KR20170016014A - 액침 리소그래피에 의한 광학기기의 세정방법 - Google Patents

액침 리소그래피에 의한 광학기기의 세정방법 Download PDF

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Publication number
KR20170016014A
KR20170016014A KR1020177002557A KR20177002557A KR20170016014A KR 20170016014 A KR20170016014 A KR 20170016014A KR 1020177002557 A KR1020177002557 A KR 1020177002557A KR 20177002557 A KR20177002557 A KR 20177002557A KR 20170016014 A KR20170016014 A KR 20170016014A
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KR
South Korea
Prior art keywords
optical element
cleaning
liquid
immersion
workpiece
Prior art date
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Ceased
Application number
KR1020177002557A
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English (en)
Korean (ko)
Inventor
앤드류 제이 헤이즐턴
히데미 가와이
더글라스 씨 왓슨
더블유 토마스 노박
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20170016014A publication Critical patent/KR20170016014A/ko
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

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  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020177002557A 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법 Ceased KR20170016014A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US46255603P 2003-04-11 2003-04-11
US60/462,556 2003-04-11
US48291303P 2003-06-27 2003-06-27
US60/482,913 2003-06-27
PCT/US2004/010309 WO2004093130A2 (en) 2003-04-11 2004-04-02 Cleanup method for optics in immersion lithography

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020157002109A Division KR101753496B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피 장치 및 액침 리소그래피 장치에 사용되는 세정 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020197001257A Division KR20190007532A (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법

Publications (1)

Publication Number Publication Date
KR20170016014A true KR20170016014A (ko) 2017-02-10

Family

ID=33303091

Family Applications (11)

Application Number Title Priority Date Filing Date
KR1020177002557A Ceased KR20170016014A (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020127025016A Expired - Fee Related KR101318542B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020117018576A Expired - Fee Related KR101324818B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020147005470A Expired - Fee Related KR101597475B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020157002109A Expired - Fee Related KR101753496B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피 장치 및 액침 리소그래피 장치에 사용되는 세정 방법
KR1020197001257A Ceased KR20190007532A (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020117024887A Expired - Fee Related KR101508810B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020117022193A Expired - Fee Related KR101508809B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020137013978A Expired - Fee Related KR101525335B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020127014420A Expired - Fee Related KR101289959B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020057019365A Expired - Fee Related KR101342824B1 (ko) 2003-04-11 2005-10-11 액침 리소그래피에 의한 광학기기의 세정방법

Family Applications After (10)

Application Number Title Priority Date Filing Date
KR1020127025016A Expired - Fee Related KR101318542B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020117018576A Expired - Fee Related KR101324818B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020147005470A Expired - Fee Related KR101597475B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020157002109A Expired - Fee Related KR101753496B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피 장치 및 액침 리소그래피 장치에 사용되는 세정 방법
KR1020197001257A Ceased KR20190007532A (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020117024887A Expired - Fee Related KR101508810B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020117022193A Expired - Fee Related KR101508809B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020137013978A Expired - Fee Related KR101525335B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020127014420A Expired - Fee Related KR101289959B1 (ko) 2003-04-11 2004-04-02 액침 리소그래피에 의한 광학기기의 세정방법
KR1020057019365A Expired - Fee Related KR101342824B1 (ko) 2003-04-11 2005-10-11 액침 리소그래피에 의한 광학기기의 세정방법

Country Status (9)

Country Link
US (10) US7522259B2 (https=)
EP (6) EP2166413A1 (https=)
JP (10) JP4837556B2 (https=)
KR (11) KR20170016014A (https=)
CN (4) CN106444292A (https=)
AT (1) ATE449982T1 (https=)
DE (1) DE602004024295D1 (https=)
SG (5) SG2013077797A (https=)
WO (1) WO2004093130A2 (https=)

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