JP2012074712A5 - - Google Patents

Download PDF

Info

Publication number
JP2012074712A5
JP2012074712A5 JP2011235682A JP2011235682A JP2012074712A5 JP 2012074712 A5 JP2012074712 A5 JP 2012074712A5 JP 2011235682 A JP2011235682 A JP 2011235682A JP 2011235682 A JP2011235682 A JP 2011235682A JP 2012074712 A5 JP2012074712 A5 JP 2012074712A5
Authority
JP
Japan
Prior art keywords
purge gas
gas mixture
humidifier
region
moisture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2011235682A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012074712A (ja
Filing date
Publication date
Priority claimed from US10/623,180 external-priority patent/US7384149B2/en
Application filed filed Critical
Publication of JP2012074712A publication Critical patent/JP2012074712A/ja
Publication of JP2012074712A5 publication Critical patent/JP2012074712A5/ja
Withdrawn legal-status Critical Current

Links

JP2011235682A 2003-07-21 2011-10-27 リソグラフ投影装置、パージガス供給システムおよびガスパージ Withdrawn JP2012074712A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/623,180 US7384149B2 (en) 2003-07-21 2003-07-21 Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
US10/623,180 2003-07-21

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2006521216A Division JP2006528431A (ja) 2003-07-21 2004-07-21 リソグラフ投影装置、パージガス供給システムおよびガスパージ

Publications (2)

Publication Number Publication Date
JP2012074712A JP2012074712A (ja) 2012-04-12
JP2012074712A5 true JP2012074712A5 (enExample) 2013-02-07

Family

ID=34079792

Family Applications (4)

Application Number Title Priority Date Filing Date
JP2006521023A Expired - Lifetime JP4487108B2 (ja) 2003-07-21 2004-07-20 リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム
JP2006521216A Withdrawn JP2006528431A (ja) 2003-07-21 2004-07-21 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2007299182A Withdrawn JP2008160080A (ja) 2003-07-21 2007-11-19 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2011235682A Withdrawn JP2012074712A (ja) 2003-07-21 2011-10-27 リソグラフ投影装置、パージガス供給システムおよびガスパージ

Family Applications Before (3)

Application Number Title Priority Date Filing Date
JP2006521023A Expired - Lifetime JP4487108B2 (ja) 2003-07-21 2004-07-20 リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム
JP2006521216A Withdrawn JP2006528431A (ja) 2003-07-21 2004-07-21 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2007299182A Withdrawn JP2008160080A (ja) 2003-07-21 2007-11-19 リソグラフ投影装置、パージガス供給システムおよびガスパージ

Country Status (9)

Country Link
US (4) US7384149B2 (enExample)
EP (3) EP1649325B1 (enExample)
JP (4) JP4487108B2 (enExample)
KR (3) KR100846184B1 (enExample)
CN (3) CN1853142B (enExample)
DE (1) DE602004027497D1 (enExample)
SG (1) SG141460A1 (enExample)
TW (3) TWI251130B (enExample)
WO (2) WO2005008339A2 (enExample)

Families Citing this family (124)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101713932B (zh) 2002-11-12 2012-09-26 Asml荷兰有限公司 光刻装置和器件制造方法
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7372541B2 (en) 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI232357B (en) 2002-11-12 2005-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR20120127755A (ko) 2002-12-10 2012-11-23 가부시키가이샤 니콘 노광장치 및 디바이스 제조방법
CN101872135B (zh) 2002-12-10 2013-07-31 株式会社尼康 曝光设备和器件制造法
SG171468A1 (en) 2002-12-10 2011-06-29 Nikon Corp Exposure apparatus and method for producing device
US7242455B2 (en) 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
AU2003289271A1 (en) 2002-12-10 2004-06-30 Nikon Corporation Exposure apparatus, exposure method and method for manufacturing device
JP4352874B2 (ja) 2002-12-10 2009-10-28 株式会社ニコン 露光装置及びデバイス製造方法
US7948604B2 (en) 2002-12-10 2011-05-24 Nikon Corporation Exposure apparatus and method for producing device
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
SG183572A1 (en) 2003-02-26 2012-09-27 Nikon Corp Exposure apparatus, exposure method, and method for producing device
KR101345474B1 (ko) 2003-03-25 2013-12-27 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1612850B1 (en) 2003-04-07 2009-03-25 Nikon Corporation Exposure apparatus and method for manufacturing a device
WO2004093159A2 (en) 2003-04-09 2004-10-28 Nikon Corporation Immersion lithography fluid control system
EP1611482B1 (en) 2003-04-10 2015-06-03 Nikon Corporation Run-off path to collect liquid for an immersion lithography apparatus
CN103383527B (zh) 2003-04-10 2015-10-28 株式会社尼康 包括用于沉浸光刻装置的真空清除的环境系统
WO2004092833A2 (en) 2003-04-10 2004-10-28 Nikon Corporation Environmental system including a transport region for an immersion lithography apparatus
JP4582089B2 (ja) 2003-04-11 2010-11-17 株式会社ニコン 液浸リソグラフィ用の液体噴射回収システム
KR20190007532A (ko) 2003-04-11 2019-01-22 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
EP2613195B1 (en) 2003-04-11 2015-12-16 Nikon Corporation Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
JP2006523958A (ja) 2003-04-17 2006-10-19 株式会社ニコン 液浸リソグラフィで使用するためのオートフォーカス素子の光学的構造
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR20060009356A (ko) 2003-05-15 2006-01-31 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
TWI616932B (zh) 2003-05-23 2018-03-01 Nikon Corp Exposure device and component manufacturing method
TWI470671B (zh) 2003-05-23 2015-01-21 尼康股份有限公司 Exposure method and exposure apparatus, and device manufacturing method
CN101614966B (zh) 2003-05-28 2015-06-17 株式会社尼康 曝光方法、曝光装置以及器件制造方法
US7189291B2 (en) * 2003-06-02 2007-03-13 Entegris, Inc. Method for the removal of airborne molecular contaminants using oxygen gas mixtures
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317504B2 (en) 2004-04-08 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2261742A3 (en) 2003-06-11 2011-05-25 ASML Netherlands BV Lithographic apparatus and device manufacturing method.
KR101520591B1 (ko) 2003-06-13 2015-05-14 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
CN101436003B (zh) 2003-06-19 2011-08-17 株式会社尼康 曝光装置及器件制造方法
WO2005006026A2 (en) 2003-07-01 2005-01-20 Nikon Corporation Using isotopically specified fluids as optical elements
EP2466383B1 (en) 2003-07-08 2014-11-19 Nikon Corporation Wafer table for immersion lithography
ATE513309T1 (de) 2003-07-09 2011-07-15 Nikon Corp Belichtungsvorrichtung und verfahren zur bauelementeherstellung
KR101296501B1 (ko) 2003-07-09 2013-08-13 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
DE602004030247D1 (de) 2003-07-09 2011-01-05 Nippon Kogaku Kk Belichtungsvorrichtung und verfahren zur bauelementherstellung
US7384149B2 (en) * 2003-07-21 2008-06-10 Asml Netherlands B.V. Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
US20060285091A1 (en) 2003-07-21 2006-12-21 Parekh Bipin S Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
EP3346485A1 (en) 2003-07-25 2018-07-11 Nikon Corporation Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method
US7175968B2 (en) 2003-07-28 2007-02-13 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a substrate
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
CN102323724B (zh) 2003-07-28 2014-08-13 株式会社尼康 液浸曝光装置及其制造方法、曝光装置、器件制造方法
US7326522B2 (en) 2004-02-11 2008-02-05 Asml Netherlands B.V. Device manufacturing method and a substrate
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005022616A1 (ja) 2003-08-29 2005-03-10 Nikon Corporation 露光装置及びデバイス製造方法
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101748923B1 (ko) 2003-09-03 2017-06-19 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
JP4444920B2 (ja) 2003-09-19 2010-03-31 株式会社ニコン 露光装置及びデバイス製造方法
SG131929A1 (en) 2003-09-29 2007-05-28 Nikon Corp Exposure apparatus, exposure method, and device manufacturing method
JP2005136364A (ja) 2003-10-08 2005-05-26 Zao Nikon Co Ltd 基板搬送装置、露光装置、並びにデバイス製造方法
KR101111364B1 (ko) 2003-10-08 2012-02-27 가부시키가이샤 자오 니콘 기판 반송 장치 및 기판 반송 방법, 노광 장치 및 노광방법, 디바이스 제조 방법
EP1672682A4 (en) 2003-10-08 2008-10-15 Zao Nikon Co Ltd SUBSTRATE TRANSPORT DEVICE AND METHOD, EXPOSURE DEVICE AND METHOD AND COMPONENT MANUFACTURING METHOD
TWI598934B (zh) 2003-10-09 2017-09-11 Nippon Kogaku Kk Exposure apparatus, exposure method, and device manufacturing method
US7352433B2 (en) 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411653B2 (en) 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
US7528929B2 (en) 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG2014014955A (en) 2003-12-03 2014-07-30 Nippon Kogaku Kk Exposure apparatus, exposure method, method for producing device, and optical part
WO2005057636A1 (ja) 2003-12-15 2005-06-23 Nikon Corporation ステージ装置、露光装置、及び露光方法
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4843503B2 (ja) 2004-01-20 2011-12-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置および投影レンズのための測定装置
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR101377815B1 (ko) 2004-02-03 2014-03-26 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US8111373B2 (en) 2004-03-25 2012-02-07 Nikon Corporation Exposure apparatus and device fabrication method
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8054448B2 (en) 2004-05-04 2011-11-08 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100594430C (zh) 2004-06-04 2010-03-17 卡尔蔡司Smt股份公司 用于测量光学成像系统的图像质量的系统
CN103439863B (zh) 2004-06-09 2016-01-06 株式会社尼康 曝光装置、曝光方法、元件制造方法及维护方法
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4894515B2 (ja) 2004-07-12 2012-03-14 株式会社ニコン 露光装置、デバイス製造方法、及び液体検出方法
WO2006019124A1 (ja) 2004-08-18 2006-02-23 Nikon Corporation 露光装置及びデバイス製造方法
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG124359A1 (en) 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG124351A1 (en) 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101427056B1 (ko) 2005-01-31 2014-08-05 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US8692973B2 (en) 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
US20060199274A1 (en) * 2005-03-01 2006-09-07 Canon Kabushiki Kaisha Atmosphere conditioning method, exposure apparatus, and device manufacturing method
JP4072543B2 (ja) * 2005-03-18 2008-04-09 キヤノン株式会社 液浸露光装置及びデバイス製造方法
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
WO2007019105A1 (en) * 2005-08-03 2007-02-15 Entegris, Inc. A transfer container
US7986395B2 (en) * 2005-10-24 2011-07-26 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography apparatus and methods
US7420194B2 (en) * 2005-12-27 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US7528387B2 (en) * 2005-12-29 2009-05-05 Interuniversitair Microelektronica Centrum (Imec) Methods and systems for characterising and optimising immersion lithographic processing
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7253875B1 (en) * 2006-03-03 2007-08-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5567327B2 (ja) 2006-04-03 2014-08-06 インテグリス・インコーポレーテッド 常圧マイクロ波プラズマ処理多孔性膜
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
KR101474572B1 (ko) 2006-06-19 2014-12-18 엔테그리스, 아이엔씨. 레티클 스토리지 정화시스템
US8564759B2 (en) * 2006-06-29 2013-10-22 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for immersion lithography
US7933000B2 (en) * 2006-11-16 2011-04-26 Asml Netherlands B.V. Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device
US7866637B2 (en) 2007-01-26 2011-01-11 Asml Netherlands B.V. Humidifying apparatus, lithographic apparatus and humidifying method
US8817226B2 (en) 2007-02-15 2014-08-26 Asml Holding N.V. Systems and methods for insitu lens cleaning using ozone in immersion lithography
US8654305B2 (en) 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
NL1036181A1 (nl) * 2007-11-30 2009-06-04 Asml Netherlands Bv A lithographic apparatus, a projection system and a device manufacturing method.
EP2128703A1 (en) 2008-05-28 2009-12-02 ASML Netherlands BV Lithographic Apparatus and a Method of Operating the Apparatus
WO2011021300A1 (ja) * 2009-08-21 2011-02-24 東レ株式会社 水蒸気透過膜、中空糸膜および中空糸膜モジュール
TWI450324B (zh) * 2010-01-25 2014-08-21 Gudeng Prec Ind Co Ltd 微影設備之光罩清潔方法及微影設備之光罩清潔系統
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
EP2659914B1 (en) * 2010-12-28 2020-06-24 Toray Industries, Inc. Hollow fiber membrane module
GB2502476A (en) * 2011-02-15 2013-11-27 Schlumberger Holdings Method and apparatus for protecting downhole components with inert atmosphere
KR20140068970A (ko) * 2011-08-31 2014-06-09 에이에스엠엘 네델란즈 비.브이. 포커스 보정을 결정하는 방법, 리소그래피 처리 셀 및 디바이스 제조 방법
KR102227564B1 (ko) * 2014-01-20 2021-03-15 삼성디스플레이 주식회사 포토레지스트 조성물
US10005018B2 (en) * 2016-09-02 2018-06-26 Battelle Memorial Institute Xenon collection method and system
JP6767257B2 (ja) * 2016-12-22 2020-10-14 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP7193459B2 (ja) * 2017-01-06 2022-12-20 エーエスエムエル ネザーランズ ビー.ブイ. 極端紫外線源(euv源)
DE102017207030A1 (de) * 2017-04-26 2018-10-31 Carl Zeiss Smt Gmbh Verfahren zur Reinigung von optischen Elementen für den ultravioletten Wellenlängenbereich
WO2019228710A1 (en) * 2018-05-28 2019-12-05 Asml Netherlands B.V. Lithographic apparatus
US12025919B2 (en) * 2018-11-30 2024-07-02 Taiwan Semiconductor Manufacturing Co., Ltd. Method of storing photoresist coated substrates and semiconductor substrate container arrangement
US11626285B2 (en) * 2019-09-10 2023-04-11 Taiwan Semiconductor Manufacturing Co., Ltd. Method of manufacturing a semiconductor device
KR102868514B1 (ko) * 2019-11-04 2025-10-02 허니웰 인터내셔널 인코포레이티드 가스 감지에서 잘못된 알람 이벤트를 검출하기 위한 방법 및 시스템
EP3832391A1 (en) * 2019-12-03 2021-06-09 ASML Netherlands B.V. Clamp assembly
KR102695305B1 (ko) * 2019-12-20 2024-08-13 사이머 엘엘씨 레이저 소스용 가스 퍼지 시스템
DE102020204545A1 (de) * 2020-04-08 2021-10-14 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum trocknen eines bauteilinnenraums
DE102023200132A1 (de) 2022-05-04 2023-11-09 Carl Zeiss Smt Gmbh Einrichtung zur Entfernung von gasförmigen Kontaminationen und Vorrichtung, insbesondere Lithographiesystem, mit einer solchen Einrichtung
WO2024170178A1 (en) 2023-02-13 2024-08-22 Asml Netherlands B.V. Gas supply module, fluid handling system, lithographic apparatus and device manufacturing method
CN116169322A (zh) * 2023-02-28 2023-05-26 格罗夫氢能源科技集团有限公司 一种燃料电池进气温湿度调节装置及系统

Family Cites Families (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19910441C1 (de) * 1999-03-10 2000-06-21 Fraunhofer Ges Forschung Luftbefeuchtung
DE2964203D1 (en) * 1978-07-12 1983-01-13 Jackson Richard R Nested hollow fiber humidifier
DD160756A3 (de) 1981-04-24 1984-02-29 Gudrun Dietz Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten
JPS62130321U (enExample) * 1986-02-07 1987-08-18
US4902456A (en) 1988-05-04 1990-02-20 Millipore Corporation Fluorocarbon membranes and process for making fluorocarbon membranes
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
US5116396A (en) * 1989-05-12 1992-05-26 Union Carbide Industrial Gases Technology Corporation Hybrid prepurifier for cryogenic air separation plants
ATE123885T1 (de) 1990-05-02 1995-06-15 Fraunhofer Ges Forschung Belichtungsvorrichtung.
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JPH0636993A (ja) 1992-05-21 1994-02-10 Canon Inc 露光装置及び半導体素子の製造方法
US5240472A (en) 1992-05-29 1993-08-31 Air Products And Chemicls, Inc. Moisture removal from a wet gas
US5348691A (en) * 1993-06-11 1994-09-20 United Technologies Corporation Atmosphere membrane humidifier and method and system for producing humidified air
IT1264661B1 (it) 1993-07-05 1996-10-04 Ausimont Spa Copolimeri termoprocessabilin del tetrafluoroetilene
US5996976A (en) * 1993-07-13 1999-12-07 Lynntech, Inc. Gas humidification system using water permeable membranes
JP3500619B2 (ja) 1993-10-28 2004-02-23 株式会社ニコン 投影露光装置
US5528905A (en) 1994-03-25 1996-06-25 Essex Invention S.A. Contactor, particularly a vapour exchanger for the control of the air hygrometric content, and a device for air handling
US6309550B1 (en) 1994-06-22 2001-10-30 Fls Miljo A/S Mass transfer method and apparatus
JPH08266631A (ja) * 1995-03-31 1996-10-15 Asahi Glass Co Ltd 呼吸用気体の加湿装置
US6545746B1 (en) * 1996-03-04 2003-04-08 Nikon Corporation Projection exposure apparatus
JP4075966B2 (ja) 1996-03-06 2008-04-16 エーエスエムエル ネザーランズ ビー.ブイ. 差分干渉計システム及びこのシステムを具えたリソグラフステップアンドスキャン装置
KR100542414B1 (ko) 1996-03-27 2006-05-10 가부시키가이샤 니콘 노광장치및공조장치
JPH09275054A (ja) * 1996-04-03 1997-10-21 Nikon Corp 半導体製造装置
WO1998028665A1 (en) 1996-12-24 1998-07-02 Koninklijke Philips Electronics N.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
DE69711929T2 (de) 1997-01-29 2002-09-05 Micronic Laser Systems Ab, Taeby Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
USRE40043E1 (en) 1997-03-10 2008-02-05 Asml Netherlands B.V. Positioning device having two object holders
WO1998048452A1 (en) * 1997-04-18 1998-10-29 Nikon Corporation Method and device for exposure control, method and device for exposure, and method of manufacture of device
US5910292A (en) 1997-08-19 1999-06-08 Aeronex, Inc. Method for water removal from corrosive gas streams
US6059859A (en) 1997-09-19 2000-05-09 Aeronex, Inc. Method, composition and apparatus for water removal from non-corrosive gas streams
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
US6089282A (en) 1998-05-08 2000-07-18 Aeronex, Inc. Method for recovery and reuse of gas
KR20010087356A (ko) * 1998-09-09 2001-09-15 와이너 길버트 피. 유체 처리 요소, 유체 처리 요소 세척 방법 및 유체 처리방법
US6254936B1 (en) 1998-09-14 2001-07-03 Silicon Valley Group, Inc. Environment exchange control for material on a wafer surface
US6235641B1 (en) 1998-10-30 2001-05-22 Fsi International Inc. Method and system to control the concentration of dissolved gas in a liquid
US6582496B1 (en) 2000-01-28 2003-06-24 Mykrolis Corporation Hollow fiber membrane contactor
KR100816232B1 (ko) * 1999-01-29 2008-03-21 엔테그리스, 아이엔씨. 중공섬유막 접촉기
US6802972B1 (en) * 1999-01-29 2004-10-12 Mykrolis Corporation Microporous hollow fiber membranes from perfluorinated thermoplastic polymers
EP1148932B1 (en) * 1999-01-29 2005-06-08 Mykrolis Corporation Method for manufacturing hollow fiber membranes
US6149817A (en) 1999-03-08 2000-11-21 Celgard Inc. Shell-less hollow fiber membrane fluid contactor
JP2000262997A (ja) * 1999-03-17 2000-09-26 Sumitomo Heavy Ind Ltd エアロゾル洗浄装置
US6394109B1 (en) * 1999-04-13 2002-05-28 Applied Materials, Inc. Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system
WO2000074120A1 (en) 1999-05-28 2000-12-07 Nikon Corporation Exposure method and apparatus
JP3927344B2 (ja) * 2000-01-19 2007-06-06 本田技研工業株式会社 加湿装置
JP2001308003A (ja) * 2000-02-15 2001-11-02 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP3869999B2 (ja) 2000-03-30 2007-01-17 キヤノン株式会社 露光装置および半導体デバイス製造方法
US6558475B1 (en) * 2000-04-10 2003-05-06 International Business Machines Corporation Process for cleaning a workpiece using supercritical carbon dioxide
EP1357998B1 (en) * 2000-05-05 2014-12-03 Entegris, Inc. Filters employing both acidic polymers and physical-adsorption media
US6432204B1 (en) * 2000-05-17 2002-08-13 Tokyo Electron Limited Temperature and humidity controlled processing system
US6402818B1 (en) 2000-06-02 2002-06-11 Celgard Inc. Degassing a liquid with a membrane contactor
JP2001349585A (ja) * 2000-06-07 2001-12-21 Orion Mach Co Ltd 吸湿性中空繊維を使用する高分子膜加湿器
JP2001358055A (ja) 2000-06-15 2001-12-26 Nikon Corp 露光装置及びデバイス製造方法
US6305097B1 (en) * 2000-06-29 2001-10-23 Texas Instruments Incorporated Apparatus for in-situ reticle cleaning at photolithography tool
JP2002158170A (ja) 2000-09-08 2002-05-31 Nikon Corp 露光装置及びデバイス製造方法
JP4610715B2 (ja) * 2000-11-06 2011-01-12 Nok株式会社 加湿装置
JP2002158154A (ja) 2000-11-16 2002-05-31 Canon Inc 露光装置
DE10059910C2 (de) * 2000-12-01 2003-01-16 Daimler Chrysler Ag Vorrichtung zur kontinuierlichen Befeuchtung und Entfeuchtung der Zuluft von Fertigungsprozessen oder Raumlufttechnik-Anlagen
US20020136939A1 (en) 2001-02-15 2002-09-26 Grieve M. James Fuel cell and battery voltage controlling method and system
JP3765531B2 (ja) 2001-03-30 2006-04-12 本田技研工業株式会社 加湿モジュール
US6391090B1 (en) 2001-04-02 2002-05-21 Aeronex, Inc. Method for purification of lens gases used in photolithography
US6842998B2 (en) * 2001-04-06 2005-01-18 Akrion Llc Membrane dryer
US6616841B2 (en) 2001-06-21 2003-09-09 Celgard Inc. Hollow fiber membrane contactor
US6514313B1 (en) 2001-06-22 2003-02-04 Aeronex, Inc. Gas purification system and method
US6828569B2 (en) * 2001-11-19 2004-12-07 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method and device manufactured thereby
US6724460B2 (en) * 2001-11-19 2004-04-20 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
US20030162305A1 (en) 2002-02-25 2003-08-28 Daniel Alvarez Gas contaminant detection and quantification method
US6638341B1 (en) 2002-06-14 2003-10-28 Aeronex, Inc. Method for rapid activation or preconditioning of porous gas purification substrates
EP1527492A2 (de) * 2002-07-18 2005-05-04 DaimlerChrysler AG Vorrichtung und verfahren zur befeuchtung eines gasstroms
AU2003289271A1 (en) 2002-12-10 2004-06-30 Nikon Corporation Exposure apparatus, exposure method and method for manufacturing device
JP2006518468A (ja) 2003-02-21 2006-08-10 インテグリス・インコーポレーテッド プロセス流体流中の汚染物質の分析方法
US7189291B2 (en) 2003-06-02 2007-03-13 Entegris, Inc. Method for the removal of airborne molecular contaminants using oxygen gas mixtures
US6867844B2 (en) 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US7384149B2 (en) 2003-07-21 2008-06-10 Asml Netherlands B.V. Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
US20060285091A1 (en) 2003-07-21 2006-12-21 Parekh Bipin S Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US11206499B2 (en) 2016-08-18 2021-12-21 Qualcomm Incorporated Hearable device comprising integrated device and wireless functionality

Similar Documents

Publication Publication Date Title
JP2012074712A5 (enExample)
NZ749312A (en) Humidification of respiratory gases
JP2006528431A5 (enExample)
CA3176879C (en) RESPIRATORY ASSISTANCE DEVICE
JP1708148S (ja) ガス供給チューブ
NZ624271A (en) Heating element, humidifier for respiratory apparatus including heating element, and respiratory apparatus
NZ746055A (en) A humidifier reservoir
NZ620739A (en) Humidification of respiratory gases
RU2013144388A (ru) Способ и устройство для генерации кислорода
MY167499A (en) An aerosol generating device with adjustable airflow
TWD174180S (zh) 用於呼吸器輸氣控制台的加濕裝置之入口擋管
JP2010522044A5 (enExample)
UA67105U (ru) Система для сухого обеспыливания и сухой очистки загрязненного пылью и вредными веществами газа, образованного в агрегатах для получения чугуна в процессе получения чугуна или в агрегатах для получения железа в процессе получения железа
JP2009532901A5 (enExample)
GB2489763A (en) A breathing apparatus
BR112012030578A2 (pt) método para controlar automaticamente uma umidade de um fluxo de gás de um sistema de suporte de pressão (50) durante o uso do sistema de suporte de pressão por um usuário e sistema de suporte de pressão
GB201015368D0 (en) Oxygen concentrator and method
UA113666C2 (xx) Керований диханням інгалятор зі струменями повітря, що ударяють у шлейф композиції
BR112015015298A2 (pt) sistema de suporte por pressão, e método de aplicação de um fluxo pressurizado de gás respirável de umidade controlada às vias aéreas de um indivíduo
JP2017500918A5 (enExample)
JP2012111012A5 (enExample)
JP2018183750A5 (enExample)
MY175137A (en) Replenising liquid material to membrane
JP2009179555A5 (enExample)
JP2017506964A5 (enExample)