TW200511389A - Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system - Google Patents
Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply systemInfo
- Publication number
- TW200511389A TW200511389A TW093121732A TW93121732A TW200511389A TW 200511389 A TW200511389 A TW 200511389A TW 093121732 A TW093121732 A TW 093121732A TW 93121732 A TW93121732 A TW 93121732A TW 200511389 A TW200511389 A TW 200511389A
- Authority
- TW
- Taiwan
- Prior art keywords
- purge gas
- gas mixture
- supply system
- lithographic projection
- projection apparatus
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Toxicology (AREA)
- Computer Networks & Wireless Communication (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Electron Beam Exposure (AREA)
- Fuel Cell (AREA)
- Air Humidification (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/623,180 US7384149B2 (en) | 2003-07-21 | 2003-07-21 | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200511389A true TW200511389A (en) | 2005-03-16 |
Family
ID=34079792
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093121654A TWI251130B (en) | 2003-07-21 | 2004-07-20 | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
| TW093121732A TW200511389A (en) | 2003-07-21 | 2004-07-21 | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
| TW096131640A TW200801848A (en) | 2003-07-21 | 2004-07-21 | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093121654A TWI251130B (en) | 2003-07-21 | 2004-07-20 | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096131640A TW200801848A (en) | 2003-07-21 | 2004-07-21 | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
Country Status (9)
| Country | Link |
|---|---|
| US (4) | US7384149B2 (zh) |
| EP (3) | EP1649325B1 (zh) |
| JP (4) | JP4487108B2 (zh) |
| KR (3) | KR100846184B1 (zh) |
| CN (3) | CN1853142B (zh) |
| DE (1) | DE602004027497D1 (zh) |
| SG (1) | SG141460A1 (zh) |
| TW (3) | TWI251130B (zh) |
| WO (2) | WO2005008339A2 (zh) |
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| CN1723541B (zh) | 2002-12-10 | 2010-06-02 | 株式会社尼康 | 曝光装置和器件制造方法 |
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| US7242455B2 (en) | 2002-12-10 | 2007-07-10 | Nikon Corporation | Exposure apparatus and method for producing device |
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2003
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- 2004-07-20 CN CN2004800266052A patent/CN1853142B/zh not_active Expired - Lifetime
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- 2004-07-20 WO PCT/NL2004/000519 patent/WO2005008339A2/en active Application Filing
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