JP2006528431A5 - - Google Patents
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- Publication number
- JP2006528431A5 JP2006528431A5 JP2006521216A JP2006521216A JP2006528431A5 JP 2006528431 A5 JP2006528431 A5 JP 2006528431A5 JP 2006521216 A JP2006521216 A JP 2006521216A JP 2006521216 A JP2006521216 A JP 2006521216A JP 2006528431 A5 JP2006528431 A5 JP 2006528431A5
- Authority
- JP
- Japan
- Prior art keywords
- purge gas
- bundle
- humidifier
- hollow fiber
- gas mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000010926 purge Methods 0.000 claims 125
- 239000012528 membrane Substances 0.000 claims 45
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 43
- 239000000203 mixture Substances 0.000 claims 41
- 239000012510 hollow fiber Substances 0.000 claims 31
- 238000000034 method Methods 0.000 claims 26
- 229920001169 thermoplastic Polymers 0.000 claims 18
- 239000004416 thermosoftening plastic Substances 0.000 claims 16
- 239000000835 fiber Substances 0.000 claims 12
- 239000012530 fluid Substances 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 12
- 239000007788 liquid Substances 0.000 claims 10
- 239000000356 contaminant Substances 0.000 claims 6
- 238000000746 purification Methods 0.000 claims 6
- 238000000059 patterning Methods 0.000 claims 4
- 229920000642 polymer Polymers 0.000 claims 4
- 230000005855 radiation Effects 0.000 claims 4
- -1 polytetrafluoroethylene Polymers 0.000 claims 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims 2
- 239000004810 polytetrafluoroethylene Substances 0.000 claims 2
- 239000011148 porous material Substances 0.000 claims 2
- 238000007789 sealing Methods 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 229920006395 saturated elastomer Polymers 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/623,180 US7384149B2 (en) | 2003-07-21 | 2003-07-21 | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
| PCT/US2004/023490 WO2005010619A2 (en) | 2003-07-21 | 2004-07-21 | Lithographic projection apparatus, purge gas supply system and gas purging |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007299182A Division JP2008160080A (ja) | 2003-07-21 | 2007-11-19 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
| JP2011235682A Division JP2012074712A (ja) | 2003-07-21 | 2011-10-27 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006528431A JP2006528431A (ja) | 2006-12-14 |
| JP2006528431A5 true JP2006528431A5 (enExample) | 2011-02-03 |
Family
ID=34079792
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006521023A Expired - Lifetime JP4487108B2 (ja) | 2003-07-21 | 2004-07-20 | リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム |
| JP2006521216A Withdrawn JP2006528431A (ja) | 2003-07-21 | 2004-07-21 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
| JP2007299182A Withdrawn JP2008160080A (ja) | 2003-07-21 | 2007-11-19 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
| JP2011235682A Withdrawn JP2012074712A (ja) | 2003-07-21 | 2011-10-27 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006521023A Expired - Lifetime JP4487108B2 (ja) | 2003-07-21 | 2004-07-20 | リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007299182A Withdrawn JP2008160080A (ja) | 2003-07-21 | 2007-11-19 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
| JP2011235682A Withdrawn JP2012074712A (ja) | 2003-07-21 | 2011-10-27 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
Country Status (9)
| Country | Link |
|---|---|
| US (4) | US7384149B2 (enExample) |
| EP (3) | EP1649325B1 (enExample) |
| JP (4) | JP4487108B2 (enExample) |
| KR (3) | KR100846184B1 (enExample) |
| CN (3) | CN1853142B (enExample) |
| DE (1) | DE602004027497D1 (enExample) |
| SG (1) | SG141460A1 (enExample) |
| TW (3) | TWI251130B (enExample) |
| WO (2) | WO2005008339A2 (enExample) |
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| US9482966B2 (en) | 2002-11-12 | 2016-11-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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- 2004-07-20 JP JP2006521023A patent/JP4487108B2/ja not_active Expired - Lifetime
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- 2004-07-20 CN CN2004800266052A patent/CN1853142B/zh not_active Expired - Lifetime
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- 2004-07-21 TW TW096131640A patent/TW200801848A/zh unknown
- 2004-07-21 EP EP10162412A patent/EP2211233A2/en not_active Withdrawn
- 2004-07-21 WO PCT/US2004/023490 patent/WO2005010619A2/en not_active Ceased
- 2004-07-21 KR KR1020077023567A patent/KR20070106805A/ko not_active Abandoned
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- 2004-07-21 CN CN2007101812213A patent/CN101144986B/zh not_active Expired - Fee Related
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- 2004-07-21 KR KR1020067001321A patent/KR101077683B1/ko not_active Expired - Fee Related
- 2004-07-21 TW TW093121732A patent/TW200511389A/zh unknown
- 2004-07-21 SG SG200802367-3A patent/SG141460A1/en unknown
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2006
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2007
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2011
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