JPS4911541A - - Google Patents
Info
- Publication number
- JPS4911541A JPS4911541A JP5451372A JP5451372A JPS4911541A JP S4911541 A JPS4911541 A JP S4911541A JP 5451372 A JP5451372 A JP 5451372A JP 5451372 A JP5451372 A JP 5451372A JP S4911541 A JPS4911541 A JP S4911541A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5451372A JPS4911541A (ja) | 1972-06-01 | 1972-06-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5451372A JPS4911541A (ja) | 1972-06-01 | 1972-06-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4911541A true JPS4911541A (ja) | 1974-02-01 |
Family
ID=12972714
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5451372A Pending JPS4911541A (ja) | 1972-06-01 | 1972-06-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4911541A (ja) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4433012A (en) * | 1980-07-10 | 1984-02-21 | Itt Industries, Inc. | Process for the pyrolytic deposition of aluminum from TIBA |
| US4460618A (en) * | 1978-05-25 | 1984-07-17 | Itt Industries, Inc. | Aluminum deposition on semiconductor bodies |
| JPS61121895A (ja) * | 1984-11-19 | 1986-06-09 | 富士重工業株式会社 | 可動ロボツト腕手首部の防護装置 |
| US7008752B2 (en) | 2004-03-17 | 2006-03-07 | Nitto Denko Corporation | Photosensitive resin composition and use of the same |
| EP1645909A2 (en) | 2004-10-07 | 2006-04-12 | Shin-Etsu Chemical Co., Ltd. | Photo-curable resin composition comprising a polyimide, a process for forming a pattern therewith, and a substrate protecting film |
| US7435525B2 (en) | 2004-05-07 | 2008-10-14 | Hitachi Chemical Dupont Microsystems Ltd. | Positive photosensitive resin composition, method for forming pattern, and electronic part |
| US7638254B2 (en) | 2004-05-07 | 2009-12-29 | Hitachi Chemical Dupont Microsystems Ltd | Positive photosensitive resin composition, method for forming pattern, and electronic part |
-
1972
- 1972-06-01 JP JP5451372A patent/JPS4911541A/ja active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4460618A (en) * | 1978-05-25 | 1984-07-17 | Itt Industries, Inc. | Aluminum deposition on semiconductor bodies |
| US4433012A (en) * | 1980-07-10 | 1984-02-21 | Itt Industries, Inc. | Process for the pyrolytic deposition of aluminum from TIBA |
| JPS61121895A (ja) * | 1984-11-19 | 1986-06-09 | 富士重工業株式会社 | 可動ロボツト腕手首部の防護装置 |
| JPS6213160B2 (ja) * | 1984-11-19 | 1987-03-24 | Fuji Heavy Ind Ltd | |
| US7008752B2 (en) | 2004-03-17 | 2006-03-07 | Nitto Denko Corporation | Photosensitive resin composition and use of the same |
| US7435525B2 (en) | 2004-05-07 | 2008-10-14 | Hitachi Chemical Dupont Microsystems Ltd. | Positive photosensitive resin composition, method for forming pattern, and electronic part |
| US7638254B2 (en) | 2004-05-07 | 2009-12-29 | Hitachi Chemical Dupont Microsystems Ltd | Positive photosensitive resin composition, method for forming pattern, and electronic part |
| EP2469337A1 (en) | 2004-05-07 | 2012-06-27 | Hitachi Chemical DuPont MicroSystems Ltd. | Positive photosensitive resin composition, method for forming pattern, and electronic component |
| EP1645909A2 (en) | 2004-10-07 | 2006-04-12 | Shin-Etsu Chemical Co., Ltd. | Photo-curable resin composition comprising a polyimide, a process for forming a pattern therewith, and a substrate protecting film |