TWI531866B - - Google Patents

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Publication number
TWI531866B
TWI531866B TW096132716A TW96132716A TWI531866B TW I531866 B TWI531866 B TW I531866B TW 096132716 A TW096132716 A TW 096132716A TW 96132716 A TW96132716 A TW 96132716A TW I531866 B TWI531866 B TW I531866B
Authority
TW
Taiwan
Application number
TW096132716A
Other versions
TW200830056A (en
Inventor
柴崎祐一
Original Assignee
尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2006237465 priority Critical
Application filed by 尼康股份有限公司 filed Critical 尼康股份有限公司
Publication of TW200830056A publication Critical patent/TW200830056A/zh
Application granted granted Critical
Publication of TWI531866B publication Critical patent/TWI531866B/zh

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • G03F7/70725Stages control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70758Drive means, e.g. actuator, motor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70775Position control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70975Assembly, maintenance, transport and storage of apparatus
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
TW096132716A 2006-09-01 2007-09-03 TWI531866B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006237465 2006-09-01

Publications (2)

Publication Number Publication Date
TW200830056A TW200830056A (en) 2008-07-16
TWI531866B true TWI531866B (zh) 2016-05-01

Family

ID=39157185

Family Applications (9)

Application Number Title Priority Date Filing Date
TW104139625A TW201610608A (en) 2006-09-01 2007-09-03 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
TW106111117A TWI623825B (zh) 2006-09-01 2007-09-03
TW106143966A TW201809913A (en) 2006-09-01 2007-09-03 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
TW105117028A TWI584082B (zh) 2006-09-01 2007-09-03
TW096132716A TWI531866B (zh) 2006-09-01 2007-09-03
TW105135034A TWI574125B (zh) 2006-09-01 2007-09-03
TW105117029A TWI600979B (zh) 2006-09-01 2007-09-03
TW103138504A TWI510871B (zh) 2006-09-01 2007-09-03
TW103138507A TWI531873B (zh) 2006-09-01 2007-09-03

Family Applications Before (4)

Application Number Title Priority Date Filing Date
TW104139625A TW201610608A (en) 2006-09-01 2007-09-03 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
TW106111117A TWI623825B (zh) 2006-09-01 2007-09-03
TW106143966A TW201809913A (en) 2006-09-01 2007-09-03 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
TW105117028A TWI584082B (zh) 2006-09-01 2007-09-03

Family Applications After (4)

Application Number Title Priority Date Filing Date
TW105135034A TWI574125B (zh) 2006-09-01 2007-09-03
TW105117029A TWI600979B (zh) 2006-09-01 2007-09-03
TW103138504A TWI510871B (zh) 2006-09-01 2007-09-03
TW103138507A TWI531873B (zh) 2006-09-01 2007-09-03

Country Status (9)

Country Link
US (3) US8860925B2 (zh)
EP (3) EP3361317A1 (zh)
JP (10) JP5486189B2 (zh)
KR (9) KR101442449B1 (zh)
CN (3) CN102749812B (zh)
HK (3) HK1173232A1 (zh)
SG (2) SG10201407218XA (zh)
TW (9) TW201610608A (zh)
WO (1) WO2008029758A1 (zh)

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