WO2008102113A2 - Printed circuit boards - Google Patents

Printed circuit boards Download PDF

Info

Publication number
WO2008102113A2
WO2008102113A2 PCT/GB2008/000552 GB2008000552W WO2008102113A2 WO 2008102113 A2 WO2008102113 A2 WO 2008102113A2 GB 2008000552 W GB2008000552 W GB 2008000552W WO 2008102113 A2 WO2008102113 A2 WO 2008102113A2
Authority
WO
WIPO (PCT)
Prior art keywords
printed circuit
composition
circuit board
coating
solder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/GB2008/000552
Other languages
English (en)
French (fr)
Other versions
WO2008102113A3 (en
Inventor
Frank Ferdinandi
Rodney Edward Smith
Mark Robson Humphries
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CROMBIE 123 Ltd
Original Assignee
CROMBIE 123 Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to PL08709439T priority Critical patent/PL2130417T3/pl
Priority to JP2009549476A priority patent/JP5558112B2/ja
Priority to AU2008217648A priority patent/AU2008217648B2/en
Priority to CN2008800054076A priority patent/CN101682998B/zh
Priority to KR1020157008970A priority patent/KR20150043557A/ko
Priority to GB0900635A priority patent/GB2453083B/en
Priority to KR1020177020884A priority patent/KR102096147B1/ko
Priority to DK08709439.7T priority patent/DK2130417T3/da
Priority to EP08709439.7A priority patent/EP2130417B1/en
Application filed by CROMBIE 123 Ltd filed Critical CROMBIE 123 Ltd
Priority to CA2678309A priority patent/CA2678309C/en
Priority to RU2009130670/07A priority patent/RU2563978C2/ru
Priority to US12/526,586 priority patent/US8492898B2/en
Priority to ES08709439T priority patent/ES2728309T3/es
Publication of WO2008102113A2 publication Critical patent/WO2008102113A2/en
Publication of WO2008102113A3 publication Critical patent/WO2008102113A3/en
Anticipated expiration legal-status Critical
Priority to US13/947,525 priority patent/US9648720B2/en
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/11Printed elements for providing electric connections to or between printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/282Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/288Removal of non-metallic coatings, e.g. for repairing
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3489Composition of fluxes; Methods of application thereof; Other methods of activating the contact surfaces
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3494Heating methods for reflowing of solder
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45117Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/45124Aluminium (Al) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45147Copper (Cu) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/4554Coating
    • H01L2224/45599Material
    • H01L2224/45686Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/4554Coating
    • H01L2224/45599Material
    • H01L2224/4569Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48599Principal constituent of the connecting portion of the wire connector being Gold (Au)
    • H01L2224/486Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/48638Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/48647Copper (Cu) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48699Principal constituent of the connecting portion of the wire connector being Aluminium (Al)
    • H01L2224/487Principal constituent of the connecting portion of the wire connector being Aluminium (Al) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/48738Principal constituent of the connecting portion of the wire connector being Aluminium (Al) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/48747Copper (Cu) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48799Principal constituent of the connecting portion of the wire connector being Copper (Cu)
    • H01L2224/488Principal constituent of the connecting portion of the wire connector being Copper (Cu) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/48838Principal constituent of the connecting portion of the wire connector being Copper (Cu) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/48847Copper (Cu) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/81009Pre-treatment of the bump connector or the bonding area
    • H01L2224/81024Applying flux to the bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/8138Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/81395Bonding interfaces outside the semiconductor or solid-state body having an external coating, e.g. protective bond-through coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/818Bonding techniques
    • H01L2224/81801Soldering or alloying
    • H01L2224/81815Reflow soldering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/83009Pre-treatment of the layer connector or the bonding area
    • H01L2224/83024Applying flux to the bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/832Applying energy for connecting
    • H01L2224/83201Compression bonding
    • H01L2224/83205Ultrasonic bonding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8338Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/83395Bonding interfaces outside the semiconductor or solid-state body having an external coating, e.g. protective bond-through coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/83801Soldering or alloying
    • H01L2224/83815Reflow soldering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/852Applying energy for connecting
    • H01L2224/85201Compression bonding
    • H01L2224/85203Thermocompression bonding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/852Applying energy for connecting
    • H01L2224/85201Compression bonding
    • H01L2224/85205Ultrasonic bonding
    • H01L2224/85207Thermosonic bonding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/8538Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/85395Bonding interfaces outside the semiconductor or solid-state body having an external coating, e.g. protective bond-through coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/8538Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/85399Material
    • H01L2224/854Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/85438Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/85447Copper (Cu) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12042LASER
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/015Fluoropolymer, e.g. polytetrafluoroethylene [PTFE]
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0179Thin film deposited insulating layer, e.g. inorganic layer for printed capacitor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/09Treatments involving charged particles
    • H05K2203/092Particle beam, e.g. using an electron beam or an ion beam
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/10Using electric, magnetic and electromagnetic fields; Using laser light
    • H05K2203/107Using laser light
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/13Moulding and encapsulation; Deposition techniques; Protective layers
    • H05K2203/1333Deposition techniques, e.g. coating
    • H05K2203/1338Chemical vapour deposition
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/13Moulding and encapsulation; Deposition techniques; Protective layers
    • H05K2203/1333Deposition techniques, e.g. coating
    • H05K2203/1366Spraying coating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/13Moulding and encapsulation; Deposition techniques; Protective layers
    • H05K2203/1333Deposition techniques, e.g. coating
    • H05K2203/1372Coating by using a liquid wave
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/13Moulding and encapsulation; Deposition techniques; Protective layers
    • H05K2203/1377Protective layers
    • H05K2203/1383Temporary protective insulating layer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof
    • H05K3/3485Applying solder paste, slurry or powder

Definitions

  • the present invention relates to articles such as those comprising printed circuit boards coated with a halo-hydrocarbon polymer.
  • PCBs are used in the electronics industry to mechanically support and electrically connect electrical and electronic components.
  • a PCB comprises a board or other substrate made of an insulating material on which conductive tracks, typically made of copper, lie. These conductive tracks function as wires between electrical components that are later attached to the board by, for example, soldering.
  • a large proportion of PCBs are manufactured by depositing or otherwise adhering a layer of copper to the substrate board, and then removing unwanted copper by chemical etching to leave copper tracks in the required configuration. At this stage the blank PCBs may often be stored for variable periods of time, potentially up to several months, prior to attachment of the electronic components to the PCB by a soldering method.
  • the conductive tracks on the printed circuit board may be made from any conductive material.
  • the preferred material for the tracks is copper. Copper is the preferred material for the conductive tracks mainly due to its high electrical conductivity, but unfortunately copper is readily oxidised in air leading to a layer of copper oxide, or tarnish, on the surface of the metal. This oxidation is particularly evident if a long period of time has elapsed between manufacture of the blank PCB and attachment of the electrical components. The components are attached by soldering, but the presence of an oxide layer on the copper tracks may reduce the effectiveness of soldering. In particular dry joints, which have a tendency to fail during operation of the device, and weak joints with low mechanical strength may be formed. Occasionally the joint will fail to make electrical contact altogether.
  • PCBs are often required in devices that are used in very harsh and corrosive environments. Under such conditions, the conductive tracks on the PCB may be corroded leading to a far shorter lifetime of the circuit board than would normally be expected. Such conditions may arise, for example, when a device is used in very humid environments, especially where microscopic droplets of water containing dissolved gases such as sulphur dioxide, hydrogen sulphide, nitrogen dioxide, hydrogen chloride, chlorine and water vapour form a corrosive solution. Additionally, droplets of moisture may form a thin film or corrosion deposits between conductive tracks on the PCB that may potentially cause short circuits.
  • gases such as sulphur dioxide, hydrogen sulphide, nitrogen dioxide, hydrogen chloride, chlorine and water vapour
  • dendrites are very fine metallic growths along a surface, resulting from electromigration, which form fern-like patterns.
  • the growth mechanism for dendrites is well understood, unlike "tin whiskers", and requires the presence of moisture that generates metal ions that are then redistributed by electromigration in the presence of an electromagnetic field.
  • the coating of the invention protects against the formation of dendrites by preventing moisture reaching the surface of the PCB, which is where dendrites normally grow.
  • the coating provides additional protection as dendrite materials have low adhesion to the surface coating reducing the formation of dendrites between contacts and components.
  • the present invention provides a printed circuit board to which a generally localised solder connection is to be made, the surface of said printed circuit board having a coating of a composition comprising one or more halo-hydrocarbon polymers, in single or multiple layers, at a thickness of from that of a monolayer (usually a few angstroms (A)) to lO ⁇ m, wherein there is no solder, or essentially no solder, between said coating composition and the conductive tracks of said printed circuit board.
  • A angstroms
  • polymer we include polymers formed in-situ from single or multiple monomers, linear, branched, grafted and crosslinked copolymers, oligomers, multipolymers, multimonomer polymers, polymer mixtures, grafted copolymers, blends and alloys of polymers, as well as interpenetrating networks of polymers (IPNs).
  • IPNs interpenetrating networks of polymers
  • the thickness of the coating is typically from lnm to 2 ⁇ m, more typically from lnm to 500nm, still more typically from 3nm to 500nm, still more typically from lOnm to 500nm, and most typically from lOnm to 250nm.
  • the coating is preferably at a thickness of from lOnm to lOOnm, in various gradients, with lOOnm being a preferred thickness.
  • the thickness of the coating is lOnm to 30nm.
  • the optimal thickness of the coating will depend on the properties that are required of the PCB. For example, if very high environmental toughness is required (high corrosion and abrasion resistance), a thicker coating may be used.
  • the coating thickness may be optimised with different thicknesses at different locations across the PCB dependent on which feature is being optimised (for example, environmental protection versus Z axis conductivity).
  • the coating thickness and flux composition can be varied to optimise environmental protection characteristics and give particularly strong solder joints.
  • the halo-hydrocarbon coating may be continuous, substantially continuous (particularly over surfaces to be soldered and non-soldering surfaces between or adjacent to them, and more particularly over substantially all exposed and vulnerable surfaces of the PCB) 5 or non-continuous.
  • a substantially continuous coating may be required.
  • a non- continuous coating may be sufficient for other purposes.
  • halo-hydrocarbon polymer By halo-hydrocarbon polymer it is meant a polymer with a straight or branched chain or ring carbon structure with 0, 1, 2 or 3 halogen atoms bound to each carbon atom in the structure.
  • the halogen atoms could be the same halogens (for example fluorine) or a mixture of halogens (for example fluorine and chlorine).
  • halo-hydrocarbon polymer as used herein includes polymers that contain one or more unsaturated groups, such as carbon-carbon double and triple bonds, and polymer that contain one or more heteroatoms (atoms which are not C, H or halogen), for example N, S or O.
  • the polymer contains substantially no unsaturation (because unsaturation often results in reduced stability) and substantially no such heteroatoms.
  • the polymer contains less than 5 % heteroatoms as a proportion of the total number of atoms in the polymer.
  • the polymer contains less than 5 % carbon-carbon double or triple bonds as a proportion of the total number of carbon-carbon bonds.
  • the molecular weight of the polymer is preferably greater than 1000 amu.
  • the polymer chains may be straight or branched, and there may be crosslinking between polymer chains.
  • the halogen may be fluorine, chlorine, bromine or iodine.
  • the polymer is a fluoro-hydrocarbon polymer, a chloro-hydrocarbon polymer or a fluoro-chloro-hydrocarbon polymer wherein 0, 1, 2 or 3 fluoro or chloro atoms are bonded to each carbon atom in the chain.
  • Examples of preferred polymers include: - PTFE, PTFE type material, fluorinated-hydrocarbons, chlorinated-fluorinated- hydrocarbons, halogenated-hydrocarbons, halo-hydrocarbons or co-polymers, oligomers, multipolymers, multimonomer polymers, polymer mixtures, blends, alloys, branched chain, grafted copolymers, cross-linked variants of these materials and also interpenetrating polymer networks (IPNs).
  • IPNs interpenetrating polymer networks
  • PCTFE polychlorotrifluoroethylene
  • copolymers oligomers, multipolymers, multimonomer polymers, polymer mixtures, blends, alloys, branched chain, grafted copolymers, cross-linked variants of this material and also interpenetrating polymer networks (IPNs).
  • IPNs interpenetrating polymer networks
  • EPCTFE ethylene copolymer of polychlorotrifluoroethylene
  • copolymers oligomers, multipolymers, multimonomer polymers, polymer mixtures, blends, alloys, branched chain, grafted copolymers, cross-linked variants of this material and also interpenetrating polymer networks (IPNs).
  • IPNs interpenetrating polymer networks
  • fluoroplastics including the materials below and co-polymers, oligomers, multipolymers, multimonomer polymers, polymer mixtures, blends, alloys, branched chain, grafted copolymers, cross-linked variants of these materials as well as interpenetrating polymer networks (IPNs): ETFE (copolymer of ethylene and tetrafluoroethylene), FEP (copolymer of tetrafluoroethylene and hexafluoropropylene), PFA (copolymer of tetrafluoroethylene and perfluoro vinyl ether), PVDF (polymer of vinylidenefluoride), THV (copolymer of tetrafluoroethylene, hexafluoropropylene and vinylidenefluoride), PVDFHFP (copolymer of vinylidene fluoride and hexafluoropropylene), MFA (copolymer of tetrafluoroethylene
  • the polymer is a polytetrafluoroethylene (PTFE) type material, and in particular polytetrafluoroethylene (PTFE).
  • PTFE polytetrafluoroethylene
  • a lower wettability may be achieved by using a coating in which the halo- hydrocarbon is a highly branched polymer a copolymer, polymer blend or a polymer mixture. It is desirable that the coating composition have any one or more, and preferably substantially all, of the following properties: capable of being deposited as continuous films, free of cracks, holes or defects; relatively low gaseous permeability which provides a significant barrier to gaseous permeation and avoids gaseous corrosion and oxidation 'through' the coating; the ability to selectively solder through without the need for prior removal and to achieve good solder joints comparable to other currently available surface finishes; the ability to withstand multiple heat cycles; chemical resistance to corrosive gases, liquids and salt solutions, particularly environmental pollutants; exhibit low surface energy and 'wettability'; to be stable inert material at normal PCB temperatures; have good mechanical properties, including good adhesion to PCB materials and good mechanical abrasion resistance; improved electrostatic protection; relatively low liquid and salt solution permeability, to avoid liquid corrosion '
  • the invention can also provide other electrical and/or electronic devices, or other articles (such as pipes or other plumbing apparatus) to which solder connections are to be made, having such a coating.
  • the invention could be used to coat the bare wires (especially copper wires) used in wire bonding techniques.
  • Wire bonding is a method of making interconnections between an integrated circuit in bare die form and the leadframe inside the integrated circuit or between the bare die and a PCB.
  • the wire used has traditionally been gold or aluminum but more recently there has been a considerable interest in using copper wire for a number of reasons including the significant cost differential with gold.
  • wire bonding two jointing methods are commonly used, wedge bonding and ball bonding, both of which use different combinations of heat, pressure, and ultrasonic energy to make a weld at either or both ends of the wire.
  • wedge bonding and ball bonding both of which use different combinations of heat, pressure, and ultrasonic energy to make a weld at either or both ends of the wire.
  • both the wire and the pad to which it is bonded must be free of contaminants including oxidation. It is standard practice to apply a gold finish to the bond pad to prevent oxidation.
  • the coating of the present invention on a copper bond pad will also provide an oxidation free surface, allowing wire bonding joints to be made using gold, aluminum or copper wire, either by wedge bonding or ball bonding but at a significantly lower cost than the standard gold finish on the bond pad.
  • the halo-hydrocarbon coating provides additional oxidation protection during the bonding process.
  • the electrodes of electronic components could be coated.
  • the polymer coating preferably provides a good barrier to the permeation of atmospheric gases and liquids, most importantly oxygen, which would normally react with the conductive tracks, typically copper tracks, to form a layer of tarnish, typically copper oxide, on the surface of the track.
  • the coated circuit board may be stored for long periods of time, up to several months or years, without damaging oxidation of the conductive tracks occurring.
  • Optical microscopy, scanning electron microscopy and back scattering electron imaging have been used to investigate the nature, continuity and thickness of the coating.
  • Energy dispersive analysis by X-rays has been used to map the levels and distribution of halogens in the coating.
  • Measurements of the surface activation and surface wettability using chemical solvent solutions provide an indication of the potential to act as a protective coating.
  • the halo-hydrocarbon polymer used provides a coating that has the unusual property that it may be soldered through to form a solder joint between the conductive track on the board and the electrical component. Flux is generally required in this soldering technique.
  • a soldering process using heat alone could be used to selectively "remove" the coating, for example laser soldering. Welding, laser-enhanced welding, ulstrasonic welding or use of conductive adhesives are further alternatives.
  • Another possible technique is wave soldering; this technique may require selective fluxing.
  • the solder used may be leaded solder or lead-free solder. There is generally no reduction in the strength of the solder joint as might be expected, and indeed under certain circumstances the solder joint may be stronger than a standard solder joint. Furthermore, under certain circumstances, the present invention may prevent dendrite formation on the solder bonds, particularly when lead-free solder is used.
  • the present invention provides an alternative technique to applying surface coatings of metals (such as tin, silver, nickel and gold) to the conductive tracks of PCBs to prevent oxidation of the conductive tracks prior to soldering.
  • metals such as tin, silver, nickel and gold
  • the present invention has the advantage that it is based on a low cost process, it does not use toxic metals such as nickel, it is environmentally friendly and it is safer than current industrial metal plating processes. It also simplifies the PCB manufacturing process and is compatible with current industrial soldering processes. In addition it has the extra benefit of "solder through” properties, whereby the need to remove the coating before soldering is avoided.
  • a further feature of the halo-hydrocarbon polymer coating is that it is only removed in the areas where solder and/or flux is applied. Thus, in the areas of the PCB where components are not attached by selective soldering the coating remains intact, maintaining a protective layer over the board and conductive tracks, which provides a barrier to corrosion by atmospheric gases such as sulphur dioxide, hydrogen sulphide, nitrogen dioxide, hydrogen chloride, chlorine and water vapour and other corrosive materials, thus avoiding corrosion by environmental pollutants.
  • the halo-hydrocarbon polymer coating is also substantially impermeable to liquids and corrosive liquids.
  • the conductive tracks on the printed circuit board may comprise any conductive material.
  • Possible materials from which the conductive tracks may be made are metals such as copper, silver, aluminium or tin, or conductive polymers or conductive inks.
  • the preferred material for the tracks is copper.
  • Conductive polymers tend to absorb water and swell, and thus coating conductive polymers with a halo-hydrocarbon polymer layer can prevent water absorption.
  • the z-axis impedance is very low compared to the impedance in the x- and y-axis.
  • z-axis it is meant the axis pointing into the plane of the PCB.
  • the coating exhibits high impedance in the x- and y- axis, thus demonstrating good insulating properties.
  • the impedance is relatively low in the z axis. This enables electrical contact to be made through the coating without having to remove it. This is particularly advantageous for applications such as keypads, switch contacts, test points and the like. This characteristic can be further optimised by controlling the properties of the coating e.g.
  • the invention prevents oxidation of, and/or other environmental damage, e.g. modulation of thermal stability, scratch, corrosion and chemical resistance and high barrier effect to the conductive tracks of the blank PCB and provides environmental protection of the assembled PCB usually with one initial step of coating the blank PCB with a halo-hydrocarbon polymer.
  • the invention also provides a method of protecting a printed circuit board which comprises providing a blank printed circuit board having an environmentally- exposed surface, and which has no solder, or essentially no solder, on said environmentally exposed surface, and applying to that surface to a thickness of a monolayer (usually a few angstroms (A)) to lO ⁇ m of a composition comprising a halo-hydrocarbon polymer by a thin film deposition technique such as plasma deposition, chemical vapour deposition (CVD), molecular beam epitaxy (MBE), creation of inter-penetrating polymer networks (IPNs) 5 surface absorption of monolayers (SAMs) of polymers of monomers to form in-situ polymers, polymer alloys, or sputtering.
  • a thin film deposition technique such as plasma deposition, chemical vapour deposition (CVD), molecular beam epitaxy (MBE), creation of inter-penetrating polymer networks (IPNs) 5 surface absorption of monolayers (SAMs
  • PE-CVD Plasma enhanced-chemical vapour deposition
  • MO-CVD metalo-organic-chemical vapour deposition
  • LE-CVD laser enhanced-chemical vapour deposition
  • the preferred method may depend on the thickness of coating that is required. Liquid coating techniques may be preferred for thicker coatings, while plasma deposition techniques may be preferred for thinner coatings.
  • the thickness of the coating is typically from lnm to 2 ⁇ m, more typically from lnm to 500nm 5 still more typically from 3nm to 500nm, still more typically from IOnm to 500nm 5 and most typically from IOnm to 250nm.
  • the coating is preferably at a thickness of from IOnm to lOOnm, with lOOnm being a preferred thickness.
  • the halo-hydrocarbon polymer is preferably a fluoro-hydrocarbon polymer, a chloro-hydrocarbon polymer or a fiuoro-chloro-hydrocarbon polymer, which may also contain micro-pigments and small quantities of other performance additives (being a common practice in the polymer industry) and may for example be polytetrafluoroethylene (PTFE) type materials.
  • PTFE polytetrafluoroethylene
  • Plasma deposition techniques are extensively used for deposition of coatings in a wide range of industrial applications.
  • the method is an effective way of depositing continuous thin film coatings using a dry and environmentally friendly technique.
  • the PCBs are coated in a vacuum chamber that generates a gas plasma comprising ionised gaseous ions, electrons, atoms and neutral species.
  • the PCB is introduced into the vacuum chamber that is first pumped down to pressures typically in the range 10 "3 to 10 mbar.
  • a gas is then introduced into the vacuum chamber to generate a stable gas plasma and one or more precursor compounds are then introduced into the plasma as either a gas or liquid to enable the deposition process.
  • the precursor compounds are typically halogen-containing hydrocarbon materials, which are selected to provide the desired coating properties.
  • the precursor compounds When introduced into the gas plasma the precursor compounds are also ionized/decomposed to generate a range of active species that will react at the surface of the PCB 5 typically by a polymerisation process, to generate a thin halo- hydrocarbon coating.
  • Preferred precursor compounds are perfluoroalkanes, perfluoroalkenes, perfluoroalkynes, fluoroalkanes, fluoroalkenes, fluoroalkynes, fluorochloroalkanes, fluorochloroalkenes, fluorochloroalkynes, or any other fluorinated and/or chlorinated organic material (such as fluorohydrocarbons, fluorocarbons, chlorofluorohydrocarbons and chlorofluorocarbons).
  • the coating on the conductive track of the PCB may comprise a very thin layer (for example 5nm or less) of metal halide (preferably a metal fluoride, such as copper fluoride) directly in contact with the metal surface.
  • metal halide preferably a metal fluoride, such as copper fluoride
  • the metal halide layer may be a monolayer or substantially a monolayer, or a few monolayers, or comprise a metal halide zone of layers at the surface.
  • Such a metal halide layer may be very robust and inert, and prevents formation of oxide layers or other tarnishes which prevent effective soldering.
  • the metal halide layer may form when active species in the gas plasma react with the metal surface or may be enhanced using a higher concentration of fluorine species.
  • the halo-hydrocarbon layer may then be deposited in combination with the metal halide layer.
  • the two layers may be discrete, axially or spatially, or alternatively there may be a graded transition from metal halide to halo-hydrocarbon. It is possible that the metal halide layer protects the metal from oxidation, whilst the halo-hydrocarbon layer provides environmental protection from corrosive gases and/or liquids as well as oxidation protection. Furthermore, should the coating eventually be worn away by mechanical abrasion, the underlying metal fluoride layer will prevent oxidation build up, enabling contact to still be made.
  • the nature and composition of the plasma deposited coating depends on a number of conditions: the plasma gas selected; the precursor compound used; the plasma pressure; the coating time; the plasma power; the chamber electrode arrangement; the preparation of the incoming PCB; and the size and geometry of the chamber.
  • the plasma deposition technique can be used to deposit thin films from a monolayer (usually a few angstroms (A)) to 10 microns (preferably to 5 microns), depending on the above settings and conditions.
  • the plasma technique itself only impacts the uppermost surface of the PCB and is typically fully compatible with the PCB itself, causing no damage or other unwanted effects.
  • An advantage of plasma coating techniques is that the coating deposited accesses all surfaces of the PCB 5 and thus vertical surfaces such as those only accessible through holes in the PCB and any overhangs will also be covered. If a particular area of the PCB should not be coated with polymer, for example gold contacts at the edge of the PCB, then these areas can be masked during the plasma deposition process.
  • an active gas plasma is used typically in the same chamber for PCB cleaning ahead of introduction of the precursor compound for the plasma deposition stage.
  • the active gas plasma is based on a stable gas, such as hydrogen, oxygen, nitrogen, argon, methane, ethane, other hydrocarbons, tetrafluoromethane (CF 4 ), hexafiuoroethane (C 2 F 6 ), tetrachloromethane (CCl 4 ), other fluorinated or chlorinated hydrocarbons, other rare gases, or a mixture thereof.
  • the PCB could be cleaned by the same material as to be deposited.
  • a fluorinated or chlorinated hydrocarbon such as tetrafluoromethane (CF 4 ) or hexafiuoroethane (C 2 F 6 ) or hexafluoropropylene (C 3 F 6 ) or octafluoropropane (C 3 Fs) could be used in the plasma method both to clean the surface of the PCB and lay down a layer of a halo-hydrocarbon polymer and/or a layer of metal fluoride (or chloride).
  • CF 4 tetrafluoromethane
  • C 2 F 6 hexafiuoroethane
  • C 3 F 6 hexafluoropropylene
  • octafluoropropane C 3 Fs
  • the invention also provides a method of making a connection to a printed circuit board coated with a composition that comprises a halo-hydrocarbon polymer, which method comprises applying solder and flux to the printed circuit board at a temperature and for a time such that the solder bonds to the metal and the composition is locally dispersed and/or absorbed and/or vaporised and/or dissolved and/or reacted.
  • the action of flux and increased temperature alone will generally interact with the halo-hydrocarbon polymer to remove the coating locally from the area of the PCB to which the flux is applied.
  • the temperature is typically 200 0 C to 300°C, preferably 240°C to 280 0 C, and most preferably 260 0 C.
  • the halo-hydrocarbon polymer may be dissolved and/or absorbed by the flux.
  • the temperature required we have found that there is often a balance between the temperature required and the acidity or other aggressiveness of the flux. Thus, milder fluxes may suffice if higher temperatures are used, and vice versa.
  • the invention may dispense with a flux if a sufficiently high temperature is used and so localised heating could be applied.
  • the composition is generally only removed specifically from the area where solder and/or flux is applied, and therefore the composition remains attached to the surface of the PCB right up until the solder joint. This provides advantageous environmental protection of the conductive tracks of the PCB right up to the solder joint.
  • the flux used in the invention could be a resin/rosin flux, an organic flux, an inorganic flux, a halide free flux, a no-clean flux, a no-residue flux or a low solids flux.
  • a resin/rosin flux could for example be a synthetic resin or a natural rosin.
  • An organic flux could for example be: an organic acid such as lactic acid or an acrylic acids; an organic salt such as dimethylammonium chloride (DMA HCl); or an organic amine such as urea.
  • An inorganic flux could for example be: an inorganic salt such as zinc chloride, sodium chloride, potassium chloride or sodium fluoride; or an inorganic acid such as hydrochloric acid or nitric acid.
  • a no-clean flux is a rosin flux.
  • Other fluxes used more widely for industrial applications such as general soldering, brazing and welding, or to clean or etch a metal surface (for example borax) could also be used in the present invention.
  • the flux used in this method is typically a mild flux such as a "no-clean" flux that does not require a subsequent step of cleaning the PCB.
  • the flux may optionally be part of a soldering paste.
  • the choice of flux may depend on the nature of the coating, particularly the thickness and composition of the coating. A thicker more resistive coating may require use of a more aggressive flux.
  • a composition comprising the active ingredient or ingredients of flux that remove the halo-hydrocarbon composition from the board could also be used in the present invention in place of flux.
  • the invention provides a use of a composition comprising a halo- hydrocarbon polymer for environmentally-protecting a printed circuit board to which a solder connection is to be made through the composition, without its prior removal, by dispersal and/or absorption and/or vaporisation of the composition optionally in the presence of a flux.
  • the environment may contain gaseous agents such as sulphur dioxide, hydrogen sulphide, nitrogen dioxide, hydrogen chloride, chlorine, ozone or water vapour, or liquids such as water, water in which the corrosive gases above are dissolved, salt solutions or other spillages.
  • Such gases are commonly present in highly polluted environments such as cities with atmospheric pollution problems.
  • One particular environmental hazard that the present invention protects PCBs against is atmospheric moisture in which one or more of the corrosive gases listed above is dissolved. We have found that the invention is able to protect PCBs against such harsh environments.
  • the invention also provides the use of a composition comprising a halo- hydrocarbon polymer for providing long-term storage stability for a blank printed circuit board to which a solder connection is to be made.
  • a composition comprising a halo- hydrocarbon polymer for providing long-term storage stability for a blank printed circuit board to which a solder connection is to be made.
  • the oxidation reactions are normally the formation of metal oxides by reaction with atmospheric oxidation, but also include other oxidation reactions, for example where copper metal is oxidised to for example Cu + or Cu 2+ .
  • the composition of the invention prevents these oxidation reactions so mat a blank PCB can be stored for long periods of time, without oxidation of the conductive tracks occurring.
  • good solder connections can be made to the PCB by standard soldering techniques, preferably in the presence of flux, without any pre- cleaning steps.
  • the invention also provides the use of a composition comprising a halo- hydrocarbon polymer to prevent oxidation and/or corrosion of the conductive tracks of a blank printed circuit board prior to the application of solder to said conductive tracks and/or the formation of a solder connection.
  • Figure 1 shows a soldering profile of a refiow oven used with a commercial solder paste containing lead.
  • Figure 2 shows a soldering profile of a refiow oven used with a lead-free commercial solder paste.
  • Figure 3 is an image of a coated PCB of the invention with a water droplet on the surface, demonstrating the low surface energy, low wettability, liquid impermeable nature of the surface coating.
  • Figure 4 is a cross-section image of strong solder joint made by soldering through the coating on a PCB of the invention.
  • Figure 5 is a cross-section image of strong solder joint formed on a PCB of the invention, demonstrating the formation of good quality copper-tin intermetallics on the upper side of lower copper surface.
  • Figure 6 is an SEM (Scanning Electron Microscopy) image of the edge of a 1 ⁇ m thick coating polymer on a PCB of the invention, shown at x30,000 magnification.
  • Figure 7 is a BEI Image (Back Scattering Electron Image) showing an example area of coated PCB of the invention, demonstrating coating continuity in excess of 99.8% coverage.
  • Figure 8 is a SEM/EDX image showing a region of coating removed selectively from a PCB of the invention by the action of flux at a temperature, for a nominal 1 micron thick coating.
  • the image on the left shows where flux has been selectively applied.
  • the image on the right shows that the coating has selectively been removed in the area to which flux was applied.
  • Figure 9 is an EDX spectrum showing the carbon/fluorine composition of the coating on the copper of a PCB of the invention.
  • Figure 10 is an image of IC component legs ripped from a soldered PCB of the invention, demonstrating strong solder joints. Under severe testing the joints finally fail by fracture of the copper pad to board substrate bond, rather than at the solder joint.
  • Figure 11 is an image of soldered pads ripped from soldered PCB of the invention, demonstrating strong solder joints. Under severe testing the joints finally fail by fracture of the copper pad to board substrate bond, rather than at the solder joint.
  • Figure 12 is an SEM image and an EDX image showing the presence of polymer coating right up to a solder joint edge formed on a PCB of the invention.
  • Figure 13 is an optical microscopy image showing a series of good quality solder joints formed on a PCB of the invention.
  • Figure 14a is an XPS spectrum of a set of thin coatings of the invention showing various contributions from C-F and Cu-F materials.
  • Figure 14b is an XPS spectrum showing C-F containing material for a thick coating.
  • Printed circuit boards that had been etched and cleaned but had not had the surface finish applied were obtained from a manufacturer. These boards were then treated by plasma deposition to generate the halogen-containing coating.
  • the PCB was introduced into the vacuum chamber that was first pumped down to pressures in the range 10 ⁇ 3 to 10 mbar. A gas was then introduced into the vacuum chamber to generate a stable gas plasma and a halogen-containing precursor hydrocarbon compound was then introduced into the plasma to enable the deposition process. When introduced into the gas plasma the precursor compound also decomposed/ionised to generate a range of active species that reacted at the surface of the PCB to generate a thin halogen-containing coating. A number of experiments were carried out on these treated boards.
  • Example 1 A commercial solder paste containing lead was applied by hand dispensing from a syringe onto a number of the component pads on one side of the PCB. Several integrated circuits were placed onto the pads that had solder paste on them. The PCB was then put into a reflow oven where the soldering profile had been set up as shown in Figure 1. Subsequently, the joints were examined visually using a microscope, where they were found to have good wetting characteristics. Some of the joints were then pulled apart by prising the component up with a tool. In each case the leg of the integrated circuit pulled out of the solder, leaving the joint to the PCB pad intact.
  • the board was mounted in a shear tester.
  • the stand-off height of the chisel tool above the PCB surface was 80 ⁇ m, and the width of chisel tool is 2mm.
  • the shear tool was moved forward at a defined speed of 1 OO ⁇ m/s against the test component, and the force was monitored until the solder joint attachment broke.
  • the shear tester used is the Dage Series 4000, with a DSlOO testing head.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Paints Or Removers (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laminated Bodies (AREA)
PCT/GB2008/000552 2007-02-19 2008-02-18 Printed circuit boards Ceased WO2008102113A2 (en)

Priority Applications (14)

Application Number Priority Date Filing Date Title
EP08709439.7A EP2130417B1 (en) 2007-02-19 2008-02-18 Printed circuit boards
AU2008217648A AU2008217648B2 (en) 2007-02-19 2008-02-18 Printed circuit boards
CA2678309A CA2678309C (en) 2007-02-19 2008-02-18 Printed circuit boards
KR1020157008970A KR20150043557A (ko) 2007-02-19 2008-02-18 인쇄 회로 기판
GB0900635A GB2453083B (en) 2007-02-19 2008-02-18 Printed circuit boards
KR1020177020884A KR102096147B1 (ko) 2007-02-19 2008-02-18 인쇄 회로 기판
DK08709439.7T DK2130417T3 (da) 2007-02-19 2008-02-18 Printplader
PL08709439T PL2130417T3 (pl) 2007-02-19 2008-02-18 Płytki obwodów drukowanych
CN2008800054076A CN101682998B (zh) 2007-02-19 2008-02-18 印刷电路板
JP2009549476A JP5558112B2 (ja) 2007-02-19 2008-02-18 プリント回路基板
RU2009130670/07A RU2563978C2 (ru) 2007-02-19 2008-02-18 Печатные платы
US12/526,586 US8492898B2 (en) 2007-02-19 2008-02-18 Printed circuit boards
ES08709439T ES2728309T3 (es) 2007-02-19 2008-02-18 Placas de circuito impreso
US13/947,525 US9648720B2 (en) 2007-02-19 2013-07-22 Method for manufacturing printed circuit boards

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0703172.7 2007-02-19
GB0703172A GB0703172D0 (en) 2007-02-19 2007-02-19 Printed circuit boards

Publications (2)

Publication Number Publication Date
WO2008102113A2 true WO2008102113A2 (en) 2008-08-28
WO2008102113A3 WO2008102113A3 (en) 2008-12-11

Family

ID=37908866

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB2008/000552 Ceased WO2008102113A2 (en) 2007-02-19 2008-02-18 Printed circuit boards

Country Status (15)

Country Link
US (2) US8492898B2 (enExample)
EP (1) EP2130417B1 (enExample)
JP (3) JP5558112B2 (enExample)
KR (3) KR20100014493A (enExample)
CN (1) CN101682998B (enExample)
AU (1) AU2008217648B2 (enExample)
CA (1) CA2678309C (enExample)
DK (1) DK2130417T3 (enExample)
ES (1) ES2728309T3 (enExample)
GB (2) GB0703172D0 (enExample)
PL (1) PL2130417T3 (enExample)
RU (1) RU2563978C2 (enExample)
TR (1) TR201905093T4 (enExample)
TW (1) TWI462671B (enExample)
WO (1) WO2008102113A2 (enExample)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010020753A3 (en) * 2008-08-18 2010-06-24 Semblant Limited Halo-hydrocarbon polymer coating
WO2011104500A1 (en) 2010-02-23 2011-09-01 Semblant Global Limited Plasma-polymerized polymer coating
WO2012066273A1 (en) 2010-11-15 2012-05-24 Semblant Global Limited Method for reducing creep corrosion
WO2013034920A2 (en) 2011-09-07 2013-03-14 Europlasma Nv Surface coatings
JP2013517382A (ja) * 2010-01-22 2013-05-16 ユーロプラズマ 低圧プラズマ工程による適応性ナノコーティングの被覆方法
US8492898B2 (en) 2007-02-19 2013-07-23 Semblant Global Limited Printed circuit boards
US8618420B2 (en) 2008-08-18 2013-12-31 Semblant Global Limited Apparatus with a wire bond and method of forming the same
US8995146B2 (en) 2010-02-23 2015-03-31 Semblant Limited Electrical assembly and method
WO2018013889A1 (en) * 2016-07-15 2018-01-18 Aculon, Inc Coated articles that demonstrate push-through electrical connectivity
CN108697001A (zh) * 2017-04-05 2018-10-23 中国科学院宁波材料技术与工程研究所 一种柔性电极和/或电路的制备方法
US10770238B2 (en) 2017-07-03 2020-09-08 Avx Corporation Solid electrolytic capacitor assembly with hydrophobic coatings
US11257628B2 (en) 2017-07-03 2022-02-22 KYOCERA AVX Components Corporation Solid electrolytic capacitor containing a nanocoating
US11786930B2 (en) 2016-12-13 2023-10-17 Hzo, Inc. Protective coating

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007062202B4 (de) * 2007-12-21 2021-06-10 Vitesco Technologies GmbH Beschreibung Verfahren zur Kontaktierung einer starren Leiterplatte mit einem Kontaktpartner und Anordnung aus starrer Leiterplatte und Kontaktpartner
GB2462824A (en) * 2008-08-18 2010-02-24 Crombie 123 Ltd Printed circuit board encapsulation
US8701657B2 (en) * 2008-08-21 2014-04-22 Geno Llc Systems for generating nitric oxide
CN103379738A (zh) * 2012-04-24 2013-10-30 镇江华扬信息科技有限公司 一种印刷电路板的表面处理方法
US9053405B1 (en) 2013-08-27 2015-06-09 Flextronics Ap, Llc Printed RFID circuit
US9565748B2 (en) * 2013-10-28 2017-02-07 Flextronics Ap, Llc Nano-copper solder for filling thermal vias
CN104741490B (zh) * 2013-12-27 2017-06-20 博世汽车部件(苏州)有限公司 一种焊接工具
US9758889B2 (en) * 2014-05-08 2017-09-12 Ymt Co., Ltd. Method for producing substrate formed with copper thin layer, method for manufacturing printed circuit board and printed circuit board manufactured thereby
CN104470202B (zh) * 2014-12-31 2017-10-24 上海创功通讯技术有限公司 用于移动终端的印刷电路板及其焊盘表面处理方法
US9516760B2 (en) * 2015-01-22 2016-12-06 Eastman Kodak Company Methods for providing electrically-conductive articles
GB2539231B (en) * 2015-06-10 2017-08-23 Semblant Ltd Coated electrical assembly
CN105386004B (zh) * 2015-10-23 2018-11-13 衢州顺络电路板有限公司 取代金手指的线路板及其制造方法
US10351729B2 (en) 2016-03-03 2019-07-16 Motorola Mobility Llc Polysiloxane films and methods of making polysiloxane films
US10212825B2 (en) 2016-03-03 2019-02-19 Motorola Mobility Llc Polysiloxane films and methods of making polysiloxane films
WO2018096917A1 (ja) * 2016-11-22 2018-05-31 千住金属工業株式会社 はんだ付け方法
CN113275217B (zh) * 2021-05-18 2022-06-24 佛山市思博睿科技有限公司 等离子体接枝共聚膜层的制备方法
GB2609034A (en) * 2021-07-19 2023-01-25 Mordechai Ronen Aviv Systems and methods for additive manufacturing of electronics
TWI866173B (zh) * 2023-04-19 2024-12-11 啟碁科技股份有限公司 電子裝置與屏蔽結構
DE102024202567A1 (de) 2024-03-19 2025-09-25 Robert Bosch Gesellschaft mit beschränkter Haftung Kondensationsbeschichtungsverfahren für Schaltungsträger

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997039610A1 (en) 1996-04-18 1997-10-23 International Business Machines Corporation Organic-metallic composite coating for copper surface protection
US20060001700A1 (en) 2004-06-30 2006-01-05 Bertelsen Craig M Flexible circuit corrosion protection
US20060292354A1 (en) 2005-06-22 2006-12-28 Japan Aviation Electronics Industry Limited Wiring substrate

Family Cites Families (160)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3770571A (en) 1969-04-02 1973-11-06 Richardson Co Fabrication of printed circuit boards
FR2048044B1 (enExample) 1969-06-30 1973-01-12 Fmc Corp
US3649475A (en) 1969-07-22 1972-03-14 Gen Dynamics Corp Multi-layer printed circuit boards and methods of making same
US3745536A (en) 1971-03-01 1973-07-10 Burroughs Corp High speed serial scan and read-out of keyboards
GB1399252A (en) 1971-05-19 1975-07-02 Post Office Electrical signal initiating keyboards
US3931454A (en) * 1972-10-17 1976-01-06 Westinghouse Electric Corporation Printed circuit board and method of preparing it
JPS5219875B2 (enExample) 1974-02-07 1977-05-31
US4136225A (en) 1977-07-08 1979-01-23 Bell Telephone Laboratories, Incorporated Cover coatings for printed circuits
JPS5439873A (en) 1977-09-06 1979-03-27 Nippon Denso Co Incombustible ypet flexible printed wiring board
US4268568A (en) 1979-05-14 1981-05-19 Bell Telephone Laboratories, Incorporated Lubricated electrical contacts
JPS5946310B2 (ja) * 1979-08-29 1984-11-12 株式会社村田製作所 熱処理された銅被膜の酸化防止法
US4508756A (en) * 1980-10-08 1985-04-02 Murata Manufacturing Co., Ltd. Method for inhibiting oxidation of a copper film on ceramic body
JPS5766613A (en) * 1980-10-11 1982-04-22 Murata Manufacturing Co Method of preventing oxidation of copper coating film on ceramic unit
US4369287A (en) 1981-03-16 1983-01-18 Motorola Inc. Permanent fluxing agent and solder-through conformal coating
US4531659A (en) * 1982-02-26 1985-07-30 Wright Hershel E Foam dispensing device air return system
JPS5997029A (ja) 1982-11-26 1984-06-04 Hitachi Ltd 絶対圧形半導体圧力センサ
US4591659A (en) 1983-12-22 1986-05-27 Trw Inc. Multilayer printed circuit board structure
US4689110A (en) 1983-12-22 1987-08-25 Trw Inc. Method of fabricating multilayer printed circuit board structure
JPS60214941A (ja) 1984-04-10 1985-10-28 株式会社 潤工社 プリント基板
JPS60214942A (ja) 1984-04-10 1985-10-28 株式会社 潤工社 圧縮変形しにくい延伸多孔質四弗化エチレン樹脂体
JPS60257592A (ja) 1984-06-04 1985-12-19 松下電工株式会社 多層プリント配線板
JPS60258232A (ja) 1984-06-04 1985-12-20 Matsushita Electric Works Ltd フツ素系樹脂積層板
US4710429A (en) 1985-04-15 1987-12-01 The Dow Chemical Company Laminates from epoxidized phenol-hydrocarbon adducts
JPS61243844A (ja) 1985-04-23 1986-10-30 Hitachi Ltd 熱硬化性樹脂組成物
JPS62252016A (ja) 1986-04-24 1987-11-02 富士ポリマテック株式会社 接点ゴム導通部の形成法
CA1312040C (en) 1985-12-19 1992-12-29 Joseph Victor Koleske Conformal coatings cured with actinic radiation
US4732649A (en) 1986-06-18 1988-03-22 Macdermid, Incorporated Method for manufacture of printed circuit boards
US4772509A (en) 1987-04-13 1988-09-20 Japan Gore-Tex, Inc. Printed circuit board base material
US4784901A (en) 1987-04-13 1988-11-15 Japan Gore-Tex, Inc. Flexible printed circuit board base material
US4755911A (en) 1987-04-28 1988-07-05 Junkosha Co., Ltd. Multilayer printed circuit board
US4797178A (en) 1987-05-13 1989-01-10 International Business Machines Corporation Plasma etch enhancement with large mass inert gas
JPH01131270A (ja) 1987-11-17 1989-05-24 Asahi Glass Co Ltd 熱硬化性樹脂組成物及びその組成物を使用した積層板
JPH0180974U (enExample) 1987-11-20 1989-05-30
ES2048205T3 (es) * 1987-12-17 1994-03-16 Ici Plc Metodo y aparato para emulsificacion.
US6238774B1 (en) * 1988-02-04 2001-05-29 Fujitsu Limited Protection of oxide superconductor
JPH01225539A (ja) 1988-03-04 1989-09-08 Junkosha Co Ltd 積層板
US4895759A (en) * 1988-03-18 1990-01-23 Ppg Industries, Inc. Saturating grade paper
US4975319A (en) 1988-07-14 1990-12-04 General Electric Company Printed circuit board from fibers impregnated with epoxy resin mixture, halogenated bisphenol and polyphenylene ether
EP0355955A3 (en) 1988-07-25 1991-12-27 Hitachi, Ltd. Connection for semiconductor devices or integrated circuits by coated wires and method of manufacturing the same
JPH0286675A (ja) 1988-09-22 1990-03-27 Nitto Denko Corp プリント基板固着材
JPH0826116B2 (ja) 1988-09-30 1996-03-13 株式会社日立製作所 熱硬化性樹脂組成物およびこれを用いたプリント回路板
JPH02120351A (ja) 1988-10-29 1990-05-08 Japan Synthetic Rubber Co Ltd 難燃性樹脂組成物
JPH03129796A (ja) 1989-03-23 1991-06-03 Matsushita Electric Works Ltd プリント配線板の製造法
JPH0624211B2 (ja) 1989-04-26 1994-03-30 新日本製鐵株式会社 絶縁被覆ボンディングワイヤ
DE3912580C2 (de) 1989-04-17 1997-08-21 F&K Delvotec Bondtechnik Gmbh Bondstempel
JPH03242992A (ja) 1990-02-21 1991-10-29 Mitsubishi Plastics Ind Ltd 曲面形状を有するプリント配線板の製法
US5141702A (en) 1990-03-13 1992-08-25 Olin Corporation Method of making coated electrical connectors
JPH03278494A (ja) 1990-03-28 1991-12-10 Toshiba Chem Corp プリント回路用基板
JPH07120858B2 (ja) 1990-03-30 1995-12-20 株式会社日立製作所 多層プリント回路板およびその製造方法
US5059728A (en) * 1990-06-29 1991-10-22 Allied-Signal Inc. Partially fluorinated alkanes having a tertiary structure
JPH0465184A (ja) 1990-07-05 1992-03-02 Kansai Paint Co Ltd 電着前処理方法
JPH04208597A (ja) 1990-12-01 1992-07-30 Fujitsu Ltd 多層プリント配線板および多層プリント配線板の製造方法
JPH04219901A (ja) * 1990-12-19 1992-08-11 Nippon Steel Corp 保護膜を有する電気部品
ATE125666T1 (de) 1991-02-07 1995-08-15 Siemens Ag Mikromehrlagenverdrahtung.
US5274913A (en) * 1991-10-25 1994-01-04 International Business Machines Corporation Method of fabricating a reworkable module
JPH05275487A (ja) 1991-11-22 1993-10-22 Sumitomo 3M Ltd 電子部品表面保護材、その表面保護材を備えた電子部品、およびその表面保護材を使用した電子部品の電気的接続方法
JP3348454B2 (ja) * 1993-02-05 2002-11-20 ソニー株式会社 酸化防止方法
JP3552241B2 (ja) * 1993-04-07 2004-08-11 千住金属工業株式会社 プリフラックス
JP3334301B2 (ja) 1993-11-25 2002-10-15 日本メクトロン株式会社 フッ素樹脂基質と金属との接着剤
IL111497A (en) 1993-12-08 2001-01-28 Rohco Inc Mcgean Seelan preparations are useful as adhesives
JPH07201502A (ja) 1993-12-28 1995-08-04 Japan Gore Tex Inc 基板実装型電子部品
CA2118544A1 (en) 1993-12-30 1995-07-01 Henry W. Krautter Reliability elastomeric keypads and method for making same
US5639989A (en) 1994-04-19 1997-06-17 Motorola Inc. Shielded electronic component assembly and method for making the same
US5658962A (en) * 1994-05-20 1997-08-19 Minnesota Mining And Manufacturing Company Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application
JP2614190B2 (ja) 1994-06-01 1997-05-28 日本ピラー工業株式会社 多層板用プリプレグ、積層板、多層プリント回路基板およびその製造方法
JPH0827453A (ja) 1994-07-14 1996-01-30 Nitto Denko Corp 難燃性接着剤
JP2533747B2 (ja) 1994-07-25 1996-09-11 株式会社日立製作所 積層板及びその製造方法
US5734008A (en) 1994-10-28 1998-03-31 Sumitomo Chemical Company, Limited Polyimide film
JPH08143846A (ja) 1994-11-24 1996-06-04 Nitto Denko Corp 難燃性接着剤
JPH08288331A (ja) 1995-04-17 1996-11-01 Tanaka Denshi Kogyo Kk 半導体装置用ボンディングワイヤ及びその製造方法
DE19535068C2 (de) 1995-09-21 1997-08-21 Lpkf Cad Cam Systeme Gmbh Beschichtung zur strukturierten Erzeugung von Leiterbahnen auf der Oberfläche von elektrisch isolierenden Substraten, Verfahren zum Herstellen der Beschichtung und von strukturierten Leiterbahnen
GB9608952D0 (en) 1995-09-22 1996-07-03 Bnfl Fluorchem Ltd Coating compositions
US7112265B1 (en) 1996-02-14 2006-09-26 Lifescan Scotland Limited Disposable test strips with integrated reagent/blood separation layer
JP4252631B2 (ja) * 1996-02-29 2009-04-08 和夫 杉山 はんだ接合用表面の清浄方法及び改質方法並びにはんだ付け方法
JPH09307219A (ja) * 1996-05-14 1997-11-28 Tamura Seisakusho Co Ltd はんだ付け用処理方法
NZ501791A (en) 1997-06-14 2001-09-28 Secr Defence Method for coating fabric, paper or other surface using pulsed plasma polymerisation
JPH1112716A (ja) 1997-06-19 1999-01-19 Seiko Epson Corp ロウ接用材料およびその製造方法
JPH1131270A (ja) 1997-07-10 1999-02-02 Sanden Corp 自動販売機の商品収納装置
JPH1140907A (ja) 1997-07-17 1999-02-12 Fuji Photo Film Co Ltd プリント配線板及び部品取り付け方法
US5858074A (en) 1997-07-29 1999-01-12 National Research Council Of Canada Organic solderability preservative compositions
JP3420492B2 (ja) 1998-01-23 2003-06-23 京セラ株式会社 半導体装置
JP3551007B2 (ja) 1998-03-02 2004-08-04 セイコーエプソン株式会社 ワイヤボンディング方法および装置ならびにワイヤバンプの形成方法
JP3974256B2 (ja) 1998-04-22 2007-09-12 新日鐵化学株式会社 アルカリ現像型感光性樹脂組成物
JPH11319635A (ja) 1998-05-15 1999-11-24 Omron Corp 接点用有機物塗布装置及び接点用有機物塗布方法
GB9821267D0 (en) 1998-10-01 1998-11-25 Secr Defence Surface coatings
US6284308B2 (en) * 1998-12-25 2001-09-04 Victor Company Of Japan, Ltd. Manufacturing method of printed circuit board
JP2000211057A (ja) 1999-01-26 2000-08-02 Hitachi Chem Co Ltd 積層用中間板
JP2000277654A (ja) * 1999-03-25 2000-10-06 Kokusai Electric Co Ltd 半導体装置
US6306273B1 (en) * 1999-04-13 2001-10-23 Aclara Biosciences, Inc. Methods and compositions for conducting processes in microfluidic devices
SG93210A1 (en) 1999-06-29 2002-12-17 Univ Singapore Method for lamination of fluoropolymer to metal and printed circuit board (pcb) substrate
JP3640337B2 (ja) 1999-10-04 2005-04-20 信越化学工業株式会社 圧力センサー装置
JP4343354B2 (ja) * 1999-11-02 2009-10-14 Agcセイミケミカル株式会社 半田用フラックス這い上がり防止剤組成物とその用途
IL132898A (en) 1999-11-11 2009-09-01 Nds Ltd System for bitstream generation
WO2001044344A1 (en) * 1999-12-17 2001-06-21 Daicel Chemical Industries, Ltd. Curable resin composition, process for producing the same, and coated object made with the same
US6335224B1 (en) 2000-05-16 2002-01-01 Sandia Corporation Protection of microelectronic devices during packaging
DE10026714A1 (de) * 2000-05-30 2001-12-13 Hueck Folien Gmbh Verbundfolie, Verfahren zu ihrer Herstellung und ihre Verwendung
US7465478B2 (en) 2000-08-11 2008-12-16 Applied Materials, Inc. Plasma immersion ion implantation process
KR100823858B1 (ko) * 2000-10-04 2008-04-21 다우 코닝 아일랜드 리미티드 피복물 형성 방법 및 피복물 형성 장치
DE10051053A1 (de) 2000-10-14 2002-05-02 Bosch Gmbh Robert Verfahren zum Schutz elektronischer oder mikromechanischer Bauteile
JP4401049B2 (ja) * 2000-12-11 2010-01-20 旭硝子株式会社 硬化性組成物、硬化被膜および被覆基材
US20020134588A1 (en) 2000-12-18 2002-09-26 Dollarhite James Michael Hardsurfacing/hardfacing pertaining primarly to the horizontal directional drilling (HDD) industry utilizing technogenia
DE10114897A1 (de) 2001-03-26 2002-10-24 Infineon Technologies Ag Elektronisches Bauteil
US6969472B2 (en) 2001-04-19 2005-11-29 Lsi Logic Corporation Method of fabricating sub-micron hemispherical and hemicylidrical structures from non-spherically shaped templates
JP2002329741A (ja) 2001-05-07 2002-11-15 Sumiden Magnet Wire Kk 銅ボンディングワイヤー
US6589639B2 (en) * 2001-05-23 2003-07-08 International Business Machines Corporation Hole fill composition and method for filling holes in a substrate
US6803092B2 (en) * 2001-06-26 2004-10-12 3M Innovative Properties Company Selective deposition of circuit-protective polymers
EP1402321A1 (en) 2001-07-04 2004-03-31 Showa Denko K.K. Resist curable resin composition and cured article thereof
DE10133739A1 (de) 2001-07-11 2003-01-30 Mewa Textil Service Ag & Co Man Ohg Transportbehälter
SG117395A1 (en) 2001-08-29 2005-12-29 Micron Technology Inc Wire bonded microelectronic device assemblies and methods of manufacturing same
US6500529B1 (en) * 2001-09-14 2002-12-31 Tonoga, Ltd. Low signal loss bonding ply for multilayer circuit boards
JP4409134B2 (ja) * 2001-10-09 2010-02-03 パナソニック株式会社 実装システム
TW545092B (en) 2001-10-25 2003-08-01 Matsushita Electric Industrial Co Ltd Prepreg and circuit board and method for manufacturing the same
JP4075379B2 (ja) 2002-01-08 2008-04-16 株式会社デンソー フッ素樹脂の表面処理方法およびフッ素樹脂を用いたプリント配線基板の製造方法
KR100502179B1 (ko) 2002-02-25 2005-08-08 스마트알앤씨 주식회사 인쇄회로기판용 금속 피복 적층체의 제조 방법
US20030215588A1 (en) 2002-04-09 2003-11-20 Yeager Gary William Thermoset composition, method, and article
JP4499344B2 (ja) 2002-05-28 2010-07-07 株式会社日立製作所 樹脂組成物とそれを用いたプリプレグ,積層板および多層プリント回路板
US6776827B2 (en) 2002-09-23 2004-08-17 Syed M. Hasan Method and solution for treating fluorocarbon surfaces
JP2004134675A (ja) * 2002-10-11 2004-04-30 Sharp Corp Soi基板、表示装置およびsoi基板の製造方法
JP2004184340A (ja) 2002-12-05 2004-07-02 Tanaka Kikinzoku Kogyo Kk Dnaプローブ固定電極の製造方法
JP4020006B2 (ja) * 2003-05-09 2007-12-12 Jsr株式会社 絶縁性樹脂組成物およびその硬化物、ならびにはんだ接合方法
EP1505146A1 (en) * 2003-08-05 2005-02-09 Air Products And Chemicals, Inc. Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols
JP2005112981A (ja) 2003-10-07 2005-04-28 Hitachi Chem Co Ltd 低誘電率樹脂組成物およびそれを用いたプリプレグ、金属張積層板、印刷配線板
TWI243751B (en) 2003-10-21 2005-11-21 Park Electrochemical Corp Laminates having a low dielectric, low dissipation factor bond core and method of making same
JP4896367B2 (ja) * 2003-10-23 2012-03-14 パナソニック株式会社 電子部品の処理方法及び装置
US6923221B2 (en) * 2003-12-04 2005-08-02 Gilbarco Inc. Vapor recovery system with ORVR compensation
JP4195365B2 (ja) 2003-12-05 2008-12-10 アルプス電気株式会社 難燃性及び耐湿性を有する回路基板
JP4551654B2 (ja) 2003-12-09 2010-09-29 株式会社神戸製鋼所 プリント配線基板の穴あけ加工に使用する樹脂被覆金属板
JP4694251B2 (ja) * 2004-06-10 2011-06-08 四国化成工業株式会社 無鉛半田付け用の銅または銅合金の表面処理剤及びその利用
WO2005121101A1 (en) * 2004-06-10 2005-12-22 Shikoku Chemicals Corporation Phenylnaphthylimidazoles for use on copper surfaces during soldering
DE102004030388A1 (de) * 2004-06-23 2006-01-26 Ormecon Gmbh Artikel mit einer Beschichtung von elektrisch leitfähigem Polymer und Verfahren zu deren Herstellung
WO2006008841A1 (ja) * 2004-07-22 2006-01-26 Kyoto University フルオロカーボン膜及びその形成方法
JP5010112B2 (ja) 2004-07-26 2012-08-29 新神戸電機株式会社 プリプレグの製造法、積層板およびプリント配線板の製造法
JP4843214B2 (ja) 2004-11-16 2011-12-21 株式会社東芝 モジュール基板およびディスク装置
US7985677B2 (en) * 2004-11-30 2011-07-26 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
JP4655663B2 (ja) * 2005-02-21 2011-03-23 コニカミノルタオプト株式会社 塗布層を有するロール状フィルムの製造方法、ロール状光学フィルム、偏光板、液晶表示装置
US7579134B2 (en) * 2005-03-15 2009-08-25 E. I. Dupont De Nemours And Company Polyimide composite coverlays and methods and compositions relating thereto
JP2007010794A (ja) 2005-06-28 2007-01-18 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性エレメント
JP2007084764A (ja) 2005-09-26 2007-04-05 Jsr Corp コーティング材およびその製造方法
JP4722669B2 (ja) 2005-10-26 2011-07-13 株式会社日立ハイテクインスツルメンツ プラズマ洗浄装置
JP4438735B2 (ja) 2005-10-31 2010-03-24 日本ピラー工業株式会社 フッ素樹脂プリント基板
JP2007129039A (ja) 2005-11-02 2007-05-24 Nippon Pillar Packing Co Ltd フッ素樹脂プリント基板及びその製造方法
US20070258722A1 (en) 2006-05-08 2007-11-08 Jin Yu Optical receiver
JP2007326956A (ja) 2006-06-07 2007-12-20 Kaneka Corp プリプレグ、積層板、およびこれらからなるプリント配線板
US7527915B2 (en) * 2006-07-19 2009-05-05 E. I. Du Pont De Nemours And Company Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto
CN101145451B (zh) * 2006-08-29 2010-04-14 松下电器产业株式会社 触点开关
US8004860B2 (en) 2006-08-29 2011-08-23 Texas Instruments Incorporated Radiofrequency and electromagnetic interference shielding
US20090008796A1 (en) 2006-12-29 2009-01-08 United Test And Assembly Center Ltd. Copper on organic solderability preservative (osp) interconnect
US20080176096A1 (en) 2007-01-22 2008-07-24 Yen-Hang Cheng Solderable layer and a method for manufacturing the same
GB0703172D0 (en) 2007-02-19 2007-03-28 Pa Knowledge Ltd Printed circuit boards
KR100882023B1 (ko) 2007-05-25 2009-02-05 한국생산기술연구원 표면에너지 제어를 이용한 패터닝 방법
JP2009051876A (ja) 2007-08-23 2009-03-12 Three M Innovative Properties Co コーティング組成物及びそれを使用した物品
TWI377656B (en) 2007-09-19 2012-11-21 Method for manufacturing packaging substrate
US8071160B2 (en) 2007-10-29 2011-12-06 Integrated Surface Technologies Surface coating process
CN105744750B (zh) 2008-08-18 2019-06-18 赛姆布兰特有限公司 卤代烃聚合物涂层
US8618420B2 (en) 2008-08-18 2013-12-31 Semblant Global Limited Apparatus with a wire bond and method of forming the same
TW201041105A (en) 2009-05-13 2010-11-16 Advanced Semiconductor Eng Substrate having single patterned metal layer, and package applied with the same, and methods of manufacturing the substrate and package
US20110049703A1 (en) 2009-08-25 2011-03-03 Jun-Chung Hsu Flip-Chip Package Structure
US8995146B2 (en) 2010-02-23 2015-03-31 Semblant Limited Electrical assembly and method
GB201203927D0 (en) 2012-03-06 2012-04-18 Semblant Ltd Coated electrical assembly
GB2485419B (en) 2010-11-15 2015-02-25 Semblant Ltd Method for reducing creep corrosion

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997039610A1 (en) 1996-04-18 1997-10-23 International Business Machines Corporation Organic-metallic composite coating for copper surface protection
US20060001700A1 (en) 2004-06-30 2006-01-05 Bertelsen Craig M Flexible circuit corrosion protection
US20060292354A1 (en) 2005-06-22 2006-12-28 Japan Aviation Electronics Industry Limited Wiring substrate

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DELTSCHEW: "Plasma treatment for fluxless soldering", SURFACE & COATINGS TECHNOLOGY ELSEVIER SWITZERLAND, vol. 142-144, July 2001 (2001-07-01), pages 803 - 807, XP002499130, DOI: doi:10.1016/S0257-8972(01)01181-1

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9648720B2 (en) 2007-02-19 2017-05-09 Semblant Global Limited Method for manufacturing printed circuit boards
US8492898B2 (en) 2007-02-19 2013-07-23 Semblant Global Limited Printed circuit boards
WO2010020753A3 (en) * 2008-08-18 2010-06-24 Semblant Limited Halo-hydrocarbon polymer coating
US8618420B2 (en) 2008-08-18 2013-12-31 Semblant Global Limited Apparatus with a wire bond and method of forming the same
AU2009283992B2 (en) * 2008-08-18 2014-06-12 Semblant Limited Halo-hydrocarbon polymer coating
US9055700B2 (en) 2008-08-18 2015-06-09 Semblant Limited Apparatus with a multi-layer coating and method of forming the same
JP2013517382A (ja) * 2010-01-22 2013-05-16 ユーロプラズマ 低圧プラズマ工程による適応性ナノコーティングの被覆方法
WO2011104500A1 (en) 2010-02-23 2011-09-01 Semblant Global Limited Plasma-polymerized polymer coating
CN102791779A (zh) * 2010-02-23 2012-11-21 赛姆布兰特有限公司 等离子体聚合的聚合物涂层
US8995146B2 (en) 2010-02-23 2015-03-31 Semblant Limited Electrical assembly and method
WO2012066273A1 (en) 2010-11-15 2012-05-24 Semblant Global Limited Method for reducing creep corrosion
WO2013034920A2 (en) 2011-09-07 2013-03-14 Europlasma Nv Surface coatings
WO2018013889A1 (en) * 2016-07-15 2018-01-18 Aculon, Inc Coated articles that demonstrate push-through electrical connectivity
US11272624B2 (en) 2016-07-15 2022-03-08 Aculon Inc. Coated articles that demonstrate push-through electrical connectivity
US11786930B2 (en) 2016-12-13 2023-10-17 Hzo, Inc. Protective coating
CN108697001A (zh) * 2017-04-05 2018-10-23 中国科学院宁波材料技术与工程研究所 一种柔性电极和/或电路的制备方法
US10770238B2 (en) 2017-07-03 2020-09-08 Avx Corporation Solid electrolytic capacitor assembly with hydrophobic coatings
US11257628B2 (en) 2017-07-03 2022-02-22 KYOCERA AVX Components Corporation Solid electrolytic capacitor containing a nanocoating

Also Published As

Publication number Publication date
CN101682998B (zh) 2012-09-19
EP2130417B1 (en) 2019-03-27
GB0703172D0 (en) 2007-03-28
GB2453083A (en) 2009-03-25
JP2010519728A (ja) 2010-06-03
ES2728309T3 (es) 2019-10-23
KR20150043557A (ko) 2015-04-22
US20100025091A1 (en) 2010-02-04
CA2678309A1 (en) 2008-08-28
AU2008217648A1 (en) 2008-08-28
US8492898B2 (en) 2013-07-23
RU2009130670A (ru) 2011-04-10
GB2453083B (en) 2009-08-05
WO2008102113A3 (en) 2008-12-11
JP2013141016A (ja) 2013-07-18
TWI462671B (zh) 2014-11-21
PL2130417T3 (pl) 2019-10-31
KR102096147B1 (ko) 2020-04-01
DK2130417T3 (da) 2019-05-27
AU2008217648B2 (en) 2010-07-29
TW200843590A (en) 2008-11-01
EP2130417A2 (en) 2009-12-09
RU2563978C2 (ru) 2015-09-27
JP2017005280A (ja) 2017-01-05
JP5558112B2 (ja) 2014-07-23
US9648720B2 (en) 2017-05-09
TR201905093T4 (tr) 2019-05-21
KR20100014493A (ko) 2010-02-10
CN101682998A (zh) 2010-03-24
US20130334292A1 (en) 2013-12-19
GB0900635D0 (en) 2009-02-25
KR20170089979A (ko) 2017-08-04
CA2678309C (en) 2016-10-04

Similar Documents

Publication Publication Date Title
CA2678309C (en) Printed circuit boards
JP5813850B2 (ja) ハロ炭化水素ポリマーコーティング
US8618420B2 (en) Apparatus with a wire bond and method of forming the same
GB2462824A (en) Printed circuit board encapsulation
AU2014202320B2 (en) Halo-hydrocarbon polymer coating
GB2462822A (en) Wire bonding

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880005407.6

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08709439

Country of ref document: EP

Kind code of ref document: A2

ENP Entry into the national phase

Ref document number: 0900635

Country of ref document: GB

Kind code of ref document: A

Free format text: PCT FILING DATE = 20080218

WWE Wipo information: entry into national phase

Ref document number: 0900635.4

Country of ref document: GB

WWE Wipo information: entry into national phase

Ref document number: 2008217648

Country of ref document: AU

WWE Wipo information: entry into national phase

Ref document number: 2678309

Country of ref document: CA

WWE Wipo information: entry into national phase

Ref document number: 12526586

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 5242/DELNP/2009

Country of ref document: IN

ENP Entry into the national phase

Ref document number: 2009549476

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 2008217648

Country of ref document: AU

Date of ref document: 20080218

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 2008709439

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 1020097019604

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 2009130670

Country of ref document: RU