KR100846184B1 - 리소그래피 투영 장치, 가스 퍼징 방법, 디바이스 제조방법 및 퍼지 가스 공급 시스템 - Google Patents

리소그래피 투영 장치, 가스 퍼징 방법, 디바이스 제조방법 및 퍼지 가스 공급 시스템 Download PDF

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KR100846184B1
KR100846184B1 KR1020067001345A KR20067001345A KR100846184B1 KR 100846184 B1 KR100846184 B1 KR 100846184B1 KR 1020067001345 A KR1020067001345 A KR 1020067001345A KR 20067001345 A KR20067001345 A KR 20067001345A KR 100846184 B1 KR100846184 B1 KR 100846184B1
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purge gas
moisture
projection apparatus
lithographic projection
gas mixture
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Korean (ko)
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KR20060058686A (ko
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안토니우스 요한네스 반 데르 네트
제프리 슈피겔만
요한누스 요제푸스 반 브라크트
Original Assignee
에이에스엠엘 네델란즈 비.브이.
인티그리스, 인코포레이티드
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Air Humidification (AREA)
  • Fuel Cell (AREA)
  • Electron Beam Exposure (AREA)
KR1020067001345A 2003-07-21 2004-07-20 리소그래피 투영 장치, 가스 퍼징 방법, 디바이스 제조방법 및 퍼지 가스 공급 시스템 Expired - Fee Related KR100846184B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/623,180 US7384149B2 (en) 2003-07-21 2003-07-21 Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
US10/623,180 2003-07-21

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KR20060058686A KR20060058686A (ko) 2006-05-30
KR100846184B1 true KR100846184B1 (ko) 2008-07-14

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KR1020067001345A Expired - Fee Related KR100846184B1 (ko) 2003-07-21 2004-07-20 리소그래피 투영 장치, 가스 퍼징 방법, 디바이스 제조방법 및 퍼지 가스 공급 시스템
KR1020077023567A Abandoned KR20070106805A (ko) 2003-07-21 2004-07-21 리소그래피 투영 장치, 세정 가스 공급 시스템 및 가스세정 방법
KR1020067001321A Expired - Fee Related KR101077683B1 (ko) 2003-07-21 2004-07-21 리소그래피 투영 장치, 세정 가스 공급 시스템 및 가스세정 방법

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KR1020077023567A Abandoned KR20070106805A (ko) 2003-07-21 2004-07-21 리소그래피 투영 장치, 세정 가스 공급 시스템 및 가스세정 방법
KR1020067001321A Expired - Fee Related KR101077683B1 (ko) 2003-07-21 2004-07-21 리소그래피 투영 장치, 세정 가스 공급 시스템 및 가스세정 방법

Country Status (9)

Country Link
US (4) US7384149B2 (enExample)
EP (3) EP1649325B1 (enExample)
JP (4) JP4487108B2 (enExample)
KR (3) KR100846184B1 (enExample)
CN (3) CN1853142B (enExample)
DE (1) DE602004027497D1 (enExample)
SG (1) SG141460A1 (enExample)
TW (3) TWI251130B (enExample)
WO (2) WO2005008339A2 (enExample)

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