UA97126C2 - Процесс шлифования сапфирной основы - Google Patents
Процесс шлифования сапфирной основыInfo
- Publication number
- UA97126C2 UA97126C2 UAA200906861A UAA200906861A UA97126C2 UA 97126 C2 UA97126 C2 UA 97126C2 UA A200906861 A UAA200906861 A UA A200906861A UA A200906861 A UAA200906861 A UA A200906861A UA 97126 C2 UA97126 C2 UA 97126C2
- Authority
- UA
- Ukraine
- Prior art keywords
- sapphire substrate
- fixed abrasive
- machining
- machining sapphire
- grinding
- Prior art date
Links
- 229910052594 sapphire Inorganic materials 0.000 title abstract 4
- 239000010980 sapphire Substances 0.000 title abstract 4
- 239000000758 substrate Substances 0.000 title abstract 4
- 238000003754 machining Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US88235106P | 2006-12-28 | 2006-12-28 | |
PCT/US2007/088548 WO2008083071A1 (en) | 2006-12-28 | 2007-12-21 | Method of grinding a sapphire substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
UA97126C2 true UA97126C2 (ru) | 2012-01-10 |
Family
ID=39253929
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
UAA200906861A UA97126C2 (ru) | 2006-12-28 | 2007-12-21 | Процесс шлифования сапфирной основы |
Country Status (13)
Country | Link |
---|---|
US (1) | US8197303B2 (zh) |
EP (1) | EP2121242B1 (zh) |
JP (3) | JP5481198B2 (zh) |
KR (7) | KR20140131598A (zh) |
CN (2) | CN101600539B (zh) |
AT (1) | ATE545481T1 (zh) |
CA (1) | CA2673523C (zh) |
IN (1) | IN2014MN01903A (zh) |
PL (1) | PL2121242T3 (zh) |
RU (1) | RU2422259C2 (zh) |
TW (1) | TWI360457B (zh) |
UA (1) | UA97126C2 (zh) |
WO (1) | WO2008083071A1 (zh) |
Families Citing this family (58)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060196849A1 (en) * | 2005-03-04 | 2006-09-07 | Kevin Moeggenborg | Composition and method for polishing a sapphire surface |
KR20110124355A (ko) * | 2006-12-28 | 2011-11-16 | 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 | 사파이어 기판 및 그 제조 방법 |
US8740670B2 (en) * | 2006-12-28 | 2014-06-03 | Saint-Gobain Ceramics & Plastics, Inc. | Sapphire substrates and methods of making same |
JP2010514581A (ja) | 2006-12-28 | 2010-05-06 | サン−ゴバン セラミックス アンド プラスティクス,インコーポレイティド | サファイア基板及びその製造方法 |
US8894731B2 (en) * | 2007-10-01 | 2014-11-25 | Saint-Gobain Abrasives, Inc. | Abrasive processing of hard and /or brittle materials |
US8882868B2 (en) * | 2008-07-02 | 2014-11-11 | Saint-Gobain Abrasives, Inc. | Abrasive slicing tool for electronics industry |
TWI407587B (zh) * | 2009-01-21 | 2013-09-01 | Lumitek Corp | 發光二極體晶圓之研磨方法 |
JP5443192B2 (ja) * | 2010-02-10 | 2014-03-19 | 株式会社ディスコ | サファイア基板の加工方法 |
KR101139928B1 (ko) * | 2010-03-25 | 2012-04-30 | 주식회사 크리스탈온 | 기판 제조방법 |
CN102214565B (zh) * | 2010-04-09 | 2012-10-03 | 中国科学院微电子研究所 | 一种对碳化硅晶片进行减薄的方法 |
US9064836B1 (en) * | 2010-08-09 | 2015-06-23 | Sandisk Semiconductor (Shanghai) Co., Ltd. | Extrinsic gettering on semiconductor devices |
GB2484348A (en) * | 2010-10-08 | 2012-04-11 | Rec Wafer Norway As | Abrasive slurry and method of production of photovoltaic wafers |
JP5653234B2 (ja) * | 2011-01-21 | 2015-01-14 | 株式会社ディスコ | 硬質基板の研削方法 |
KR20130013577A (ko) * | 2011-07-28 | 2013-02-06 | 한솔테크닉스(주) | 기판 제조방법 |
JP5856433B2 (ja) * | 2011-10-21 | 2016-02-09 | 株式会社ディスコ | サファイア基板の研削方法 |
CN102403434B (zh) * | 2011-11-23 | 2014-08-27 | 杭州士兰明芯科技有限公司 | 一种垂直结构led芯片的制作方法 |
CN103213061B (zh) * | 2012-01-18 | 2015-06-03 | 张卫兴 | 图形化衬底专用蓝宝石衬底片加工工艺 |
US10052848B2 (en) | 2012-03-06 | 2018-08-21 | Apple Inc. | Sapphire laminates |
CN102729116B (zh) * | 2012-06-20 | 2016-04-27 | 大连淡宁实业发展有限公司 | 蓝宝石单晶长方体窗口多面抛光批量加工的加工工艺 |
US9221289B2 (en) | 2012-07-27 | 2015-12-29 | Apple Inc. | Sapphire window |
CN104736296B (zh) * | 2012-08-24 | 2018-08-28 | 艺康美国股份有限公司 | 抛光蓝宝石表面的方法 |
US9777398B2 (en) * | 2012-09-25 | 2017-10-03 | Apple Inc. | Plane orientation of crystalline structures |
KR101308379B1 (ko) * | 2012-12-24 | 2013-09-16 | 주식회사 에스코넥 | 모서리부의 곡률반경을 최소화한 프레스제품의 제조방법 |
US9232672B2 (en) | 2013-01-10 | 2016-01-05 | Apple Inc. | Ceramic insert control mechanism |
JP6436517B2 (ja) * | 2013-02-20 | 2018-12-12 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
CN103252708B (zh) * | 2013-05-29 | 2016-01-06 | 南京航空航天大学 | 基于固结磨料抛光垫的蓝宝石衬底的超精密加工方法 |
JP6166106B2 (ja) * | 2013-06-14 | 2017-07-19 | 株式会社ディスコ | サファイア基板の加工方法 |
US9678540B2 (en) | 2013-09-23 | 2017-06-13 | Apple Inc. | Electronic component embedded in ceramic material |
US9632537B2 (en) | 2013-09-23 | 2017-04-25 | Apple Inc. | Electronic component embedded in ceramic material |
CN103639877A (zh) * | 2013-11-26 | 2014-03-19 | 浙江上城科技有限公司 | 超薄蓝宝石片的抛光加工方法 |
US9154678B2 (en) | 2013-12-11 | 2015-10-06 | Apple Inc. | Cover glass arrangement for an electronic device |
CN103707147B (zh) * | 2013-12-18 | 2016-04-06 | 上海现代先进超精密制造中心有限公司 | 碳化硅超硬材料高精度大平面的加工方法 |
CN103698824B (zh) * | 2013-12-27 | 2015-11-18 | 贵州蓝科睿思技术研发中心 | 一种蓝宝石镀膜盖板及其加工方法 |
US9225056B2 (en) | 2014-02-12 | 2015-12-29 | Apple Inc. | Antenna on sapphire structure |
CN106170848A (zh) * | 2014-09-16 | 2016-11-30 | Mt系统公司 | 采用高温湿法进行的蓝宝石减薄和平滑化 |
CN106271942A (zh) * | 2015-05-20 | 2017-01-04 | 蓝思科技股份有限公司 | 蓝宝石基片的外形加工方法及含金刚石砂的砂轮 |
US10406634B2 (en) | 2015-07-01 | 2019-09-10 | Apple Inc. | Enhancing strength in laser cutting of ceramic components |
JP6687231B2 (ja) | 2015-07-15 | 2020-04-22 | 三井研削砥石株式会社 | 研磨工具及びその製造方法並びに研磨物の製造方法 |
CN105215838B (zh) * | 2015-10-29 | 2017-11-28 | 江苏吉星新材料有限公司 | 一种蓝宝石晶片的研磨装置及其研磨方法 |
CN105598749A (zh) * | 2015-11-09 | 2016-05-25 | 长春博启光学玻璃制造有限公司 | 全等厚蓝宝石半球、超半球整流罩的加工方法及加工设备 |
CN106363528A (zh) * | 2016-08-30 | 2017-02-01 | 天通银厦新材料有限公司 | 一种针对蓝宝石的固结磨料及研磨工艺 |
JP6917233B2 (ja) * | 2017-07-25 | 2021-08-11 | 株式会社ディスコ | ウエーハの加工方法 |
KR102180827B1 (ko) | 2018-09-21 | 2020-11-19 | 주식회사 포스코 | 도금량 제어 장치 및 도금량 제어 방법 |
KR102180828B1 (ko) | 2018-09-21 | 2020-11-19 | 주식회사 포스코 | 도금량 제어 장치 및 도금량 제어 방법 |
CN109551312A (zh) * | 2018-12-18 | 2019-04-02 | 福建福晶科技股份有限公司 | 一种钛宝石的表面冷加工方法 |
KR20210121024A (ko) * | 2019-02-01 | 2021-10-07 | 가부시키가이샤 노리타케 캄파니 리미티드 | 고경질 취성재용 메탈 본드 지석 |
US11022753B2 (en) * | 2019-02-14 | 2021-06-01 | Magic Leap, Inc. | Biased total thickness variations in waveguide display substrates |
KR102171310B1 (ko) * | 2019-02-22 | 2020-10-28 | 주식회사 마리알로 | 연마 방법 |
KR102198949B1 (ko) * | 2019-02-28 | 2021-01-06 | 에임즈마이크론 주식회사 | 질화갈륨 기판의 가공 장치 및 가공 방법 |
CN110018028B (zh) * | 2019-04-17 | 2023-01-13 | 宸鸿科技(厦门)有限公司 | 一种蓝宝石基材电子组件的金相切片样品制备方法 |
CN110098117A (zh) * | 2019-05-15 | 2019-08-06 | 上海新昇半导体科技有限公司 | 提高晶圆抛光平坦度的方法及硅片加工方法 |
CN110484207B (zh) * | 2019-09-20 | 2020-05-29 | 江苏京晶光电科技有限公司 | 一种蓝宝石晶片细磨研磨液的制备方法 |
CN110722692B (zh) * | 2019-10-12 | 2021-09-07 | 江苏澳洋顺昌集成电路股份有限公司 | 一种控制研磨产品bow值加工的方法 |
JP7271468B2 (ja) * | 2020-05-11 | 2023-05-11 | 信越化学工業株式会社 | サファイア基板の研削方法 |
JP7535962B2 (ja) | 2021-02-25 | 2024-08-19 | 株式会社ノリタケカンパニーリミテド | 超仕上加工方法 |
TWM633935U (zh) * | 2021-04-07 | 2022-11-11 | 日商信越化學工業股份有限公司 | 積層體的製造系統、積層體以及半導體裝置 |
TW202242209A (zh) * | 2021-04-28 | 2022-11-01 | 日商信越化學工業股份有限公司 | 積層結構體、半導體裝置以及積層結構體的製造方法 |
WO2022266138A1 (en) * | 2021-06-14 | 2022-12-22 | Entegris, Inc. | Grinding of hard substrates |
Family Cites Families (56)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56152562A (en) * | 1980-04-24 | 1981-11-26 | Fujitsu Ltd | Grinder |
JPS5968924A (ja) * | 1982-10-13 | 1984-04-19 | Toshiba Corp | 集積回路基板 |
JPS6296400A (ja) | 1985-10-23 | 1987-05-02 | Mitsubishi Metal Corp | ウエハの製造方法 |
JPH05235312A (ja) | 1992-02-19 | 1993-09-10 | Fujitsu Ltd | 半導体基板及びその製造方法 |
JP2987111B2 (ja) * | 1995-08-31 | 1999-12-06 | 株式会社東芝 | 半導体装置及びその製造方法 |
JPH09262761A (ja) * | 1996-03-27 | 1997-10-07 | Sumitomo Sitix Corp | 半導体ウェーハの研磨方法 |
JPH10166259A (ja) | 1996-12-12 | 1998-06-23 | Okamoto Kosaku Kikai Seisakusho:Kk | サファイア基板研削研磨方法および装置 |
JP3526509B2 (ja) * | 1997-03-27 | 2004-05-17 | 京セラ株式会社 | 磁気ディスク用基板 |
JP4264992B2 (ja) | 1997-05-28 | 2009-05-20 | ソニー株式会社 | 半導体装置の製造方法 |
US6102789A (en) | 1998-03-27 | 2000-08-15 | Norton Company | Abrasive tools |
US6019668A (en) | 1998-03-27 | 2000-02-01 | Norton Company | Method for grinding precision components |
JP2000124173A (ja) * | 1998-10-16 | 2000-04-28 | Hitachi Ltd | 半導体装置の製造方法 |
US6394888B1 (en) * | 1999-05-28 | 2002-05-28 | Saint-Gobain Abrasive Technology Company | Abrasive tools for grinding electronic components |
US6685539B1 (en) | 1999-08-24 | 2004-02-03 | Ricoh Company, Ltd. | Processing tool, method of producing tool, processing method and processing apparatus |
US6495463B2 (en) * | 1999-09-28 | 2002-12-17 | Strasbaugh | Method for chemical mechanical polishing |
US6346036B1 (en) * | 1999-10-28 | 2002-02-12 | Strasbaugh | Multi-pad apparatus for chemical mechanical planarization |
US20020052169A1 (en) * | 2000-03-17 | 2002-05-02 | Krishna Vepa | Systems and methods to significantly reduce the grinding marks in surface grinding of semiconductor wafers |
WO2001085393A1 (en) * | 2000-05-09 | 2001-11-15 | 3M Innovative Properties Company | Porous abrasive article having ceramic abrasive composites, methods of making, and methods of use |
JP2001322899A (ja) * | 2000-05-11 | 2001-11-20 | Matsushita Electric Ind Co Ltd | 窒化ガリウム系化合物半導体基板及びその製造方法 |
JP2002052448A (ja) | 2000-08-07 | 2002-02-19 | Dowa Mining Co Ltd | 半導体ウェハおよびその加工方法 |
KR100842473B1 (ko) * | 2000-10-26 | 2008-07-01 | 신에츠 한도타이 가부시키가이샤 | 웨이퍼의 제조방법 및 연마장치 및 웨이퍼 |
JP4651207B2 (ja) | 2001-02-26 | 2011-03-16 | 京セラ株式会社 | 半導体用基板とその製造方法 |
US6685755B2 (en) * | 2001-11-21 | 2004-02-03 | Saint-Gobain Abrasives Technology Company | Porous abrasive tool and method for making the same |
JP2003165798A (ja) | 2001-11-28 | 2003-06-10 | Hitachi Cable Ltd | 窒化ガリウム単結晶基板の製造方法、窒化ガリウム単結晶のエピタキシャル成長自立基板、及びその上に形成したデバイス素子 |
JP2003165042A (ja) * | 2001-11-29 | 2003-06-10 | Okamoto Machine Tool Works Ltd | 基板用乾式研磨装置および基板の乾式研磨方法 |
JP2003236735A (ja) * | 2002-02-20 | 2003-08-26 | Sumitomo Electric Ind Ltd | ウエハ研削方法 |
JP3968566B2 (ja) * | 2002-03-26 | 2007-08-29 | 日立電線株式会社 | 窒化物半導体結晶の製造方法及び窒化物半導体ウエハ並びに窒化物半導体デバイス |
JP2004029736A (ja) * | 2002-03-29 | 2004-01-29 | Hoya Corp | 電子デバイス用基板の平坦度決定方法および製造方法、マスクブランクおよび転写用マスクの製造方法 |
JP3613345B2 (ja) | 2002-09-11 | 2005-01-26 | 株式会社Neomax | 研磨装置および研磨装置用キャリア |
US6921719B2 (en) * | 2002-10-31 | 2005-07-26 | Strasbaugh, A California Corporation | Method of preparing whole semiconductor wafer for analysis |
JP2004168622A (ja) * | 2002-11-22 | 2004-06-17 | Kyocera Corp | 単結晶サファイア基板およびその製造方法 |
US6869894B2 (en) | 2002-12-20 | 2005-03-22 | General Chemical Corporation | Spin-on adhesive for temporary wafer coating and mounting to support wafer thinning and backside processing |
JP4278996B2 (ja) | 2003-01-29 | 2009-06-17 | 並木精密宝石株式会社 | ステップバンチ単結晶サファイヤ傾斜基板及びその製造方法 |
JP2004296912A (ja) * | 2003-03-27 | 2004-10-21 | Kyocera Corp | ウェハ支持基板 |
JP2004327566A (ja) * | 2003-04-23 | 2004-11-18 | Nikon Corp | Cmp研磨方法及び半導体デバイスの製造方法 |
KR100550491B1 (ko) | 2003-05-06 | 2006-02-09 | 스미토모덴키고교가부시키가이샤 | 질화물 반도체 기판 및 질화물 반도체 기판의 가공 방법 |
US7115480B2 (en) | 2003-05-07 | 2006-10-03 | Micron Technology, Inc. | Micromechanical strained semiconductor by wafer bonding |
JP4345357B2 (ja) * | 2003-05-27 | 2009-10-14 | 株式会社Sumco | 半導体ウェーハの製造方法 |
CN1289261C (zh) * | 2003-07-16 | 2006-12-13 | 上海新华霞实业有限公司 | 光学蓝宝石晶体基片的研磨工艺 |
US7439158B2 (en) | 2003-07-21 | 2008-10-21 | Micron Technology, Inc. | Strained semiconductor by full wafer bonding |
JP4486435B2 (ja) * | 2003-08-06 | 2010-06-23 | パナソニック株式会社 | Iii族窒化物結晶基板の製造方法、それに用いるエッチング液 |
KR20050029645A (ko) * | 2003-09-23 | 2005-03-28 | 삼성전기주식회사 | 샌드 블래스트를 이용한 사파이어 웨이퍼의 분할 방법 |
DE102004010377A1 (de) | 2004-03-03 | 2005-09-22 | Schott Ag | Herstellung von Substratwafern für defektarme Halbleiterbauteile, ihre Verwendung, sowie damit erhaltene Bauteile |
JP2005255463A (ja) * | 2004-03-11 | 2005-09-22 | Sumitomo Metal Mining Co Ltd | サファイア基板とその製造方法 |
JP3888374B2 (ja) | 2004-03-17 | 2007-02-28 | 住友電気工業株式会社 | GaN単結晶基板の製造方法 |
JP4333466B2 (ja) * | 2004-04-22 | 2009-09-16 | 日立電線株式会社 | 半導体基板の製造方法及び自立基板の製造方法 |
WO2006031641A2 (en) * | 2004-09-10 | 2006-03-23 | Cree, Inc. | Method of manufacturing carrier wafer and resulting carrier wafer structures |
WO2006044078A2 (en) | 2004-09-17 | 2006-04-27 | Pacific Biosciences Of California, Inc. | Apparatus and method for analysis of molecules |
JP2006128536A (ja) * | 2004-11-01 | 2006-05-18 | Hitachi Cable Ltd | 半導体エピタキシャルウェハ及びそれから切り出した半導体素子 |
US7396412B2 (en) | 2004-12-22 | 2008-07-08 | Sokudo Co., Ltd. | Coat/develop module with shared dispense |
JP4646638B2 (ja) * | 2005-01-14 | 2011-03-09 | 株式会社リコー | 表面研磨加工法及び加工装置 |
JP4664693B2 (ja) | 2005-01-24 | 2011-04-06 | 株式会社ディスコ | ウエーハの研削方法 |
JP4820108B2 (ja) | 2005-04-25 | 2011-11-24 | コマツNtc株式会社 | 半導体ウエーハの製造方法およびワークのスライス方法ならびにそれらに用いられるワイヤソー |
DE102005021099A1 (de) | 2005-05-06 | 2006-12-07 | Universität Ulm | GaN-Schichten |
JP5702931B2 (ja) * | 2006-09-22 | 2015-04-15 | サン−ゴバン セラミックス アンド プラスティクス,インコーポレイティド | 単結晶c−面サファイア材料の形成方法 |
KR20110124355A (ko) | 2006-12-28 | 2011-11-16 | 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 | 사파이어 기판 및 그 제조 방법 |
-
2007
- 2007-12-21 PL PL07855323T patent/PL2121242T3/pl unknown
- 2007-12-21 JP JP2009544217A patent/JP5481198B2/ja not_active Expired - Fee Related
- 2007-12-21 CA CA2673523A patent/CA2673523C/en not_active Expired - Fee Related
- 2007-12-21 CN CN2007800488935A patent/CN101600539B/zh not_active Expired - Fee Related
- 2007-12-21 UA UAA200906861A patent/UA97126C2/ru unknown
- 2007-12-21 EP EP07855323A patent/EP2121242B1/en not_active Not-in-force
- 2007-12-21 CN CN201310272500.6A patent/CN103382575B/zh not_active Expired - Fee Related
- 2007-12-21 KR KR20147029599A patent/KR20140131598A/ko active IP Right Grant
- 2007-12-21 AT AT07855323T patent/ATE545481T1/de active
- 2007-12-21 KR KR1020127003194A patent/KR101291112B1/ko not_active IP Right Cessation
- 2007-12-21 WO PCT/US2007/088548 patent/WO2008083071A1/en active Application Filing
- 2007-12-21 KR KR1020157015920A patent/KR20150075119A/ko active Application Filing
- 2007-12-21 KR KR1020137009222A patent/KR101369828B1/ko not_active IP Right Cessation
- 2007-12-21 RU RU2009128754/02A patent/RU2422259C2/ru not_active IP Right Cessation
- 2007-12-21 US US11/963,454 patent/US8197303B2/en not_active Expired - Fee Related
- 2007-12-21 KR KR1020137019582A patent/KR101715024B1/ko active IP Right Grant
- 2007-12-21 KR KR1020167032676A patent/KR20160137681A/ko not_active Application Discontinuation
- 2007-12-21 IN IN1903MUN2014 patent/IN2014MN01903A/en unknown
- 2007-12-21 TW TW096149566A patent/TWI360457B/zh not_active IP Right Cessation
- 2007-12-21 KR KR1020097013036A patent/KR101159658B1/ko active IP Right Grant
-
2012
- 2012-06-21 JP JP2012139635A patent/JP5743962B2/ja not_active Expired - Fee Related
-
2014
- 2014-10-28 JP JP2014219182A patent/JP2015039033A/ja not_active Ceased
Also Published As
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IN2014MN01903A (zh) | ||
EP2100325A4 (en) | WATER-BASED POLISHING PELLET FOR POLISHING A SILICON CARBIDE MONOCRYSTALLINE SUBSTRATE, AND POLISHING METHOD THEREOF | |
MY149975A (en) | Polishing composition and method utilizing abrasive particles treated with an aminosilane | |
TW200617151A (en) | Polishing composition and polishing method using the same | |
MX2009010035A (es) | Articulos abrasivos, herramientas alternantes rotacionales y metodos. | |
MY153077A (en) | Method to selectively polish silicon carbide films | |
SG178605A1 (en) | Chemical mechanical polishing conditioner | |
MX2009010119A (es) | Metodos para remover defectos en superficies. | |
IL185418A0 (en) | Composition and method for polishing a sapphire surface | |
TW200714416A (en) | Tool having sintered-body abrasive portion and method for producing the same | |
WO2009017672A3 (en) | Wire saw process | |
EP1994112A4 (en) | CHEMICAL MECHANICAL POLISHING PASTE AND METHOD OF POLISHING A SEMICONDUCTOR WAFER USING THE SAME | |
MY170361A (en) | Sapphire polishing slurry and sapphire polishing method | |
EP1478012A4 (en) | POLISHING METHOD AND POLISHING FLUID | |
JP2010283371A5 (zh) | ||
EP1796152A4 (en) | POLISHING AGENT FOR MECHANICAL CHEMICAL PLANARIZATION (CMP) | |
TW200706619A (en) | Polishing composition and method for defect improvement by reduced particle stiction on copper surface | |
WO2008102672A1 (ja) | 研磨スラリーおよびその製造方法、ならびに窒化物結晶体およびその表面研磨方法 | |
WO2007022016A3 (en) | Abrasive tool | |
AU2003254825A1 (en) | Cmp abrasive and substrate polishing method | |
EP2113938A3 (en) | Group III nitride crystal and method for surface treatment thereof, Group III nitride stack and manufacturing method thereof, and group III nitride semiconductor device and manufacturing method thereof | |
TW200626289A (en) | An optimized grooving structure for a CMP polishing pad | |
TW200517477A (en) | Chemical mechanical abrasive slurry and method of using the same | |
MY156911A (en) | Insert carrier and method for the simultaneous double-side material-removing processing of semiconductor wafers | |
IL176850A0 (en) | Coated abrasives |