WO2014038064A1 - 電力変換用スイッチング素子および電力変換装置 - Google Patents
電力変換用スイッチング素子および電力変換装置 Download PDFInfo
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- WO2014038064A1 WO2014038064A1 PCT/JP2012/072905 JP2012072905W WO2014038064A1 WO 2014038064 A1 WO2014038064 A1 WO 2014038064A1 JP 2012072905 W JP2012072905 W JP 2012072905W WO 2014038064 A1 WO2014038064 A1 WO 2014038064A1
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- H02M1/00—Details of apparatus for conversion
- H02M1/08—Circuits specially adapted for the generation of control voltages for semiconductor devices incorporated in static converters
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- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B70/00—Technologies for an efficient end-user side electric power management and consumption
- Y02B70/10—Technologies improving the efficiency by using switched-mode power supplies [SMPS], i.e. efficient power electronics conversion e.g. power factor correction or reduction of losses in power supplies or efficient standby modes
Definitions
- the present invention relates to a power conversion switching element and a power conversion device using the power conversion switching element.
- switching elements for power conversion such as IGBT (Insulated Gate Bipolar Transistor) have come to be widely applied from small power devices such as home air conditioners and microwave ovens to high power devices in railways and steelworks. It was. In order to promote the use of renewable new energy and energy saving, power conversion from direct current to alternating current or from alternating current to direct current is indispensable. It has become an important key component for realizing.
- IGBT Insulated Gate Bipolar Transistor
- Patent Document 1 a plurality of trench-type gates are arranged at equal intervals, and a control signal shifted in turn-off timing is supplied to adjacent trench-type gates, thereby impairing low conduction loss characteristics.
- An example of an IGBT capable of expanding the safe operation area at the time of turn-off without disclosing the above is disclosed.
- Patent Document 2 a plurality of trench-type gates are alternately arranged at two different intervals, and a channel layer is formed on the upper part of the semiconductor layer sandwiched between the two gates having a smaller gate interval. (Base region) and emitter region are formed, and a floating layer not connected to the emitter electrode is formed in the semiconductor layer sandwiched between the two gates having the wider gate interval without causing a reduction in short-circuit resistance and breakdown voltage.
- An example of an IGBT capable of reducing conduction loss, that is, on-voltage, is disclosed.
- the IGBT having the structure disclosed in Patent Document 2 has a large turn-off loss, and at the time of turn-on, the time change rate dv / of the output voltage of the IGBT or the diode of the opposite arm is large. It has been found that there is a problem that the controllability of dt is lowered.
- Patent Document 3 the problem that the controllability of the time change rate (dv / dt) of the output voltage at turn-on is reduced is described in Patent Document 3 as follows. .
- the collector current determined by the product of the transconductance (gm) of the MOS (Metal-Oxide-Semiconductor) FET (Field-Effect-Transistor) structure and the time change rate (dvge / dt) of the gate-emitter voltage (vge).
- the time change rate (dic / dt) increases and the switching speed is accelerated.
- the amount of holes that flow transiently into the floating layer is mainly determined by the internal structure of the semiconductor, so it is difficult to control with the external gate resistance. Accordingly, the accelerated dic / dt cannot be controlled by the external gate resistance, and as a result, a period in which the time change rate dv / dt of the voltage of the IGBT and the diode of the arm is not controllable by the gate resistance occurs.
- Patent Document 3 proposes an IGBT having a structure in which parasitic capacitance is unlikely to occur by increasing the thickness of an insulating film between a drift layer or a floating layer and a gate electrode. If the parasitic capacitance between the gate electrode and the gate electrode is small, the feedback capacitance is also small, so that the controllability of the time change rate (dv / dt) of the output voltage at turn-on is improved.
- an object of the present invention is to reduce the loss at the time of turn-off and to improve the controllability of the time change rate (dv / dt) of the output voltage at the time of turn-on. It is providing the switching element for conversion, and a power converter device.
- a switching element for power conversion according to the present invention includes a first conductive type semiconductor layer formed on a semiconductor substrate, and a first conductive type semiconductor layer formed on the first surface side of the semiconductor substrate in contact with the first conductive type semiconductor layer.
- a part of the surface of the channel layer sandwiched between the second gate electrodes is in contact with each of the first gate electrode and the second gate electrode through the gate insulating film.
- the first conductivity type emitter region formed in this manner the emitter electrode to which the first conductivity type emitter region and the second conductivity type channel layer are electrically connected, and the gate electrode set different from each other. And is in contact with the second conductive type floating layer which is the channel layer sandwiched between two gate electrodes adjacent to each other and insulated from the emitter electrode, and the first conductive type semiconductor layer, A second conductive type collector layer formed on the second surface side; and a collector electrode electrically connected to the second conductive type collector layer, the first gate electrode belonging to the same set And the second gate electrode is a, the distance between two adjacent gate electrodes belonging to different groups is b, and each gate electrode satisfies b> a With placing, for each of said first gate electrode and the second gate electrode, and supplying the first drive signal and second drive signal with a time difference to a drive timing.
- the switching element for power conversion and power converter device which can improve the controllability of the time change rate (dv / dt) of the output voltage at the time of turn-on are provided. Is done.
- FIG. 1 It is the figure which showed the 2nd example of the drive sequence of the drive signal which drives a 1st gate electrode (G1) and a 2nd gate electrode (G2), respectively, when turning off the switching element for power conversion. It is the figure which showed the 2nd example of the drive sequence of the drive signal which each drives a 1st gate electrode (G1) and a 2nd gate electrode (G2), when turning on the switching element for power conversion. It is the figure which showed the example of the output characteristic of the switching element for power conversion. It is the figure which showed the example of the effect of embodiment of this invention. It is the figure which showed the example of another effect of embodiment of this invention.
- FIGS. 6 is a diagram showing an example of a block configuration of a drive circuit that realizes a drive sequence of drive signals shown in FIGS. It is the figure which showed the 1st modification of the structure of the switching element for power conversion which concerns on the 1st Embodiment of this invention. It is the figure which showed the 2nd modification of the structure of the switching element for power conversion which concerns on the 1st Embodiment of this invention. It is the figure which showed the 3rd modification of the structure of the switching element for power conversion which concerns on the 1st Embodiment of this invention, (a) is an example of sectional drawing, (b) is an example of planar arrangement
- FIG. 6 is a diagram showing an example of a circuit configuration of a power conversion device to which the power conversion switching elements according to the first to sixth embodiments of the present invention are applied.
- FIG. 1 is a diagram schematically showing an example of the structure of the switching element 100 for power conversion according to the first embodiment of the present invention, where (a) is an example of a cross-sectional view thereof, and (b) is It is an example of a planar layout.
- the cross-sectional view shown in FIG. 1A is a cross-sectional view corresponding to the one-dot chain line AA ′ portion in the plan layout of FIG.
- the power conversion switching element 100 can be referred to as an IGBT having two independent control gates, and is spaced by an interval a on the surface side of an n ⁇ type semiconductor substrate 1 such as silicon.
- a set of trench-type first gate electrode 6 (G1) and second gate electrode 13 (G2) arranged adjacent to each other has a structure in which the pair is repeatedly arranged at an interval b.
- the first gate electrode 6 (G1) and the second gate electrode 13 (G2) are connected to the p-type channel layer 2 or the p-type floating layer 15 on the surface side of the n ⁇ -type semiconductor substrate 1, for example.
- a p-type semiconductor layer is formed, a trench deeper than the p-type semiconductor layer is formed in the p-type semiconductor layer, a gate insulating film 5 is formed on the inner wall of the trench, and the gate insulating film 5 This is formed by embedding conductive polysilicon or the like in the trench in which is formed.
- a p-type channel layer is provided between the first gate electrode 6 (G1) and the second gate electrode 13 (G2). 2 and p-type floating layers 15 are alternately formed.
- a mold emitter region 3 (also referred to as a source region) is formed.
- a p-type emitter region 12 is formed in a part of the surface portion of the p-type channel layer 2 where the n-type emitter region 3 is not formed.
- An interlayer insulating film 16 is formed on the top (outside) of the gate electrodes 6 and 13, the n-type emitter region 3, the p-type emitter region 12, and the p-type floating layer 15.
- An emitter electrode 7 made of such a metal is formed.
- an opening is formed in the interlayer insulating film 16 above the n-type emitter region 3 and the p-type emitter region 12, and the n-type emitter region 3 and the p-type emitter region 12 are in contact with the emitter electrode 7.
- the p-type floating layer 15 is insulated from the emitter electrode 7 by the interlayer insulating film 16.
- the distance a is smaller than the distance b between the first gate electrode 6 (G1) and the second gate electrode 13 (G2) across the region where the p-type floating layer 15 is formed. That is, it is assumed that the interval a ⁇ the interval b. Note that, when the distance a ⁇ the distance b, effects such as improvement in high-speed switching performance, short-circuit withstand capability, and reduction of on-voltage can be obtained (see Patent Document 2).
- a p-type collector layer 4 is formed on the back side of the n ⁇ -type semiconductor substrate 1, and a collector electrode 8 made of a conductive metal or the like is formed in contact with the p-type collector layer 4. Has been.
- the n ⁇ -type semiconductor substrate 1 except for the p-type channel layer 2, the n-type emitter region 3, the p-type emitter region 12 and the p-type collector layer 4 is n ⁇ type.
- the type semiconductor substrate 1 itself is usually called an n ⁇ type drift layer 1d.
- the first gate electrode 6 (G1) and the second gate electrode 13 (G2) are respectively formed with a first metal wiring 40 and a second gate electrode formed thereon.
- the metal wiring 41 is connected.
- the first metal wiring 40 and the second metal wiring 41 are independent wirings insulated from each other, and are connected to a first gate terminal and a second gate terminal (not shown), respectively.
- the gate layers constituting the first gate electrode 6 (G1) and the second gate electrode 13 (G2) and the metal wiring layers constituting the first metal wiring 40 and the second metal wiring 41 are as follows: They are electrically connected by contact holes 42 formed in the interlayer insulating film 16.
- the switching element 100 for power conversion according to the first embodiment of the present invention has the first gate electrode 6 that can be driven independently from the outside via the first gate terminal and the second gate terminal. (G1) and the second gate electrode 13 (G2).
- FIG. 2 is a diagram showing an example of a drive sequence of drive signals for driving the first gate electrode 6 (G1) and the second gate electrode 13 (G2) when the power conversion switching element 100 is turned off. is there.
- a voltage higher than the threshold voltage Vth is already applied to both the first gate electrode 6 (G1) and the second gate electrode 13 (G2), and the switching state of the power conversion switching element 100 is changed. Assume that it is in the “on” state.
- the threshold voltage Vth referred to here is an n-type emitter region in the p-type channel layer 2 when a voltage is applied to the first gate electrode 6 (G1) or the second gate electrode 13 (G2). This is the lowest voltage at which a conduction path (channel) connecting 3 and the n ⁇ -type drift layer 1d is formed.
- the drive signal for the first gate electrode 6 (G1) is changed from a state higher than the threshold voltage Vth to a lower state. Change (turn off).
- the drive signal for the second gate electrode 13 (G2) is changed from a state higher than the threshold voltage Vth to a lower state, preceding the turn-off timing by a predetermined time (for example, 3 ⁇ s). (Turn off).
- the turn-off timing is shifted by a predetermined time (for example, 3 ⁇ sec), The effect that the turn-off loss of the switching element 100 for power conversion is reduced is obtained.
- a predetermined time for example, 3 ⁇ sec
- the voltage of the drive signal of the first gate electrode 6 (G1) is higher than the threshold voltage Vth
- the voltage of the drive signal of the second gate electrode 13 (G2) is higher than the threshold voltage Vth.
- the first gate electrode 6 (G1) In such a state, if the voltage of the drive signal of the first gate electrode 6 (G1) is changed from a state higher than the threshold voltage Vth to a state lower (turned off), the first gate The channel formed on the electrode 6 (G1) side also disappears, and no electrons are injected into the n ⁇ -type drift layer 1d through the channel. As a result, the switching state of the power conversion switching element 100 is in the “off” state. That is, the power conversion switching element 100 is turned off.
- the time difference t d of the timing that each turn of the driving signal of the driving signal of the first gate electrode 6 (G1) and the second gate electrode 13 (G2) becomes longer, a period in which on-voltage is increased longer Therefore, conduction loss increases.
- the time difference t d is desirably 3 ⁇ s or more.
- FIG. 3 is a diagram showing an example of a drive sequence of drive signals for driving the first gate electrode 6 (G1) and the second gate electrode 13 (G2) when the power conversion switching element 100 is turned on. is there.
- a voltage lower than the threshold voltage Vth is already applied to both the first gate electrode 6 (G1) and the second gate electrode 13 (G2), and the switching state of the power conversion switching element 100 is changed. Assume that it is in the “off” state.
- the drive signal for the first gate electrode 6 (G1) is changed from a state lower than the threshold voltage Vth to a higher state. Change (turn on).
- the drive signal of the second gate electrode 13 (G2) is changed from a state lower than the threshold voltage Vth to a higher state after a predetermined time (for example, 3 ⁇ s) from the turn-on timing. (Turn on).
- the turn-on timing is shifted by a predetermined time (for example, 3 ⁇ sec),
- a predetermined time for example, 3 ⁇ sec
- the second gate electrode 13 (G2) Since the voltage of the drive signal is still lower than the threshold voltage Vth, the n-type emitter region 3 and the n ⁇ -type drift layer 1d are connected to the second gate electrode 13 (G2) side. A channel is not formed. Therefore, the injection of electrons into the n ⁇ -type drift layer 1d is performed only through the channel formed on the first gate electrode 6 (G1) side, and therefore the rate of change of collector current with time dic / dt Does not become too large, and the switching speed is suppressed. As a result, the controllability of the time change rate dv / dt of the output voltage of the power conversion switching element 100 is improved.
- the time difference t d is preferably not less than 3 [mu] s.
- the drive signal of the second gate electrode 13 (G2) is turned off prior to the turn-off timing of the drive signal of the first gate electrode 6 (G1). The reverse may be possible.
- the drive signal of the second gate electrode 13 (G2) is turned on after being delayed from the turn-on timing of the drive signal of the first gate electrode 6 (G1). May be reversed.
- FIG. 4 shows a second example of a drive sequence of drive signals for driving the first gate electrode 6 (G1) and the second gate electrode 13 (G2) when the power conversion switching element 100 is turned off. It is a figure.
- the difference between this drive sequence and the drive sequence shown in FIG. 2 is that the voltage when the gate of the drive signal of the second gate electrode 13 (G2) is turned off is set to a negative voltage ( ⁇ Vcc).
- the switching element 100 for power conversion is turned off, if the voltage for turning off the drive signal of the second gate electrode 13 (G2) is a negative voltage ( ⁇ Vcc), the second gate electrode 13 (G2 A p-type accumulation layer is formed in the p-type floating layer 15 in contact with the first via the gate insulating film 5. As a result, hole discharge at the time of turn-off is promoted, and turn-off loss is reduced.
- FIG. 5 shows a second example of a drive sequence of drive signals for driving the first gate electrode 6 (G1) and the second gate electrode 13 (G2) when the power conversion switching element 100 is turned on. It is a figure.
- the driving sequence is different from the driving sequence shown in FIG. 3 in that the voltage when the gate of the driving signal of the second gate electrode 13 (G2) is turned off is set to the ground potential (Gnd).
- the second gate electrode 13 A channel connecting the p-type channel layer 2 and the p-type floating layer 15 is formed in the n ⁇ -type drift layer 1 d in contact with G2) via the gate insulating film 5.
- the potential of the p-type channel layer 2 also fluctuates due to the potential fluctuation of the p-type floating layer 15 at the time of turn-on, and the controllability of the output voltage temporal change rate dv / dt deteriorates. Therefore, in the example shown in FIG. 5, the voltage when the gate of the drive signal of the second gate electrode 13 (G2) is turned off is assumed to be the ground potential (Gnd).
- the ground potential (Gnd) is assumed to be the same as the potential of the emitter electrode 7.
- FIG. 6 is a diagram illustrating an example of output characteristics of the power conversion switching element 100.
- the voltage Vg1 of the first gate electrode 6 (G1) is fixed to + 15V
- the voltage Vg2 of the second gate electrode 13 (G2) is changed in three ways: + 15V, 0V, and ⁇ 15V.
- the output characteristics are shown.
- the voltage Vg2 of the second gate electrode 13 (G2) is + 15V
- the on-voltage is minimum
- the voltage Vg2 is ⁇ 15V
- the on-voltage is maximum.
- the on-voltage is lowered, and at the time of turn-off, the second gate is turned on.
- the on-voltage is increased by setting the voltage Vg2 of the electrode 13 (G2) to ⁇ 15V.
- the turn-off loss is reduced.
- by dynamically controlling the voltage Vg2 of the second gate electrode 13 (G2) on the time axis it is possible to obtain an effect of reducing the on-voltage and reducing the turn-off loss.
- FIG. 7 is a diagram showing an example of the effect of the embodiment of the present invention.
- the trade-off curve between the on-voltage and the turn-off loss shown in FIG. 7 is a trade-off curve of the comparative example.
- the comparative example here refers to driving the first gate electrode 6 (G1) and the second gate electrode 13 (G2) of the switching element 100 for power conversion shown in FIG. 1 with drive signals of the same timing. This is the case.
- the first gate electrode 6 (G1) and the second gate electrode 13 (G2) of the switching element 100 for power conversion shown in FIG. 1 are driven by the drive signal shown in FIG. This is the case.
- the values of the on-voltage and turn-off loss at each point represented by black square marks are obtained when the impurity concentration of the p-type collector layer 4 is changed as a parameter. It represents the on-voltage and turn-off loss values.
- the trade-off curve of this comparative example when the impurity concentration of the p-type collector layer 4 is increased, the on-voltage is decreased, but the turn-off loss is increased, and when the impurity concentration of the p-type collector layer 4 is decreased, The on-voltage increases, but the turn-off loss decreases. Therefore, it can be seen from the trade-off curve of this comparative example that the on-voltage is low and the turn-off loss cannot be reduced only by changing the impurity concentration of the p-type collector layer 4.
- the turn-off loss is represented by the black triangle mark. Is improved to the position indicated by. That is, in the present embodiment, it can be seen that in the power conversion switching element 100, the on-voltage can be lowered and the turn-on loss can be reduced.
- the drive signals for the first gate electrode 6 (G1) and the second gate electrode 13 (G2) of the power conversion switching element 100 shown in FIG. It can be said that by controlling the drive by shifting, the trade-off between the on-voltage and the turn-off loss can be significantly improved as compared with the comparative example.
- FIG. 8 is a diagram showing an example of another effect of the embodiment of the present invention.
- the meanings of the comparative example and this embodiment shown in FIG. 8 are the same as in FIG.
- FIG. 8 is different from FIG. 7 and shows two trade-off curves of on-state voltage and turn-off loss for the comparative example.
- the trade-off curve drawn with a solid line including black square marks indicates the first gate electrode 6 (G1) and the second gate electrode 13 (G2) in the switching element 100 for power conversion shown in FIG. Is a trade-off curve when the distance a is 3 ⁇ m.
- the trade-off curve drawn by a broken line including white square marks indicates the first gate electrode 6 (G1) and the second gate electrode 13 (G2) in the power conversion switching element 100 shown in FIG. Is a trade-off curve when the distance a is 1 ⁇ m.
- the respective on-voltage and turn-off loss are as shown in FIG. Move from the point represented by the black triangle mark to the point represented by the white triangle mark. That is, by reducing the distance a between the first gate electrode 6 (G1) and the second gate electrode 13 (G2), the on-voltage is reduced and the turn-off loss is increased. However, the increase in turn-off loss is much smaller than in the comparative example.
- the interval a is set to 1 ⁇ m or less.
- FIG. 9 is a diagram showing an example of a block configuration of a drive circuit that realizes the drive signal drive sequence shown in FIGS.
- the power conversion switching element 100 driven by two different drive signals as shown in FIGS. 2 to 5 is represented by an IGBT 31 and a variable resistor 32.
- the variable resistor 32 is a circuit representation of controlling the physical quantity of the accumulated amount of holes in the n ⁇ -type drift layer 1 d by the second gate electrode 13.
- the gate drive circuit 37 generates two drive signals with shifted timings as shown in FIGS. 2 to 5 based on the control signal output from the microcomputer 36.
- buffer circuits 33 and 34 for receiving one of the drive signals output from the control circuit 35 and generating the first drive signal 38 and the second drive signal 39 for driving the switching element 30, respectively. Is done.
- the drive signal 38 output from the buffer circuit 33 is input to the gate terminal of the IGBT 31, and the drive signal 39 output from the buffer circuit 33 is input to the gate terminal of the IGBT 31 and the resistance control terminal of the variable resistor 32. Is done. Note that physically, the drive signal 38 is connected to the first gate electrode 6 (G1), and the drive signal 39 is connected to the second gate electrode 13 (G2).
- FIG. 10 is a diagram showing a first modification of the structure of the switching element for power conversion according to the first embodiment of the present invention.
- the switching element 100 for power conversion shown in FIG. 1 two independent gates are used to input drive signals for driving the first gate electrode 6 (G1) and the second gate electrode 13 (G2).
- a terminal (not shown in FIG. 1) is required.
- the resistor 20 can be realized by being embedded in a semiconductor device called the power conversion switching element 101, so that the gate drive circuit 37 provided outside can be simplified. Therefore, the cost of a power conversion device such as an inverter using the power conversion switching element 101 can be reduced.
- FIG. 11 is a view showing a second modification of the structure of the switching element for power conversion according to the first embodiment of the present invention.
- the power conversion switching element 102 according to the second modification two independent gate terminals are combined into one, as in the first modification. Then, a drive signal for driving the second gate electrode 13 (G2) is input from the gate terminal combined into one, and a drive signal obtained by delaying the drive signal by the resistor 20 and the capacitor 21 is the first. Input to the gate electrode 6 (G1).
- the mechanism for driving the first gate electrode 6 (G1) and the second gate electrode 13 (G2) in the power conversion switching element 102 is the same as that in the first modification.
- the capacitor 21 can also be realized by being embedded in a semiconductor device called a power conversion switching element 102. Therefore, the power conversion switching element 102 according to the second modification can achieve the same effect as the power conversion switching element 101 according to the first modification.
- FIG. 12A and 12B are diagrams showing a third modification of the structure of the power conversion switching device according to the first embodiment of the present invention, in which FIG. 12A is an example of a cross-sectional view, and FIG. It is an example of a layout drawing.
- the cross-sectional view shown in FIG. 12A is a cross-sectional view corresponding to the one-dot chain line A-A ′ portion in the plan layout view of FIG.
- the power conversion switching element 103 shown in FIG. 12 is different from the power conversion switching element 100 shown in FIG. 1 in that the first gate electrode 6 (G1) and the second gate electrode 13 (G2) are different. There is a way to repeat the set. That is, in the power conversion switching element 100 of FIG. 1, the set of the first gate electrode 6 (G1) and the second gate electrode 13 (G2) is (G1-G2)-(G1-G2)- -It is arranged repeatedly while being translated. On the other hand, in the power conversion switching element 103 of FIG. 12, the set of the first gate electrode 6 (G1) and the second gate electrode 13 (G2) is (G1-G2)-(G2-G1)- ⁇ They are arranged repeatedly while their positions are reversed.
- the power conversion switching element 103 even if the pair of the first gate electrode 6 (G1) and the second gate electrode 13 (G2) is repeatedly arranged with their positions reversed with respect to each other, these When the first gate electrode 6 (G1) and the second gate electrode 13 (G2) are driven by the drive signals shown in FIGS. 2 to 5, the power conversion switching element 100 shown in FIG. It is clear from the above description that the same effect can be obtained.
- first gate electrode 6 or second gate electrode 13 are adjacent to each other through the p-type floating layer 15 side. Therefore, as shown in FIG. 12B, adjacent first gate electrodes 6 or second gate electrodes 13 are connected in a region where the gate electrodes 6 and 13 are connected to the upper metal wirings 40 and 41. be able to. Accordingly, since the area of each gate electrode region in the region connecting the gate electrodes 6 and 13 and the metal wirings 40 and 41 can be increased, the gate electrode regions include the gate electrodes 6 and 13 and the metal wires. More contact holes 42 for connecting the wirings 40 and 41 can be provided. Therefore, the contact resistance and the resistance of the gate electrode region can be reduced.
- FIG. 13 is a diagram schematically showing an example of the structure of the power conversion switching element 110 according to the second embodiment of the present invention.
- the structure of the power conversion switching element 110 according to the second embodiment is almost the same as the structure of the power conversion switching element 100 according to the first embodiment shown in FIG.
- the power conversion switching device 110 according to the second embodiment is different in that an n-type buffer layer 14 is provided at the interface between the p-type collector layer 4 and the n ⁇ -type drift layer 1d.
- the n-type buffer layer 14 is directed from the interface between the p-type channel layer 2 and the p-type floating layer 15 and the n ⁇ -type drift layer 1 d to the n ⁇ -type drift layer 1 d in a state where the power conversion switching element 110 is turned off. This serves to prevent the depletion layer extending in this way from reaching the p-type collector layer 4.
- the impurity concentration of the n-type buffer layer 14 is higher than that of the n ⁇ -type drift layer 1d.
- the first gate electrode 6 (G1) and the second gate electrode 13 (G2) are shifted in time using the drive signals shown in FIGS. To drive. Therefore, also in this case, the same effect as that of the first embodiment can be obtained. That is, the turn-off loss is reduced also in the power conversion switching device 110, and the controllability of the time change rate dv / dt of the output voltage is improved.
- FIG. 14 is a diagram schematically showing an example of the structure of the power conversion switching element 120 according to the third embodiment of the present invention.
- the structure of the power conversion switching element 120 according to the third embodiment is almost the same as the structure of the power conversion switching element 100 according to the first embodiment shown in FIG.
- the power conversion switching device 120 according to the third embodiment is different in that an n-type hole barrier layer 10 is provided at the interface between the p-type channel layer 2 and the n ⁇ -type drift layer 1d.
- the n-type hole barrier layer 10 plays a role of blocking holes injected from the p-type collector layer 4 and reducing the resistance of the n ⁇ -type drift layer 1d.
- the first gate electrode 6 (G1) and the second gate electrode 13 (G2) are shifted in time by using the drive signals shown in FIGS. To drive. Therefore, also in this case, the same effect as that of the first embodiment can be obtained. That is, the power conversion switching element 140 also reduces the turn-off loss and improves the controllability of the time rate of change dv / dt of the output voltage.
- FIG. 15 is a diagram schematically showing an example of the structure of the power conversion switching element 130 according to the fourth embodiment of the present invention.
- the structure of the power conversion switching element 130 according to the fourth embodiment is almost the same as the structure of the power conversion switching element 100 according to the first embodiment shown in FIG.
- the power conversion switching element 130 according to the third embodiment is different in that the p-type floating layer 15 provided in the power conversion switching element 100 according to the first embodiment is not provided.
- the first gate electrode 6 (G1) and the second gate electrode 13 (G2) are shifted in time using the drive signals shown in FIGS. To drive.
- the turn-off loss is reduced, and the controllability of the time change rate dv / dt of the output voltage is improved.
- the reason why the controllability of the time change rate dv / dt of the output voltage is improved is that the voltage below the threshold value is applied to the second gate electrode 13 (G2) at the time of turn-on so that the time change rate of the collector current is increased. This is because dic / dt is lowered and the switching speed is suppressed.
- FIG. 16 is a diagram schematically showing an example of the structure of the power conversion switching element 140 according to the fifth embodiment of the present invention.
- the trench-type first gate electrode 6 (G1) and the second gate electrode 6 (G1) are formed on the surface side of the n ⁇ -type semiconductor substrate 1.
- Gate electrodes 13 (G2) are arranged at substantially equal intervals.
- the n ⁇ type semiconductor substrate 1 between the trench type first gate electrode 6 (G1) and the second gate electrode 13 (G2) includes a p type collector layer 4, an n type emitter region 3 and A p-type emitter region 12 is formed, and the n-type emitter region 3 and the p-type emitter region 12 are connected to an emitter electrode 7 provided on the upper surface side thereof.
- no layer or region corresponding to the p-type floating layer 15 in the power conversion switching device 100 according to the first embodiment is provided.
- a p-type collector layer 4 is formed on the n ⁇ -type semiconductor substrate 1 on the back side of the power conversion switching element 140, and the p-type collector layer 4 is connected to the collector electrode 8.
- the first gate electrode 6 (G1) and the second gate electrode 13 (G2) are shifted in time by using the drive signals shown in FIGS. To drive.
- the turn-off loss is reduced, and the controllability of the time change rate dv / dt of the output voltage is improved.
- the reason why the controllability of the time rate of change dv / dt of the output voltage is improved is the same as in the case of the fourth embodiment. This is because when applied, the rate of change of collector current with time dic / dt is reduced, and the switching speed is suppressed.
- FIG. 17 is a diagram schematically showing an example of the structure of the power conversion switching element 150 according to the sixth embodiment of the present invention.
- the planar first gate electrode 6 (G1) and the second gate electrode 6 are formed on the surface of the n ⁇ type semiconductor substrate 1.
- Gate electrodes 13 (G2) are arranged at substantially equal intervals.
- the n ⁇ type semiconductor substrate 1 between the trench type first gate electrode 6 (G1) and the second gate electrode 13 (G2) includes a p type collector layer 4, an n type emitter region 3 and A p-type emitter region 12 is formed, and the n-type emitter region 3 and the p-type emitter region 12 are connected to an emitter electrode 7 provided on the upper surface side thereof.
- a p-type collector layer 4 is formed on the n ⁇ -type semiconductor substrate 1 on the back side of the power conversion switching element 140, and the p-type collector layer 4 is connected to the collector electrode 8.
- the first gate electrode 6 (G1) and the second gate electrode 13 (G2) are shifted in time using the drive signals shown in FIGS. To drive.
- the turn-off loss is reduced, and the controllability of the time change rate dv / dt of the output voltage is improved.
- the reason why the controllability of the time rate of change dv / dt of the output voltage is improved is the same as in the case of the fourth embodiment. This is because when applied, the rate of change of collector current with time dic / dt is reduced, and the switching speed is suppressed.
- FIG. 18 is a diagram illustrating an example of a circuit configuration of a power conversion apparatus 1000 to which the power conversion switching elements 100, 110, 120, 130, 140, and 150 according to the first to sixth embodiments of the present invention are applied. is there.
- a power conversion device 1000 is generally called an inverter device.
- the power conversion device 1000 converts electric energy from a DC power source 960 into an AC current having a desired frequency, and uses the motor 950 for variable speed control. It is used.
- the positive electrode of the DC power supply 960 is connected to the P terminal 900 of the power converter 1000, and the negative electrode is connected to the N terminal 901.
- a three-phase alternating current is output from the U terminal 910, the V terminal 911, and the W terminal 912 and connected to the motor 950.
- the power conversion switching element 700 mentioned here refers to any one of the power conversion switching elements 100, 110, 120, 130, 140, 150 according to the first to sixth embodiments.
- each collector electrode 8 is connected to the P terminal 900, and the emitter electrode 7 is connected to the U terminal 910, the V terminal 911, and the W terminal 912. Further, in the so-called lower arm side power conversion switching element 700, each emitter electrode 7 is connected to the N terminal 901, and the collector electrode 8 is connected to the U terminal 910, the V terminal 911, and the W terminal 912.
- each gate drive circuit 800 by controlling the ON / OFF timing phase of each power conversion switching element 700 by each gate drive circuit 800, the U terminal 910, the V terminal 911, and the W terminal 912 can control the three phases. AC current is output.
- the gate drive circuit 800 here corresponds to the gate drive circuit 37 shown in FIG.
- a flywheel diode 600 is connected in antiparallel to each power conversion switching element 700.
- the flywheel diode 600 causes the current flowing through the power conversion switching element 700 to be in antiparallel with the power conversion switching element 700 on the lower arm side.
- the energy stored in the coil of the motor 950 is released by commutating the flywheel diode 600 connected to. The same applies to the case where the lower arm side power conversion switching element 700 is turned off.
- a conduction loss occurs when each power conversion switching element 700 is conductive, and a switching loss occurs when the power conversion switching element 700 is turned on / off.
- the power conversion switching is performed. Since the power conversion switching elements 100, 110, 120, 130, 140, 150 described in the first to sixth embodiments are used as the element 700, the conduction loss and the switching loss as the power conversion apparatus 1000 are reduced.
- the configuration of the power conversion apparatus 1000 shown in FIG. 18 is an example, and may be a device that outputs a two-phase alternating current, or a device that converts alternating current into direct current. The same effect as this embodiment can be obtained.
- the n-channel MOSFET is used for the gate portion of the power conversion switching elements 100, 110, 120, 130, 140, and 150.
- a p-channel MOSFET may be used.
- the present invention is not limited to the embodiment described above, and includes various modifications.
- the above embodiment has been described in detail for easy understanding of the present invention, and is not necessarily limited to the one having all the configurations described.
- a part of the configuration of an embodiment can be replaced with a part of the configuration of another embodiment, and further, a part or all of the configuration of the other embodiment is added to the configuration of the certain embodiment. Is also possible.
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Abstract
Description
図1は、本発明の第1の実施形態に係る電力変換用スイッチング素子100の構造の例を模式的に示した図であり、(a)は、その断面図の例、(b)は、平面配置図の例である。なお、図1(a)に示した断面図は、図1(b)の平面配置図における一点鎖線A-A’部分に対応する断面図である。
なお、ここでいう比較例とは、図1に示した電力変換用スイッチング素子100の第1のゲート電極6(G1)および第2のゲート電極13(G2)を、同じタイミングの駆動信号で駆動した場合をいう。また、本実施形態とは、図1に示した電力変換用スイッチング素子100の第1のゲート電極6(G1)および第2のゲート電極13(G2)を、図2で示した駆動信号で駆動した場合をいう。
また、コンデンサ21も抵抗20と同様に電力変換用スイッチング素子102という半導体装置の中に埋め込んで実現することができる。従って、第2の変形例に係る電力変換用スイッチング素子102でも、第1の変形例に係る電力変換用スイッチング素子101と同様の効果を得ることができる。
図13は、本発明の第2の実施形態に係る電力変換用スイッチング素子110の構造の例を模式的に示した図である。
図14は、本発明の第3の実施形態に係る電力変換用スイッチング素子120の構造の例を模式的に示した図である。
図15は、本発明の第4の実施形態に係る電力変換用スイッチング素子130の構造の例を模式的に示した図である。
図16は、本発明の第5の実施形態に係る電力変換用スイッチング素子140の構造の例を模式的に示した図である。
図17は、本発明の第6の実施形態に係る電力変換用スイッチング素子150の構造の例を模式的に示した図である。
図18は、本発明の第1~第6の実施形態に係る電力変換用スイッチング素子100,110,120,130,140,150を適用した電力変換装置1000の回路構成の例を示した図である。このような電力変換装置1000は、一般にはインバータ装置と呼ばれ、例えば、直流電源960からの電気エネルギーを所望の周波数の交流電流に変換し、モータ950の回転数を可変速制御する用途などに用いられている。
1d n-型ドリフト層(第1導電型半導体層)
2 p型チャネル層(第2導電型チャネル層)
3 n型エミッタ領域(第1導電型エミッタ領域)
4 p型コレクタ層(第2導電型コレクタ層)
5 ゲート絶縁膜
6 第1のゲート電極(G1)
7 エミッタ電極
8 コレクタ電極
10 n型ホールバリア層(第1導電型のホールバリア層)
12 p型エミッタ領域
13 第2のゲート電極(G2)
14 n型バッファ層(第1導電型のバッファ層)
15 p型フローティング層
16 層間絶縁膜
21 抵抗
22 コンデンサ
31 IGBT
32 可変抵抗
33,34 バッファ回路
35 制御回路
36 マイコン
37 ゲート駆動回路
40 第1の金属配線
41 第2の金属配線
42 コンタクトホール
100,101,102.103 電力変換用スイッチング素子
110,120,130,140,150 電力変換用スイッチング素子
600 フライホイールダイオード(ダイオード)
700 電力変換用スイッチング素子
800 ゲート駆動回路
900 P端子
901 N端子
910 U端子
911 V端子
912 W端子
950 モータ
960 直流電源
Claims (12)
- 半導体基板に形成された第1導電型の半導体層と、
前記第1導電型の半導体層に接し、前記半導体基板の第1表面側に形成された第2導電型のチャネル層と、
前記半導体基板の前記第1表面側に前記チャネル層を貫いて形成された複数のトレンチの互いに隣接する2つずつのトレンチのそれぞれに、前記半導体層および前記チャネル層とゲート絶縁膜を介して接するように設けられた第1のゲート電極および第2のゲート電極とからなるゲート電極の組と、
前記ゲート電極の組の同じ組に属する前記第1のゲート電極および前記第2のゲート電極の間に挟まれた前記チャネル層の表面の一部に、前記第1のゲート電極および前記第2のゲート電極のそれぞれに前記ゲート絶縁膜を介して接するように形成された第1導電型のエミッタ領域と、
前記第1導電型のエミッタ領域および前記第2導電型のチャネル層が電気的に接続されるエミッタ電極と、
前記ゲート電極の組の互いに異なる組に属し、互いに隣接する2つのゲート電極に挟まれ、前記エミッタ電極と絶縁された前記チャネル層である第2導電型のフローティング層と、
前記第1導電型の半導体層に接し、前記半導体基板の第2表面側に形成された第2導電型のコレクタ層と、
前記第2導電型のコレクタ層に電気的に接続されたコレクタ電極と、
を備え、
前記同じ組に属する前記第1のゲート電極と前記第2のゲート電極との間隔をaとし、前記互いに異なる組に属し、互いに隣接する2つのゲート電極同士の間隔をbとして、それぞれのゲート電極を、b>aを満たすように配置するとともに、
前記第1のゲート電極および前記第2のゲート電極のそれぞれに対し、駆動タイミングに時間差のある第1の駆動信号および第2の駆動信号を供給すること
を特徴とする電力変換用スイッチング素子。 - 請求の範囲第1項に記載の電力変換用スイッチング素子において、
前記第1の駆動信号がターンオフされるタイミングと前記第2の駆動信号がターンオフされるタイミングの時間差は3μ秒以上であること
を特徴とする電力変換用スイッチング素子。 - 請求の範囲第1項に記載の電力変換用スイッチング素子において、
前記第1の駆動信号がターンオンされるタイミングと前記第2の駆動信号がターンオンされるタイミングの時間差は3μ秒以上であること
を特徴とする電力変換用スイッチング素子。 - 請求の範囲第2項または第3項に記載の電力変換用スイッチング素子において、
前記同じ組に属する前記第1のゲート電極と前記第2のゲート電極との間隔aは1μm以下であること
を特徴とする電力変換用スイッチング素子。 - 請求の範囲第1項に記載の電力変換用スイッチング素子において、
前記第1のゲート電極と前記第2のゲート電極とは、抵抗を介して接続されており、前記第1のゲート電極を駆動する前記第1の駆動信号は、前記第2のゲート電極を駆動する前記第2の駆動信号を、前記抵抗により遅延させた信号であること
を特徴とする電力変換用スイッチング素子。 - 請求項1に記載の電力変換用スイッチング素子において、
前記第1のゲート電極と前記第2のゲート電極とは、抵抗を介して接続され、かつ、前記第1のゲート電極と前記エミッタ電極とは、コンデンサを介して接続されており、前記第1のゲート電極を駆動する前記第1の駆動信号は、前記第2のゲート電極を駆動する前記第2の駆動信号を、前記抵抗および前記コンデンサにより遅延させた信号であること
を特徴とする電力変換用スイッチング素子。 - 請求の範囲第1項に記載の電力変換用スイッチング素子において、
前記第1導電型の半導体層と前記第2導電型のコレクタ層との間に、前記第1導電型の半導体層よりも不純物の濃度が高濃度の第1導電型のバッファ層が形成されていること
を特徴とする電力変換用スイッチング素子。 - 請求の範囲第1項に記載の電力変換用スイッチング素子において、
前記第1のゲート電極および前記第2のゲート電極の組の同じ組に属する前記第1のゲート電極および前記第2のゲート電極の間に挟まれた前記チャネル層と前記第1導電型の半導体層との境界部分に、前記第1導電型の半導体層よりも不純物の濃度が高濃度の第1導電型のホールバリア層が形成されていること
を特徴とする電力変換用スイッチング素子。 - 半導体基板に形成された第1導電型の半導体層と、
前記第1導電型の半導体層に接し、前記半導体基板の第1表面側に形成された第2導電型のチャネル領域と、
前記第2導電型のチャネル領域および前記第1導電型の半導体層のそれぞれにゲート絶縁膜を介して接するように設けられたゲート電極と、
前記チャネル領域内の前記第1導電型の半導体層と離間した位置に、その一部が前記ゲート絶縁膜を介して前記ゲート電極に接するように設けられた第1導電型のエミッタ領域と、
前記第1導電型のエミッタ領域および前記第2導電型のチャネル領域が電気的に接続されるエミッタ電極と、
前記第1導電型の半導体層に接し、前記半導体基板の第2表面側に形成された第2導電型のコレクタ層と、
前記第2導電型のコレクタ層に電気的に接続されたコレクタ電極と、
を備え、
前記ゲート電極は、駆動タイミングに時間差のある第1の駆動信号および第2の駆動信号がそれぞれ供給される第1のゲート電極と第2のゲート電極とに分離され、前記第1のゲート電極と前記第2のゲート電極とは、前記半導体基板の第1表面側に交互に配置されること
を特徴とする電力変換用スイッチング素子。 - 請求の範囲第9項に記載の電力変換用スイッチング素子において、
前記第1の駆動信号がターンオフされるタイミングと前記第2の駆動信号がターンオフされるタイミングとの時間差は3μ秒以上であること
を特徴とする電力変換用スイッチング素子。 - 請求の範囲第9項に記載の電力変換用スイッチング素子において、
前記第1の駆動信号がターンオンされるタイミングと前記第2の駆動信号がターンオンされるタイミングの時間差は3μ秒以上であること
を特徴とする電力変換用スイッチング素子。 - 一対の直流端子と、電流をオン・オフする2つの電流スイッチング素子が前記直流端子間に直列に接続されて構成される直交流変換回路と、前記直交流変換回路の前記2つの電流スイッチング素子が接続される箇所に接続される交流端子と、を含んで構成される電力変換装置であって、
前記電流スイッチング素子は、請求の範囲第1項または第9項に記載の電力変換用スイッチング素子であること
を特徴とする電力変換装置。
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000101076A (ja) * | 1998-09-25 | 2000-04-07 | Toshiba Corp | 絶縁ゲート型半導体素子とその駆動方法 |
JP2000307116A (ja) * | 1999-02-17 | 2000-11-02 | Hitachi Ltd | 半導体装置及び電力変換装置 |
JP2004319624A (ja) * | 2003-04-14 | 2004-11-11 | Denso Corp | 半導体装置 |
JP2005191221A (ja) * | 2003-12-25 | 2005-07-14 | Toshiba Corp | 半導体装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100745557B1 (ko) | 1999-02-17 | 2007-08-02 | 가부시키가이샤 히타치세이사쿠쇼 | Igbt 및 전력변환 장치 |
JP4829003B2 (ja) | 1999-02-17 | 2011-11-30 | 株式会社日立製作所 | 半導体装置及び電力変換装置 |
US7638839B2 (en) | 2007-03-09 | 2009-12-29 | Hitachi, Ltd. | Power semiconductor device and power conversion device using the same |
JP4644730B2 (ja) * | 2008-08-12 | 2011-03-02 | 株式会社日立製作所 | 半導体装置及びそれを用いた電力変換装置 |
JP5452195B2 (ja) | 2009-12-03 | 2014-03-26 | 株式会社 日立パワーデバイス | 半導体装置及びそれを用いた電力変換装置 |
JP4957840B2 (ja) * | 2010-02-05 | 2012-06-20 | 株式会社デンソー | 絶縁ゲート型半導体装置 |
EP2541604A4 (en) * | 2010-02-25 | 2016-04-20 | Renesas Electronics Corp | SEMICONDUCTOR COMPONENT AND MANUFACTURING METHOD THEREFOR |
JP5806535B2 (ja) * | 2011-07-20 | 2015-11-10 | 株式会社 日立パワーデバイス | 半導体装置及びそれを用いた電力変換装置 |
JP6072445B2 (ja) * | 2012-06-28 | 2017-02-01 | 株式会社 日立パワーデバイス | 半導体装置およびそれを用いた電力変換装置 |
JP5696713B2 (ja) * | 2012-11-06 | 2015-04-08 | 株式会社デンソー | 半導体装置及びその検査方法 |
JP5932623B2 (ja) * | 2012-12-05 | 2016-06-08 | 株式会社 日立パワーデバイス | 半導体装置およびそれを用いた電力変換装置 |
JP5987990B2 (ja) * | 2013-08-15 | 2016-09-07 | 富士電機株式会社 | 半導体装置 |
JP6256613B2 (ja) * | 2014-08-20 | 2018-01-10 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
-
2012
- 2012-09-07 DE DE112012006885.8T patent/DE112012006885T5/de active Pending
- 2012-09-07 JP JP2014534125A patent/JP6228542B2/ja active Active
- 2012-09-07 CN CN201280074588.4A patent/CN104488085A/zh active Pending
- 2012-09-07 US US14/418,610 patent/US9595602B2/en active Active
- 2012-09-07 WO PCT/JP2012/072905 patent/WO2014038064A1/ja active Application Filing
-
2017
- 2017-01-31 US US15/420,393 patent/US20170141677A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000101076A (ja) * | 1998-09-25 | 2000-04-07 | Toshiba Corp | 絶縁ゲート型半導体素子とその駆動方法 |
JP2000307116A (ja) * | 1999-02-17 | 2000-11-02 | Hitachi Ltd | 半導体装置及び電力変換装置 |
JP2004319624A (ja) * | 2003-04-14 | 2004-11-11 | Denso Corp | 半導体装置 |
JP2005191221A (ja) * | 2003-12-25 | 2005-07-14 | Toshiba Corp | 半導体装置 |
Cited By (30)
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JP2016063169A (ja) * | 2014-09-22 | 2016-04-25 | 株式会社日立製作所 | 半導体装置 |
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JP7229064B2 (ja) | 2019-03-27 | 2023-02-27 | 株式会社日立製作所 | 半導体装置およびそれを用いた電力変換装置並びに半導体装置の駆動方法 |
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Also Published As
Publication number | Publication date |
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US20170141677A1 (en) | 2017-05-18 |
DE112012006885T5 (de) | 2015-06-03 |
US9595602B2 (en) | 2017-03-14 |
US20150303288A1 (en) | 2015-10-22 |
CN104488085A (zh) | 2015-04-01 |
JPWO2014038064A1 (ja) | 2016-08-08 |
JP6228542B2 (ja) | 2017-11-08 |
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