t−ブチルフェニル)ヨードニウム塩、トリフルオロメタンスルホン酸のトリメチルスルホニウム塩、トリフルオロメタンスルホン酸のジメチルフェニルスルホニウム塩、トリフルオロメタンスルホン酸のジフェニルメチルスルホニウム塩、ノナフルオロブタンスルホン酸のジ(t−ブチルフェニル)ヨードニウム塩、ベンゼンスルホン酸のジメチルフェニルスルホニウム塩、及びトルエンスルホン酸のジフェニルメチルスルホニウム塩のいずれかであることを特徴とするポジ型感光性樹脂組成物。
[2] 上記(a)成分が、下記一般式(I)
[3] 上記(c)成分の分解開始温度が、140℃以上250℃以下であることを特徴とする上記[1]または[2]のいずれか1つに記載のポジ型感光性樹脂組成物。
[4]さらに、(d)フェノール性水酸基を有する化合物を含むことを特徴とする上記[1]〜[3]のいずれか1つに記載のポジ型感光性樹脂組成物。
[5]上記(d)成分が、下記一般式(II)
[6]上記一般式(II)中、Xで表される基が、下記一般式(III)
[7] 上記(a)成分、(b)成分、および(c)成分間の配合割合が、上記(a)成分100重量部に対して、上記(b)成分5〜100重量部、上記(c)成分0.1〜30重量部であることを特徴とする上記[1]〜[6]のいずれか1つに記載のポジ型感光性樹脂組成物。
[8] 上記(a)成分、(b)成分、(c)成分、および(d)成分間の配合割合が、上記(a)成分100重量部に対して、上記(b)成分5〜100重量部、上記(c)成分0.1〜30重量部、上記(d)成分1〜30重量部であることを特徴とする上記[4]〜[7]のいずれか1つに記載のポジ型感光性樹脂組成物。
[9] 上記[1]〜[8]のいずれか1つに記載のポジ型感光性樹脂組成物を支持基板上に塗布し乾燥し、感光性樹脂膜を得る工程と、上記感光性樹脂膜を所定のパターンの活性光線に露光する工程と、上記露光後の感光性樹脂膜をアルカリ水溶液を用いて現像する工程とを含むことを特徴とするパターン製造方法。
[10] 上記現像後の感光性樹脂膜を加熱処理する工程をさらに含むことを特徴とする、上記[9]に記載のパターン製造方法。
[11] 上記加熱処理は、周波数を変化させながらマイクロ波をパルス状に照射する処理であることを特徴とする上記[10]に記載のパターン製造方法。
[12] 上記加熱処理が、280℃以下の温度において行われることを特徴とする上記[10]又は[11]に記載のパターン製造方法。
[13]上記[9]〜[12]のいずれか1つに記載のパターンの製造方法により得られるパターンの層を有してなる電子デバイスを有する電子部品であって、上記電子デバイスが、その中に設けられた上記パターンの層を、層間絶縁膜層及び/または表面保護膜層として含むことを特徴とする電子部品。
[14] MRAMであることを特徴とする上記[13]に記載の電子部品。
本発明のポジ型感光性樹脂組成物は、(a)成分として、ポリオキサゾール前駆体の構造を有するアルカリ水溶液可溶性のポリアミドを含む。本発明に用いられるポリアミドは、ポリオキサゾール前駆体の構造を一部に有し、全体としてアルカリ水溶液可溶性であれば特に制限はなく、例えば、ポリオキサゾール前駆体ではないポリアミドの構造、ポリベンゾオキサゾールの構造、ポリイミドやポリイミド前駆体(ポリアミド酸やポリアミド酸エステル)の構造等をポリオキサゾール前駆体の構造と共に有していても良い。
ジアミン(i)及びテトラカルボン酸二無水物(ii)としては次のものが挙げられる。
合成例1 ポリベンゾオキサゾール前駆体の合成
攪拌機、温度計を備えた0.5リットルのフラスコ中に、4,4'−ジフェニルエーテルジカルボン酸15.48gと、N−メチルピロリドン90gとを仕込み、フラスコを5℃に冷却した後、塩化チオニル12.64gを滴下し、30分間反応させて、4,4'−ジフェニルエーテルジカルボン酸クロリドの溶液を得た。次いで、攪拌機、温度計を備えた0.5リットルのフラスコ中に、N−メチルピロリドン87.5gを仕込み、ビス(3−アミノ−4−ヒドロキシフェニル)ヘキサフルオロプロパン18.30gを添加し、攪拌溶解した。次いで、ピリジン8.53gを添加し、温度を0〜5℃に保ちながら、4,4'−ジフェニルエーテルジカルボン酸クロリドの溶液を30分間で滴下した後、30分間攪拌を続けた。得られた溶液を3リットルの水に投入し、析出物を回収、純水で3回洗浄した後、減圧乾燥してポリヒドロキシアミド(ポリベンゾオキサゾール前駆体)を得た(以下、ポリマーIとする)。ポリマーIのGPC法標準ポリスチレン換算により求めた重量平均分子量は14580、分散度は1.6であった。
合成例1で使用した4,4'−ジフェニルエーテルジカルボン酸の20mol%をシクロヘキサン−1,4−ジカルボン酸に置き換えた以外は合成例1と同様の条件にて合成を行った。得られたポリヒドロキシアミド(以下、ポリマーIIとする)の標準ポリスチレン換算により求めた重量平均分子量は18580、分散度は1.5であった。
上記ポリベンゾオキサゾール前駆体100重量部[(a)成分]に対し、感光剤である成分(b)、加熱により酸を発生する熱潜在酸発生剤(c)、フェノール性水酸基を有する化合物(d)、溶剤(e)を下記表1に示した所定量にて配合し、さらに接着助剤として尿素プロピルトリエトキシシランの50%メタノール溶液10重量部を配合した。この溶液を3μm孔のテフロン(登録商標)フィルタを用いて加圧ろ過して、感光性樹脂組成物の溶液を得た。
さらに、表1に示した実施例1、2、3、4、5、6、参考例4、5で用いた材料からなるポジ型感光性樹脂組成物溶液に関して、硬化方法を変えた検討を行った。まず、これらのポジ型感光性樹脂組成物溶液をシリコンウエハ上にスピンコートして、120℃で3分間加熱し、膜厚15μmの塗膜を形成した。その後、上記塗膜をラムダテクノロジー社製Microcure2100により、マイクロ波出力450W、マイクロ波周波数5.9〜7.0GHzとし、基板温度を200℃に保って、2時間硬化し、膜厚約10μmの硬化膜を得た。
実施例1と同様に合成例で合成したポリベンゾオキサゾール前駆体100重量部[(a)成分]に対し、感光剤である成分(b)、成分(c)、フェノール性水酸基を有する化合物(d)、溶剤(e)を下記表5に示した所定量にて配合し、さらに接着助剤として尿素プロピルトリエトキシシランの50%メタノール溶液10重量部を配合した。なお、ここでは、成分(c)に関しては添加しないか、あるいは以下に示すC15〜C19を用いた。上記溶液を3μm孔のテフロン(登録商標)フィルタを用いて加圧ろ過して、感光性樹脂組成物の溶液を得た。
合成例3 ヒドロキシ基含有ジアミン化合物(VII)の合成
乾燥窒素気流下、ビス(3−アミノ−4−ヒドロキシフェニル)ヘキサフルオロプロパン18.3g(0.05mol)をアセトン100ml、プロピレンオキシド17.4g(0.3mol)に溶解させ、−15℃に冷却した。ここに4−ニトロベンゾイルクロリド20.4g(0.11mol)をアセトン100mlに溶解させた溶液を滴下した。滴下終了後、−15℃で4時間反応させ、その後室温に戻した。析出した白色固体をろ別し、50℃で真空乾燥した。次に得られた固体30gを300mlのステンレスオートクレーブに入れ、メチルセルソルブ250mlに分散させ、5%パラジウム−カーボンを2g加えた。ここに水素を導入して、還元反応を室温で行った。約2時間反応後、ろ過して触媒であるパラジウム化合物を除き、ロータリーエバポレーターで濃縮し、ジアミン化合物(VII)を得た。得られた固体をそのまま反応に使用した。
乾燥窒素気流下、ビス(3−アミノ−4−ヒドロキシフェニル)ヘキサフルオロプロパン18.3g(0.05mol)とアリルグリシジルエーテル34.2g(0.3mol)をγ−ブチロラクトン100gに溶解させ、−15℃に冷却した。ここにγ−ブチロラクトンに溶解させた無水トリメリット酸クロリド22.1g(0.11mol)を反応液の温度が0℃を超えないように滴下した。滴下終了後、0℃で4時間反応させた。この溶液をロータリーエバポレーターで濃縮して、トルエン1lに投入して酸無水物(VIII)を得た。
乾燥窒素気流下、合成例3で得られたヒドロキシル基含有ジアミン(VII)15.1g(0.025mol)をN−メチル−2−ピロリドン50gに溶解させた。ここに合成例4で得られたヒドロキシ基含有酸無水物(VIII)17.5g(0.025mol)をピリジン30gとともに加えて、60℃で6時間反応させた。反応終了後、溶液を水2lに投入してポリマー固体の沈殿をろ過により集めた後、水洗、減圧乾燥して、ポリ(イミドーベンゾオキサゾール)前駆体を得た(以下、ポリマーIIIとする)。
合成例5で使用したヒドロキシル基含有ジアミン(VII)を4,4’−ジアミノフェニルエーテル5.01g(0.025mol)に置き換えた以外は、合成例5と同様の条件にて合成を行い、ポリ(イミドーベンゾオキサゾール)前駆体を得た(以下、ポリマーIVとする)。
2 保護膜
3 第1導体層
4 層間絶縁膜層
5 感光樹脂層
6A、6B、6C 窓
7 第2導体層
8 表面保護膜層
Claims (14)
- (a)ポリオキサゾール前駆体の構造を有するアルカリ水溶液可溶性のポリアミドと、(b)o−キノンジアジド化合物と、(c)加熱により酸を発生する熱潜在酸発生剤とを含むポジ型感光性樹脂組成物であって、
前記(c)成分が、パラトルエンスルホン酸のジ(t−ブチルフェニル)ヨードニウム塩、トリフルオロメタンスルホン酸のジ(t−ブチルフェニル)ヨードニウム塩、トリフルオロメタンスルホン酸のトリメチルスルホニウム塩、トリフルオロメタンスルホン酸のジメチルフェニルスルホニウム塩、トリフルオロメタンスルホン酸のジフェニルメチルスルホニウム塩、ノナフルオロブタンスルホン酸のジ(t−ブチルフェニル)ヨードニウム塩、ベンゼンスルホン酸のジメチルフェニルスルホニウム塩、及びトルエンスルホン酸のジフェニルメチルスルホニウム塩のいずれかであることを特徴とするポジ型感光性樹脂組成物。 - 前記(c)成分の分解開始温度が、140℃以上250℃以下であることを特徴とする請求項1または2に記載のポジ型感光性樹脂組成物。
- さらに、(d)フェノール性水酸基を有する化合物を含むことを特徴とする請求項1〜3のいずれか1項に記載のポジ型感光性樹脂組成物。
- 前記(a)成分、(b)成分、および(c)成分間の配合割合が、前記(a)成分100重量部に対して、前記(b)成分5〜100重量部、前記(c)成分0.1〜30重量部であることを特徴とする請求項1〜6のいずれか1項に記載のポジ型感光性樹脂組成物。
- 前記(a)成分、(b)成分、(c)成分、および(d)成分間の配合割合が、前記(a)成分100重量部に対して、前記(b)成分5〜100重量部、前記(c)成分0.1〜30重量部、前記(d)成分1〜30重量部であることを特徴とする請求項5〜7のいずれか1項に記載のポジ型感光性樹脂組成物。
- 請求項1〜8のいずれか1項に記載のポジ型感光性樹脂組成物を支持基板上に塗布し乾燥し、感光性樹脂膜を得る工程と、
前記感光性樹脂膜を所定のパターンの活性光線に露光する工程と、
前記露光後の感光性樹脂膜をアルカリ水溶液を用いて現像する工程とを含むことを特徴とするパターン製造方法。 - 前記現像後の感光性樹脂膜を加熱処理する工程をさらに含むことを特徴とする、請求項9記載のパターン製造方法。
- 前記加熱処理は、周波数を変化させながらマイクロ波をパルス状に照射する処理であることを特徴とする請求項10に記載のパターン製造方法。
- 前記加熱処理が280℃以下の温度において行われることを特徴とする請求項10又は11に記載のパターン製造方法。
- 請求項9〜12のいずれか1項に記載のパターンの製造方法により得られるパターンの層を有してなる電子デバイスを有する電子部品であって、前記電子デバイスが、その中に設けられた前記パターンの層を、層間絶縁膜層及び/または表面保護膜層として含むことを特徴とする電子部品。
- MRAMであることを特徴とする請求項13に記載の電子部品。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011095992A JP5115635B2 (ja) | 2004-05-07 | 2011-04-22 | ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 |
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004139149 | 2004-05-07 | ||
JP2004139149 | 2004-05-07 | ||
JP2004185613 | 2004-06-23 | ||
JP2004185613 | 2004-06-23 | ||
JP2004229285 | 2004-08-05 | ||
JP2004229285 | 2004-08-05 | ||
JP2011095992A JP5115635B2 (ja) | 2004-05-07 | 2011-04-22 | ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006519410A Division JP4775261B2 (ja) | 2004-05-07 | 2005-03-11 | ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011158921A true JP2011158921A (ja) | 2011-08-18 |
JP5115635B2 JP5115635B2 (ja) | 2013-01-09 |
Family
ID=35320359
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006519410A Active JP4775261B2 (ja) | 2004-05-07 | 2005-03-11 | ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 |
JP2011095992A Active JP5115635B2 (ja) | 2004-05-07 | 2011-04-22 | ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006519410A Active JP4775261B2 (ja) | 2004-05-07 | 2005-03-11 | ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7435525B2 (ja) |
EP (2) | EP2469337B1 (ja) |
JP (2) | JP4775261B2 (ja) |
KR (1) | KR100774672B1 (ja) |
CN (1) | CN1860414B (ja) |
TW (1) | TWI289149B (ja) |
WO (1) | WO2005109099A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013012082A1 (ja) | 2011-07-20 | 2013-01-24 | 株式会社ブリヂストン | ビードフィラー検査装置、ビードフィラー検査用プログラム及びビードフィラー検査方法 |
WO2023182327A1 (ja) * | 2022-03-23 | 2023-09-28 | 東レ株式会社 | ポジ型感光性樹脂組成物、硬化物、有機el表示装置、硬化物の製造方法 |
Families Citing this family (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4721845B2 (ja) * | 2004-09-28 | 2011-07-13 | 旭化成イーマテリアルズ株式会社 | ポジ型感光性樹脂組成物 |
JP4507850B2 (ja) * | 2004-11-19 | 2010-07-21 | 住友ベークライト株式会社 | ポジ型感光性樹脂組成物、並びにそれを用いたパターン形成方法、半導体装置の製造方法、及び表示装置の製造方法 |
JP5029747B2 (ja) * | 2005-05-18 | 2012-09-19 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、パターンの製造方法及び電子部品 |
JP4682764B2 (ja) * | 2005-09-15 | 2011-05-11 | 日立化成デュポンマイクロシステムズ株式会社 | ポジ型感光性樹脂組成物、パターン形成方法及び電子部品 |
JP4698356B2 (ja) * | 2005-09-20 | 2011-06-08 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物 |
KR100981830B1 (ko) | 2005-09-22 | 2010-09-13 | 히다치 가세이듀퐁 마이쿠로시스데무즈 가부시키가이샤 | 네거티브형 감광성 수지 조성물, 패턴 형성방법 및전자부품 |
EP1965256B1 (en) * | 2005-11-30 | 2014-04-30 | Sumitomo Bakelite Co., Ltd. | Positive photosensitive resin composition, and use of the same for manufacturing a semiconductor device and a display |
JP4780586B2 (ja) * | 2006-05-08 | 2011-09-28 | 旭化成イーマテリアルズ株式会社 | ポジ型感光性樹脂組成物 |
JP4742995B2 (ja) * | 2006-06-02 | 2011-08-10 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、パターンの製造方法及び電子部品 |
US20100159217A1 (en) * | 2006-06-20 | 2010-06-24 | Hitachi Chemical Dupont Microsystems, Ltd | Negative-type photosensitive resin composition, method for forming patterns, and electronic parts |
CN101600994B (zh) * | 2007-02-19 | 2013-05-01 | 住友电木株式会社 | 感光性树脂组合物、固化膜、保护膜、绝缘膜及使用它们的半导体装置和显示装置 |
US8298747B2 (en) * | 2007-03-12 | 2012-10-30 | Hitachi Chemical Dupont Microsystems, Ltd. | Photosensitive resin composition, process for producing patterned hardened film with use thereof and electronic part |
ATE547743T1 (de) | 2007-03-14 | 2012-03-15 | Fujifilm Corp | Lichtempfindliche zusammensetzung und herstellungsverfahren für ein gehärtetes reliefmuster |
KR101399281B1 (ko) * | 2007-06-29 | 2014-05-26 | 주식회사 동진쎄미켐 | 유기박막 트랜지스터용 감광성 수지 조성물 |
JP5072462B2 (ja) * | 2007-07-11 | 2012-11-14 | 旭化成イーマテリアルズ株式会社 | ポジ型感光性樹脂組成物 |
JP5061792B2 (ja) | 2007-08-21 | 2012-10-31 | 住友ベークライト株式会社 | ポジ型感光性樹脂組成物、硬化膜、保護膜、絶縁膜およびそれを用いた半導体装置、表示体装置。 |
US8420291B2 (en) * | 2007-10-29 | 2013-04-16 | Hitachi Chemical Dupont Microsystems, Ltd. | Positive photosensitive resin composition, method for forming pattern, electronic component |
KR100914062B1 (ko) * | 2007-11-30 | 2009-08-28 | 제일모직주식회사 | 포지티브형 감광성 수지 조성물 |
WO2009093706A1 (ja) * | 2008-01-24 | 2009-07-30 | Asahi Kasei E-Materials Corporation | 感光性樹脂積層体 |
KR20100006952A (ko) * | 2008-07-11 | 2010-01-22 | 삼성전자주식회사 | 포토레지스트 조성물, 이를 이용한 금속 패턴의 형성 방법및 표시 기판의 제조 방법 |
KR100913058B1 (ko) * | 2008-08-25 | 2009-08-20 | 금호석유화학 주식회사 | 포지티브형 감광성 수지 조성물, 패턴 형성 방법 및 반도체소자 |
JP5233526B2 (ja) * | 2008-09-05 | 2013-07-10 | 東レ株式会社 | 感光性組成物、それから形成された硬化膜、および硬化膜を有する素子 |
JP5651917B2 (ja) * | 2008-11-25 | 2015-01-14 | 日立化成デュポンマイクロシステムズ株式会社 | ポジ型感光性樹脂組成物、該樹脂組成物を用いたパターン硬化膜の製造方法及び電子部品 |
GB2466251B (en) * | 2008-12-16 | 2011-03-09 | Ind Tech Res Inst | Encapsulant compositions and method for fabricating encapsulant materials |
KR101311940B1 (ko) * | 2008-12-29 | 2013-09-26 | 제일모직주식회사 | 포지티브형 감광성 수지 조성물 |
KR20110023354A (ko) * | 2009-08-31 | 2011-03-08 | 금호석유화학 주식회사 | 포지티브형 감광성 조성물 |
KR101200140B1 (ko) * | 2009-08-31 | 2012-11-12 | 금호석유화학 주식회사 | 포지티브형 감광성 조성물 |
JP2011053458A (ja) * | 2009-09-02 | 2011-03-17 | Hitachi Chemical Dupont Microsystems Ltd | 感光性樹脂組成物、該樹脂組成物を用いたパターン硬化膜の製造方法及び電子部品 |
US20110143275A1 (en) * | 2009-12-16 | 2011-06-16 | Konica Minolta Business Technologies, Inc. | Producing method of water dispersion of polyester resin particles, resin composition, producing method of resin composition and electrophotographic toner |
JP5381742B2 (ja) * | 2010-01-21 | 2014-01-08 | 日立化成デュポンマイクロシステムズ株式会社 | ポジ型感光性樹脂組成物、パターン硬化膜の製造方法及び電子部品 |
JP5110144B2 (ja) * | 2010-10-12 | 2012-12-26 | 日立化成デュポンマイクロシステムズ株式会社 | ポジ型感光性樹脂組成物、パターン形成方法及び電子部品 |
JP5110145B2 (ja) * | 2010-10-12 | 2012-12-26 | 日立化成デュポンマイクロシステムズ株式会社 | ポジ型感光性樹脂組成物、パターン形成方法及び電子部品 |
KR101400187B1 (ko) | 2010-12-30 | 2014-05-27 | 제일모직 주식회사 | 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자 |
KR101910220B1 (ko) * | 2011-06-15 | 2018-10-19 | 히다치 가세이듀퐁 마이쿠로시스데무즈 가부시키가이샤 | 감광성 수지 조성물, 그 수지 조성물을 사용한 패턴 경화막의 제조 방법 및 전자 부품 |
JP5879795B2 (ja) * | 2011-07-26 | 2016-03-08 | 日立化成株式会社 | 有機エレクトロニクス材料、インク組成物、有機薄膜及びその製造方法、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、表示素子、照明装置、並びに表示装置 |
KR101423176B1 (ko) | 2011-11-29 | 2014-07-25 | 제일모직 주식회사 | 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자 |
KR101432603B1 (ko) | 2011-12-29 | 2014-08-21 | 제일모직주식회사 | 감광성 노볼락 수지, 이를 포함하는 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 이를 포함하는 반도체 소자 |
KR101486568B1 (ko) * | 2011-12-30 | 2015-01-27 | 제일모직 주식회사 | 포지티브형 감광성 수지 조성물 |
JP6164070B2 (ja) * | 2013-12-04 | 2017-07-19 | 日立化成デュポンマイクロシステムズ株式会社 | ポリイミド前駆体、該ポリイミド前駆体を含む樹脂組成物、それを用いたパターン硬化膜の製造方法及び半導体装置 |
JP6267982B2 (ja) * | 2014-02-05 | 2018-01-24 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、電子デバイスの製造方法、新規化合物、及び、新規化合物の製造方法 |
KR102585279B1 (ko) * | 2014-10-02 | 2023-10-05 | 에이치디 마이크로시스템즈 가부시키가이샤 | 포지티브형 감광성 수지 조성물, 패턴 경화막의 제조 방법, 경화물, 층간 절연막, 커버 코트층, 표면 보호막 및 전자 부품 |
JPWO2016152656A1 (ja) * | 2015-03-26 | 2018-02-22 | 東レ株式会社 | 感光性樹脂組成物 |
US11175582B2 (en) * | 2015-12-30 | 2021-11-16 | Fujifilm Electronic Materials U.S.A., Inc. | Photosensitive stacked structure |
WO2017122623A1 (ja) * | 2016-01-15 | 2017-07-20 | 東レ株式会社 | 硬化膜およびその製造方法 |
US11592744B2 (en) | 2016-02-05 | 2023-02-28 | Hd Microsystems, Ltd. | Positive-type photosensitive resin composition |
JP6691203B1 (ja) * | 2018-12-26 | 2020-04-28 | 東京応化工業株式会社 | 化学増幅型ポジ型感光性樹脂組成物、感光性ドライフィルム、感光性ドライフィルムの製造方法、パターン化されたレジスト膜の製造方法、鋳型付き基板の製造方法及びめっき造形物の製造方法 |
EP4006073A4 (en) * | 2019-07-29 | 2022-11-23 | Asahi Kasei Kabushiki Kaisha | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, POLYIMIDE MANUFACTURING METHOD, HARDENED RELIEF PATTERN MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE |
KR20220015327A (ko) * | 2020-07-30 | 2022-02-08 | 주식회사 엘지화학 | 바인더 수지, 포지티브형 감광성 수지 조성물, 절연막 및 반도체 장치 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11338154A (ja) * | 1998-05-29 | 1999-12-10 | Hitachi Chemical Dupont Microsystems Ltd | ポジ型感光性樹脂組成物及び電子部品の製造法 |
JP2000241973A (ja) * | 1998-05-29 | 2000-09-08 | Hitachi Chemical Dupont Microsystems Ltd | 感光性重合体組成物、レリーフパターンの製造法及び電子部品 |
JP2004077551A (ja) * | 2002-08-09 | 2004-03-11 | Hitachi Chemical Dupont Microsystems Ltd | 感光性樹脂組成物並びにそれを用いたレリーフパターンおよび耐熱性塗膜の製造方法およびそれらを有する電子部品 |
JP2005215436A (ja) * | 2004-01-30 | 2005-08-11 | Hitachi Chemical Dupont Microsystems Ltd | ポジ型感光性樹脂組成物、パターンの製造法及び電子部品 |
Family Cites Families (56)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4911541A (ja) | 1972-06-01 | 1974-02-01 | ||
JPS536287B2 (ja) | 1974-07-20 | 1978-03-07 | ||
US4093461A (en) | 1975-07-18 | 1978-06-06 | Gaf Corporation | Positive working thermally stable photoresist composition, article and method of using |
JPS5952822B2 (ja) | 1978-04-14 | 1984-12-21 | 東レ株式会社 | 耐熱性感光材料 |
JPS606368B2 (ja) | 1979-08-01 | 1985-02-18 | 東レ株式会社 | 感光性ポリイミド前駆体 |
DE2931297A1 (de) * | 1979-08-01 | 1981-02-19 | Siemens Ag | Waermebestaendige positivresists und verfahren zur herstellung waermebestaendiger reliefstrukturen |
JPS59108031A (ja) | 1982-12-13 | 1984-06-22 | Ube Ind Ltd | 感光性ポリイミド |
US4629777A (en) | 1983-05-18 | 1986-12-16 | Ciba-Geigy Corporation | Polyimides, a process for their preparation and their use |
JPS59231533A (ja) | 1983-05-18 | 1984-12-26 | チバ−ガイギ−・アクチエンゲゼルシヤフト | 塗膜を被覆した材料およびその使用方法 |
JPS59220730A (ja) | 1983-05-30 | 1984-12-12 | Ube Ind Ltd | 溶媒可溶性の感光性ポリイミド |
JPS59232122A (ja) | 1983-06-14 | 1984-12-26 | Ube Ind Ltd | 有機溶媒可溶性の感光性ポリイミド |
JPS606729A (ja) | 1983-06-24 | 1985-01-14 | Ube Ind Ltd | 有機溶媒に可溶性の感光性ポリイミド |
JPS6072925A (ja) | 1983-09-30 | 1985-04-25 | Ube Ind Ltd | 有機溶媒可溶性の感光性ポリイミド |
JPS6157620A (ja) | 1984-08-30 | 1986-03-24 | Ube Ind Ltd | 有機溶媒可溶性の感光性ポリイミド |
JPS61146962A (ja) | 1984-12-17 | 1986-07-04 | 清水建設株式会社 | スリツプフオ−ムによる側壁構築工法 |
ZA876216B (en) | 1986-08-22 | 1989-04-26 | Cetus Corp | Purified thermostable enzyme |
US4927736A (en) | 1987-07-21 | 1990-05-22 | Hoechst Celanese Corporation | Hydroxy polyimides and high temperature positive photoresists therefrom |
JPS6446862A (en) | 1987-08-18 | 1989-02-21 | Fujitsu Ltd | Bus controller |
JPH03763A (ja) | 1989-01-09 | 1991-01-07 | Nitto Denko Corp | ポジ型感光性ポリイミド組成物 |
JP2877894B2 (ja) | 1990-05-29 | 1999-04-05 | 住友ベークライト株式会社 | ポジ型感光性樹脂組成物 |
JP2828740B2 (ja) | 1990-06-14 | 1998-11-25 | 住友ベークライト株式会社 | ポジ型感光性樹脂組成物 |
US5241040A (en) | 1990-07-11 | 1993-08-31 | International Business Machines Corporation | Microwave processing |
EP0512339B1 (de) | 1991-05-07 | 1997-10-15 | Siemens Aktiengesellschaft | Hochwärmebeständige Positivresists und Verfahren zur Herstellung hochwärmebeständiger Reliefstrukturen |
JP3084494B2 (ja) | 1991-12-27 | 2000-09-04 | 日本石油化学株式会社 | 顔料の製造方法 |
TW298593B (ja) * | 1993-02-12 | 1997-02-21 | Hoechst Ag | |
JP2841161B2 (ja) | 1994-01-27 | 1998-12-24 | 株式会社巴川製紙所 | パターン形成用感光性樹脂組成物およびパターン形成方法 |
JPH08146862A (ja) | 1994-11-25 | 1996-06-07 | Asahi Glass Co Ltd | ホログラムの露光方法 |
JPH08319307A (ja) | 1995-05-29 | 1996-12-03 | Nippon Kayaku Co Ltd | 樹脂組成物、レジストインキ組成物及びその硬化物 |
EP0761718B1 (de) | 1995-08-31 | 2001-02-28 | Infineon Technologies AG | Herstellung von Poly-o-hydroxyamiden und Poly-o-mercaptoamiden |
JP3760957B2 (ja) * | 1996-03-05 | 2006-03-29 | 信越化学工業株式会社 | 新規スルホニウム塩及び化学増幅ポジ型レジスト材料 |
TW502135B (en) * | 1996-05-13 | 2002-09-11 | Sumitomo Bakelite Co | Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same |
US5738915A (en) | 1996-09-19 | 1998-04-14 | Lambda Technologies, Inc. | Curing polymer layers on semiconductor substrates using variable frequency microwave energy |
JPH10186664A (ja) | 1996-12-20 | 1998-07-14 | Asahi Chem Ind Co Ltd | ポジ型感光性耐熱材料 |
JP3871767B2 (ja) | 1997-05-07 | 2007-01-24 | 旭化成エレクトロニクス株式会社 | 感光性組成物 |
JP4221788B2 (ja) * | 1997-11-17 | 2009-02-12 | 住友化学株式会社 | 耐熱性に優れたレジストパターンの形成方法及びそれに用いられるポジ型レジスト組成物 |
TW466382B (en) | 1997-11-17 | 2001-12-01 | Sumitomo Chemical Co | A method for forming a resist pattern and a positive resist composition used for the same |
JP4058788B2 (ja) | 1998-01-12 | 2008-03-12 | 東レ株式会社 | 感光性耐熱性樹脂前駆体組成物 |
JP2000056559A (ja) | 1998-08-13 | 2000-02-25 | Canon Inc | 電子写真画像形成装置 |
US6143467A (en) | 1998-10-01 | 2000-11-07 | Arch Specialty Chemicals, Inc. | Photosensitive polybenzoxazole precursor compositions |
JP3455697B2 (ja) | 1999-05-27 | 2003-10-14 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、パターンの製造法及び電子部品 |
JP4154086B2 (ja) * | 1999-07-29 | 2008-09-24 | 日立化成工業株式会社 | 感光性重合体組成物、パターンの製造法及び電子部品 |
JP3891540B2 (ja) * | 1999-10-25 | 2007-03-14 | キヤノン株式会社 | 磁気抵抗効果メモリ、磁気抵抗効果メモリに記録される情報の記録再生方法、およびmram |
JP3755382B2 (ja) | 1999-10-29 | 2006-03-15 | 日立化成デュポンマイクロシステムズ株式会社 | ポジ型感光性樹脂組成物、パターンの製造法及び電子部品 |
JP4428780B2 (ja) | 1999-12-24 | 2010-03-10 | 旭化成イーマテリアルズ株式会社 | ポジ感光性組成物 |
JP4586238B2 (ja) | 2000-05-26 | 2010-11-24 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性重合体組成物、パターンの製造法及び電子部品 |
JP2002169283A (ja) * | 2000-11-30 | 2002-06-14 | Hitachi Chemical Dupont Microsystems Ltd | 感光性重合体組成物、パターンの製造法及び電子部品 |
TW574620B (en) * | 2001-02-26 | 2004-02-01 | Toray Industries | Precursor composition of positive photosensitive resin and display device using it |
JP2003221444A (ja) | 2001-11-26 | 2003-08-05 | Kansai Paint Co Ltd | ポリベンゾオキサゾール前駆体及びそれを用いた被覆用組成物 |
KR20030043702A (ko) * | 2001-11-26 | 2003-06-02 | 간사이 페인트 가부시키가이샤 | 폴리벤족사졸 전구체 및 그것을 이용하는 피복용 조성물 |
CN1180038C (zh) * | 2002-03-26 | 2004-12-15 | 清华大学 | 一种热固化剂 |
TWI287028B (en) * | 2002-05-17 | 2007-09-21 | Hitachi Chem Dupont Microsys | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment |
JP4410977B2 (ja) * | 2002-07-09 | 2010-02-10 | 富士通株式会社 | 化学増幅レジスト材料及びそれを用いたパターニング方法 |
EP1609024B1 (en) * | 2003-03-11 | 2015-09-30 | Fujifilm Electronic Materials USA, Inc. | Photosensitive resin compositions |
JP4300059B2 (ja) | 2003-05-15 | 2009-07-22 | 関西ペイント株式会社 | ポジ型感光性樹脂組成物及びパターン形成方法 |
JP4595412B2 (ja) | 2003-07-09 | 2010-12-08 | 東レ株式会社 | 感光性樹脂前駆体組成物 |
TWI360565B (en) * | 2003-07-09 | 2012-03-21 | Toray Industries | Photosensitive resin precursor composition |
-
2005
- 2005-03-11 JP JP2006519410A patent/JP4775261B2/ja active Active
- 2005-03-11 KR KR1020067006509A patent/KR100774672B1/ko active IP Right Grant
- 2005-03-11 US US10/576,494 patent/US7435525B2/en active Active
- 2005-03-11 CN CN2005800011683A patent/CN1860414B/zh active Active
- 2005-03-11 EP EP12160970.5A patent/EP2469337B1/en active Active
- 2005-03-11 EP EP05720621.1A patent/EP1744213B1/en active Active
- 2005-03-11 WO PCT/JP2005/004350 patent/WO2005109099A1/ja not_active Application Discontinuation
- 2005-03-18 TW TW094108316A patent/TWI289149B/zh active
-
2011
- 2011-04-22 JP JP2011095992A patent/JP5115635B2/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11338154A (ja) * | 1998-05-29 | 1999-12-10 | Hitachi Chemical Dupont Microsystems Ltd | ポジ型感光性樹脂組成物及び電子部品の製造法 |
JP2000241973A (ja) * | 1998-05-29 | 2000-09-08 | Hitachi Chemical Dupont Microsystems Ltd | 感光性重合体組成物、レリーフパターンの製造法及び電子部品 |
JP2004077551A (ja) * | 2002-08-09 | 2004-03-11 | Hitachi Chemical Dupont Microsystems Ltd | 感光性樹脂組成物並びにそれを用いたレリーフパターンおよび耐熱性塗膜の製造方法およびそれらを有する電子部品 |
JP2005215436A (ja) * | 2004-01-30 | 2005-08-11 | Hitachi Chemical Dupont Microsystems Ltd | ポジ型感光性樹脂組成物、パターンの製造法及び電子部品 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013012082A1 (ja) | 2011-07-20 | 2013-01-24 | 株式会社ブリヂストン | ビードフィラー検査装置、ビードフィラー検査用プログラム及びビードフィラー検査方法 |
WO2023182327A1 (ja) * | 2022-03-23 | 2023-09-28 | 東レ株式会社 | ポジ型感光性樹脂組成物、硬化物、有機el表示装置、硬化物の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1744213A1 (en) | 2007-01-17 |
EP2469337B1 (en) | 2014-01-22 |
CN1860414A (zh) | 2006-11-08 |
US7435525B2 (en) | 2008-10-14 |
JP5115635B2 (ja) | 2013-01-09 |
WO2005109099A1 (ja) | 2005-11-17 |
EP2469337A1 (en) | 2012-06-27 |
TWI289149B (en) | 2007-11-01 |
KR100774672B1 (ko) | 2007-11-08 |
KR20060085629A (ko) | 2006-07-27 |
CN1860414B (zh) | 2011-01-26 |
US20070122733A1 (en) | 2007-05-31 |
JPWO2005109099A1 (ja) | 2008-03-21 |
JP4775261B2 (ja) | 2011-09-21 |
EP1744213B1 (en) | 2014-09-03 |
EP1744213A4 (en) | 2011-02-02 |
TW200604251A (en) | 2006-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5115635B2 (ja) | ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 | |
JP4639956B2 (ja) | 感光性樹脂組成物、パターンの製造方法及び電子部品 | |
JP4682764B2 (ja) | ポジ型感光性樹脂組成物、パターン形成方法及び電子部品 | |
JP5621887B2 (ja) | ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 | |
JP5386781B2 (ja) | 感光性樹脂組成物、該樹脂組成物を用いたパターン硬化膜の製造方法及び電子部品 | |
JP2006313237A (ja) | ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 | |
JP2006189788A (ja) | ネガ型感光性樹脂組成物、パターン形成方法及び電子部品 | |
JP2007213032A (ja) | ポジ型感光性樹脂組成物、パターン形成方法及び電子部品 | |
JP5387750B2 (ja) | 感光性樹脂組成物、該樹脂組成物を用いたパターン硬化膜の製造方法及び電子部品 | |
US7638254B2 (en) | Positive photosensitive resin composition, method for forming pattern, and electronic part | |
JP5029386B2 (ja) | ポジ型感光性樹脂前駆体組成物、パターン硬化膜の製造方法及び電子部品 | |
JP4742995B2 (ja) | 感光性樹脂組成物、パターンの製造方法及び電子部品 | |
JP5110145B2 (ja) | ポジ型感光性樹脂組成物、パターン形成方法及び電子部品 | |
JP2011128359A (ja) | ポジ型感光性樹脂組成物、それを用いた硬化膜及び電子部品 | |
JP5029385B2 (ja) | ポジ型感光性樹脂前駆体組成物、パターン硬化膜の製造方法及び電子部品 | |
JP5110144B2 (ja) | ポジ型感光性樹脂組成物、パターン形成方法及び電子部品 | |
JP4529566B2 (ja) | マイクロ波硬化用ポジ型感光性樹脂組成物を用いたパターンの製造方法 | |
JP5741641B2 (ja) | 感光性樹脂組成物、該樹脂組成物を用いたパターン硬化膜の製造方法及び電子部品 | |
JP4793126B2 (ja) | 感光性樹脂組成物、パターンの製造方法及び電子部品 | |
JP5029747B2 (ja) | 感光性樹脂組成物、パターンの製造方法及び電子部品 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20110422 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120703 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120731 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120821 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120829 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120918 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20121001 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5115635 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20151026 Year of fee payment: 3 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |