JP2011119710A - 半導体装置及びその動作方法 - Google Patents
半導体装置及びその動作方法 Download PDFInfo
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- JP2011119710A JP2011119710A JP2010246195A JP2010246195A JP2011119710A JP 2011119710 A JP2011119710 A JP 2011119710A JP 2010246195 A JP2010246195 A JP 2010246195A JP 2010246195 A JP2010246195 A JP 2010246195A JP 2011119710 A JP2011119710 A JP 2011119710A
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
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Abstract
【解決手段】固体撮像素子の信号電荷蓄積部を光電変換素子のカソード電位に初期化することでリセットトランジスタを省く構成とし、酸化物半導体層を用いたオフ電流が1×10−13A以下の薄膜トランジスタを固体撮像素子の転送トランジスタに用いることで信号電荷蓄積部の電位が一定に保たれ、ダイナミックレンジを向上させることができる。また、周辺回路に相補型金属酸化物半導体素子が作製可能なシリコン半導体を用いることで高速かつ低消費電力の半導体装置を作製することができる。
【選択図】図1
Description
本発明の一態様は、金属絶縁物半導体素子、所謂MIS(Metal Insulator Semiconductor)トランジスタを用いた半導体装置である。本明細書では、チャネル形成領域に薄膜の半導体を用いた素子を薄膜トランジスタと称し、チャネル形成領域にバルクの半導体を用いた素子をバルクトランジスタと称する。ただし、SOI(Silicon on Insulator)基板に形成されている半導体層は薄膜とも言えるが、本明細書では該半導体層で形成したトランジスタはバルクトランジスタの一種とする。
本発明の一形態は、酸化物半導体中でキャリアの供与体(ドナーまたはアクセプタ)となり得る不純物を極めて少ないレベルにまで除去することで、真性または実質的に真性な半導体であって、当該酸化物半導体を薄膜トランジスタに適用するものである。本実施の形態では、評価用素子(TEGとも呼ぶ)でのオフ電流の測定値について以下に説明する。
本発明の一態様における薄膜トランジスタを含む固体撮像素子の動作について説明する。
101 転送トランジスタ
102 酸化物半導体層
104 ソース電極
106 ドレイン電極
108 ゲート電極
110 光電変換素子
114 p型領域
116 信号電荷蓄積部
118 ゲート絶縁層
131 増幅トランジスタ
136 ゲート絶縁層
138 ゲート電極
140 絶縁膜
142 保護絶縁層
152 配線層
154 配線
132a n型領域
138a 導電層
138b 導電層
201 トランジスタ
204 ソース電極
210 光電変換素子
301 トランジスタ
304 ソース電極
305 バッファ層
306 ドレイン電極
310 光電変換素子
112 n型領域
450 窒素雰囲気下
501 転送トランジスタ
510 光電変換素子
516 信号電荷蓄積部
531 増幅トランジスタ
540 容量電極
541 絶縁膜
600 レンズ
602 カラーフィルタ
604 配線層
606 層間絶縁膜
608 光電変換素子
610 レンズ
612 カラーフィルタ
618 光電変換素子
1002 フォトダイオード
1004 転送トランジスタ
1006 リセットトランジスタ
1008 増幅トランジスタ
1010 信号電荷蓄積部
1040 リセット信号線
1050 転送スイッチ線
1120 垂直出力線
1210 信号電荷蓄積部
1212 フォトダイオード
1214 転送トランジスタ
1218 増幅トランジスタ
1220 垂直出力線
1240 リセット信号線
1250 転送スイッチ線
1408 増幅トランジスタ
1410 信号電荷蓄積部
1412 フォトダイオード
1414 転送トランジスタ
1422 フォトダイオード
1424 転送トランジスタ
1432 フォトダイオード
1434 転送トランジスタ
1442 フォトダイオード
1444 転送トランジスタ
1451 転送スイッチ線
1452 転送スイッチ線
1453 転送スイッチ線
1454 転送スイッチ線
1461 リセット信号線
1470 垂直出力線
1508 増幅トランジスタ
1510 信号電荷蓄積部
1512 フォトダイオード
1514 転送トランジスタ
1522 フォトダイオード
1524 転送トランジスタ
1532 フォトダイオード
1534 転送トランジスタ
1542 フォトダイオード
1544 転送トランジスタ
1551 転送スイッチ線
1552 転送スイッチ線
1553 転送スイッチ線
1554 転送スイッチ線
1561 リセット信号線
1570 垂直出力線
1572 転送スイッチ線
1610 信号電荷蓄積部
1612 フォトダイオード
1614 転送トランジスタ
1618 増幅トランジスタ
1620 信号電荷蓄積部
1622 フォトダイオード
1624 転送トランジスタ
1628 増幅トランジスタ
1630 信号電荷蓄積部
1632 フォトダイオード
1634 転送トランジスタ
1642 フォトダイオード
1644 転送トランジスタ
1652 フォトダイオード
1654 転送トランジスタ
1662 フォトダイオード
1664 転送トランジスタ
1665 リセット信号線
1666 リセット信号線
1667 リセット信号線
1668 リセット信号線
1672 フォトダイオード
1674 転送トランジスタ
1675 垂直出力線
1676 垂直出力線
1682 フォトダイオード
1684 転送トランジスタ
1751 転送スイッチ線
1753 転送スイッチ線
1754 転送スイッチ線
2000 画素部
2020 リセット端子駆動回路
2040 転送端子駆動回路
2060 垂直出力線駆動回路
2100 画素マトリクス
2120 各垂直出力線
2200 シフトレジスタ
2210 シフトレジスタ
2220 シフトレジスタ
2300 バッファ回路
2310 バッファ回路
2320 バッファ回路
2400 アナログスイッチ
2500 映像出力線
Claims (10)
- シリコン半導体に埋設された光電変換素子部と、
前記光電変換素子部と電気的に接続される転送トランジスタと、
前記転送トランジスタと電気的に接続される信号電荷蓄積部と、
前記信号電荷蓄積部と電気的に接続される増幅トランジスタと、
を有し、
前記転送トランジスタのチャネル形成領域は酸化物半導体で形成されており、前記増幅トランジスタのチャネル形成領域は前記シリコン半導体で形成された画素部を有することを特徴とする半導体装置。 - 請求項1において、前記増幅トランジスタの上部に前記転送トランジスタが形成されていることを特徴とする半導体装置。
- 請求項1または2において、前記転送トランジスタのオフ電流は1×10−13A以下であることを特徴とする半導体装置。
- 請求項1乃至3のいずれか一項において、前記酸化物半導体のキャリア濃度は1×1014/cm3未満であることを特徴とする半導体装置。
- 請求項1乃至4のいずれか一項において、前記画素部はシリコン半導体をチャネル形成領域に有する相補型トランジスタで構成された周辺回路部と電気的に接続されていることを特徴とする半導体装置。
- 請求項1乃至5のいずれか一項において、前記信号電荷蓄積部は、絶縁層を誘電体として含むことを特徴とする半導体装置。
- 請求項1乃至6のいずれか一項に記載の半導体装置を具備することを特徴とする電子機器。
- 光電変換素子部と、
前記光電変換素子部と電気的に接続される転送トランジスタと、
前記転送トランジスタと電気的に接続される信号電荷蓄積部と、
前記信号電荷蓄積部と電気的に接続される増幅トランジスタと、
を有し、
前記光電変換素子部を順バイアスとし、
前記転送トランジスタをオンして前記信号電荷蓄積部を前記光電変換素子部のカソード電位に初期化し、
前記光電変換素子部を逆バイアスとし、
前記光電変換素子部に光を照射して前記信号電荷蓄積部の電位を変化させ、
前記転送トランジスタをオフして前記信号電荷蓄積部の電位を保持し、
前記信号電荷蓄積部の電位に従って前記増幅トランジスタより信号を出力させる半導体装置の動作方法。 - 請求項8において、前記転送トランジスタのチャネル形成領域は、酸化物半導体で形成されていることを特徴とする半導体装置の動作方法。
- 請求項8または9において、前記増幅トランジスタのチャネル形成領域は、シリコン半導体で形成されていることを特徴とする半導体装置の動作方法。
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Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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US9307578B2 (en) | 2011-08-17 | 2016-04-05 | Lam Research Corporation | System and method for monitoring temperatures of and controlling multiplexed heater array |
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KR20180030286A (ko) | 2016-09-12 | 2018-03-22 | 삼성디스플레이 주식회사 | 테스트부를 갖는 표시장치 |
JP2018093297A (ja) * | 2016-11-30 | 2018-06-14 | キヤノン株式会社 | 光電変換装置、撮像システム |
US10714400B2 (en) * | 2017-08-30 | 2020-07-14 | Micron Technology, Inc. | Methods of forming semiconductor structures comprising thin film transistors including oxide semiconductors |
CN110892528A (zh) * | 2019-10-12 | 2020-03-17 | 长江存储科技有限责任公司 | 半导体器件及其制作方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000114453A (ja) * | 1998-12-08 | 2000-04-21 | Internatl Business Mach Corp <Ibm> | 薄膜及びバルク・シリコン・トランジスタを組み合わせる併合化論理回路及びメモリ |
JP2002353431A (ja) * | 2001-05-22 | 2002-12-06 | Canon Inc | 光電変換装置及びその製造方法 |
JP2003197890A (ja) * | 2001-12-26 | 2003-07-11 | Canon Inc | 光電変換装置及び画像形成システム |
JP2006165530A (ja) * | 2004-11-10 | 2006-06-22 | Canon Inc | センサ及び非平面撮像装置 |
JP2008218648A (ja) * | 2007-03-02 | 2008-09-18 | Sony Corp | 撮像装置およびカメラ |
JP2009010362A (ja) * | 2007-05-31 | 2009-01-15 | Canon Inc | 酸化物半導体を用いた薄膜トランジスタの製造方法 |
JP2009535819A (ja) * | 2006-08-31 | 2009-10-01 | マイクロン テクノロジー, インク. | 高性能画像センサのための透明チャネル薄膜トランジスタベースのピクセル |
Family Cites Families (161)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60199277A (ja) * | 1984-03-23 | 1985-10-08 | Junichi Nishizawa | 2次元固体撮像装置 |
JPS60198861A (ja) | 1984-03-23 | 1985-10-08 | Fujitsu Ltd | 薄膜トランジスタ |
JPH0244256B2 (ja) | 1987-01-28 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn2o5deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
JPH0244258B2 (ja) | 1987-02-24 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn3o6deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
JPH0244260B2 (ja) | 1987-02-24 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn5o8deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
JPS63210023A (ja) | 1987-02-24 | 1988-08-31 | Natl Inst For Res In Inorg Mater | InGaZn↓4O↓7で示される六方晶系の層状構造を有する化合物およびその製造法 |
JPH0244262B2 (ja) | 1987-02-27 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn6o9deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
JPH0244263B2 (ja) | 1987-04-22 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn7o10deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
JPH02208974A (ja) * | 1989-02-09 | 1990-08-20 | Hitachi Ltd | 固体撮像装置 |
JPH04257263A (ja) | 1991-02-12 | 1992-09-11 | Matsushita Electric Ind Co Ltd | 固体撮像装置 |
JPH05251705A (ja) | 1992-03-04 | 1993-09-28 | Fuji Xerox Co Ltd | 薄膜トランジスタ |
JPH0864795A (ja) | 1994-08-19 | 1996-03-08 | Fuji Xerox Co Ltd | 薄膜トランジスタ及びイメージセンサ |
JP3479375B2 (ja) | 1995-03-27 | 2003-12-15 | 科学技術振興事業団 | 亜酸化銅等の金属酸化物半導体による薄膜トランジスタとpn接合を形成した金属酸化物半導体装置およびそれらの製造方法 |
ES2211937T3 (es) | 1995-08-02 | 2004-07-16 | Canon Kabushiki Kaisha | Dispositivo sensor de imagenes de estado solido con linea de salida comun. |
EP0820644B1 (en) * | 1995-08-03 | 2005-08-24 | Koninklijke Philips Electronics N.V. | Semiconductor device provided with transparent switching element |
JP3625598B2 (ja) * | 1995-12-30 | 2005-03-02 | 三星電子株式会社 | 液晶表示装置の製造方法 |
JP4170454B2 (ja) | 1998-07-24 | 2008-10-22 | Hoya株式会社 | 透明導電性酸化物薄膜を有する物品及びその製造方法 |
JP2000150861A (ja) * | 1998-11-16 | 2000-05-30 | Tdk Corp | 酸化物薄膜 |
JP3276930B2 (ja) * | 1998-11-17 | 2002-04-22 | 科学技術振興事業団 | トランジスタ及び半導体装置 |
TW460731B (en) | 1999-09-03 | 2001-10-21 | Ind Tech Res Inst | Electrode structure and production method of wide viewing angle LCD |
US6960817B2 (en) | 2000-04-21 | 2005-11-01 | Canon Kabushiki Kaisha | Solid-state imaging device |
JP4089858B2 (ja) | 2000-09-01 | 2008-05-28 | 国立大学法人東北大学 | 半導体デバイス |
KR20020038482A (ko) * | 2000-11-15 | 2002-05-23 | 모리시타 요이찌 | 박막 트랜지스터 어레이, 그 제조방법 및 그것을 이용한표시패널 |
JP3899236B2 (ja) * | 2001-02-16 | 2007-03-28 | シャープ株式会社 | イメージセンサの製造方法 |
JP3997731B2 (ja) * | 2001-03-19 | 2007-10-24 | 富士ゼロックス株式会社 | 基材上に結晶性半導体薄膜を形成する方法 |
JP2002289859A (ja) | 2001-03-23 | 2002-10-04 | Minolta Co Ltd | 薄膜トランジスタ |
JP3925839B2 (ja) | 2001-09-10 | 2007-06-06 | シャープ株式会社 | 半導体記憶装置およびその試験方法 |
JP4090716B2 (ja) | 2001-09-10 | 2008-05-28 | 雅司 川崎 | 薄膜トランジスタおよびマトリクス表示装置 |
JP4164562B2 (ja) | 2002-09-11 | 2008-10-15 | 独立行政法人科学技術振興機構 | ホモロガス薄膜を活性層として用いる透明薄膜電界効果型トランジスタ |
EP1443130B1 (en) * | 2001-11-05 | 2011-09-28 | Japan Science and Technology Agency | Natural superlattice homologous single crystal thin film, method for preparation thereof, and device using said single crystal thin film |
JP4083486B2 (ja) * | 2002-02-21 | 2008-04-30 | 独立行政法人科学技術振興機構 | LnCuO(S,Se,Te)単結晶薄膜の製造方法 |
JP2003258227A (ja) | 2002-02-27 | 2003-09-12 | Canon Inc | 放射線検出装置及びその製造方法 |
JP2003264273A (ja) * | 2002-03-08 | 2003-09-19 | Canon Inc | 放射線検出装置 |
US7049190B2 (en) * | 2002-03-15 | 2006-05-23 | Sanyo Electric Co., Ltd. | Method for forming ZnO film, method for forming ZnO semiconductor layer, method for fabricating semiconductor device, and semiconductor device |
JP3933591B2 (ja) * | 2002-03-26 | 2007-06-20 | 淳二 城戸 | 有機エレクトロルミネッセント素子 |
US7339187B2 (en) | 2002-05-21 | 2008-03-04 | State Of Oregon Acting By And Through The Oregon State Board Of Higher Education On Behalf Of Oregon State University | Transistor structures |
JP2004022625A (ja) * | 2002-06-13 | 2004-01-22 | Murata Mfg Co Ltd | 半導体デバイス及び該半導体デバイスの製造方法 |
US7105868B2 (en) * | 2002-06-24 | 2006-09-12 | Cermet, Inc. | High-electron mobility transistor with zinc oxide |
JP4304927B2 (ja) * | 2002-07-16 | 2009-07-29 | ソニー株式会社 | 固体撮像素子及びその製造方法 |
US7067843B2 (en) * | 2002-10-11 | 2006-06-27 | E. I. Du Pont De Nemours And Company | Transparent oxide semiconductor thin film transistors |
JP4166105B2 (ja) | 2003-03-06 | 2008-10-15 | シャープ株式会社 | 半導体装置およびその製造方法 |
JP2004273732A (ja) | 2003-03-07 | 2004-09-30 | Sharp Corp | アクティブマトリクス基板およびその製造方法 |
JP4108633B2 (ja) | 2003-06-20 | 2008-06-25 | シャープ株式会社 | 薄膜トランジスタおよびその製造方法ならびに電子デバイス |
US7262463B2 (en) * | 2003-07-25 | 2007-08-28 | Hewlett-Packard Development Company, L.P. | Transistor including a deposited channel region having a doped portion |
US7115923B2 (en) * | 2003-08-22 | 2006-10-03 | Micron Technology, Inc. | Imaging with gate controlled charge storage |
US7253392B2 (en) * | 2003-09-08 | 2007-08-07 | Micron Technology, Inc. | Image sensor with photo diode gate |
JP4578792B2 (ja) * | 2003-09-26 | 2010-11-10 | 富士通セミコンダクター株式会社 | 固体撮像装置 |
US7332786B2 (en) * | 2003-11-26 | 2008-02-19 | Micron Technology, Inc. | Anti-blooming storage pixel |
JP2005228997A (ja) * | 2004-02-13 | 2005-08-25 | Matsushita Electric Ind Co Ltd | 固体撮像装置およびその製造方法 |
US7145174B2 (en) * | 2004-03-12 | 2006-12-05 | Hewlett-Packard Development Company, Lp. | Semiconductor device |
CN102856390B (zh) | 2004-03-12 | 2015-11-25 | 独立行政法人科学技术振兴机构 | 包含薄膜晶体管的lcd或有机el显示器的转换组件 |
US7282782B2 (en) * | 2004-03-12 | 2007-10-16 | Hewlett-Packard Development Company, L.P. | Combined binary oxide semiconductor device |
US7297977B2 (en) | 2004-03-12 | 2007-11-20 | Hewlett-Packard Development Company, L.P. | Semiconductor device |
US7211825B2 (en) * | 2004-06-14 | 2007-05-01 | Yi-Chi Shih | Indium oxide-based thin film transistors and circuits |
JP2006100760A (ja) * | 2004-09-02 | 2006-04-13 | Casio Comput Co Ltd | 薄膜トランジスタおよびその製造方法 |
US7285501B2 (en) * | 2004-09-17 | 2007-10-23 | Hewlett-Packard Development Company, L.P. | Method of forming a solution processed device |
US7427776B2 (en) * | 2004-10-07 | 2008-09-23 | Hewlett-Packard Development Company, L.P. | Thin-film transistor and methods |
US7298084B2 (en) * | 2004-11-02 | 2007-11-20 | 3M Innovative Properties Company | Methods and displays utilizing integrated zinc oxide row and column drivers in conjunction with organic light emitting diodes |
EP1810335B1 (en) * | 2004-11-10 | 2020-05-27 | Canon Kabushiki Kaisha | Light-emitting device |
US7791072B2 (en) * | 2004-11-10 | 2010-09-07 | Canon Kabushiki Kaisha | Display |
US7453065B2 (en) * | 2004-11-10 | 2008-11-18 | Canon Kabushiki Kaisha | Sensor and image pickup device |
EP2453480A2 (en) * | 2004-11-10 | 2012-05-16 | Canon Kabushiki Kaisha | Amorphous oxide and field effect transistor |
US7863611B2 (en) * | 2004-11-10 | 2011-01-04 | Canon Kabushiki Kaisha | Integrated circuits utilizing amorphous oxides |
JP5138163B2 (ja) | 2004-11-10 | 2013-02-06 | キヤノン株式会社 | 電界効果型トランジスタ |
JP5126729B2 (ja) | 2004-11-10 | 2013-01-23 | キヤノン株式会社 | 画像表示装置 |
US7868326B2 (en) * | 2004-11-10 | 2011-01-11 | Canon Kabushiki Kaisha | Field effect transistor |
US7829444B2 (en) * | 2004-11-10 | 2010-11-09 | Canon Kabushiki Kaisha | Field effect transistor manufacturing method |
JP5118810B2 (ja) | 2004-11-10 | 2013-01-16 | キヤノン株式会社 | 電界効果型トランジスタ |
JP5126730B2 (ja) * | 2004-11-10 | 2013-01-23 | キヤノン株式会社 | 電界効果型トランジスタの製造方法 |
US7579224B2 (en) * | 2005-01-21 | 2009-08-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing a thin film semiconductor device |
US7608531B2 (en) * | 2005-01-28 | 2009-10-27 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, electronic device, and method of manufacturing semiconductor device |
TWI562380B (en) * | 2005-01-28 | 2016-12-11 | Semiconductor Energy Lab Co Ltd | Semiconductor device, electronic device, and method of manufacturing semiconductor device |
US7858451B2 (en) * | 2005-02-03 | 2010-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device, semiconductor device and manufacturing method thereof |
US7948171B2 (en) * | 2005-02-18 | 2011-05-24 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device |
US20060197092A1 (en) * | 2005-03-03 | 2006-09-07 | Randy Hoffman | System and method for forming conductive material on a substrate |
JP4224036B2 (ja) * | 2005-03-17 | 2009-02-12 | 富士通マイクロエレクトロニクス株式会社 | フォトダイオード領域を埋め込んだイメージセンサ及びその製造方法 |
JP4459099B2 (ja) | 2005-03-18 | 2010-04-28 | キヤノン株式会社 | 固体撮像装置及びカメラ |
US8681077B2 (en) * | 2005-03-18 | 2014-03-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, and display device, driving method and electronic apparatus thereof |
US7544967B2 (en) * | 2005-03-28 | 2009-06-09 | Massachusetts Institute Of Technology | Low voltage flexible organic/transparent transistor for selective gas sensing, photodetecting and CMOS device applications |
US7645478B2 (en) * | 2005-03-31 | 2010-01-12 | 3M Innovative Properties Company | Methods of making displays |
US8300031B2 (en) * | 2005-04-20 | 2012-10-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device comprising transistor having gate and drain connected through a current-voltage conversion element |
JP2006344849A (ja) | 2005-06-10 | 2006-12-21 | Casio Comput Co Ltd | 薄膜トランジスタ |
US7691666B2 (en) | 2005-06-16 | 2010-04-06 | Eastman Kodak Company | Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
US7402506B2 (en) * | 2005-06-16 | 2008-07-22 | Eastman Kodak Company | Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
US7507618B2 (en) | 2005-06-27 | 2009-03-24 | 3M Innovative Properties Company | Method for making electronic devices using metal oxide nanoparticles |
FR2888989B1 (fr) * | 2005-07-21 | 2008-06-06 | St Microelectronics Sa | Capteur d'images |
KR100711890B1 (ko) * | 2005-07-28 | 2007-04-25 | 삼성에스디아이 주식회사 | 유기 발광표시장치 및 그의 제조방법 |
JP2007059128A (ja) * | 2005-08-23 | 2007-03-08 | Canon Inc | 有機el表示装置およびその製造方法 |
JP2007073705A (ja) * | 2005-09-06 | 2007-03-22 | Canon Inc | 酸化物半導体チャネル薄膜トランジスタおよびその製造方法 |
JP4280736B2 (ja) * | 2005-09-06 | 2009-06-17 | キヤノン株式会社 | 半導体素子 |
JP4560502B2 (ja) * | 2005-09-06 | 2010-10-13 | キヤノン株式会社 | 電界効果型トランジスタ |
JP5116225B2 (ja) * | 2005-09-06 | 2013-01-09 | キヤノン株式会社 | 酸化物半導体デバイスの製造方法 |
JP4850457B2 (ja) | 2005-09-06 | 2012-01-11 | キヤノン株式会社 | 薄膜トランジスタ及び薄膜ダイオード |
EP3614442A3 (en) * | 2005-09-29 | 2020-03-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having oxide semiconductor layer and manufactoring method thereof |
JP4720414B2 (ja) | 2005-10-06 | 2011-07-13 | 日本ビクター株式会社 | 固体撮像素子及びその製造方法 |
JP5037808B2 (ja) * | 2005-10-20 | 2012-10-03 | キヤノン株式会社 | アモルファス酸化物を用いた電界効果型トランジスタ、及び該トランジスタを用いた表示装置 |
JP4752447B2 (ja) * | 2005-10-21 | 2011-08-17 | ソニー株式会社 | 固体撮像装置およびカメラ |
CN101667544B (zh) * | 2005-11-15 | 2012-09-05 | 株式会社半导体能源研究所 | 半导体器件及其制造方法 |
JP4777772B2 (ja) | 2005-12-28 | 2011-09-21 | 富士通セミコンダクター株式会社 | 半導体撮像装置 |
TWI292281B (en) * | 2005-12-29 | 2008-01-01 | Ind Tech Res Inst | Pixel structure of active organic light emitting diode and method of fabricating the same |
US7867636B2 (en) * | 2006-01-11 | 2011-01-11 | Murata Manufacturing Co., Ltd. | Transparent conductive film and method for manufacturing the same |
JP4894275B2 (ja) * | 2006-01-20 | 2012-03-14 | ソニー株式会社 | 固体撮像装置 |
JP4977478B2 (ja) * | 2006-01-21 | 2012-07-18 | 三星電子株式会社 | ZnOフィルム及びこれを用いたTFTの製造方法 |
US7576394B2 (en) * | 2006-02-02 | 2009-08-18 | Kochi Industrial Promotion Center | Thin film transistor including low resistance conductive thin films and manufacturing method thereof |
US7977169B2 (en) * | 2006-02-15 | 2011-07-12 | Kochi Industrial Promotion Center | Semiconductor device including active layer made of zinc oxide with controlled orientations and manufacturing method thereof |
JP5110803B2 (ja) | 2006-03-17 | 2012-12-26 | キヤノン株式会社 | 酸化物膜をチャネルに用いた電界効果型トランジスタ及びその製造方法 |
US7419844B2 (en) * | 2006-03-17 | 2008-09-02 | Sharp Laboratories Of America, Inc. | Real-time CMOS imager having stacked photodiodes fabricated on SOI wafer |
KR20070101595A (ko) | 2006-04-11 | 2007-10-17 | 삼성전자주식회사 | ZnO TFT |
US20070252928A1 (en) | 2006-04-28 | 2007-11-01 | Toppan Printing Co., Ltd. | Structure, transmission type liquid crystal display, reflection type display and manufacturing method thereof |
JP5028033B2 (ja) | 2006-06-13 | 2012-09-19 | キヤノン株式会社 | 酸化物半導体膜のドライエッチング方法 |
JP5116264B2 (ja) * | 2006-07-10 | 2013-01-09 | キヤノン株式会社 | 光電変換装置、光電変換装置の製造方法および光電変換装置を用いた撮像システム |
JP4999400B2 (ja) * | 2006-08-09 | 2012-08-15 | キヤノン株式会社 | 酸化物半導体膜のドライエッチング方法 |
JP4609797B2 (ja) * | 2006-08-09 | 2011-01-12 | Nec液晶テクノロジー株式会社 | 薄膜デバイス及びその製造方法 |
JP5127183B2 (ja) | 2006-08-23 | 2013-01-23 | キヤノン株式会社 | アモルファス酸化物半導体膜を用いた薄膜トランジスタの製造方法 |
JP4332545B2 (ja) * | 2006-09-15 | 2009-09-16 | キヤノン株式会社 | 電界効果型トランジスタ及びその製造方法 |
JP4274219B2 (ja) * | 2006-09-27 | 2009-06-03 | セイコーエプソン株式会社 | 電子デバイス、有機エレクトロルミネッセンス装置、有機薄膜半導体装置 |
JP5164357B2 (ja) * | 2006-09-27 | 2013-03-21 | キヤノン株式会社 | 半導体装置及び半導体装置の製造方法 |
US7622371B2 (en) * | 2006-10-10 | 2009-11-24 | Hewlett-Packard Development Company, L.P. | Fused nanocrystal thin film semiconductor and method |
US7916195B2 (en) * | 2006-10-13 | 2011-03-29 | Sony Corporation | Solid-state imaging device, imaging apparatus and camera |
JP5116290B2 (ja) | 2006-11-21 | 2013-01-09 | キヤノン株式会社 | 薄膜トランジスタの製造方法 |
US7772021B2 (en) * | 2006-11-29 | 2010-08-10 | Samsung Electronics Co., Ltd. | Flat panel displays comprising a thin-film transistor having a semiconductive oxide in its channel and methods of fabricating the same for use in flat panel displays |
JP2008140684A (ja) * | 2006-12-04 | 2008-06-19 | Toppan Printing Co Ltd | カラーelディスプレイおよびその製造方法 |
KR101303578B1 (ko) * | 2007-01-05 | 2013-09-09 | 삼성전자주식회사 | 박막 식각 방법 |
US8207063B2 (en) * | 2007-01-26 | 2012-06-26 | Eastman Kodak Company | Process for atomic layer deposition |
JP2008198648A (ja) | 2007-02-08 | 2008-08-28 | Toshiba Corp | X線撮像装置 |
TWI478347B (zh) | 2007-02-09 | 2015-03-21 | Idemitsu Kosan Co | A thin film transistor, a thin film transistor substrate, and an image display device, and an image display device, and a semiconductor device |
KR100851215B1 (ko) * | 2007-03-14 | 2008-08-07 | 삼성에스디아이 주식회사 | 박막 트랜지스터 및 이를 이용한 유기 전계 발광표시장치 |
WO2008117739A1 (ja) * | 2007-03-23 | 2008-10-02 | Idemitsu Kosan Co., Ltd. | 半導体デバイス、多結晶半導体薄膜、多結晶半導体薄膜の製造方法、電界効果型トランジスタ、及び、電界効果型トランジスタの製造方法 |
JP5197058B2 (ja) | 2007-04-09 | 2013-05-15 | キヤノン株式会社 | 発光装置とその作製方法 |
WO2008126879A1 (en) | 2007-04-09 | 2008-10-23 | Canon Kabushiki Kaisha | Light-emitting apparatus and production method thereof |
US7795613B2 (en) | 2007-04-17 | 2010-09-14 | Toppan Printing Co., Ltd. | Structure with transistor |
KR101325053B1 (ko) | 2007-04-18 | 2013-11-05 | 삼성디스플레이 주식회사 | 박막 트랜지스터 기판 및 이의 제조 방법 |
KR20080094300A (ko) | 2007-04-19 | 2008-10-23 | 삼성전자주식회사 | 박막 트랜지스터 및 그 제조 방법과 박막 트랜지스터를포함하는 평판 디스플레이 |
KR101334181B1 (ko) | 2007-04-20 | 2013-11-28 | 삼성전자주식회사 | 선택적으로 결정화된 채널층을 갖는 박막 트랜지스터 및 그제조 방법 |
CN101663762B (zh) * | 2007-04-25 | 2011-09-21 | 佳能株式会社 | 氧氮化物半导体 |
KR101345376B1 (ko) | 2007-05-29 | 2013-12-24 | 삼성전자주식회사 | ZnO 계 박막 트랜지스터 및 그 제조방법 |
JP5109687B2 (ja) | 2007-06-22 | 2012-12-26 | セイコーエプソン株式会社 | 検出装置及び電子機器 |
US7759628B2 (en) | 2007-06-22 | 2010-07-20 | Seiko Epson Corporation | Detection device and electronic apparatus having plural scanning lines, detection lines, power supply lines and plural unit circuits arranged on a substrate |
KR20090002841A (ko) * | 2007-07-04 | 2009-01-09 | 삼성전자주식회사 | 산화물 반도체, 이를 포함하는 박막 트랜지스터 및 그 제조방법 |
JP5151375B2 (ja) | 2007-10-03 | 2013-02-27 | ソニー株式会社 | 固体撮像装置およびその製造方法および撮像装置 |
KR20090040158A (ko) * | 2007-10-19 | 2009-04-23 | 삼성전자주식회사 | 투명한 트랜지스터를 구비한 시모스 이미지 센서 |
JP5292787B2 (ja) * | 2007-11-30 | 2013-09-18 | ソニー株式会社 | 固体撮像装置及びカメラ |
CN103258857B (zh) * | 2007-12-13 | 2016-05-11 | 出光兴产株式会社 | 使用了氧化物半导体的场效应晶体管及其制造方法 |
US8202365B2 (en) * | 2007-12-17 | 2012-06-19 | Fujifilm Corporation | Process for producing oriented inorganic crystalline film, and semiconductor device using the oriented inorganic crystalline film |
WO2009081796A1 (ja) | 2007-12-20 | 2009-07-02 | Konica Minolta Holdings, Inc. | 電子デバイスおよび電子デバイスの製造方法 |
KR101228160B1 (ko) | 2007-12-27 | 2013-01-30 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | a-IGZO 산화물 박막의 제조 방법 |
JP5061915B2 (ja) | 2008-01-18 | 2012-10-31 | ソニー株式会社 | 固体撮像素子及び撮像装置 |
WO2009093625A1 (ja) * | 2008-01-23 | 2009-07-30 | Idemitsu Kosan Co., Ltd. | 電界効果型トランジスタ及びその製造方法、それを用いた表示装置、並びに半導体装置 |
JP5038188B2 (ja) | 2008-02-28 | 2012-10-03 | キヤノン株式会社 | 撮像装置及びそれを用いた撮像システム |
US8709855B2 (en) * | 2008-06-05 | 2014-04-29 | International Business Machines Corporation | Intralevel conductive light shield |
JP4623179B2 (ja) * | 2008-09-18 | 2011-02-02 | ソニー株式会社 | 薄膜トランジスタおよびその製造方法 |
JP5451280B2 (ja) * | 2008-10-09 | 2014-03-26 | キヤノン株式会社 | ウルツ鉱型結晶成長用基板およびその製造方法ならびに半導体装置 |
KR101776955B1 (ko) * | 2009-02-10 | 2017-09-08 | 소니 주식회사 | 고체 촬상 장치와 그 제조 방법, 및 전자 기기 |
JP4835710B2 (ja) * | 2009-03-17 | 2011-12-14 | ソニー株式会社 | 固体撮像装置、固体撮像装置の製造方法、固体撮像装置の駆動方法、及び電子機器 |
JP4499819B2 (ja) * | 2009-04-23 | 2010-07-07 | 国立大学法人東北大学 | 固体撮像装置 |
KR101584664B1 (ko) * | 2009-05-08 | 2016-01-13 | 삼성전자주식회사 | 씨모스 이미지 센서 |
KR101893128B1 (ko) * | 2009-10-21 | 2018-08-30 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 아날로그 회로 및 반도체 장치 |
EP2491586B1 (en) * | 2009-10-21 | 2019-11-20 | Semiconductor Energy Laboratory Co. Ltd. | Semiconductor device |
KR101952065B1 (ko) * | 2009-11-06 | 2019-02-25 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 동작 방법 |
KR101707159B1 (ko) * | 2009-11-06 | 2017-02-15 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
US9236408B2 (en) * | 2012-04-25 | 2016-01-12 | Semiconductor Energy Laboratory Co., Ltd. | Oxide semiconductor device including photodiode |
-
2010
- 2010-10-12 KR KR1020177035531A patent/KR101952065B1/ko active IP Right Grant
- 2010-10-12 KR KR1020127012007A patent/KR101810254B1/ko active IP Right Grant
- 2010-10-12 WO PCT/JP2010/068231 patent/WO2011055625A1/en active Application Filing
- 2010-10-12 KR KR1020147013960A patent/KR101605984B1/ko active IP Right Grant
- 2010-10-27 TW TW103119537A patent/TWI534998B/zh not_active IP Right Cessation
- 2010-10-27 TW TW099136689A patent/TWI512957B/zh active
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- 2010-11-02 JP JP2010246195A patent/JP5489955B2/ja not_active Expired - Fee Related
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- 2018-11-12 JP JP2018211919A patent/JP6879646B2/ja active Active
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- 2020-07-06 JP JP2020116260A patent/JP6964165B2/ja active Active
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- 2021-09-24 JP JP2021155012A patent/JP6976478B1/ja active Active
- 2021-11-09 JP JP2021182313A patent/JP6993535B1/ja active Active
- 2021-12-09 JP JP2021199960A patent/JP7349485B2/ja active Active
-
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- 2023-09-11 JP JP2023146874A patent/JP2023164550A/ja active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000114453A (ja) * | 1998-12-08 | 2000-04-21 | Internatl Business Mach Corp <Ibm> | 薄膜及びバルク・シリコン・トランジスタを組み合わせる併合化論理回路及びメモリ |
JP2002353431A (ja) * | 2001-05-22 | 2002-12-06 | Canon Inc | 光電変換装置及びその製造方法 |
JP2003197890A (ja) * | 2001-12-26 | 2003-07-11 | Canon Inc | 光電変換装置及び画像形成システム |
JP2006165530A (ja) * | 2004-11-10 | 2006-06-22 | Canon Inc | センサ及び非平面撮像装置 |
JP2009535819A (ja) * | 2006-08-31 | 2009-10-01 | マイクロン テクノロジー, インク. | 高性能画像センサのための透明チャネル薄膜トランジスタベースのピクセル |
JP2008218648A (ja) * | 2007-03-02 | 2008-09-18 | Sony Corp | 撮像装置およびカメラ |
JP2009010362A (ja) * | 2007-05-31 | 2009-01-15 | Canon Inc | 酸化物半導体を用いた薄膜トランジスタの製造方法 |
Cited By (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102030178B1 (ko) * | 2011-06-30 | 2019-10-08 | 소니 주식회사 | 촬상 소자, 촬상 소자의 구동 방법, 촬상 소자의 제조 방법, 및 전자 기기 |
JP2013033896A (ja) * | 2011-06-30 | 2013-02-14 | Sony Corp | 撮像素子、撮像素子の駆動方法、撮像素子の製造方法、および電子機器 |
KR20130007444A (ko) * | 2011-06-30 | 2013-01-18 | 소니 주식회사 | 촬상 소자, 촬상 소자의 구동 방법, 촬상 소자의 제조 방법, 및 전자 기기 |
JP2021002673A (ja) * | 2011-07-15 | 2021-01-07 | 株式会社半導体エネルギー研究所 | イメージセンサ |
JP2022118032A (ja) * | 2011-07-15 | 2022-08-12 | 株式会社半導体エネルギー研究所 | 半導体装置 |
KR102262921B1 (ko) | 2011-07-15 | 2021-06-08 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 구동 방법 |
JP2019212920A (ja) * | 2011-07-15 | 2019-12-12 | 株式会社半導体エネルギー研究所 | イメージセンサ |
JP7371167B2 (ja) | 2011-07-15 | 2023-10-30 | 株式会社半導体エネルギー研究所 | 半導体装置 |
KR20200022413A (ko) * | 2011-07-15 | 2020-03-03 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 구동 방법 |
JP2018067742A (ja) * | 2011-07-15 | 2018-04-26 | 株式会社半導体エネルギー研究所 | 半導体装置 |
KR102132318B1 (ko) | 2011-07-15 | 2020-07-09 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 구동 방법 |
KR20200084851A (ko) * | 2011-07-15 | 2020-07-13 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 구동 방법 |
KR102319771B1 (ko) | 2011-07-15 | 2021-10-29 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 구동 방법 |
KR20210068360A (ko) * | 2011-07-15 | 2021-06-09 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 구동 방법 |
JP2020109416A (ja) * | 2012-03-21 | 2020-07-16 | 株式会社半導体エネルギー研究所 | 距離測定装置の距離測定方法 |
JP2016506620A (ja) * | 2012-12-13 | 2016-03-03 | シーブライト・インコーポレイテッドCbrite Inc. | Motfetを有するピクセル化されたイメージャおよびその製造方法 |
JP2021122048A (ja) * | 2014-03-28 | 2021-08-26 | 株式会社半導体エネルギー研究所 | 撮像装置 |
JP2020109994A (ja) * | 2014-03-28 | 2020-07-16 | 株式会社半導体エネルギー研究所 | 電子機器および撮像装置 |
JP2015216369A (ja) * | 2014-04-23 | 2015-12-03 | 株式会社半導体エネルギー研究所 | 撮像装置 |
JP2020017961A (ja) * | 2014-07-18 | 2020-01-30 | 株式会社半導体エネルギー研究所 | 撮像装置 |
US11848341B2 (en) | 2015-01-30 | 2023-12-19 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device and electronic device |
TWI792065B (zh) * | 2015-01-30 | 2023-02-11 | 日商半導體能源研究所股份有限公司 | 成像裝置及電子裝置 |
JP2020074564A (ja) * | 2015-01-30 | 2020-05-14 | 株式会社半導体エネルギー研究所 | 電子機器及び撮像装置 |
US11777038B2 (en) | 2015-07-17 | 2023-10-03 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, method for manufacturing the same, and electronic device |
JP2022043075A (ja) * | 2015-07-17 | 2022-03-15 | 株式会社半導体エネルギー研究所 | 電子機器 |
JP2022082642A (ja) * | 2015-09-10 | 2022-06-02 | 株式会社半導体エネルギー研究所 | 撮像装置 |
JP7117466B2 (ja) | 2015-09-10 | 2022-08-12 | 株式会社半導体エネルギー研究所 | 撮像装置 |
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JP2020198446A (ja) * | 2015-09-10 | 2020-12-10 | 株式会社半導体エネルギー研究所 | 撮像装置 |
JPWO2019050024A1 (ja) * | 2017-09-11 | 2020-10-22 | パナソニックIpマネジメント株式会社 | 距離測定方法および距離測定装置 |
WO2021048669A1 (ja) * | 2019-09-11 | 2021-03-18 | 株式会社半導体エネルギー研究所 | 撮像装置 |
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