IN2012DN03251A - - Google Patents

Download PDF

Info

Publication number
IN2012DN03251A
IN2012DN03251A IN3251DEN2012A IN2012DN03251A IN 2012DN03251 A IN2012DN03251 A IN 2012DN03251A IN 3251DEN2012 A IN3251DEN2012 A IN 3251DEN2012A IN 2012DN03251 A IN2012DN03251 A IN 2012DN03251A
Authority
IN
India
Prior art keywords
substrate
core
terminals
coupled
layers
Prior art date
Application number
Other languages
English (en)
Inventor
Qing Ma
Chuan Hu
Patrick Morrow
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Publication of IN2012DN03251A publication Critical patent/IN2012DN03251A/en

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68Shapes or dispositions thereof
    • H10W70/685Shapes or dispositions thereof comprising multiple insulating layers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4602Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
    • H05K3/4605Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated made from inorganic insulating material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W40/00Arrangements for thermal protection or thermal control
    • H10W40/20Arrangements for cooling
    • H10W40/22Arrangements for cooling characterised by their shape, e.g. having conical or cylindrical projections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01Manufacture or treatment
    • H10W70/05Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01Manufacture or treatment
    • H10W70/05Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/095Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers of vias therein
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/63Vias, e.g. via plugs
    • H10W70/635Through-vias
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/65Shapes or dispositions of interconnections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/69Insulating materials thereof
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0183Dielectric layers
    • H05K2201/0195Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/095Conductive through-holes or vias
    • H05K2201/096Vertically aligned vias, holes or stacked vias
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/65Shapes or dispositions of interconnections
    • H10W70/654Top-view layouts
    • H10W70/656Fan-in layouts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/072Connecting or disconnecting of bump connectors
    • H10W72/07231Techniques
    • H10W72/07236Soldering or alloying
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/877Bump connectors and die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/736Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked lead frame, conducting package substrate or heat sink
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Combinations Of Printed Boards (AREA)
  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
IN3251DEN2012 2009-12-17 2010-11-01 IN2012DN03251A (enExample)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/653,722 US9420707B2 (en) 2009-12-17 2009-12-17 Substrate for integrated circuit devices including multi-layer glass core and methods of making the same
PCT/US2010/054931 WO2011084216A2 (en) 2009-12-17 2010-11-01 Substrate for integrated circuit devices including multi-layer glass core and methods of making the same

Publications (1)

Publication Number Publication Date
IN2012DN03251A true IN2012DN03251A (enExample) 2015-10-23

Family

ID=44149499

Family Applications (1)

Application Number Title Priority Date Filing Date
IN3251DEN2012 IN2012DN03251A (enExample) 2009-12-17 2010-11-01

Country Status (9)

Country Link
US (2) US9420707B2 (enExample)
JP (2) JP2013512583A (enExample)
KR (1) KR101466582B1 (enExample)
CN (2) CN102656685B (enExample)
DE (1) DE112010004888B4 (enExample)
GB (1) GB2488265B (enExample)
IN (1) IN2012DN03251A (enExample)
TW (1) TWI467717B (enExample)
WO (1) WO2011084216A2 (enExample)

Families Citing this family (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9420707B2 (en) 2009-12-17 2016-08-16 Intel Corporation Substrate for integrated circuit devices including multi-layer glass core and methods of making the same
US8207453B2 (en) 2009-12-17 2012-06-26 Intel Corporation Glass core substrate for integrated circuit devices and methods of making the same
US20110229687A1 (en) * 2010-03-19 2011-09-22 Qualcomm Incorporated Through Glass Via Manufacturing Process
JP5419226B2 (ja) * 2010-07-29 2014-02-19 日東電工株式会社 フリップチップ型半導体裏面用フィルム及びその用途
JP6088724B2 (ja) * 2010-08-31 2017-03-01 ユニ・チャーム株式会社 吸収体の製造装置、及び通気性部材の製造方法
US8853072B2 (en) * 2011-06-06 2014-10-07 Micron Technology, Inc. Methods of forming through-substrate interconnects
US8780576B2 (en) * 2011-09-14 2014-07-15 Invensas Corporation Low CTE interposer
WO2013133827A1 (en) 2012-03-07 2013-09-12 Intel Corporation Glass clad microelectronic substrate
US10629993B2 (en) * 2012-07-19 2020-04-21 HungYu David Yang Method and apparatus for a 60 GHz endfire antenna
US20140027163A1 (en) * 2012-07-30 2014-01-30 Samsung Electro-Mechanics Co., Ltd. Printed circuit board and method for manufacturing the same
US10115671B2 (en) 2012-08-03 2018-10-30 Snaptrack, Inc. Incorporation of passives and fine pitch through via for package on package
US9001520B2 (en) 2012-09-24 2015-04-07 Intel Corporation Microelectronic structures having laminated or embedded glass routing structures for high density packaging
US9373586B2 (en) * 2012-11-14 2016-06-21 Taiwan Semiconductor Manufacturing Co., Ltd. Copper etching integration scheme
JP2014120687A (ja) * 2012-12-18 2014-06-30 Hitachi Chemical Co Ltd 積層板、多層積層板、プリント配線板、多層プリント配線板及び積層板の製造方法
US9312219B2 (en) * 2012-12-28 2016-04-12 Dyi-chung Hu Interposer and packaging substrate having the interposer
WO2014119178A1 (ja) * 2013-01-30 2014-08-07 京セラ株式会社 実装構造体の製造方法
KR20150014167A (ko) * 2013-07-29 2015-02-06 삼성전기주식회사 유리 코어가 구비된 인쇄회로기판
US9178572B1 (en) * 2013-09-24 2015-11-03 Amazon Technologies, Inc. Integrated radio frequency or near field communications antenna
KR20150042042A (ko) * 2013-10-10 2015-04-20 삼성전기주식회사 인쇄회로기판 및 그 제조방법
JP5846185B2 (ja) 2013-11-21 2016-01-20 大日本印刷株式会社 貫通電極基板及び貫通電極基板を用いた半導体装置
JP2015146401A (ja) * 2014-02-04 2015-08-13 大日本印刷株式会社 ガラスインターポーザー
JP6273873B2 (ja) * 2014-02-04 2018-02-07 大日本印刷株式会社 ガラスインターポーザー基板の製造方法
CN106463466B (zh) * 2014-05-06 2019-11-08 英特尔公司 具有集成天线的多层封装件
JP2016009844A (ja) * 2014-06-26 2016-01-18 ソニー株式会社 半導体装置および半導体装置の製造方法
US9368436B2 (en) * 2014-08-04 2016-06-14 Infineon Technologies Ag Source down semiconductor devices and methods of formation thereof
CN104409429A (zh) * 2014-11-23 2015-03-11 北京工业大学 一种带应力牺牲结构的芯片封装结构及封装方法
JP6447075B2 (ja) * 2014-12-10 2019-01-09 凸版印刷株式会社 配線基板、半導体装置及び半導体装置の製造方法
US9397048B1 (en) * 2015-03-23 2016-07-19 Inotera Memories, Inc. Semiconductor structure and manufacturing method thereof
CN106356351B (zh) * 2015-07-15 2019-02-01 凤凰先驱股份有限公司 基板结构及其制作方法
TWI581460B (zh) * 2015-09-04 2017-05-01 錼創科技股份有限公司 發光元件及其製作方法
KR102470168B1 (ko) * 2015-12-08 2022-11-23 삼성전기주식회사 패키지기판
CN107424974A (zh) * 2016-05-24 2017-12-01 胡迪群 具有埋入式噪声屏蔽墙的封装基板
JP6372546B2 (ja) * 2016-11-15 2018-08-15 大日本印刷株式会社 貫通電極基板及び貫通電極基板を用いた半導体装置
DE102016222885A1 (de) * 2016-11-21 2018-05-24 Daimler Ag Elektronisches Bauteil und Verfahren zu dessen Herstellung
EP3615488B1 (en) * 2017-04-26 2021-10-06 Corning Incorporated Micro-perforated glass laminates and methods of making the same
TW202441595A (zh) 2017-07-24 2024-10-16 美商康寧公司 精密結構玻璃物件、積體電路封裝、光學元件、微流體元件及其製造方法
TWI713842B (zh) * 2018-05-10 2020-12-21 恆勁科技股份有限公司 覆晶封裝基板之製法及其結構
US10672859B2 (en) 2018-06-27 2020-06-02 Intel Corporation Embedded magnetic inductor
US20210359185A1 (en) * 2018-10-19 2021-11-18 Corning Incorporated Device including vias and method and material for fabricating vias
JP7293360B2 (ja) 2019-03-07 2023-06-19 アブソリックス インコーポレイテッド パッケージング基板及びこれを含む半導体装置
JP7433318B2 (ja) 2019-03-07 2024-02-19 アブソリックス インコーポレイテッド パッケージング基板及びこれを含む半導体装置
WO2020185021A1 (ko) * 2019-03-12 2020-09-17 에스케이씨 주식회사 패키징 기판 및 이를 포함하는 반도체 장치
JP7228697B2 (ja) 2019-03-12 2023-02-24 アブソリックス インコーポレイテッド パッケージング基板及びこれを含む半導体装置
CN113261093B (zh) 2019-03-12 2024-04-16 爱玻索立克公司 半导体封装用基板及其制备方法以及半导体装置
CN113424304B (zh) 2019-03-12 2024-04-12 爱玻索立克公司 装载盒及对象基板的装载方法
ES3041275T3 (en) 2019-03-29 2025-11-11 Absolics Inc Packaging glass substrate for semiconductor, packaging substrate for semiconductor, and semiconductor device
CN110335542B (zh) * 2019-04-03 2021-04-30 上海天马微电子有限公司 显示面板及其制作方法、显示装置
CN112039460B (zh) 2019-07-19 2022-05-10 中芯集成电路(宁波)有限公司 薄膜体声波谐振器及其制作方法
US12191240B2 (en) * 2019-08-13 2025-01-07 Intel Corporation Hybrid glass core for wafer level and panel level packaging applications
KR20220089715A (ko) 2019-08-23 2022-06-28 앱솔릭스 인코포레이티드 패키징 기판 및 이를 포함하는 반도체 장치
US11659660B2 (en) * 2019-11-01 2023-05-23 Raytheon Company Oxide liner stress buffer
GB2590643B (en) * 2019-12-20 2022-08-03 Graphcore Ltd Method of manufacturing a computer device
US11503704B2 (en) * 2019-12-30 2022-11-15 General Electric Company Systems and methods for hybrid glass and organic packaging for radio frequency electronics
CN111244063B (zh) 2020-03-12 2023-03-21 奥特斯科技(重庆)有限公司 部件承载件及制造部件承载件的方法
US11398419B2 (en) * 2020-07-16 2022-07-26 Advanced Semiconductor Engineering, Inc. Wiring structure and method for manufacturing the same
US12557211B2 (en) * 2021-06-04 2026-02-17 Intel Corporation Package having thick glass core with high aspect ratio vias
US20220406617A1 (en) * 2021-06-16 2022-12-22 Intel Corporation Dual sided glass interconnect dual damascene vias
CN115513228B (zh) * 2021-06-23 2025-09-19 京东方科技集团股份有限公司 集成有无源器件的基板及其制备方法
US12525496B2 (en) * 2021-12-21 2026-01-13 Intel Corporation Glass vias and planes with reduced tapering
US20230207407A1 (en) * 2021-12-24 2023-06-29 Intel Corporation Plate-up hybrid structures using modified glass patterning processes
CN114430001B (zh) * 2022-01-10 2025-02-18 深圳Tcl新技术有限公司 玻璃基板加工方法及显示装置
US20230317621A1 (en) * 2022-03-29 2023-10-05 Intel Corporation Glass substrate package with hybrid bonded die
US20240071883A1 (en) * 2022-08-23 2024-02-29 Intel Corporation Self-alignment of glass core halves using protruded bumps
US20240153857A1 (en) * 2022-11-08 2024-05-09 Intel Corporation High aspect ratio tgv substrates through direct hybrid bonding of thin tgv substrates
US20240154514A1 (en) * 2022-11-09 2024-05-09 Intel Corporation Current equalization and reconfigurable double control loop for voltage regulators
WO2024124532A1 (zh) * 2022-12-16 2024-06-20 京东方科技集团股份有限公司 功能基板及其制备方法
US12199027B2 (en) * 2023-02-10 2025-01-14 Dyi-chung Hu Substrate and manufacturing method thereof
US12100632B2 (en) * 2023-02-10 2024-09-24 Dyi-chung Hu Glass core substrate and manufacturing method thereof
CN117038633B (zh) * 2023-10-08 2024-01-26 甬矽电子(宁波)股份有限公司 扇出型封装结构、封装产品和扇出型封装方法
KR20260007725A (ko) * 2024-07-08 2026-01-15 엘지이노텍 주식회사 회로 기판 및 이를 포함하는 반도체 패키지
CN119252813B (zh) * 2024-08-20 2025-10-03 深圳市紫光同创电子股份有限公司 封装结构以及芯片
CN119581429B (zh) * 2024-11-25 2025-10-03 上海人工智能创新中心 一种晶圆级集成结构及其制作方法

Family Cites Families (135)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3958317A (en) 1974-09-25 1976-05-25 Rockwell International Corporation Copper surface treatment for epoxy bonding
US4221047A (en) * 1979-03-23 1980-09-09 International Business Machines Corporation Multilayered glass-ceramic substrate for mounting of semiconductor device
US4379553A (en) * 1979-07-20 1983-04-12 General Electric Company Bowling lane with fire retardant decorative surface
US4327143A (en) * 1981-01-23 1982-04-27 Westinghouse Electric Corp. Moisture resistant laminates impregnated with an impregnating composition comprising epoxy resin and a dicyandiamide derivative
US4404060A (en) * 1981-05-08 1983-09-13 Siemens Aktiengesellschaft Method for producing insulating ring zones by galvanic and etch technologies at orifice areas of through-holes in a plate
US4664309A (en) * 1983-06-30 1987-05-12 Raychem Corporation Chip mounting device
US4622058A (en) 1984-06-22 1986-11-11 International Business Machines Corporation Formation of a multi-layer glass-metallized structure formed on and interconnected to multi-layered-metallized ceramic substrate
JPS61116881A (ja) 1984-11-12 1986-06-04 Nippon Soken Inc 電極の接続方法
US4639543A (en) * 1985-02-04 1987-01-27 Richard J. Birch Semiconductor devices having a metallic glass substrate
JPH0634452B2 (ja) 1985-08-05 1994-05-02 株式会社日立製作所 セラミツクス回路基板
US4828597A (en) * 1987-12-07 1989-05-09 General Electric Company Flexible glass fiber mat bonding method
JPH01247041A (ja) 1988-03-28 1989-10-02 Meiji Seika Kaisha Ltd 高圧ガス封入キャンデイーの製造方法
DE3830364C1 (enExample) 1988-09-07 1990-01-18 Schott Glaswerke, 6500 Mainz, De
DE68927499D1 (de) 1988-09-30 1997-01-09 Right Hemisphere Pty Ltd Fernsehprogramm-verteilungssystem
JP2598152B2 (ja) * 1990-04-28 1997-04-09 シャープ株式会社 タッチパネル
US5294238A (en) * 1991-03-27 1994-03-15 Semiconductor Energy Laboratory Co., Ltd. Glass substrate for a semiconductor device and method for making same
US5253319A (en) * 1992-02-24 1993-10-12 Corning Incorporated Planar optical waveguides with planar optical elements
JPH05267853A (ja) 1992-03-23 1993-10-15 Nec Toyama Ltd 多層プリント配線板の製造方法
US5466488A (en) * 1993-02-08 1995-11-14 Mitsubishi Materials Corporation Method of making glazed AlN substrate with an Al2 O3 -SiO2 interfacial layer
JPH06237081A (ja) 1993-02-10 1994-08-23 Matsushita Electric Ind Co Ltd 多層セラミック基板の製造方法
JP3102192B2 (ja) * 1993-03-18 2000-10-23 株式会社日立製作所 多層配線基板の製造方法
US5455385A (en) * 1993-06-28 1995-10-03 Harris Corporation Multilayer LTCC tub architecture for hermetically sealing semiconductor die, external electrical access for which is provided by way of sidewall recesses
US5585675A (en) * 1994-05-11 1996-12-17 Harris Corporation Semiconductor die packaging tub having angularly offset pad-to-pad via structure configured to allow three-dimensional stacking and electrical interconnections among multiple identical tubs
JP2595909B2 (ja) * 1994-09-14 1997-04-02 日本電気株式会社 半導体装置
US5705855A (en) * 1995-01-13 1998-01-06 Motorola, Inc. Integrated circuit for directly attaching to a glass substrate and method for manufacturing the same
JPH0917919A (ja) * 1995-06-29 1997-01-17 Fujitsu Ltd 半導体装置
US5917652A (en) * 1996-02-05 1999-06-29 Minnesota Mining And Manufacturing Company Durable retroreflective elements
TW322591B (enExample) * 1996-02-09 1997-12-11 Handotai Energy Kenkyusho Kk
JP2959480B2 (ja) * 1996-08-12 1999-10-06 日本電気株式会社 半導体装置及びその製造方法
US5981880A (en) * 1996-08-20 1999-11-09 International Business Machines Corporation Electronic device packages having glass free non conductive layers
WO1998016956A1 (en) * 1996-10-17 1998-04-23 Nokia Mobile Phones Limited Method for fabricating fbars on glass substrates
DE69735406T2 (de) 1996-10-25 2006-08-31 Canon K.K. Glasschaltungssubstrat und Verfahren zu dessen Herstellung
JP3395621B2 (ja) 1997-02-03 2003-04-14 イビデン株式会社 プリント配線板及びその製造方法
JP3961092B2 (ja) 1997-06-03 2007-08-15 株式会社東芝 複合配線基板、フレキシブル基板、半導体装置、および複合配線基板の製造方法
WO1999021707A1 (en) * 1997-10-24 1999-05-06 Agfa-Gevaert Naamloze Vennootschap A laminate comprising a thin borosilicate glass substrate as a constituting layer
WO1999045588A2 (en) * 1998-03-02 1999-09-10 Koninklijke Philips Electronics N.V. Semiconductor device comprising a glass supporting body onto which a substrate with semiconductor elements and a metallization is attached by means of an adhesive
US6154176A (en) * 1998-08-07 2000-11-28 Sarnoff Corporation Antennas formed using multilayer ceramic substrates
JP2000119047A (ja) 1998-10-08 2000-04-25 Nippon Sheet Glass Co Ltd 合わせガラス体とその製造方法
JP4221859B2 (ja) 1999-02-12 2009-02-12 株式会社デンソー 半導体装置の製造方法
US6539750B1 (en) * 1999-04-30 2003-04-01 Matsushita Electric Industrial Co., Ltd. Glass substrate forming mold and production method for glass substrate
JP3756041B2 (ja) * 1999-05-27 2006-03-15 Hoya株式会社 多層プリント配線板の製造方法
EP1744609B1 (en) * 1999-06-02 2012-12-12 Ibiden Co., Ltd. Multi-layer printed circuit board and method of manufacturing multi-layer printed circuit board
US6413620B1 (en) 1999-06-30 2002-07-02 Kyocera Corporation Ceramic wiring substrate and method of producing the same
JP2001053191A (ja) 1999-08-05 2001-02-23 Fujitsu Ltd 電極突起を導出した基板及びその製造方法
DE60045566D1 (de) * 1999-08-06 2011-03-03 Ibiden Co Ltd Mehrschicht-Leiterplatte
CN101232776B (zh) * 1999-09-02 2011-04-20 揖斐电株式会社 印刷布线板
CN100521868C (zh) * 1999-10-26 2009-07-29 伊比登株式会社 多层印刷配线板及多层印刷配线板的制造方法
TW512653B (en) * 1999-11-26 2002-12-01 Ibiden Co Ltd Multilayer circuit board and semiconductor device
EP1990833A3 (en) * 2000-02-25 2010-09-29 Ibiden Co., Ltd. Multilayer printed circuit board and multilayer printed circuit board manufacturing method
DE10019355A1 (de) * 2000-04-18 2001-10-31 Schott Glas Glaskörper mit erhöhter Festigkeit
JP2001307547A (ja) * 2000-04-25 2001-11-02 Murata Mfg Co Ltd 導電性組成物およびそれを用いた印刷回路板
JP3407716B2 (ja) 2000-06-08 2003-05-19 株式会社村田製作所 複合積層電子部品
JP2001354439A (ja) * 2000-06-12 2001-12-25 Matsushita Electric Ind Co Ltd ガラス基板の加工方法および高周波回路の製作方法
TWI242398B (en) 2000-06-14 2005-10-21 Matsushita Electric Industrial Co Ltd Printed circuit board and method of manufacturing the same
DE10034507C1 (de) * 2000-07-15 2002-02-21 Schott Glas Verfahren zum Erzeugen von Mikrostrukturen auf Glas- oder Kunststoffsubstraten nach der Heißformtechnologie und zugehöriges Formgebungswerkzeug
US6518514B2 (en) * 2000-08-21 2003-02-11 Matsushita Electric Industrial Co., Ltd. Circuit board and production of the same
JP4372330B2 (ja) 2000-10-30 2009-11-25 富士通株式会社 分布型光増幅装置、光通信用の局および光通信システム
US6577490B2 (en) * 2000-12-12 2003-06-10 Ngk Spark Plug Co., Ltd. Wiring board
JP2002290030A (ja) * 2001-03-23 2002-10-04 Ngk Spark Plug Co Ltd 配線基板
JP3905325B2 (ja) 2001-04-23 2007-04-18 富士通株式会社 多層プリント配線板
JP4092890B2 (ja) 2001-05-31 2008-05-28 株式会社日立製作所 マルチチップモジュール
JP2002366051A (ja) * 2001-06-08 2002-12-20 Sanyo Electric Co Ltd 集積回路チップ及びこれを用いた表示装置
JPWO2003007370A1 (ja) 2001-07-12 2004-11-04 株式会社日立製作所 配線ガラス基板およびその製造方法ならびに配線ガラス基板に用いられる導電性ペーストおよび半導体モジュールならびに配線基板および導体形成方法
WO2003024865A2 (de) * 2001-08-24 2003-03-27 Schott Glas Verfahren zur herstellung von mikro-elektromechanischen bauelementen
JP2003110238A (ja) 2001-09-28 2003-04-11 Murata Mfg Co Ltd ガラスセラミック多層基板の製造方法
JP4079699B2 (ja) 2001-09-28 2008-04-23 富士通株式会社 多層配線回路基板
TWI312166B (en) * 2001-09-28 2009-07-11 Toppan Printing Co Ltd Multi-layer circuit board, integrated circuit package, and manufacturing method for multi-layer circuit board
JP2003142804A (ja) 2001-10-31 2003-05-16 Kyocera Corp 回路基板
US6673698B1 (en) * 2002-01-19 2004-01-06 Megic Corporation Thin film semiconductor package utilizing a glass substrate with composite polymer/metal interconnect layers
DE10215654A1 (de) * 2002-04-09 2003-11-06 Infineon Technologies Ag Elektronisches Bauteil mit mindestens einem Halbleiterchip und Flip-Chip-Kontakten sowie Verfahren zu seiner Herstellung
US6657304B1 (en) * 2002-06-06 2003-12-02 Advanced Micro Devices, Inc. Conformal barrier liner in an integrated circuit interconnect
US7260890B2 (en) 2002-06-26 2007-08-28 Georgia Tech Research Corporation Methods for fabricating three-dimensional all organic interconnect structures
US7102367B2 (en) * 2002-07-23 2006-09-05 Fujitsu Limited Probe card and testing method of semiconductor chip, capacitor and manufacturing method thereof
JP4368798B2 (ja) 2002-08-30 2009-11-18 日東紡音響エンジニアリング株式会社 音源探査システム
EP1535315B1 (de) * 2002-09-06 2010-11-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Glasartiges flächensubstrat, seine verwendung und verfahren zu seiner herstellung
TW560698U (en) * 2002-09-09 2003-11-01 Via Tech Inc Structure of chip package
JP3822549B2 (ja) * 2002-09-26 2006-09-20 富士通株式会社 配線基板
TWI227050B (en) * 2002-10-11 2005-01-21 Sanyo Electric Co Semiconductor device and method for manufacturing the same
GB2420912B (en) * 2002-12-11 2006-07-26 Dainippon Printing Co Ltd Multilayer wiring board and manufacture method thereof
KR100919674B1 (ko) 2002-12-27 2009-10-06 주식회사 하이닉스반도체 반도체 소자의 제조 방법
CN100477891C (zh) * 2003-01-16 2009-04-08 富士通株式会社 多层布线基板及其制造方法、纤维强化树脂基板制造方法
TWI246780B (en) * 2003-03-10 2006-01-01 Toyoda Gosei Kk Solid-state component device and manufacturing method thereof
JP2005005488A (ja) 2003-06-12 2005-01-06 Dainippon Printing Co Ltd 半導体モジュールおよびそれらの製造方法
JP2005045150A (ja) * 2003-07-25 2005-02-17 Matsushita Electric Ind Co Ltd 中間接続用配線基材および多層配線基板、ならびにこれらの製造方法
US20080164057A1 (en) * 2003-07-30 2008-07-10 Hiroyuki Mori Printed Wiring Board And Method Of Manufacturing Same
WO2005027605A1 (ja) * 2003-09-09 2005-03-24 Hoya Corporation 両面配線ガラス基板の製造方法
JP2005144622A (ja) * 2003-11-18 2005-06-09 Seiko Epson Corp 構造体の製造方法、液滴吐出ヘッド、液滴吐出装置
JP3965695B2 (ja) * 2004-01-30 2007-08-29 船井電機株式会社 液晶表示装置
JP4387231B2 (ja) * 2004-03-31 2009-12-16 新光電気工業株式会社 キャパシタ実装配線基板及びその製造方法
US6976306B1 (en) * 2004-07-12 2005-12-20 Unitech Printed Circuit Board Corporation Modular method for manufacturing circuit board
JP4528062B2 (ja) 2004-08-25 2010-08-18 富士通株式会社 半導体装置およびその製造方法
US7339260B2 (en) * 2004-08-27 2008-03-04 Ngk Spark Plug Co., Ltd. Wiring board providing impedance matching
DE102004049233A1 (de) * 2004-10-09 2006-04-20 Schott Ag Verfahren zur Mikrostrukturierung von Substraten aus Flachglas
KR100701205B1 (ko) 2005-01-12 2007-03-29 박성호 적층재 접합방법 및 그 장치
KR100594327B1 (ko) 2005-03-24 2006-06-30 삼성전자주식회사 라운드 형태의 단면을 가지는 나노와이어를 구비한 반도체소자 및 그 제조 방법
JP4527585B2 (ja) 2005-03-30 2010-08-18 財団法人鉄道総合技術研究所 軸受監視システム、及び軸受監視プログラム
JP4534062B2 (ja) * 2005-04-19 2010-09-01 ルネサスエレクトロニクス株式会社 半導体装置
US7795134B2 (en) 2005-06-28 2010-09-14 Micron Technology, Inc. Conductive interconnect structures and formation methods using supercritical fluids
US7759582B2 (en) * 2005-07-07 2010-07-20 Ibiden Co., Ltd. Multilayer printed wiring board
US7834273B2 (en) * 2005-07-07 2010-11-16 Ibiden Co., Ltd. Multilayer printed wiring board
JP4072176B2 (ja) * 2005-08-29 2008-04-09 新光電気工業株式会社 多層配線基板の製造方法
US7164572B1 (en) * 2005-09-15 2007-01-16 Medtronic, Inc. Multi-path, mono-polar co-fired hermetic electrical feedthroughs and methods of fabrication therfor
US20070060970A1 (en) * 2005-09-15 2007-03-15 Burdon Jeremy W Miniaturized co-fired electrical interconnects for implantable medical devices
US20070090416A1 (en) 2005-09-28 2007-04-26 Doyle Brian S CMOS devices with a single work function gate electrode and method of fabrication
CN101371352B (zh) * 2006-02-14 2010-11-10 株式会社村田制作所 多层陶瓷电子部件和多层陶瓷基片以及多层陶瓷电子部件的制造方法
JP4904891B2 (ja) * 2006-03-31 2012-03-28 富士通株式会社 回路基板および電子装置、回路基板の製造方法
KR101037229B1 (ko) * 2006-04-27 2011-05-25 스미토모 베이클리트 컴퍼니 리미티드 반도체 장치 및 반도체 장치의 제조 방법
JP5003082B2 (ja) * 2006-09-26 2012-08-15 富士通株式会社 インターポーザ及びその製造方法
WO2008053833A1 (fr) * 2006-11-03 2008-05-08 Ibiden Co., Ltd. Tableau de câblage imprimé multicouche
US8592994B2 (en) * 2006-12-05 2013-11-26 Sumitomo Bakelite Co., Ltd. Semiconductor package, core layer material, buildup layer material, and sealing resin composition
US8093506B2 (en) * 2006-12-21 2012-01-10 Ngk Spark Plug Co., Ltd. Multilayer wiring board and power supply structure to be embedded in multilayer wiring board
JP4279869B2 (ja) * 2006-12-26 2009-06-17 Tdk株式会社 多層セラミックス基板
JP4265668B2 (ja) * 2007-03-08 2009-05-20 ソニー株式会社 回路基板の製造方法および回路基板
US20080217748A1 (en) * 2007-03-08 2008-09-11 International Business Machines Corporation Low cost and low coefficient of thermal expansion packaging structures and processes
TWI416673B (zh) * 2007-03-30 2013-11-21 住友電木股份有限公司 覆晶半導體封裝用之接續構造、增層材料、密封樹脂組成物及電路基板
JP2008283140A (ja) 2007-05-14 2008-11-20 Shinko Electric Ind Co Ltd 配線基板の製造方法及び配線基板
US8877565B2 (en) 2007-06-28 2014-11-04 Intel Corporation Method of forming a multilayer substrate core structure using sequential microvia laser drilling and substrate core structure formed according to the method
JP5080234B2 (ja) * 2007-12-19 2012-11-21 新光電気工業株式会社 配線基板およびその製造方法
US20090174069A1 (en) * 2008-01-04 2009-07-09 National Semiconductor Corporation I/o pad structure for enhancing solder joint reliability in integrated circuit devices
JP5138395B2 (ja) 2008-01-22 2013-02-06 新光電気工業株式会社 配線基板及びその製造方法
TW200933899A (en) 2008-01-29 2009-08-01 Sanyo Electric Co Mesa type semiconductor device and method for making the same
JP5207868B2 (ja) * 2008-02-08 2013-06-12 ルネサスエレクトロニクス株式会社 半導体装置
JP5176995B2 (ja) 2008-05-14 2013-04-03 凸版印刷株式会社 半導体パッケージ用多層基板の製造方法
JP5217639B2 (ja) * 2008-05-30 2013-06-19 富士通株式会社 コア基板およびプリント配線板
WO2009147936A1 (ja) 2008-06-02 2009-12-10 イビデン株式会社 多層プリント配線板の製造方法
JP5352146B2 (ja) * 2008-07-23 2013-11-27 ルネサスエレクトロニクス株式会社 半導体装置
US7749900B2 (en) * 2008-09-30 2010-07-06 Intel Corporation Method and core materials for semiconductor packaging
US20100164030A1 (en) * 2008-12-31 2010-07-01 International Business Machines Corporation Chip carrier bearing large silicon for high performance computing and related method
US8207453B2 (en) 2009-12-17 2012-06-26 Intel Corporation Glass core substrate for integrated circuit devices and methods of making the same
US9420707B2 (en) 2009-12-17 2016-08-16 Intel Corporation Substrate for integrated circuit devices including multi-layer glass core and methods of making the same
JP2011204765A (ja) 2010-03-24 2011-10-13 Toshiba Corp 半導体装置の製造方法及び半導体装置
WO2012061304A1 (en) * 2010-11-02 2012-05-10 Georgia Tech Research Corporation Ultra-thin interposer assemblies with through vias
US8674235B2 (en) 2011-06-06 2014-03-18 Intel Corporation Microelectronic substrate for alternate package functionality
WO2013133827A1 (en) 2012-03-07 2013-09-12 Intel Corporation Glass clad microelectronic substrate
US9001520B2 (en) 2012-09-24 2015-04-07 Intel Corporation Microelectronic structures having laminated or embedded glass routing structures for high density packaging

Also Published As

Publication number Publication date
US9420707B2 (en) 2016-08-16
TW201138033A (en) 2011-11-01
WO2011084216A3 (en) 2011-09-09
CN102656685A (zh) 2012-09-05
US9761514B2 (en) 2017-09-12
US20160322290A1 (en) 2016-11-03
WO2011084216A2 (en) 2011-07-14
TWI467717B (zh) 2015-01-01
GB2488265B (en) 2014-04-30
US20110147059A1 (en) 2011-06-23
DE112010004888T5 (de) 2012-10-18
GB2488265A (en) 2012-08-22
KR101466582B1 (ko) 2014-11-28
KR20120095420A (ko) 2012-08-28
CN102656685B (zh) 2016-08-17
GB201208343D0 (en) 2012-06-27
JP2013512583A (ja) 2013-04-11
CN105977234B (zh) 2020-03-06
CN105977234A (zh) 2016-09-28
DE112010004888B4 (de) 2019-02-07
JP2015043438A (ja) 2015-03-05

Similar Documents

Publication Publication Date Title
IN2012DN03251A (enExample)
IN2012DN03163A (enExample)
KR101044200B1 (ko) 리지드-플렉서블 회로기판 및 그 제조방법
WO2010104610A8 (en) Stacked microelectronic assembly with microelectronic elements having vias extending through bond pads
MY152730A (en) Multilayer circuit board, insulating sheet, and semiconductor package using multilayer circuit board
WO2009066504A1 (ja) 部品内蔵モジュール
WO2009057654A1 (ja) 部品内蔵配線板、部品内蔵配線板の製造方法
TW200721399A (en) Semiconductor device, stacked semiconductor device, and manufacturing method for semiconductor device
WO2010068515A3 (en) Electronic devices including flexible electrical circuits and related methods
TW200509368A (en) Circuit module and manufacturing method thereof
GB201213447D0 (en) Multilayer security wrap
WO2009048154A1 (ja) 半導体装置及びその設計方法
JP2010153505A5 (enExample)
MY147728A (en) Process for manufacturing circuit board
WO2011140141A3 (en) Printed circuit board with embossed hollow heatsink pad
TW200612440A (en) Polymer-matrix conductive film and method for fabricating the same
WO2012175207A3 (de) Elektronische baugruppe und verfahren zu deren herstellung
WO2011163333A3 (en) Sandwich structure for directional coupler
WO2011112409A3 (en) Wiring substrate with customization layers
WO2014162478A1 (ja) 部品内蔵基板及びその製造方法
TW200833211A (en) Circuit board structure with capacitor embedded therein and method for fabricating the same
WO2009075079A1 (ja) 回路板、回路板の製造方法およびカバーレイフィルム
CN104427740B (zh) 电路板及其制作方法
TW200701430A (en) Semiconductor device and manufacturing method therefor
WO2008111408A1 (ja) 多層配線基板及びその製造方法