JP4487108B2 - リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム - Google Patents

リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム Download PDF

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Publication number
JP4487108B2
JP4487108B2 JP2006521023A JP2006521023A JP4487108B2 JP 4487108 B2 JP4487108 B2 JP 4487108B2 JP 2006521023 A JP2006521023 A JP 2006521023A JP 2006521023 A JP2006521023 A JP 2006521023A JP 4487108 B2 JP4487108 B2 JP 4487108B2
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Japan
Prior art keywords
purge gas
projection apparatus
gas mixture
lithographic projection
moisture
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Expired - Lifetime
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JP2006521023A
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English (en)
Japanese (ja)
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JP2006528425A (ja
Inventor
デル ネット、アントニウス、ヨハネス ファン
シュピーゲルマン、ジェフリー
ブラグト、ヨハヌス、ヨセフス ファン
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Entegris Inc
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Entegris Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Toxicology (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Electron Beam Exposure (AREA)
  • Fuel Cell (AREA)
  • Air Humidification (AREA)
JP2006521023A 2003-07-21 2004-07-20 リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム Expired - Lifetime JP4487108B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/623,180 US7384149B2 (en) 2003-07-21 2003-07-21 Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
PCT/NL2004/000519 WO2005008339A2 (en) 2003-07-21 2004-07-20 Lithographic projection apparatus, purge gas supply system and gas purging method

Publications (2)

Publication Number Publication Date
JP2006528425A JP2006528425A (ja) 2006-12-14
JP4487108B2 true JP4487108B2 (ja) 2010-06-23

Family

ID=34079792

Family Applications (4)

Application Number Title Priority Date Filing Date
JP2006521023A Expired - Lifetime JP4487108B2 (ja) 2003-07-21 2004-07-20 リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム
JP2006521216A Withdrawn JP2006528431A (ja) 2003-07-21 2004-07-21 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2007299182A Withdrawn JP2008160080A (ja) 2003-07-21 2007-11-19 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2011235682A Withdrawn JP2012074712A (ja) 2003-07-21 2011-10-27 リソグラフ投影装置、パージガス供給システムおよびガスパージ

Family Applications After (3)

Application Number Title Priority Date Filing Date
JP2006521216A Withdrawn JP2006528431A (ja) 2003-07-21 2004-07-21 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2007299182A Withdrawn JP2008160080A (ja) 2003-07-21 2007-11-19 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2011235682A Withdrawn JP2012074712A (ja) 2003-07-21 2011-10-27 リソグラフ投影装置、パージガス供給システムおよびガスパージ

Country Status (9)

Country Link
US (4) US7384149B2 (enExample)
EP (3) EP1649325B1 (enExample)
JP (4) JP4487108B2 (enExample)
KR (3) KR100846184B1 (enExample)
CN (3) CN1853142B (enExample)
DE (1) DE602004027497D1 (enExample)
SG (1) SG141460A1 (enExample)
TW (3) TWI251130B (enExample)
WO (2) WO2005008339A2 (enExample)

Families Citing this family (124)

* Cited by examiner, † Cited by third party
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