JP2012074712A5 - - Google Patents

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JP2012074712A5
JP2012074712A5 JP2011235682A JP2011235682A JP2012074712A5 JP 2012074712 A5 JP2012074712 A5 JP 2012074712A5 JP 2011235682 A JP2011235682 A JP 2011235682A JP 2011235682 A JP2011235682 A JP 2011235682A JP 2012074712 A5 JP2012074712 A5 JP 2012074712A5
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purge gas
gas mixture
humidifier
region
moisture
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JP2012074712A (ja
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Priority claimed from US10/623,180 external-priority patent/US7384149B2/en
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JP2011235682A 2003-07-21 2011-10-27 リソグラフ投影装置、パージガス供給システムおよびガスパージ Withdrawn JP2012074712A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/623,180 US7384149B2 (en) 2003-07-21 2003-07-21 Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
US10/623,180 2003-07-21

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JP2006521216A Division JP2006528431A (ja) 2003-07-21 2004-07-21 リソグラフ投影装置、パージガス供給システムおよびガスパージ

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JP2012074712A JP2012074712A (ja) 2012-04-12
JP2012074712A5 true JP2012074712A5 (enExample) 2013-02-07

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JP2006521023A Expired - Lifetime JP4487108B2 (ja) 2003-07-21 2004-07-20 リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム
JP2006521216A Withdrawn JP2006528431A (ja) 2003-07-21 2004-07-21 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2007299182A Withdrawn JP2008160080A (ja) 2003-07-21 2007-11-19 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2011235682A Withdrawn JP2012074712A (ja) 2003-07-21 2011-10-27 リソグラフ投影装置、パージガス供給システムおよびガスパージ

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JP2006521023A Expired - Lifetime JP4487108B2 (ja) 2003-07-21 2004-07-20 リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム
JP2006521216A Withdrawn JP2006528431A (ja) 2003-07-21 2004-07-21 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2007299182A Withdrawn JP2008160080A (ja) 2003-07-21 2007-11-19 リソグラフ投影装置、パージガス供給システムおよびガスパージ

Country Status (9)

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US (4) US7384149B2 (enExample)
EP (3) EP1649325B1 (enExample)
JP (4) JP4487108B2 (enExample)
KR (3) KR100846184B1 (enExample)
CN (3) CN1853142B (enExample)
DE (1) DE602004027497D1 (enExample)
SG (1) SG141460A1 (enExample)
TW (3) TWI251130B (enExample)
WO (2) WO2005008339A2 (enExample)

Families Citing this family (124)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG2010050110A (en) 2002-11-12 2014-06-27 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7372541B2 (en) 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI251127B (en) 2002-11-12 2006-03-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7242455B2 (en) 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
SG171468A1 (en) 2002-12-10 2011-06-29 Nikon Corp Exposure apparatus and method for producing device
EP1571698A4 (en) 2002-12-10 2006-06-21 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD FOR PRODUCING COMPONENTS
CN1723541B (zh) 2002-12-10 2010-06-02 株式会社尼康 曝光装置和器件制造方法
US7948604B2 (en) 2002-12-10 2011-05-24 Nikon Corporation Exposure apparatus and method for producing device
CN101872135B (zh) 2002-12-10 2013-07-31 株式会社尼康 曝光设备和器件制造法
JP4352874B2 (ja) 2002-12-10 2009-10-28 株式会社ニコン 露光装置及びデバイス製造方法
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
KR101506408B1 (ko) 2003-02-26 2015-03-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
EP1610361B1 (en) 2003-03-25 2014-05-21 Nikon Corporation Exposure system and device production method
KR101176817B1 (ko) 2003-04-07 2012-08-24 가부시키가이샤 니콘 노광장치 및 디바이스 제조방법
WO2004093159A2 (en) 2003-04-09 2004-10-28 Nikon Corporation Immersion lithography fluid control system
KR20180089562A (ko) 2003-04-10 2018-08-08 가부시키가이샤 니콘 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템
WO2004093160A2 (en) 2003-04-10 2004-10-28 Nikon Corporation Run-off path to collect liquid for an immersion lithography apparatus
EP3062152B1 (en) 2003-04-10 2017-12-20 Nikon Corporation Environmental system including vaccum scavenge for an immersion lithography apparatus
JP4315198B2 (ja) 2003-04-11 2009-08-19 株式会社ニコン 液浸液体を光学アセンブリ下に維持するリソグラフィ装置及び液浸液体維持方法並びにそれらを用いるデバイス製造方法
KR101324818B1 (ko) 2003-04-11 2013-11-01 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
JP4582089B2 (ja) 2003-04-11 2010-11-17 株式会社ニコン 液浸リソグラフィ用の液体噴射回収システム
CN1774667A (zh) 2003-04-17 2006-05-17 株式会社尼康 用在浸没式平版印刷方法中自动聚焦部件的光学配置
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
WO2004102646A1 (ja) 2003-05-15 2004-11-25 Nikon Corporation 露光装置及びデバイス製造方法
TWI511181B (zh) 2003-05-23 2015-12-01 尼康股份有限公司 Exposure method and exposure apparatus, and device manufacturing method
TWI518742B (zh) 2003-05-23 2016-01-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
KR20180122033A (ko) 2003-05-28 2018-11-09 가부시키가이샤 니콘 노광 방법, 노광 장치, 및 디바이스 제조 방법
US7189291B2 (en) * 2003-06-02 2007-03-13 Entegris, Inc. Method for the removal of airborne molecular contaminants using oxygen gas mixtures
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2261742A3 (en) 2003-06-11 2011-05-25 ASML Netherlands BV Lithographic apparatus and device manufacturing method.
US7317504B2 (en) 2004-04-08 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI409853B (zh) 2003-06-13 2013-09-21 尼康股份有限公司 An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method
DE602004024782D1 (de) 2003-06-19 2010-02-04 Nippon Kogaku Kk Belichtungseinrichtung und bauelementeherstellungsverfahren
WO2005006026A2 (en) 2003-07-01 2005-01-20 Nikon Corporation Using isotopically specified fluids as optical elements
EP3179309A1 (en) 2003-07-08 2017-06-14 Nikon Corporation Wafer table for immersion lithography
DE602004030247D1 (de) 2003-07-09 2011-01-05 Nippon Kogaku Kk Belichtungsvorrichtung und verfahren zur bauelementherstellung
WO2005006415A1 (ja) 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
WO2005006418A1 (ja) 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
US20060285091A1 (en) 2003-07-21 2006-12-21 Parekh Bipin S Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
US7384149B2 (en) * 2003-07-21 2008-06-10 Asml Netherlands B.V. Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
EP1650787A4 (en) 2003-07-25 2007-09-19 Nikon Corp INVESTIGATION METHOD AND INVESTIGATION DEVICE FOR AN OPTICAL PROJECTION SYSTEM AND METHOD OF MANUFACTURING AN OPTICAL PROJECTION SYSTEM
US7175968B2 (en) 2003-07-28 2007-02-13 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a substrate
US7326522B2 (en) 2004-02-11 2008-02-05 Asml Netherlands B.V. Device manufacturing method and a substrate
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
KR101641011B1 (ko) 2003-07-28 2016-07-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101419192B1 (ko) 2003-08-29 2014-07-15 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101288140B1 (ko) 2003-09-03 2013-07-19 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
WO2005029559A1 (ja) 2003-09-19 2005-03-31 Nikon Corporation 露光装置及びデバイス製造方法
KR101743378B1 (ko) 2003-09-29 2017-06-15 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
JP2005136364A (ja) 2003-10-08 2005-05-26 Zao Nikon Co Ltd 基板搬送装置、露光装置、並びにデバイス製造方法
WO2005036623A1 (ja) 2003-10-08 2005-04-21 Zao Nikon Co., Ltd. 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法
KR101111364B1 (ko) 2003-10-08 2012-02-27 가부시키가이샤 자오 니콘 기판 반송 장치 및 기판 반송 방법, 노광 장치 및 노광방법, 디바이스 제조 방법
TWI553701B (zh) 2003-10-09 2016-10-11 尼康股份有限公司 Exposure apparatus and exposure method, component manufacturing method
US7352433B2 (en) 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411653B2 (en) 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
JP4295712B2 (ja) 2003-11-14 2009-07-15 エーエスエムエル ネザーランズ ビー.ブイ. リソグラフィ装置及び装置製造方法
TWI605315B (zh) 2003-12-03 2017-11-11 尼康股份有限公司 Exposure device, exposure method, and device manufacturing method
KR101941351B1 (ko) 2003-12-15 2019-01-22 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 및 노광 방법
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005071491A2 (en) 2004-01-20 2005-08-04 Carl Zeiss Smt Ag Exposure apparatus and measuring device for a projection lens
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR101276392B1 (ko) 2004-02-03 2013-06-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101504445B1 (ko) 2004-03-25 2015-03-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8054448B2 (en) 2004-05-04 2011-11-08 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7796274B2 (en) 2004-06-04 2010-09-14 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
KR101162128B1 (ko) 2004-06-09 2012-07-03 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8384874B2 (en) 2004-07-12 2013-02-26 Nikon Corporation Immersion exposure apparatus and device manufacturing method to detect if liquid on base member
US8305553B2 (en) 2004-08-18 2012-11-06 Nikon Corporation Exposure apparatus and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE602006012746D1 (de) 2005-01-14 2010-04-22 Asml Netherlands Bv Lithografische Vorrichtung und Herstellungsverfahren
SG124351A1 (en) 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP3079164A1 (en) 2005-01-31 2016-10-12 Nikon Corporation Exposure apparatus and method for producing device
US8692973B2 (en) 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
US20060199274A1 (en) * 2005-03-01 2006-09-07 Canon Kabushiki Kaisha Atmosphere conditioning method, exposure apparatus, and device manufacturing method
JP4072543B2 (ja) * 2005-03-18 2008-04-09 キヤノン株式会社 液浸露光装置及びデバイス製造方法
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
JP2009503899A (ja) * 2005-08-03 2009-01-29 インテグリス・インコーポレーテッド 移送容器
US7986395B2 (en) * 2005-10-24 2011-07-26 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography apparatus and methods
US7420194B2 (en) * 2005-12-27 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US7528387B2 (en) * 2005-12-29 2009-05-05 Interuniversitair Microelektronica Centrum (Imec) Methods and systems for characterising and optimising immersion lithographic processing
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7253875B1 (en) * 2006-03-03 2007-08-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7963401B2 (en) 2006-04-03 2011-06-21 Entegris, Inc. Atmospheric pressure microwave plasma treated porous membranes
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
US8776841B2 (en) 2006-06-19 2014-07-15 Entegris, Inc. System for purging reticle storage
US8564759B2 (en) * 2006-06-29 2013-10-22 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for immersion lithography
US7933000B2 (en) * 2006-11-16 2011-04-26 Asml Netherlands B.V. Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device
US7866637B2 (en) * 2007-01-26 2011-01-11 Asml Netherlands B.V. Humidifying apparatus, lithographic apparatus and humidifying method
US8817226B2 (en) 2007-02-15 2014-08-26 Asml Holding N.V. Systems and methods for insitu lens cleaning using ozone in immersion lithography
US8654305B2 (en) 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
NL1036181A1 (nl) * 2007-11-30 2009-06-04 Asml Netherlands Bv A lithographic apparatus, a projection system and a device manufacturing method.
US9176393B2 (en) 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
CN102481524B (zh) * 2009-08-21 2014-06-18 东丽株式会社 水蒸气透过性膜、中空纱膜和中空纱膜组件
TWI450324B (zh) * 2010-01-25 2014-08-21 家登精密工業股份有限公司 微影設備之光罩清潔方法及微影設備之光罩清潔系統
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
RU2596790C2 (ru) * 2010-12-28 2016-09-10 Торэй Индастриз, Инк. Медицинский материал и половолоконный мембранный модуль
US20140102796A1 (en) * 2011-02-15 2014-04-17 Schlumberger Technology Corporation Method And Apparatus For Protecting Downhole Components With Inert Atmosphere
WO2013029957A2 (en) * 2011-08-31 2013-03-07 Asml Netherlands B.V. A method of determining focus corrections, lithographic processing cell and device manufacturing method
KR102227564B1 (ko) * 2014-01-20 2021-03-15 삼성디스플레이 주식회사 포토레지스트 조성물
US10005018B2 (en) * 2016-09-02 2018-06-26 Battelle Memorial Institute Xenon collection method and system
JP6767257B2 (ja) * 2016-12-22 2020-10-14 東京エレクトロン株式会社 基板処理装置及び基板処理方法
CN117202469A (zh) * 2017-01-06 2023-12-08 Asml荷兰有限公司 引导装置和相关联的系统
DE102017207030A1 (de) * 2017-04-26 2018-10-31 Carl Zeiss Smt Gmbh Verfahren zur Reinigung von optischen Elementen für den ultravioletten Wellenlängenbereich
CN112204472B (zh) * 2018-05-28 2024-10-11 Asml荷兰有限公司 光刻设备
US12025919B2 (en) * 2018-11-30 2024-07-02 Taiwan Semiconductor Manufacturing Co., Ltd. Method of storing photoresist coated substrates and semiconductor substrate container arrangement
US11626285B2 (en) 2019-09-10 2023-04-11 Taiwan Semiconductor Manufacturing Co., Ltd. Method of manufacturing a semiconductor device
KR102868514B1 (ko) * 2019-11-04 2025-10-02 허니웰 인터내셔널 인코포레이티드 가스 감지에서 잘못된 알람 이벤트를 검출하기 위한 방법 및 시스템
EP3832391A1 (en) * 2019-12-03 2021-06-09 ASML Netherlands B.V. Clamp assembly
CN114830463A (zh) * 2019-12-20 2022-07-29 西默有限公司 用于激光源的气体吹扫系统
DE102020204545A1 (de) 2020-04-08 2021-10-14 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum trocknen eines bauteilinnenraums
DE102023200132A1 (de) 2022-05-04 2023-11-09 Carl Zeiss Smt Gmbh Einrichtung zur Entfernung von gasförmigen Kontaminationen und Vorrichtung, insbesondere Lithographiesystem, mit einer solchen Einrichtung
JP2026505272A (ja) 2023-02-13 2026-02-13 エーエスエムエル ネザーランズ ビー.ブイ. ガス供給モジュール、流体ハンドリングシステム、リソグラフィ装置及びデバイス製造方法
CN116169322B (zh) * 2023-02-28 2026-01-06 格罗夫氢能源科技集团有限公司 一种燃料电池进气温湿度调节装置及系统

Family Cites Families (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19910441C1 (de) * 1999-03-10 2000-06-21 Fraunhofer Ges Forschung Luftbefeuchtung
EP0009543B1 (en) * 1978-07-12 1982-12-08 Richard R. Dr. Jackson Nested hollow fiber humidifier
DD160756A3 (de) 1981-04-24 1984-02-29 Gudrun Dietz Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten
JPS62130321U (enExample) 1986-02-07 1987-08-18
US4902456A (en) 1988-05-04 1990-02-20 Millipore Corporation Fluorocarbon membranes and process for making fluorocarbon membranes
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
US5116396A (en) * 1989-05-12 1992-05-26 Union Carbide Industrial Gases Technology Corporation Hybrid prepurifier for cryogenic air separation plants
DE59105735D1 (de) 1990-05-02 1995-07-20 Fraunhofer Ges Forschung Belichtungsvorrichtung.
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JPH0636993A (ja) * 1992-05-21 1994-02-10 Canon Inc 露光装置及び半導体素子の製造方法
US5240472A (en) 1992-05-29 1993-08-31 Air Products And Chemicls, Inc. Moisture removal from a wet gas
US5348691A (en) * 1993-06-11 1994-09-20 United Technologies Corporation Atmosphere membrane humidifier and method and system for producing humidified air
IT1264661B1 (it) 1993-07-05 1996-10-04 Ausimont Spa Copolimeri termoprocessabilin del tetrafluoroetilene
US5996976A (en) * 1993-07-13 1999-12-07 Lynntech, Inc. Gas humidification system using water permeable membranes
JP3500619B2 (ja) * 1993-10-28 2004-02-23 株式会社ニコン 投影露光装置
US5528905A (en) 1994-03-25 1996-06-25 Essex Invention S.A. Contactor, particularly a vapour exchanger for the control of the air hygrometric content, and a device for air handling
ATE226473T1 (de) 1994-06-22 2002-11-15 Fls Miljo As Vorrichtung zur massenübertragung
JPH08266631A (ja) * 1995-03-31 1996-10-15 Asahi Glass Co Ltd 呼吸用気体の加湿装置
US6545746B1 (en) 1996-03-04 2003-04-08 Nikon Corporation Projection exposure apparatus
EP0824722B1 (en) 1996-03-06 2001-07-25 Asm Lithography B.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
KR100542414B1 (ko) * 1996-03-27 2006-05-10 가부시키가이샤 니콘 노광장치및공조장치
JPH09275054A (ja) * 1996-04-03 1997-10-21 Nikon Corp 半導体製造装置
DE69717975T2 (de) 1996-12-24 2003-05-28 Asml Netherlands B.V., Veldhoven In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
ATE216091T1 (de) 1997-01-29 2002-04-15 Micronic Laser Systems Ab Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
EP0900412B1 (en) 1997-03-10 2005-04-06 ASML Netherlands B.V. Lithographic apparatus comprising a positioning device having two object holders
IL132431A0 (en) * 1997-04-18 2001-03-19 Nikon Corp Method and device for exposure control method and device for exposure and method of manufacture of device
US5910292A (en) * 1997-08-19 1999-06-08 Aeronex, Inc. Method for water removal from corrosive gas streams
US6059859A (en) * 1997-09-19 2000-05-09 Aeronex, Inc. Method, composition and apparatus for water removal from non-corrosive gas streams
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
US6089282A (en) * 1998-05-08 2000-07-18 Aeronex, Inc. Method for recovery and reuse of gas
JP4673973B2 (ja) * 1998-09-09 2011-04-20 ポール・コーポレーション 流体処理要素、流体処理要素を掃除する方法、および流体を処理する方法
US6254936B1 (en) * 1998-09-14 2001-07-03 Silicon Valley Group, Inc. Environment exchange control for material on a wafer surface
US6235641B1 (en) 1998-10-30 2001-05-22 Fsi International Inc. Method and system to control the concentration of dissolved gas in a liquid
KR100816232B1 (ko) * 1999-01-29 2008-03-21 엔테그리스, 아이엔씨. 중공섬유막 접촉기
US6802972B1 (en) * 1999-01-29 2004-10-12 Mykrolis Corporation Microporous hollow fiber membranes from perfluorinated thermoplastic polymers
WO2000044480A1 (en) * 1999-01-29 2000-08-03 Mykrolis Corporation Method for manufacturing hollow fiber membranes
US6582496B1 (en) * 2000-01-28 2003-06-24 Mykrolis Corporation Hollow fiber membrane contactor
US6149817A (en) 1999-03-08 2000-11-21 Celgard Inc. Shell-less hollow fiber membrane fluid contactor
JP2000262997A (ja) * 1999-03-17 2000-09-26 Sumitomo Heavy Ind Ltd エアロゾル洗浄装置
US6394109B1 (en) * 1999-04-13 2002-05-28 Applied Materials, Inc. Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system
AU4949900A (en) * 1999-05-28 2000-12-18 Nikon Corporation Exposure method and apparatus
JP3927344B2 (ja) * 2000-01-19 2007-06-06 本田技研工業株式会社 加湿装置
JP2001308003A (ja) * 2000-02-15 2001-11-02 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP3869999B2 (ja) * 2000-03-30 2007-01-17 キヤノン株式会社 露光装置および半導体デバイス製造方法
US6558475B1 (en) * 2000-04-10 2003-05-06 International Business Machines Corporation Process for cleaning a workpiece using supercritical carbon dioxide
AU2001259568A1 (en) * 2000-05-05 2001-11-20 Extraction Systems, Inc. Filters employing both acidic polymers and physical-absorption media
US6432204B1 (en) * 2000-05-17 2002-08-13 Tokyo Electron Limited Temperature and humidity controlled processing system
US6402818B1 (en) 2000-06-02 2002-06-11 Celgard Inc. Degassing a liquid with a membrane contactor
JP2001349585A (ja) 2000-06-07 2001-12-21 Orion Mach Co Ltd 吸湿性中空繊維を使用する高分子膜加湿器
JP2001358055A (ja) 2000-06-15 2001-12-26 Nikon Corp 露光装置及びデバイス製造方法
US6305097B1 (en) * 2000-06-29 2001-10-23 Texas Instruments Incorporated Apparatus for in-situ reticle cleaning at photolithography tool
JP2002158170A (ja) * 2000-09-08 2002-05-31 Nikon Corp 露光装置及びデバイス製造方法
JP4610715B2 (ja) 2000-11-06 2011-01-12 Nok株式会社 加湿装置
JP2002158154A (ja) * 2000-11-16 2002-05-31 Canon Inc 露光装置
DE10059910C2 (de) * 2000-12-01 2003-01-16 Daimler Chrysler Ag Vorrichtung zur kontinuierlichen Befeuchtung und Entfeuchtung der Zuluft von Fertigungsprozessen oder Raumlufttechnik-Anlagen
US20020136939A1 (en) 2001-02-15 2002-09-26 Grieve M. James Fuel cell and battery voltage controlling method and system
JP3765531B2 (ja) 2001-03-30 2006-04-12 本田技研工業株式会社 加湿モジュール
US6391090B1 (en) 2001-04-02 2002-05-21 Aeronex, Inc. Method for purification of lens gases used in photolithography
US6842998B2 (en) * 2001-04-06 2005-01-18 Akrion Llc Membrane dryer
US6616841B2 (en) 2001-06-21 2003-09-09 Celgard Inc. Hollow fiber membrane contactor
US6514313B1 (en) * 2001-06-22 2003-02-04 Aeronex, Inc. Gas purification system and method
US6828569B2 (en) * 2001-11-19 2004-12-07 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method and device manufactured thereby
US6724460B2 (en) * 2001-11-19 2004-04-20 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
US20030162305A1 (en) * 2002-02-25 2003-08-28 Daniel Alvarez Gas contaminant detection and quantification method
US6638341B1 (en) * 2002-06-14 2003-10-28 Aeronex, Inc. Method for rapid activation or preconditioning of porous gas purification substrates
WO2004017450A2 (de) * 2002-07-18 2004-02-26 Daimlerchrysler Ag Vorrichtung und verfahren zur befeuchtung eines gasstroms
EP1571698A4 (en) 2002-12-10 2006-06-21 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD FOR PRODUCING COMPONENTS
DE602004004369T2 (de) * 2003-02-21 2007-11-29 Entegris, Inc., Chaska Verfahren zur analyse von verunreinigungen in einem prozessfluidstrom
US7189291B2 (en) * 2003-06-02 2007-03-13 Entegris, Inc. Method for the removal of airborne molecular contaminants using oxygen gas mixtures
US6867844B2 (en) 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US20060285091A1 (en) 2003-07-21 2006-12-21 Parekh Bipin S Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
US7384149B2 (en) * 2003-07-21 2008-06-10 Asml Netherlands B.V. Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
US7779781B2 (en) * 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US11206499B2 (en) 2016-08-18 2021-12-21 Qualcomm Incorporated Hearable device comprising integrated device and wireless functionality

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