JP2012074712A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2012074712A5 JP2012074712A5 JP2011235682A JP2011235682A JP2012074712A5 JP 2012074712 A5 JP2012074712 A5 JP 2012074712A5 JP 2011235682 A JP2011235682 A JP 2011235682A JP 2011235682 A JP2011235682 A JP 2011235682A JP 2012074712 A5 JP2012074712 A5 JP 2012074712A5
- Authority
- JP
- Japan
- Prior art keywords
- purge gas
- gas mixture
- humidifier
- region
- moisture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/623,180 US7384149B2 (en) | 2003-07-21 | 2003-07-21 | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
| US10/623,180 | 2003-07-21 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006521216A Division JP2006528431A (ja) | 2003-07-21 | 2004-07-21 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012074712A JP2012074712A (ja) | 2012-04-12 |
| JP2012074712A5 true JP2012074712A5 (enExample) | 2013-02-07 |
Family
ID=34079792
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006521023A Expired - Lifetime JP4487108B2 (ja) | 2003-07-21 | 2004-07-20 | リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム |
| JP2006521216A Withdrawn JP2006528431A (ja) | 2003-07-21 | 2004-07-21 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
| JP2007299182A Withdrawn JP2008160080A (ja) | 2003-07-21 | 2007-11-19 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
| JP2011235682A Withdrawn JP2012074712A (ja) | 2003-07-21 | 2011-10-27 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
Family Applications Before (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006521023A Expired - Lifetime JP4487108B2 (ja) | 2003-07-21 | 2004-07-20 | リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム |
| JP2006521216A Withdrawn JP2006528431A (ja) | 2003-07-21 | 2004-07-21 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
| JP2007299182A Withdrawn JP2008160080A (ja) | 2003-07-21 | 2007-11-19 | リソグラフ投影装置、パージガス供給システムおよびガスパージ |
Country Status (9)
| Country | Link |
|---|---|
| US (4) | US7384149B2 (enExample) |
| EP (3) | EP1649325B1 (enExample) |
| JP (4) | JP4487108B2 (enExample) |
| KR (3) | KR100846184B1 (enExample) |
| CN (3) | CN1853142B (enExample) |
| DE (1) | DE602004027497D1 (enExample) |
| SG (1) | SG141460A1 (enExample) |
| TW (3) | TWI251130B (enExample) |
| WO (2) | WO2005008339A2 (enExample) |
Families Citing this family (124)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101713932B (zh) | 2002-11-12 | 2012-09-26 | Asml荷兰有限公司 | 光刻装置和器件制造方法 |
| US10503084B2 (en) | 2002-11-12 | 2019-12-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7372541B2 (en) | 2002-11-12 | 2008-05-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| TWI232357B (en) | 2002-11-12 | 2005-05-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| US9482966B2 (en) | 2002-11-12 | 2016-11-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| KR20120127755A (ko) | 2002-12-10 | 2012-11-23 | 가부시키가이샤 니콘 | 노광장치 및 디바이스 제조방법 |
| CN101872135B (zh) | 2002-12-10 | 2013-07-31 | 株式会社尼康 | 曝光设备和器件制造法 |
| SG171468A1 (en) | 2002-12-10 | 2011-06-29 | Nikon Corp | Exposure apparatus and method for producing device |
| US7242455B2 (en) | 2002-12-10 | 2007-07-10 | Nikon Corporation | Exposure apparatus and method for producing device |
| AU2003289271A1 (en) | 2002-12-10 | 2004-06-30 | Nikon Corporation | Exposure apparatus, exposure method and method for manufacturing device |
| JP4352874B2 (ja) | 2002-12-10 | 2009-10-28 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
| US7948604B2 (en) | 2002-12-10 | 2011-05-24 | Nikon Corporation | Exposure apparatus and method for producing device |
| DE10261775A1 (de) | 2002-12-20 | 2004-07-01 | Carl Zeiss Smt Ag | Vorrichtung zur optischen Vermessung eines Abbildungssystems |
| SG183572A1 (en) | 2003-02-26 | 2012-09-27 | Nikon Corp | Exposure apparatus, exposure method, and method for producing device |
| KR101345474B1 (ko) | 2003-03-25 | 2013-12-27 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| EP1612850B1 (en) | 2003-04-07 | 2009-03-25 | Nikon Corporation | Exposure apparatus and method for manufacturing a device |
| WO2004093159A2 (en) | 2003-04-09 | 2004-10-28 | Nikon Corporation | Immersion lithography fluid control system |
| EP1611482B1 (en) | 2003-04-10 | 2015-06-03 | Nikon Corporation | Run-off path to collect liquid for an immersion lithography apparatus |
| CN103383527B (zh) | 2003-04-10 | 2015-10-28 | 株式会社尼康 | 包括用于沉浸光刻装置的真空清除的环境系统 |
| WO2004092833A2 (en) | 2003-04-10 | 2004-10-28 | Nikon Corporation | Environmental system including a transport region for an immersion lithography apparatus |
| JP4582089B2 (ja) | 2003-04-11 | 2010-11-17 | 株式会社ニコン | 液浸リソグラフィ用の液体噴射回収システム |
| KR20190007532A (ko) | 2003-04-11 | 2019-01-22 | 가부시키가이샤 니콘 | 액침 리소그래피에 의한 광학기기의 세정방법 |
| EP2613195B1 (en) | 2003-04-11 | 2015-12-16 | Nikon Corporation | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| JP2006523958A (ja) | 2003-04-17 | 2006-10-19 | 株式会社ニコン | 液浸リソグラフィで使用するためのオートフォーカス素子の光学的構造 |
| TWI295414B (en) | 2003-05-13 | 2008-04-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| KR20060009356A (ko) | 2003-05-15 | 2006-01-31 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| TWI616932B (zh) | 2003-05-23 | 2018-03-01 | Nikon Corp | Exposure device and component manufacturing method |
| TWI470671B (zh) | 2003-05-23 | 2015-01-21 | 尼康股份有限公司 | Exposure method and exposure apparatus, and device manufacturing method |
| CN101614966B (zh) | 2003-05-28 | 2015-06-17 | 株式会社尼康 | 曝光方法、曝光装置以及器件制造方法 |
| US7189291B2 (en) * | 2003-06-02 | 2007-03-13 | Entegris, Inc. | Method for the removal of airborne molecular contaminants using oxygen gas mixtures |
| US7213963B2 (en) | 2003-06-09 | 2007-05-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7317504B2 (en) | 2004-04-08 | 2008-01-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP2261742A3 (en) | 2003-06-11 | 2011-05-25 | ASML Netherlands BV | Lithographic apparatus and device manufacturing method. |
| KR101520591B1 (ko) | 2003-06-13 | 2015-05-14 | 가부시키가이샤 니콘 | 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법 |
| CN101436003B (zh) | 2003-06-19 | 2011-08-17 | 株式会社尼康 | 曝光装置及器件制造方法 |
| WO2005006026A2 (en) | 2003-07-01 | 2005-01-20 | Nikon Corporation | Using isotopically specified fluids as optical elements |
| EP2466383B1 (en) | 2003-07-08 | 2014-11-19 | Nikon Corporation | Wafer table for immersion lithography |
| ATE513309T1 (de) | 2003-07-09 | 2011-07-15 | Nikon Corp | Belichtungsvorrichtung und verfahren zur bauelementeherstellung |
| KR101296501B1 (ko) | 2003-07-09 | 2013-08-13 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| DE602004030247D1 (de) | 2003-07-09 | 2011-01-05 | Nippon Kogaku Kk | Belichtungsvorrichtung und verfahren zur bauelementherstellung |
| US7384149B2 (en) * | 2003-07-21 | 2008-06-10 | Asml Netherlands B.V. | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
| US20060285091A1 (en) | 2003-07-21 | 2006-12-21 | Parekh Bipin S | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application |
| EP3346485A1 (en) | 2003-07-25 | 2018-07-11 | Nikon Corporation | Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method |
| US7175968B2 (en) | 2003-07-28 | 2007-02-13 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and a substrate |
| EP1503244A1 (en) | 2003-07-28 | 2005-02-02 | ASML Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
| CN102323724B (zh) | 2003-07-28 | 2014-08-13 | 株式会社尼康 | 液浸曝光装置及其制造方法、曝光装置、器件制造方法 |
| US7326522B2 (en) | 2004-02-11 | 2008-02-05 | Asml Netherlands B.V. | Device manufacturing method and a substrate |
| US7779781B2 (en) | 2003-07-31 | 2010-08-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| WO2005022616A1 (ja) | 2003-08-29 | 2005-03-10 | Nikon Corporation | 露光装置及びデバイス製造方法 |
| TWI263859B (en) | 2003-08-29 | 2006-10-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| KR101748923B1 (ko) | 2003-09-03 | 2017-06-19 | 가부시키가이샤 니콘 | 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법 |
| JP4444920B2 (ja) | 2003-09-19 | 2010-03-31 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
| SG131929A1 (en) | 2003-09-29 | 2007-05-28 | Nikon Corp | Exposure apparatus, exposure method, and device manufacturing method |
| JP2005136364A (ja) | 2003-10-08 | 2005-05-26 | Zao Nikon Co Ltd | 基板搬送装置、露光装置、並びにデバイス製造方法 |
| KR101111364B1 (ko) | 2003-10-08 | 2012-02-27 | 가부시키가이샤 자오 니콘 | 기판 반송 장치 및 기판 반송 방법, 노광 장치 및 노광방법, 디바이스 제조 방법 |
| EP1672682A4 (en) | 2003-10-08 | 2008-10-15 | Zao Nikon Co Ltd | SUBSTRATE TRANSPORT DEVICE AND METHOD, EXPOSURE DEVICE AND METHOD AND COMPONENT MANUFACTURING METHOD |
| TWI598934B (zh) | 2003-10-09 | 2017-09-11 | Nippon Kogaku Kk | Exposure apparatus, exposure method, and device manufacturing method |
| US7352433B2 (en) | 2003-10-28 | 2008-04-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7411653B2 (en) | 2003-10-28 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus |
| US7528929B2 (en) | 2003-11-14 | 2009-05-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| SG2014014955A (en) | 2003-12-03 | 2014-07-30 | Nippon Kogaku Kk | Exposure apparatus, exposure method, method for producing device, and optical part |
| WO2005057636A1 (ja) | 2003-12-15 | 2005-06-23 | Nikon Corporation | ステージ装置、露光装置、及び露光方法 |
| US7394521B2 (en) | 2003-12-23 | 2008-07-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4843503B2 (ja) | 2004-01-20 | 2011-12-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置および投影レンズのための測定装置 |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| KR101377815B1 (ko) | 2004-02-03 | 2014-03-26 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| US8111373B2 (en) | 2004-03-25 | 2012-02-07 | Nikon Corporation | Exposure apparatus and device fabrication method |
| US7898642B2 (en) | 2004-04-14 | 2011-03-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8054448B2 (en) | 2004-05-04 | 2011-11-08 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
| US7616383B2 (en) | 2004-05-18 | 2009-11-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN100594430C (zh) | 2004-06-04 | 2010-03-17 | 卡尔蔡司Smt股份公司 | 用于测量光学成像系统的图像质量的系统 |
| CN103439863B (zh) | 2004-06-09 | 2016-01-06 | 株式会社尼康 | 曝光装置、曝光方法、元件制造方法及维护方法 |
| US7463330B2 (en) | 2004-07-07 | 2008-12-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4894515B2 (ja) | 2004-07-12 | 2012-03-14 | 株式会社ニコン | 露光装置、デバイス製造方法、及び液体検出方法 |
| WO2006019124A1 (ja) | 2004-08-18 | 2006-02-23 | Nikon Corporation | 露光装置及びデバイス製造方法 |
| US7701550B2 (en) | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7397533B2 (en) | 2004-12-07 | 2008-07-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7880860B2 (en) | 2004-12-20 | 2011-02-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| SG124359A1 (en) | 2005-01-14 | 2006-08-30 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| SG124351A1 (en) | 2005-01-14 | 2006-08-30 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| KR101427056B1 (ko) | 2005-01-31 | 2014-08-05 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| US8692973B2 (en) | 2005-01-31 | 2014-04-08 | Nikon Corporation | Exposure apparatus and method for producing device |
| US7282701B2 (en) | 2005-02-28 | 2007-10-16 | Asml Netherlands B.V. | Sensor for use in a lithographic apparatus |
| US20060199274A1 (en) * | 2005-03-01 | 2006-09-07 | Canon Kabushiki Kaisha | Atmosphere conditioning method, exposure apparatus, and device manufacturing method |
| JP4072543B2 (ja) * | 2005-03-18 | 2008-04-09 | キヤノン株式会社 | 液浸露光装置及びデバイス製造方法 |
| USRE43576E1 (en) | 2005-04-08 | 2012-08-14 | Asml Netherlands B.V. | Dual stage lithographic apparatus and device manufacturing method |
| WO2007019105A1 (en) * | 2005-08-03 | 2007-02-15 | Entegris, Inc. | A transfer container |
| US7986395B2 (en) * | 2005-10-24 | 2011-07-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Immersion lithography apparatus and methods |
| US7420194B2 (en) * | 2005-12-27 | 2008-09-02 | Asml Netherlands B.V. | Lithographic apparatus and substrate edge seal |
| US7528387B2 (en) * | 2005-12-29 | 2009-05-05 | Interuniversitair Microelektronica Centrum (Imec) | Methods and systems for characterising and optimising immersion lithographic processing |
| US7649611B2 (en) | 2005-12-30 | 2010-01-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7253875B1 (en) * | 2006-03-03 | 2007-08-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP5567327B2 (ja) | 2006-04-03 | 2014-08-06 | インテグリス・インコーポレーテッド | 常圧マイクロ波プラズマ処理多孔性膜 |
| DE102006021797A1 (de) | 2006-05-09 | 2007-11-15 | Carl Zeiss Smt Ag | Optische Abbildungseinrichtung mit thermischer Dämpfung |
| KR101474572B1 (ko) | 2006-06-19 | 2014-12-18 | 엔테그리스, 아이엔씨. | 레티클 스토리지 정화시스템 |
| US8564759B2 (en) * | 2006-06-29 | 2013-10-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus and method for immersion lithography |
| US7933000B2 (en) * | 2006-11-16 | 2011-04-26 | Asml Netherlands B.V. | Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device |
| US7866637B2 (en) | 2007-01-26 | 2011-01-11 | Asml Netherlands B.V. | Humidifying apparatus, lithographic apparatus and humidifying method |
| US8817226B2 (en) | 2007-02-15 | 2014-08-26 | Asml Holding N.V. | Systems and methods for insitu lens cleaning using ozone in immersion lithography |
| US8654305B2 (en) | 2007-02-15 | 2014-02-18 | Asml Holding N.V. | Systems and methods for insitu lens cleaning in immersion lithography |
| US8237911B2 (en) | 2007-03-15 | 2012-08-07 | Nikon Corporation | Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine |
| NL1036181A1 (nl) * | 2007-11-30 | 2009-06-04 | Asml Netherlands Bv | A lithographic apparatus, a projection system and a device manufacturing method. |
| EP2128703A1 (en) | 2008-05-28 | 2009-12-02 | ASML Netherlands BV | Lithographic Apparatus and a Method of Operating the Apparatus |
| WO2011021300A1 (ja) * | 2009-08-21 | 2011-02-24 | 東レ株式会社 | 水蒸気透過膜、中空糸膜および中空糸膜モジュール |
| TWI450324B (zh) * | 2010-01-25 | 2014-08-21 | Gudeng Prec Ind Co Ltd | 微影設備之光罩清潔方法及微影設備之光罩清潔系統 |
| EP2381310B1 (en) | 2010-04-22 | 2015-05-06 | ASML Netherlands BV | Fluid handling structure and lithographic apparatus |
| EP2659914B1 (en) * | 2010-12-28 | 2020-06-24 | Toray Industries, Inc. | Hollow fiber membrane module |
| GB2502476A (en) * | 2011-02-15 | 2013-11-27 | Schlumberger Holdings | Method and apparatus for protecting downhole components with inert atmosphere |
| KR20140068970A (ko) * | 2011-08-31 | 2014-06-09 | 에이에스엠엘 네델란즈 비.브이. | 포커스 보정을 결정하는 방법, 리소그래피 처리 셀 및 디바이스 제조 방법 |
| KR102227564B1 (ko) * | 2014-01-20 | 2021-03-15 | 삼성디스플레이 주식회사 | 포토레지스트 조성물 |
| US10005018B2 (en) * | 2016-09-02 | 2018-06-26 | Battelle Memorial Institute | Xenon collection method and system |
| JP6767257B2 (ja) * | 2016-12-22 | 2020-10-14 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
| JP7193459B2 (ja) * | 2017-01-06 | 2022-12-20 | エーエスエムエル ネザーランズ ビー.ブイ. | 極端紫外線源(euv源) |
| DE102017207030A1 (de) * | 2017-04-26 | 2018-10-31 | Carl Zeiss Smt Gmbh | Verfahren zur Reinigung von optischen Elementen für den ultravioletten Wellenlängenbereich |
| WO2019228710A1 (en) * | 2018-05-28 | 2019-12-05 | Asml Netherlands B.V. | Lithographic apparatus |
| US12025919B2 (en) * | 2018-11-30 | 2024-07-02 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method of storing photoresist coated substrates and semiconductor substrate container arrangement |
| US11626285B2 (en) * | 2019-09-10 | 2023-04-11 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method of manufacturing a semiconductor device |
| KR102868514B1 (ko) * | 2019-11-04 | 2025-10-02 | 허니웰 인터내셔널 인코포레이티드 | 가스 감지에서 잘못된 알람 이벤트를 검출하기 위한 방법 및 시스템 |
| EP3832391A1 (en) * | 2019-12-03 | 2021-06-09 | ASML Netherlands B.V. | Clamp assembly |
| KR102695305B1 (ko) * | 2019-12-20 | 2024-08-13 | 사이머 엘엘씨 | 레이저 소스용 가스 퍼지 시스템 |
| DE102020204545A1 (de) * | 2020-04-08 | 2021-10-14 | Carl Zeiss Smt Gmbh | Verfahren und vorrichtung zum trocknen eines bauteilinnenraums |
| DE102023200132A1 (de) | 2022-05-04 | 2023-11-09 | Carl Zeiss Smt Gmbh | Einrichtung zur Entfernung von gasförmigen Kontaminationen und Vorrichtung, insbesondere Lithographiesystem, mit einer solchen Einrichtung |
| WO2024170178A1 (en) | 2023-02-13 | 2024-08-22 | Asml Netherlands B.V. | Gas supply module, fluid handling system, lithographic apparatus and device manufacturing method |
| CN116169322A (zh) * | 2023-02-28 | 2023-05-26 | 格罗夫氢能源科技集团有限公司 | 一种燃料电池进气温湿度调节装置及系统 |
Family Cites Families (76)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19910441C1 (de) * | 1999-03-10 | 2000-06-21 | Fraunhofer Ges Forschung | Luftbefeuchtung |
| DE2964203D1 (en) * | 1978-07-12 | 1983-01-13 | Jackson Richard R | Nested hollow fiber humidifier |
| DD160756A3 (de) | 1981-04-24 | 1984-02-29 | Gudrun Dietz | Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten |
| JPS62130321U (enExample) * | 1986-02-07 | 1987-08-18 | ||
| US4902456A (en) | 1988-05-04 | 1990-02-20 | Millipore Corporation | Fluorocarbon membranes and process for making fluorocarbon membranes |
| US5523193A (en) | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
| US5116396A (en) * | 1989-05-12 | 1992-05-26 | Union Carbide Industrial Gases Technology Corporation | Hybrid prepurifier for cryogenic air separation plants |
| ATE123885T1 (de) | 1990-05-02 | 1995-06-15 | Fraunhofer Ges Forschung | Belichtungsvorrichtung. |
| US5229872A (en) | 1992-01-21 | 1993-07-20 | Hughes Aircraft Company | Exposure device including an electrically aligned electronic mask for micropatterning |
| JPH0636993A (ja) | 1992-05-21 | 1994-02-10 | Canon Inc | 露光装置及び半導体素子の製造方法 |
| US5240472A (en) | 1992-05-29 | 1993-08-31 | Air Products And Chemicls, Inc. | Moisture removal from a wet gas |
| US5348691A (en) * | 1993-06-11 | 1994-09-20 | United Technologies Corporation | Atmosphere membrane humidifier and method and system for producing humidified air |
| IT1264661B1 (it) | 1993-07-05 | 1996-10-04 | Ausimont Spa | Copolimeri termoprocessabilin del tetrafluoroetilene |
| US5996976A (en) * | 1993-07-13 | 1999-12-07 | Lynntech, Inc. | Gas humidification system using water permeable membranes |
| JP3500619B2 (ja) | 1993-10-28 | 2004-02-23 | 株式会社ニコン | 投影露光装置 |
| US5528905A (en) | 1994-03-25 | 1996-06-25 | Essex Invention S.A. | Contactor, particularly a vapour exchanger for the control of the air hygrometric content, and a device for air handling |
| US6309550B1 (en) | 1994-06-22 | 2001-10-30 | Fls Miljo A/S | Mass transfer method and apparatus |
| JPH08266631A (ja) * | 1995-03-31 | 1996-10-15 | Asahi Glass Co Ltd | 呼吸用気体の加湿装置 |
| US6545746B1 (en) * | 1996-03-04 | 2003-04-08 | Nikon Corporation | Projection exposure apparatus |
| JP4075966B2 (ja) | 1996-03-06 | 2008-04-16 | エーエスエムエル ネザーランズ ビー.ブイ. | 差分干渉計システム及びこのシステムを具えたリソグラフステップアンドスキャン装置 |
| KR100542414B1 (ko) | 1996-03-27 | 2006-05-10 | 가부시키가이샤 니콘 | 노광장치및공조장치 |
| JPH09275054A (ja) * | 1996-04-03 | 1997-10-21 | Nikon Corp | 半導体製造装置 |
| WO1998028665A1 (en) | 1996-12-24 | 1998-07-02 | Koninklijke Philips Electronics N.V. | Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device |
| DE69711929T2 (de) | 1997-01-29 | 2002-09-05 | Micronic Laser Systems Ab, Taeby | Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl |
| SE509062C2 (sv) | 1997-02-28 | 1998-11-30 | Micronic Laser Systems Ab | Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster |
| USRE40043E1 (en) | 1997-03-10 | 2008-02-05 | Asml Netherlands B.V. | Positioning device having two object holders |
| WO1998048452A1 (en) * | 1997-04-18 | 1998-10-29 | Nikon Corporation | Method and device for exposure control, method and device for exposure, and method of manufacture of device |
| US5910292A (en) | 1997-08-19 | 1999-06-08 | Aeronex, Inc. | Method for water removal from corrosive gas streams |
| US6059859A (en) | 1997-09-19 | 2000-05-09 | Aeronex, Inc. | Method, composition and apparatus for water removal from non-corrosive gas streams |
| NL1008352C2 (nl) | 1998-02-19 | 1999-08-20 | Stichting Tech Wetenschapp | Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden. |
| US6089282A (en) | 1998-05-08 | 2000-07-18 | Aeronex, Inc. | Method for recovery and reuse of gas |
| KR20010087356A (ko) * | 1998-09-09 | 2001-09-15 | 와이너 길버트 피. | 유체 처리 요소, 유체 처리 요소 세척 방법 및 유체 처리방법 |
| US6254936B1 (en) | 1998-09-14 | 2001-07-03 | Silicon Valley Group, Inc. | Environment exchange control for material on a wafer surface |
| US6235641B1 (en) | 1998-10-30 | 2001-05-22 | Fsi International Inc. | Method and system to control the concentration of dissolved gas in a liquid |
| US6582496B1 (en) | 2000-01-28 | 2003-06-24 | Mykrolis Corporation | Hollow fiber membrane contactor |
| KR100816232B1 (ko) * | 1999-01-29 | 2008-03-21 | 엔테그리스, 아이엔씨. | 중공섬유막 접촉기 |
| US6802972B1 (en) * | 1999-01-29 | 2004-10-12 | Mykrolis Corporation | Microporous hollow fiber membranes from perfluorinated thermoplastic polymers |
| EP1148932B1 (en) * | 1999-01-29 | 2005-06-08 | Mykrolis Corporation | Method for manufacturing hollow fiber membranes |
| US6149817A (en) | 1999-03-08 | 2000-11-21 | Celgard Inc. | Shell-less hollow fiber membrane fluid contactor |
| JP2000262997A (ja) * | 1999-03-17 | 2000-09-26 | Sumitomo Heavy Ind Ltd | エアロゾル洗浄装置 |
| US6394109B1 (en) * | 1999-04-13 | 2002-05-28 | Applied Materials, Inc. | Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system |
| WO2000074120A1 (en) | 1999-05-28 | 2000-12-07 | Nikon Corporation | Exposure method and apparatus |
| JP3927344B2 (ja) * | 2000-01-19 | 2007-06-06 | 本田技研工業株式会社 | 加湿装置 |
| JP2001308003A (ja) * | 2000-02-15 | 2001-11-02 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
| JP3869999B2 (ja) | 2000-03-30 | 2007-01-17 | キヤノン株式会社 | 露光装置および半導体デバイス製造方法 |
| US6558475B1 (en) * | 2000-04-10 | 2003-05-06 | International Business Machines Corporation | Process for cleaning a workpiece using supercritical carbon dioxide |
| EP1357998B1 (en) * | 2000-05-05 | 2014-12-03 | Entegris, Inc. | Filters employing both acidic polymers and physical-adsorption media |
| US6432204B1 (en) * | 2000-05-17 | 2002-08-13 | Tokyo Electron Limited | Temperature and humidity controlled processing system |
| US6402818B1 (en) | 2000-06-02 | 2002-06-11 | Celgard Inc. | Degassing a liquid with a membrane contactor |
| JP2001349585A (ja) * | 2000-06-07 | 2001-12-21 | Orion Mach Co Ltd | 吸湿性中空繊維を使用する高分子膜加湿器 |
| JP2001358055A (ja) | 2000-06-15 | 2001-12-26 | Nikon Corp | 露光装置及びデバイス製造方法 |
| US6305097B1 (en) * | 2000-06-29 | 2001-10-23 | Texas Instruments Incorporated | Apparatus for in-situ reticle cleaning at photolithography tool |
| JP2002158170A (ja) | 2000-09-08 | 2002-05-31 | Nikon Corp | 露光装置及びデバイス製造方法 |
| JP4610715B2 (ja) * | 2000-11-06 | 2011-01-12 | Nok株式会社 | 加湿装置 |
| JP2002158154A (ja) | 2000-11-16 | 2002-05-31 | Canon Inc | 露光装置 |
| DE10059910C2 (de) * | 2000-12-01 | 2003-01-16 | Daimler Chrysler Ag | Vorrichtung zur kontinuierlichen Befeuchtung und Entfeuchtung der Zuluft von Fertigungsprozessen oder Raumlufttechnik-Anlagen |
| US20020136939A1 (en) | 2001-02-15 | 2002-09-26 | Grieve M. James | Fuel cell and battery voltage controlling method and system |
| JP3765531B2 (ja) | 2001-03-30 | 2006-04-12 | 本田技研工業株式会社 | 加湿モジュール |
| US6391090B1 (en) | 2001-04-02 | 2002-05-21 | Aeronex, Inc. | Method for purification of lens gases used in photolithography |
| US6842998B2 (en) * | 2001-04-06 | 2005-01-18 | Akrion Llc | Membrane dryer |
| US6616841B2 (en) | 2001-06-21 | 2003-09-09 | Celgard Inc. | Hollow fiber membrane contactor |
| US6514313B1 (en) | 2001-06-22 | 2003-02-04 | Aeronex, Inc. | Gas purification system and method |
| US6828569B2 (en) * | 2001-11-19 | 2004-12-07 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| US6724460B2 (en) * | 2001-11-19 | 2004-04-20 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects |
| US20030162305A1 (en) | 2002-02-25 | 2003-08-28 | Daniel Alvarez | Gas contaminant detection and quantification method |
| US6638341B1 (en) | 2002-06-14 | 2003-10-28 | Aeronex, Inc. | Method for rapid activation or preconditioning of porous gas purification substrates |
| EP1527492A2 (de) * | 2002-07-18 | 2005-05-04 | DaimlerChrysler AG | Vorrichtung und verfahren zur befeuchtung eines gasstroms |
| AU2003289271A1 (en) | 2002-12-10 | 2004-06-30 | Nikon Corporation | Exposure apparatus, exposure method and method for manufacturing device |
| JP2006518468A (ja) | 2003-02-21 | 2006-08-10 | インテグリス・インコーポレーテッド | プロセス流体流中の汚染物質の分析方法 |
| US7189291B2 (en) | 2003-06-02 | 2007-03-13 | Entegris, Inc. | Method for the removal of airborne molecular contaminants using oxygen gas mixtures |
| US6867844B2 (en) | 2003-06-19 | 2005-03-15 | Asml Holding N.V. | Immersion photolithography system and method using microchannel nozzles |
| US7384149B2 (en) | 2003-07-21 | 2008-06-10 | Asml Netherlands B.V. | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
| US20060285091A1 (en) | 2003-07-21 | 2006-12-21 | Parekh Bipin S | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application |
| US7779781B2 (en) | 2003-07-31 | 2010-08-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7701550B2 (en) | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US11206499B2 (en) | 2016-08-18 | 2021-12-21 | Qualcomm Incorporated | Hearable device comprising integrated device and wireless functionality |
-
2003
- 2003-07-21 US US10/623,180 patent/US7384149B2/en not_active Expired - Lifetime
-
2004
- 2004-07-20 EP EP04774827A patent/EP1649325B1/en not_active Expired - Lifetime
- 2004-07-20 WO PCT/NL2004/000519 patent/WO2005008339A2/en not_active Ceased
- 2004-07-20 CN CN2004800266052A patent/CN1853142B/zh not_active Expired - Lifetime
- 2004-07-20 US US10/894,365 patent/US7113254B2/en not_active Expired - Lifetime
- 2004-07-20 JP JP2006521023A patent/JP4487108B2/ja not_active Expired - Lifetime
- 2004-07-20 TW TW093121654A patent/TWI251130B/zh not_active IP Right Cessation
- 2004-07-20 KR KR1020067001345A patent/KR100846184B1/ko not_active Expired - Fee Related
- 2004-07-21 US US10/565,486 patent/US7879137B2/en not_active Expired - Fee Related
- 2004-07-21 TW TW093121732A patent/TW200511389A/zh unknown
- 2004-07-21 KR KR1020077023567A patent/KR20070106805A/ko not_active Abandoned
- 2004-07-21 KR KR1020067001321A patent/KR101077683B1/ko not_active Expired - Fee Related
- 2004-07-21 DE DE602004027497T patent/DE602004027497D1/de not_active Expired - Lifetime
- 2004-07-21 EP EP04757185A patent/EP1646915B1/en not_active Expired - Lifetime
- 2004-07-21 JP JP2006521216A patent/JP2006528431A/ja not_active Withdrawn
- 2004-07-21 CN CN2007101812213A patent/CN101144986B/zh not_active Expired - Fee Related
- 2004-07-21 EP EP10162412A patent/EP2211233A2/en not_active Withdrawn
- 2004-07-21 WO PCT/US2004/023490 patent/WO2005010619A2/en not_active Ceased
- 2004-07-21 TW TW096131640A patent/TW200801848A/zh unknown
- 2004-07-21 CN CN200480021018A patent/CN100590530C/zh not_active Expired - Fee Related
- 2004-07-21 SG SG200802367-3A patent/SG141460A1/en unknown
-
2006
- 2006-09-25 US US11/525,934 patent/US7450215B2/en not_active Expired - Lifetime
-
2007
- 2007-11-19 JP JP2007299182A patent/JP2008160080A/ja not_active Withdrawn
-
2011
- 2011-10-27 JP JP2011235682A patent/JP2012074712A/ja not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2012074712A5 (enExample) | ||
| NZ749312A (en) | Humidification of respiratory gases | |
| JP2006528431A5 (enExample) | ||
| CA3176879C (en) | RESPIRATORY ASSISTANCE DEVICE | |
| JP1708148S (ja) | ガス供給チューブ | |
| NZ624271A (en) | Heating element, humidifier for respiratory apparatus including heating element, and respiratory apparatus | |
| NZ746055A (en) | A humidifier reservoir | |
| NZ620739A (en) | Humidification of respiratory gases | |
| RU2013144388A (ru) | Способ и устройство для генерации кислорода | |
| MY167499A (en) | An aerosol generating device with adjustable airflow | |
| TWD174180S (zh) | 用於呼吸器輸氣控制台的加濕裝置之入口擋管 | |
| JP2010522044A5 (enExample) | ||
| UA67105U (ru) | Система для сухого обеспыливания и сухой очистки загрязненного пылью и вредными веществами газа, образованного в агрегатах для получения чугуна в процессе получения чугуна или в агрегатах для получения железа в процессе получения железа | |
| JP2009532901A5 (enExample) | ||
| GB2489763A (en) | A breathing apparatus | |
| BR112012030578A2 (pt) | método para controlar automaticamente uma umidade de um fluxo de gás de um sistema de suporte de pressão (50) durante o uso do sistema de suporte de pressão por um usuário e sistema de suporte de pressão | |
| GB201015368D0 (en) | Oxygen concentrator and method | |
| UA113666C2 (xx) | Керований диханням інгалятор зі струменями повітря, що ударяють у шлейф композиції | |
| BR112015015298A2 (pt) | sistema de suporte por pressão, e método de aplicação de um fluxo pressurizado de gás respirável de umidade controlada às vias aéreas de um indivíduo | |
| JP2017500918A5 (enExample) | ||
| JP2012111012A5 (enExample) | ||
| JP2018183750A5 (enExample) | ||
| MY175137A (en) | Replenising liquid material to membrane | |
| JP2009179555A5 (enExample) | ||
| JP2017506964A5 (enExample) |