CN1853142B - 光刻投影装置、气体净化方法、器件制造方法以及净化气体供应系统 - Google Patents

光刻投影装置、气体净化方法、器件制造方法以及净化气体供应系统 Download PDF

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Publication number
CN1853142B
CN1853142B CN2004800266052A CN200480026605A CN1853142B CN 1853142 B CN1853142 B CN 1853142B CN 2004800266052 A CN2004800266052 A CN 2004800266052A CN 200480026605 A CN200480026605 A CN 200480026605A CN 1853142 B CN1853142 B CN 1853142B
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China
Prior art keywords
purge gas
gas
moisture
gas mixture
projection apparatus
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Expired - Lifetime
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CN2004800266052A
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Chinese (zh)
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CN1853142A (zh
Inventor
A·J·范德内特
J·斯佩格尔曼
J·J·范布拉格特
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ASML Holding NV
Entegris Inc
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ASML Holding NV
Entegris Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Air Humidification (AREA)
  • Fuel Cell (AREA)
  • Electron Beam Exposure (AREA)
CN2004800266052A 2003-07-21 2004-07-20 光刻投影装置、气体净化方法、器件制造方法以及净化气体供应系统 Expired - Lifetime CN1853142B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/623,180 2003-07-21
US10/623,180 US7384149B2 (en) 2003-07-21 2003-07-21 Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
PCT/NL2004/000519 WO2005008339A2 (en) 2003-07-21 2004-07-20 Lithographic projection apparatus, purge gas supply system and gas purging method

Publications (2)

Publication Number Publication Date
CN1853142A CN1853142A (zh) 2006-10-25
CN1853142B true CN1853142B (zh) 2012-03-07

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CN2004800266052A Expired - Lifetime CN1853142B (zh) 2003-07-21 2004-07-20 光刻投影装置、气体净化方法、器件制造方法以及净化气体供应系统
CN200480021018A Expired - Fee Related CN100590530C (zh) 2003-07-21 2004-07-21 光刻投影设备、气体吹扫方法、设备制造方法和吹扫气体提供系统
CN2007101812213A Expired - Fee Related CN101144986B (zh) 2003-07-21 2004-07-21 光刻投影设备、气体吹扫方法、设备制造方法和吹扫气体提供系统

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CN200480021018A Expired - Fee Related CN100590530C (zh) 2003-07-21 2004-07-21 光刻投影设备、气体吹扫方法、设备制造方法和吹扫气体提供系统
CN2007101812213A Expired - Fee Related CN101144986B (zh) 2003-07-21 2004-07-21 光刻投影设备、气体吹扫方法、设备制造方法和吹扫气体提供系统

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US (4) US7384149B2 (enExample)
EP (3) EP1649325B1 (enExample)
JP (4) JP4487108B2 (enExample)
KR (3) KR100846184B1 (enExample)
CN (3) CN1853142B (enExample)
DE (1) DE602004027497D1 (enExample)
SG (1) SG141460A1 (enExample)
TW (3) TWI251130B (enExample)
WO (2) WO2005008339A2 (enExample)

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