JP5085954B2 - フッ素系溶剤含有溶液の精製方法及び精製装置ならびに洗浄装置 - Google Patents

フッ素系溶剤含有溶液の精製方法及び精製装置ならびに洗浄装置 Download PDF

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JP5085954B2
JP5085954B2 JP2007044315A JP2007044315A JP5085954B2 JP 5085954 B2 JP5085954 B2 JP 5085954B2 JP 2007044315 A JP2007044315 A JP 2007044315A JP 2007044315 A JP2007044315 A JP 2007044315A JP 5085954 B2 JP5085954 B2 JP 5085954B2
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water
filter
solvent
cleaning
purification
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Japanese (ja)
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JP2008208048A (ja
JP2008208048A5 (enExample
Inventor
大輔 中里
裕美 小布施
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3M Innovative Properties Co
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3M Innovative Properties Co
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Priority to JP2007044315A priority Critical patent/JP5085954B2/ja
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Priority to EP08728908A priority patent/EP2114831A4/en
Priority to KR1020097018237A priority patent/KR101381494B1/ko
Priority to PCT/US2008/052896 priority patent/WO2008103536A1/en
Priority to US12/527,903 priority patent/US20100126934A1/en
Priority to CN2008800060429A priority patent/CN101622201B/zh
Priority to TW097106127A priority patent/TWI427057B/zh
Publication of JP2008208048A publication Critical patent/JP2008208048A/ja
Publication of JP2008208048A5 publication Critical patent/JP2008208048A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D11/00—Solvent extraction
    • B01D11/04—Solvent extraction of solutions which are liquid
    • B01D11/0492—Applications, solvents used
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/26—Treatment of water, waste water, or sewage by extraction
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C02F1/281—Treatment of water, waste water, or sewage by sorption using inorganic sorbents
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/40—Devices for separating or removing fatty or oily substances or similar floating material
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C02F2101/12—Halogens or halogen-containing compounds
    • C02F2101/14—Fluorine or fluorine-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Water Treatment By Sorption (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Extraction Or Liquid Replacement (AREA)
  • Treatment Of Liquids With Adsorbents In General (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)
JP2007044315A 2007-02-23 2007-02-23 フッ素系溶剤含有溶液の精製方法及び精製装置ならびに洗浄装置 Active JP5085954B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2007044315A JP5085954B2 (ja) 2007-02-23 2007-02-23 フッ素系溶剤含有溶液の精製方法及び精製装置ならびに洗浄装置
KR1020097018237A KR101381494B1 (ko) 2007-02-23 2008-02-04 불소계 용매-함유 용액의 정제 방법
PCT/US2008/052896 WO2008103536A1 (en) 2007-02-23 2008-02-04 Purification process of fluorine-based solvent-containing solution
US12/527,903 US20100126934A1 (en) 2007-02-23 2008-02-04 Purification process of fluorine-based solvent-containing solution
EP08728908A EP2114831A4 (en) 2007-02-23 2008-02-04 CLEANING PROCEDURE FOR A FLUORIN-BASED SOLVENT-BASED SOLUTION
CN2008800060429A CN101622201B (zh) 2007-02-23 2008-02-04 含氟基溶剂的溶液的纯化方法
TW097106127A TWI427057B (zh) 2007-02-23 2008-02-21 用於純化含有以氟為基溶劑之溶液的方法及裝置以及清洗裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007044315A JP5085954B2 (ja) 2007-02-23 2007-02-23 フッ素系溶剤含有溶液の精製方法及び精製装置ならびに洗浄装置

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JP2008208048A JP2008208048A (ja) 2008-09-11
JP2008208048A5 JP2008208048A5 (enExample) 2010-04-08
JP5085954B2 true JP5085954B2 (ja) 2012-11-28

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JP2007044315A Active JP5085954B2 (ja) 2007-02-23 2007-02-23 フッ素系溶剤含有溶液の精製方法及び精製装置ならびに洗浄装置

Country Status (7)

Country Link
US (1) US20100126934A1 (enExample)
EP (1) EP2114831A4 (enExample)
JP (1) JP5085954B2 (enExample)
KR (1) KR101381494B1 (enExample)
CN (1) CN101622201B (enExample)
TW (1) TWI427057B (enExample)
WO (1) WO2008103536A1 (enExample)

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WO2016144734A1 (en) 2015-03-12 2016-09-15 Dupont-Mitsui Fluorochemicals Co. Ltd Separating method of fluorine-containing solvent, removing method of fluorine-containing solvent contaminant, and apparatus therefore
US12275661B2 (en) 2023-07-14 2025-04-15 Claros Technologies Inc. Methods and systems of iodine capture from aqueous solutions

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JP5368131B2 (ja) * 2009-02-20 2013-12-18 大日本スクリーン製造株式会社 溶剤再生装置及びその方法
JP5821844B2 (ja) * 2010-06-07 2015-11-24 セントラル硝子株式会社 保護膜形成用薬液
US9607864B2 (en) 2012-05-23 2017-03-28 Stmicroelectronics, Inc. Dual medium filter for ion and particle filtering during semiconductor processing
CN103730409B (zh) * 2012-10-16 2016-12-28 中芯国际集成电路制造(上海)有限公司 半导体器件的制作方法、清洗方法和清洗系统
JP6149421B2 (ja) * 2013-02-20 2017-06-21 栗田工業株式会社 溶液の供給方法及び供給装置
CN103083998B (zh) * 2013-03-01 2014-12-03 成都广亚科技有限公司 一种溶剂净化装置及其处理方法
US9104104B2 (en) 2013-04-24 2015-08-11 Orthogonal, Inc. Method of patterning a device
EP3024810B1 (en) * 2013-07-25 2018-06-20 3M Innovative Properties Company Nitrogen containing hydrofluoroethers and methods of making same
EP3150645B1 (en) 2014-05-30 2020-03-04 AGC Inc. Process for producing a fluorinated polymer
JP6542392B2 (ja) * 2016-01-05 2019-07-10 富士フイルム株式会社 処理液、基板の洗浄方法、および、半導体デバイスの製造方法
JP6480017B2 (ja) * 2016-01-05 2019-03-06 富士フイルム株式会社 処理液、基板の洗浄方法、及び、半導体デバイスの製造方法
JP6542393B2 (ja) * 2016-01-05 2019-07-10 富士フイルム株式会社 処理液、基板の洗浄方法および半導体デバイスの製造方法
JPWO2018043697A1 (ja) * 2016-09-02 2019-06-24 富士フイルム株式会社 有機溶剤の精製方法および有機溶剤の精製装置
KR102257694B1 (ko) * 2016-09-30 2021-05-31 후지필름 가부시키가이샤 반도체 칩의 제조 방법, 키트
JP2018118183A (ja) * 2017-01-23 2018-08-02 光治郎 大川 被洗浄物洗浄装置
WO2019003605A1 (ja) * 2017-06-26 2019-01-03 Ａｇｃ株式会社 真空蒸着用のマスクの洗浄方法及びリンス組成物
CN111278578A (zh) * 2017-11-10 2020-06-12 日本瑞翁株式会社 清洗溶剂组合物的再生方法和再生装置、以及被清洗物的清洗方法和清洗系统
JP7126830B2 (ja) * 2018-01-19 2022-08-29 スリーエム イノベイティブ プロパティズ カンパニー フッ素化液体の再生方法、及び該方法を用いる再生装置
WO2020031732A1 (ja) * 2018-08-10 2020-02-13 日本ゼオン株式会社 フッ素系溶剤含有物の精製方法およびフッ素系溶剤含有精製物
CN111100750A (zh) * 2018-10-29 2020-05-05 台境企业股份有限公司 废氟素油的处理方法及系统
CN109365386A (zh) * 2018-12-06 2019-02-22 深圳市盈石科技有限公司 一种净洗装置及其净洗方法
JP2021000603A (ja) * 2019-06-21 2021-01-07 スリーエム イノベイティブ プロパティズ カンパニー フッ素化液体の精製方法、及び該方法を用いる精製装置
WO2021045956A1 (en) * 2019-09-03 2021-03-11 Fujifilm Electronic Materials U.S.A., Inc. Systems and methods for purifying solvents
JP2021041337A (ja) * 2019-09-10 2021-03-18 スリーエム イノベイティブ プロパティズ カンパニー アルコール含有フッ素化液体の再生方法、及び該方法を用いる再生システム
CN111863298B (zh) * 2020-06-10 2022-08-05 中国原子能科学研究院 一种purex流程污溶剂的深度净化方法
CN114284130B (zh) * 2020-09-27 2025-03-21 东莞新科技术研究开发有限公司 去除晶圆表面杂质的方法
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WO2016144734A1 (en) 2015-03-12 2016-09-15 Dupont-Mitsui Fluorochemicals Co. Ltd Separating method of fluorine-containing solvent, removing method of fluorine-containing solvent contaminant, and apparatus therefore
US12275661B2 (en) 2023-07-14 2025-04-15 Claros Technologies Inc. Methods and systems of iodine capture from aqueous solutions
US12351498B2 (en) 2023-07-14 2025-07-08 Claros Technologies Inc. Methods and systems of PFAS destruction using UV irradiation at 222 nanometers
US12473222B2 (en) 2023-07-14 2025-11-18 Claros Technologies Inc. Methods and systems for recycling materials during PFAS destruction

Also Published As

Publication number Publication date
KR20090122220A (ko) 2009-11-26
KR101381494B1 (ko) 2014-04-04
TWI427057B (zh) 2014-02-21
CN101622201B (zh) 2012-07-11
JP2008208048A (ja) 2008-09-11
US20100126934A1 (en) 2010-05-27
EP2114831A4 (en) 2012-12-12
WO2008103536A1 (en) 2008-08-28
TW200900379A (en) 2009-01-01
EP2114831A1 (en) 2009-11-11
CN101622201A (zh) 2010-01-06

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