CN1853142B - 光刻投影装置、气体净化方法、器件制造方法以及净化气体供应系统 - Google Patents

光刻投影装置、气体净化方法、器件制造方法以及净化气体供应系统 Download PDF

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Publication number
CN1853142B
CN1853142B CN2004800266052A CN200480026605A CN1853142B CN 1853142 B CN1853142 B CN 1853142B CN 2004800266052 A CN2004800266052 A CN 2004800266052A CN 200480026605 A CN200480026605 A CN 200480026605A CN 1853142 B CN1853142 B CN 1853142B
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China
Prior art keywords
purge gas
gas
gas mixture
moisture
humidification
Prior art date
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Expired - Lifetime
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CN2004800266052A
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English (en)
Chinese (zh)
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CN1853142A (zh
Inventor
A·J·范德内特
J·斯佩格尔曼
J·J·范布拉格特
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ASML Holding NV
Entegris Inc
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ASML Holding NV
Entegris Inc
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Publication of CN1853142A publication Critical patent/CN1853142A/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Fuel Cell (AREA)
  • Air Humidification (AREA)
  • Electron Beam Exposure (AREA)
CN2004800266052A 2003-07-21 2004-07-20 光刻投影装置、气体净化方法、器件制造方法以及净化气体供应系统 Expired - Lifetime CN1853142B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/623,180 US7384149B2 (en) 2003-07-21 2003-07-21 Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
US10/623,180 2003-07-21
PCT/NL2004/000519 WO2005008339A2 (en) 2003-07-21 2004-07-20 Lithographic projection apparatus, purge gas supply system and gas purging method

Publications (2)

Publication Number Publication Date
CN1853142A CN1853142A (zh) 2006-10-25
CN1853142B true CN1853142B (zh) 2012-03-07

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Family Applications (3)

Application Number Title Priority Date Filing Date
CN2004800266052A Expired - Lifetime CN1853142B (zh) 2003-07-21 2004-07-20 光刻投影装置、气体净化方法、器件制造方法以及净化气体供应系统
CN2007101812213A Expired - Fee Related CN101144986B (zh) 2003-07-21 2004-07-21 光刻投影设备、气体吹扫方法、设备制造方法和吹扫气体提供系统
CN200480021018A Expired - Fee Related CN100590530C (zh) 2003-07-21 2004-07-21 光刻投影设备、气体吹扫方法、设备制造方法和吹扫气体提供系统

Family Applications After (2)

Application Number Title Priority Date Filing Date
CN2007101812213A Expired - Fee Related CN101144986B (zh) 2003-07-21 2004-07-21 光刻投影设备、气体吹扫方法、设备制造方法和吹扫气体提供系统
CN200480021018A Expired - Fee Related CN100590530C (zh) 2003-07-21 2004-07-21 光刻投影设备、气体吹扫方法、设备制造方法和吹扫气体提供系统

Country Status (9)

Country Link
US (4) US7384149B2 (enExample)
EP (3) EP1649325B1 (enExample)
JP (4) JP4487108B2 (enExample)
KR (3) KR100846184B1 (enExample)
CN (3) CN1853142B (enExample)
DE (1) DE602004027497D1 (enExample)
SG (1) SG141460A1 (enExample)
TW (3) TWI251130B (enExample)
WO (2) WO2005008339A2 (enExample)

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