JP5702931B2 - 単結晶c−面サファイア材料の形成方法 - Google Patents
単結晶c−面サファイア材料の形成方法 Download PDFInfo
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- JP5702931B2 JP5702931B2 JP2009529410A JP2009529410A JP5702931B2 JP 5702931 B2 JP5702931 B2 JP 5702931B2 JP 2009529410 A JP2009529410 A JP 2009529410A JP 2009529410 A JP2009529410 A JP 2009529410A JP 5702931 B2 JP5702931 B2 JP 5702931B2
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- sapphire
- temperature gradient
- single crystal
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/206—Controlling or regulating the thermal history of growing the ingot
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/34—Edge-defined film-fed crystal-growth using dies or slits
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/20—Aluminium oxides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1092—Shape defined by a solid member other than seed or product [e.g., Bridgman-Stockbarger]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/23907—Pile or nap type surface or component
- Y10T428/23986—With coating, impregnation, or bond
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第1例では、C−面単結晶サファイアプレートを製造するための技術が、a−面材料を製造するための周知の装置と条件を用いて、試みられた。上記装置では、モリブデンのるつぼが、10cmの幅及び0.15cmの厚みを有する30cmの長さのリボンを製造するために適切なアルミナを供給することで満たされた。上記融液は誘導結合加熱によって約2050℃に保持された。上記装置は、ダイ開口部に抜け出る3つの垂直に配向された毛細管を有するモリブデンのダイを含み、それぞれの毛細管は、10cmの幅及び0.15cmの厚みを有した。サファイアの種結晶は、上記ダイ開口部で上記融液に接触された。上記種結晶は、そのC軸が、上記ダイの主な垂直面に垂直に配向された。次いで、上記種は2.5cm/hrの速度で上方に引き上げられた。上記ダイ開口部の真上の熱損失は、断熱材と熱シールドとを含む上記装置の低い温度勾配の区域によって制御された。上記リボンが高く引き上げられるにつれて、上記温度勾配は増加し、上記リボンが上記装置のより高い位置に到達するにつれて、上記リボンはより速い速度で冷却されることを可能とする。これは、上記種の方位を別にすれば、a−面単結晶サファイアを製造するために用いられる技術と類似または同一でもよい。
例2では、例えば図5に示すような単結晶成長装置が使用された。それは例1で使用された装置と異なっていた。例えば、減少した温度勾配の領域を形成するために、高温ゾーンの上の後部ヒーターが使用された。モリブデン封入物270、第2誘導加熱コイル232、及び水平熱シールド260を含む上記後部ヒーターが、例1の装置においてよりも間隔を近づけて一緒に設置された。加えて、例2の単結晶成長装置は、約15cmの高さまで高温ゾーンを囲うグラファイト断熱材272を含んだ。上記装置は、例1と同様に、モリブデンの3つのダイとモリブデンのるつぼとを含んだ。
Claims (4)
- エッジディファインドフィルム−フェド成長法を用いた単結晶C−面サファイア材料の形成方法であって、
ダイ開口部の長手方向軸にほぼ垂直のC軸配向を有する種を溶融治具に入れること;
該ダイの上に単結晶サファイアを結晶化させること、
ここで、該単結晶サファイアは該サファイアの主面にほぼ垂直のC軸配向を示す;
1cm以上、20cm以下の長さを有するとともに、該ダイの開口部に隣接して位置し、第1の温度勾配を示す第1領域に該サファイアを通過させること、
その際、該第1領域が20℃/cm〜60℃/cmの該第1の温度勾配を示し、該サファイアが1850℃より高くなっている;
続いて該サファイアを、1cm以上、30cm以下の長さを有するとともに、該第1領域に隣接し且つ該ダイの遠位側に位置し、第2の温度勾配を示す第2領域に通過させること、
その際、該第2領域が3℃/cm〜15℃/cmの該第2の温度勾配を示し、該サファイアが1850℃より高くなっている;及び
10,000転位/cm2未満を示す材料を製造するために該C−面サファイアを冷却すること、
ここで、該転位密度は、ブラッグ回折に基づく透過X線回折トポグラフィーを使用して検出される;
を含む、形成方法。 - 該第1の温度勾配は、該第2の温度勾配より少なくとも10℃/cm大きい、請求項1に記載の方法。
- 2.5cm/hrよりも速い速度で該単結晶サファイアを引き上げることを含む、請求項1に記載の方法。
- 30cm以上の長さを有するサファイアプレートを製造することを含む、請求項1に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US82672306P | 2006-09-22 | 2006-09-22 | |
US60/826,723 | 2006-09-22 | ||
PCT/US2007/079149 WO2008036888A1 (en) | 2006-09-22 | 2007-09-21 | C-plane sapphire method and apparatus |
Publications (2)
Publication Number | Publication Date |
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JP2010504274A JP2010504274A (ja) | 2010-02-12 |
JP5702931B2 true JP5702931B2 (ja) | 2015-04-15 |
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Application Number | Title | Priority Date | Filing Date |
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JP2009529410A Expired - Fee Related JP5702931B2 (ja) | 2006-09-22 | 2007-09-21 | 単結晶c−面サファイア材料の形成方法 |
Country Status (12)
Country | Link |
---|---|
US (3) | US8652658B2 (ja) |
EP (1) | EP2082081B1 (ja) |
JP (1) | JP5702931B2 (ja) |
KR (5) | KR101298965B1 (ja) |
CN (2) | CN102965729A (ja) |
AU (1) | AU2007299677B2 (ja) |
CA (1) | CA2663382C (ja) |
MX (1) | MX2009003120A (ja) |
RU (1) | RU2436875C2 (ja) |
TW (2) | TWI472652B (ja) |
UA (1) | UA96952C2 (ja) |
WO (1) | WO2008036888A1 (ja) |
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KR100718188B1 (ko) * | 2004-05-07 | 2007-05-15 | 삼성코닝 주식회사 | 비극성 a면 질화물 반도체 단결정 기판 및 이의 제조방법 |
ATE468427T1 (de) | 2004-08-05 | 2010-06-15 | Amosov Vladimir Iljich | Verfahren zum ziehen von einkristallen aus einer schmelze |
JP2006176359A (ja) | 2004-12-22 | 2006-07-06 | Tdk Corp | 単結晶の製造装置及び製造方法 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6025080B1 (ja) * | 2015-12-26 | 2016-11-16 | 並木精密宝石株式会社 | 大型efg法用育成炉の熱反射板構造 |
JP2017114757A (ja) * | 2015-12-26 | 2017-06-29 | 並木精密宝石株式会社 | 大型efg法用育成炉の熱反射板構造 |
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