KR100314552B1 - 노광장치 및 노광장치 작동방법 - Google Patents
노광장치 및 노광장치 작동방법 Download PDFInfo
- Publication number
- KR100314552B1 KR100314552B1 KR1019990025867A KR19990025867A KR100314552B1 KR 100314552 B1 KR100314552 B1 KR 100314552B1 KR 1019990025867 A KR1019990025867 A KR 1019990025867A KR 19990025867 A KR19990025867 A KR 19990025867A KR 100314552 B1 KR100314552 B1 KR 100314552B1
- Authority
- KR
- South Korea
- Prior art keywords
- stage
- window frame
- mask
- base
- mask stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T74/00—Machine element or mechanism
- Y10T74/20—Control lever and linkage systems
- Y10T74/20012—Multiple controlled elements
- Y10T74/20201—Control moves in two planes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Toxicology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (19)
- 마스크의 패턴을 대상물상에 노광하는 노광장치에 있어서,기초상에 지지되는 메인프레임;상기 패턴을 상기 대상물에 노광하는 노광 디바이스;상기 마스크를 보유하며, 상기 메인프레임에 의해 이동가능하게 지지되는 마스크 스테이지;상기 기초상에 지지되는 반응프레임; 및상기 반응프레임에 적어도 부분적으로 연결되어, 상기 마스크 스테이지를 이동시키는 구동 디바이스를 포함하며,상기 마스크 스테이지의 이동에 의해 발생하는 반력의 일부가 상기 메인프레임을 통하지 않고, 상기 반응프레임을 통해서 상기 기초에 전달되는 것을 특징으로 하는 노광장치.
- 제 1 항에 있어서,상기 노광 디바이스는 상기 패턴을 투영하는 투영시스템을 포함하는 것을 특징으로 하는 노광장치.
- 제 3 항에 있어서,상기 투영시스템은 상기 마스크 아래쪽에 배치되는 것을 특징으로 하는 노광장치.
- 제 3 항에 있어서,상기 투영시스템은 화상을 광학적으로 투영하는 것을 특징으로 하는 노광장치.
- 제 1 항에 있어서,상기 메인프레임은 상기 노광 디바이스를 지지하는 것을 특징으로 하는 노광장치.
- 제 1 항에 있어서,상기 메인프레임은 스테이지 기부를 포함하고, 상기 마스크 스테이지가 베어링상에서 상기 스테이지 기부의 표면 상부를 이동할 수 있도록 한 것을 특징으로 하는 노광장치.
- 제 7 항에 있어서,상기 베어링은 상기 마스크 스테이지를 지지하는 비접촉 베어링인 것을 특징으로 하는 노광장치.
- 제 8 항에 있어서,상기 베어링은 공기 베어링을 포함하는 것을 특징으로 하는 노광장치.
- 제 1 항에 있어서,상기 구동 디바이스는 리니어 모터를 포함하는 것을 특징으로 하는 노광장치.
- 제 1 항에 있어서,상기 구동 디바이스는 상기 마스크 스테이지에 연결된 제 1 부분과 상기 반응프레임에 연결된 제 2 부분을 포함하는 것을 특징으로 하는 노광장치.
- 제 11 항에 있어서,상기 제 1 부분은 코일을 포함하고, 상기 제 2 부분은 자석을 포함하는 것을 특징으로 하는 노광장치.
- 제 1 항에 있어서,상기 구동 디바이스는 상기 마스크 스테이지를 2차원 평면에서 이동시키는 것을 특징으로 하는 노광장치.
- 제 1 항에 있어서,상기 반응프레임은 코일과 자석중 어느 하나를 상기 구동 디바이스의 일부분으로 지지하는 것을 특징으로 하는 노광장치.
- 제 1 항에 있어서,상기 대상물을 보유하여 이동하는 대상물 스테이지를 더 포함하는 것을 특징으로 하는 노광장치.
- 제 15 항에 있어서,상기 메인프레임은 상기 대상물 스테이지를 이동 가능하게 지지하는 것을 특징으로 하는 노광장치.
- 제 15 항에 있어서,상기 메인프레임은 상기 대상물 스테이지와 상기 노광 디바이스를 지지하는 것을 특징으로 하는 노광장치.
- 제 1 항에 있어서,상기 마스크 스테이지는 세라믹 또는 스틸로 제조된 것을 특징으로 하는 노광장치.
- 제 1 항에 있어서,상기 노광 장치는 주사형 노광장치인 것을 특징으로 하는 노광장치.
- 마스크의 패턴을 대상물상에 전사하기 위한 노광장치 작동방법에 있어서, 상기 노광장치는 기초상에 지지되는 메인프레임, 상기 패턴을 상기 대상물에 노광하는 노광 디바이스, 마스크를 보유하며 상기 메인프레임에 의해 이동 가능하게 지지되는 마스크 스테이지, 상기 기초상에 지지되는 반응프레임, 및 상기 반응프레임에 적어도 일부분이 결합되어 있으며 상기 마스크 스테이지를 이동시키는 구동 디바이스를 포함하며, 상기 방법은,상기 마스크 스테이지를 상기 구동 디바이스에 의해 이동시키는 단계; 및상기 마스크 스테이지의 이동에 의해 유발된 반력의 일부분을 상기 반응프레임에 실질적으로 전달하는 단계를 포함하는 것을 특징으로 하는 노광장치 작동방법.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/416,558 US5874820A (en) | 1995-04-04 | 1995-04-04 | Window frame-guided stage mechanism |
| US416,558 | 1995-04-04 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960009937A Division KR100300220B1 (ko) | 1995-04-04 | 1996-04-03 | 스테이지 기구 및 그 동작방법 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020010033268A Division KR100314556B1 (ko) | 1995-04-04 | 2001-06-13 | 노광장치 및 노광방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR100314552B1 true KR100314552B1 (ko) | 2001-11-15 |
Family
ID=23650430
Family Applications (6)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960009937A Expired - Lifetime KR100300220B1 (ko) | 1995-04-04 | 1996-04-03 | 스테이지 기구 및 그 동작방법 |
| KR1019990025867A Expired - Fee Related KR100314552B1 (ko) | 1995-04-04 | 1999-06-30 | 노광장치 및 노광장치 작동방법 |
| KR1019990025869A Expired - Fee Related KR100314553B1 (ko) | 1995-04-04 | 1999-06-30 | 노광장치 및 노광방법 |
| KR1019990025872A Expired - Fee Related KR100314555B1 (ko) | 1995-04-04 | 1999-06-30 | 노광장치 및 노광방법 |
| KR1019990025871A Expired - Fee Related KR100314554B1 (ko) | 1995-04-04 | 1999-06-30 | 노광장치 및 노광방법 |
| KR1020010033268A Expired - Fee Related KR100314556B1 (ko) | 1995-04-04 | 2001-06-13 | 노광장치 및 노광방법 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960009937A Expired - Lifetime KR100300220B1 (ko) | 1995-04-04 | 1996-04-03 | 스테이지 기구 및 그 동작방법 |
Family Applications After (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019990025869A Expired - Fee Related KR100314553B1 (ko) | 1995-04-04 | 1999-06-30 | 노광장치 및 노광방법 |
| KR1019990025872A Expired - Fee Related KR100314555B1 (ko) | 1995-04-04 | 1999-06-30 | 노광장치 및 노광방법 |
| KR1019990025871A Expired - Fee Related KR100314554B1 (ko) | 1995-04-04 | 1999-06-30 | 노광장치 및 노광방법 |
| KR1020010033268A Expired - Fee Related KR100314556B1 (ko) | 1995-04-04 | 2001-06-13 | 노광장치 및 노광방법 |
Country Status (3)
| Country | Link |
|---|---|
| US (11) | US5874820A (ko) |
| JP (3) | JPH08330224A (ko) |
| KR (6) | KR100300220B1 (ko) |
Families Citing this family (257)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7365513B1 (en) | 1994-04-01 | 2008-04-29 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
| US5874820A (en) | 1995-04-04 | 1999-02-23 | Nikon Corporation | Window frame-guided stage mechanism |
| US6989647B1 (en) * | 1994-04-01 | 2006-01-24 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
| US5528118A (en) | 1994-04-01 | 1996-06-18 | Nikon Precision, Inc. | Guideless stage with isolated reaction stage |
| JP3363662B2 (ja) * | 1994-05-19 | 2003-01-08 | キヤノン株式会社 | 走査ステージ装置およびこれを用いた露光装置 |
| US6721034B1 (en) | 1994-06-16 | 2004-04-13 | Nikon Corporation | Stage unit, drive table, and scanning exposure apparatus using the same |
| US5850280A (en) * | 1994-06-16 | 1998-12-15 | Nikon Corporation | Stage unit, drive table, and scanning exposure and apparatus using same |
| US6008500A (en) * | 1995-04-04 | 1999-12-28 | Nikon Corporation | Exposure apparatus having dynamically isolated reaction frame |
| US6392741B1 (en) * | 1995-09-05 | 2002-05-21 | Nikon Corporation | Projection exposure apparatus having active vibration isolator and method of controlling vibration by the active vibration isolator |
| US6522386B1 (en) * | 1997-07-24 | 2003-02-18 | Nikon Corporation | Exposure apparatus having projection optical system with aberration correction element |
| WO1999025011A1 (en) | 1997-11-12 | 1999-05-20 | Nikon Corporation | Projection exposure apparatus |
| AU1260099A (en) | 1997-11-25 | 1999-06-15 | Nikon Corporation | Projection exposure system |
| JP3526202B2 (ja) * | 1998-02-03 | 2004-05-10 | キヤノン株式会社 | ステージ装置、およびこれを用いた露光装置、ならびにデバイス製造方法 |
| AU2186099A (en) | 1998-02-09 | 1999-08-23 | Nikon Corporation | Apparatus for supporting base plate, apparatus and method for transferring base plate, method of replacing base plate, and exposure apparatus and method of manufacturing the same |
| US6260282B1 (en) * | 1998-03-27 | 2001-07-17 | Nikon Corporation | Stage control with reduced synchronization error and settling time |
| JPH11287880A (ja) * | 1998-04-01 | 1999-10-19 | Canon Inc | ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法 |
| JP3554186B2 (ja) * | 1998-04-08 | 2004-08-18 | キヤノン株式会社 | 露光装置、デバイス製造方法および反力受け方法 |
| JP4362975B2 (ja) | 1998-04-10 | 2009-11-11 | 株式会社ニコン | リニアモーターコイル、コイル、リニアモーター、電気モーター、リニアモーターの製造方法、電気モーターの製造方法、ステージ装置、露光装置 |
| EP1134793A4 (en) * | 1998-06-17 | 2006-07-26 | Nikon Corp | EXPOSURE METHOD AND DEVICE |
| TWI242113B (en) * | 1998-07-17 | 2005-10-21 | Asml Netherlands Bv | Positioning device and lithographic projection apparatus comprising such a device |
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| JP2001068396A (ja) * | 1999-08-26 | 2001-03-16 | Canon Inc | ステージ制御装置 |
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| EP1107067B1 (en) * | 1999-12-01 | 2006-12-27 | ASML Netherlands B.V. | Positioning apparatus and lithographic apparatus comprising the same |
| DE60032568T2 (de) | 1999-12-01 | 2007-10-04 | Asml Netherlands B.V. | Positionierungsapparat und damit versehener lithographischer Apparat |
| US6791661B2 (en) | 1999-12-09 | 2004-09-14 | Nikon Corporation | Gas replacement method and apparatus, and exposure method and apparatus |
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| JP2001209188A (ja) | 2000-01-27 | 2001-08-03 | Nikon Corp | 走査型露光装置および走査露光方法並びにマスク |
| US6873400B2 (en) | 2000-02-02 | 2005-03-29 | Nikon Corporation | Scanning exposure method and system |
| US6307619B1 (en) * | 2000-03-23 | 2001-10-23 | Silicon Valley Group, Inc. | Scanning framing blade apparatus |
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1995
- 1995-04-04 US US08/416,558 patent/US5874820A/en not_active Expired - Lifetime
-
1996
- 1996-03-15 JP JP5862996A patent/JPH08330224A/ja active Pending
- 1996-04-03 KR KR1019960009937A patent/KR100300220B1/ko not_active Expired - Lifetime
-
1998
- 1998-11-12 US US09/192,153 patent/US6246202B1/en not_active Expired - Lifetime
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1999
- 1999-05-25 US US09/317,847 patent/US6087797A/en not_active Expired - Lifetime
- 1999-05-26 US US09/318,622 patent/US6150787A/en not_active Expired - Lifetime
- 1999-05-26 US US09/318,623 patent/US6188195B1/en not_active Expired - Lifetime
- 1999-05-26 US US09/320,842 patent/US6020710A/en not_active Expired - Lifetime
- 1999-05-27 US US09/320,706 patent/US6151105A/en not_active Expired - Lifetime
- 1999-05-27 US US09/320,703 patent/US6175404B1/en not_active Expired - Lifetime
- 1999-06-30 KR KR1019990025867A patent/KR100314552B1/ko not_active Expired - Fee Related
- 1999-06-30 KR KR1019990025869A patent/KR100314553B1/ko not_active Expired - Fee Related
- 1999-06-30 KR KR1019990025872A patent/KR100314555B1/ko not_active Expired - Fee Related
- 1999-06-30 KR KR1019990025871A patent/KR100314554B1/ko not_active Expired - Fee Related
-
2001
- 2001-04-18 US US09/836,273 patent/US6316901B2/en not_active Expired - Lifetime
- 2001-06-13 KR KR1020010033268A patent/KR100314556B1/ko not_active Expired - Fee Related
- 2001-09-28 US US09/964,550 patent/US6683433B2/en not_active Expired - Fee Related
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2003
- 2003-03-04 JP JP2003056611A patent/JP3867676B2/ja not_active Expired - Lifetime
- 2003-07-02 US US10/611,260 patent/US6747732B1/en not_active Expired - Fee Related
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2006
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Also Published As
| Publication number | Publication date |
|---|---|
| US6151105A (en) | 2000-11-21 |
| US6087797A (en) | 2000-07-11 |
| KR100314554B1 (ko) | 2001-11-30 |
| US6020710A (en) | 2000-02-01 |
| KR100314556B1 (ko) | 2001-11-16 |
| JP3969455B2 (ja) | 2007-09-05 |
| KR960039104A (ko) | 1996-11-21 |
| US5874820A (en) | 1999-02-23 |
| KR100314555B1 (ko) | 2001-11-17 |
| JP3867676B2 (ja) | 2007-01-10 |
| KR100300220B1 (ko) | 2001-11-30 |
| US6246202B1 (en) | 2001-06-12 |
| JPH08330224A (ja) | 1996-12-13 |
| KR100314553B1 (ko) | 2001-11-15 |
| US6188195B1 (en) | 2001-02-13 |
| JP2006313940A (ja) | 2006-11-16 |
| US6150787A (en) | 2000-11-21 |
| US6683433B2 (en) | 2004-01-27 |
| US20040095085A1 (en) | 2004-05-20 |
| US6747732B1 (en) | 2004-06-08 |
| US20010019250A1 (en) | 2001-09-06 |
| US20020017889A1 (en) | 2002-02-14 |
| US6175404B1 (en) | 2001-01-16 |
| JP2003264147A (ja) | 2003-09-19 |
| US6316901B2 (en) | 2001-11-13 |
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