CN101622201B - 含氟基溶剂的溶液的纯化方法 - Google Patents

含氟基溶剂的溶液的纯化方法 Download PDF

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Publication number
CN101622201B
CN101622201B CN2008800060429A CN200880006042A CN101622201B CN 101622201 B CN101622201 B CN 101622201B CN 2008800060429 A CN2008800060429 A CN 2008800060429A CN 200880006042 A CN200880006042 A CN 200880006042A CN 101622201 B CN101622201 B CN 101622201B
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CN
China
Prior art keywords
solution
fluorine
water
based solvent
purification process
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Expired - Fee Related
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CN2008800060429A
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English (en)
Chinese (zh)
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CN101622201A (zh
Inventor
中里大辅
小布施裕美
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D11/00—Solvent extraction
    • B01D11/04—Solvent extraction of solutions which are liquid
    • B01D11/0492—Applications, solvents used
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/26—Treatment of water, waste water, or sewage by extraction
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C02F1/281—Treatment of water, waste water, or sewage by sorption using inorganic sorbents
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/40—Devices for separating or removing fatty or oily substances or similar floating material
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C02F2101/12—Halogens or halogen-containing compounds
    • C02F2101/14—Fluorine or fluorine-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Water Treatment By Sorption (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Extraction Or Liquid Replacement (AREA)
  • Treatment Of Liquids With Adsorbents In General (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)
CN2008800060429A 2007-02-23 2008-02-04 含氟基溶剂的溶液的纯化方法 Expired - Fee Related CN101622201B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007044315A JP5085954B2 (ja) 2007-02-23 2007-02-23 フッ素系溶剤含有溶液の精製方法及び精製装置ならびに洗浄装置
JP044315/2007 2007-02-23
PCT/US2008/052896 WO2008103536A1 (en) 2007-02-23 2008-02-04 Purification process of fluorine-based solvent-containing solution

Publications (2)

Publication Number Publication Date
CN101622201A CN101622201A (zh) 2010-01-06
CN101622201B true CN101622201B (zh) 2012-07-11

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008800060429A Expired - Fee Related CN101622201B (zh) 2007-02-23 2008-02-04 含氟基溶剂的溶液的纯化方法

Country Status (7)

Country Link
US (1) US20100126934A1 (enExample)
EP (1) EP2114831A4 (enExample)
JP (1) JP5085954B2 (enExample)
KR (1) KR101381494B1 (enExample)
CN (1) CN101622201B (enExample)
TW (1) TWI427057B (enExample)
WO (1) WO2008103536A1 (enExample)

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JP5620056B2 (ja) * 2008-10-10 2014-11-05 スリーエム イノベイティブプロパティズカンパニー フッ素系溶剤の精製方法
JP5368131B2 (ja) * 2009-02-20 2013-12-18 大日本スクリーン製造株式会社 溶剤再生装置及びその方法
JP5821844B2 (ja) * 2010-06-07 2015-11-24 セントラル硝子株式会社 保護膜形成用薬液
US9607864B2 (en) 2012-05-23 2017-03-28 Stmicroelectronics, Inc. Dual medium filter for ion and particle filtering during semiconductor processing
CN103730409B (zh) * 2012-10-16 2016-12-28 中芯国际集成电路制造(上海)有限公司 半导体器件的制作方法、清洗方法和清洗系统
JP6149421B2 (ja) * 2013-02-20 2017-06-21 栗田工業株式会社 溶液の供給方法及び供給装置
CN103083998B (zh) * 2013-03-01 2014-12-03 成都广亚科技有限公司 一种溶剂净化装置及其处理方法
US9104104B2 (en) 2013-04-24 2015-08-11 Orthogonal, Inc. Method of patterning a device
EP3024810B1 (en) * 2013-07-25 2018-06-20 3M Innovative Properties Company Nitrogen containing hydrofluoroethers and methods of making same
EP3150645B1 (en) 2014-05-30 2020-03-04 AGC Inc. Process for producing a fluorinated polymer
JP2016168530A (ja) * 2015-03-12 2016-09-23 三井・デュポンフロロケミカル株式会社 フッ素含有溶剤分離方法、フッ素含有溶剤汚染物除去方法、及び装置
JP6542392B2 (ja) * 2016-01-05 2019-07-10 富士フイルム株式会社 処理液、基板の洗浄方法、および、半導体デバイスの製造方法
JP6480017B2 (ja) * 2016-01-05 2019-03-06 富士フイルム株式会社 処理液、基板の洗浄方法、及び、半導体デバイスの製造方法
JP6542393B2 (ja) * 2016-01-05 2019-07-10 富士フイルム株式会社 処理液、基板の洗浄方法および半導体デバイスの製造方法
JPWO2018043697A1 (ja) * 2016-09-02 2019-06-24 富士フイルム株式会社 有機溶剤の精製方法および有機溶剤の精製装置
KR102257694B1 (ko) * 2016-09-30 2021-05-31 후지필름 가부시키가이샤 반도체 칩의 제조 방법, 키트
JP2018118183A (ja) * 2017-01-23 2018-08-02 光治郎 大川 被洗浄物洗浄装置
WO2019003605A1 (ja) * 2017-06-26 2019-01-03 Ａｇｃ株式会社 真空蒸着用のマスクの洗浄方法及びリンス組成物
CN111278578A (zh) * 2017-11-10 2020-06-12 日本瑞翁株式会社 清洗溶剂组合物的再生方法和再生装置、以及被清洗物的清洗方法和清洗系统
JP7126830B2 (ja) * 2018-01-19 2022-08-29 スリーエム イノベイティブ プロパティズ カンパニー フッ素化液体の再生方法、及び該方法を用いる再生装置
WO2020031732A1 (ja) * 2018-08-10 2020-02-13 日本ゼオン株式会社 フッ素系溶剤含有物の精製方法およびフッ素系溶剤含有精製物
CN111100750A (zh) * 2018-10-29 2020-05-05 台境企业股份有限公司 废氟素油的处理方法及系统
CN109365386A (zh) * 2018-12-06 2019-02-22 深圳市盈石科技有限公司 一种净洗装置及其净洗方法
JP2021000603A (ja) * 2019-06-21 2021-01-07 スリーエム イノベイティブ プロパティズ カンパニー フッ素化液体の精製方法、及び該方法を用いる精製装置
WO2021045956A1 (en) * 2019-09-03 2021-03-11 Fujifilm Electronic Materials U.S.A., Inc. Systems and methods for purifying solvents
JP2021041337A (ja) * 2019-09-10 2021-03-18 スリーエム イノベイティブ プロパティズ カンパニー アルコール含有フッ素化液体の再生方法、及び該方法を用いる再生システム
CN111863298B (zh) * 2020-06-10 2022-08-05 中国原子能科学研究院 一种purex流程污溶剂的深度净化方法
CN114284130B (zh) * 2020-09-27 2025-03-21 东莞新科技术研究开发有限公司 去除晶圆表面杂质的方法
CN114560758B (zh) * 2022-02-22 2023-08-18 中船(邯郸)派瑞特种气体股份有限公司 一种电子级九氟丁基甲醚的纯化方法
CN116832582B (zh) * 2023-07-06 2024-03-08 山东众海机械有限公司 一种激光光纤金属切割高压空气提纯的工艺
US20250019268A1 (en) 2023-07-14 2025-01-16 Claros Technologies Inc. Methods and Systems of Photo-Electrochemical PFAS Destruction

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US5580458A (en) * 1992-07-31 1996-12-03 Sharp Kabushiki Kaisha Method for waste water treatment using calcium carbonate mineral and microorganisms in combination
EP0790293A1 (en) * 1991-02-06 1997-08-20 Asahi Kasei Kogyo Kabushiki Kaisha Lubricant
US6652758B2 (en) * 2000-09-26 2003-11-25 Ionics, Incorporated Simultaneous ammonia and fluoride treatment for wastewater
CN1483679A (zh) * 2003-07-23 2004-03-24 上海三爱富新材料股份有限公司 含氟醚的降解方法和含氟醚废水的处理方法
WO2006009981A1 (en) * 2004-06-21 2006-01-26 Exxonmobil Chemical Patents Inc. Polymeriyation process and reactor system

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Also Published As

Publication number Publication date
JP5085954B2 (ja) 2012-11-28
KR20090122220A (ko) 2009-11-26
KR101381494B1 (ko) 2014-04-04
TWI427057B (zh) 2014-02-21
JP2008208048A (ja) 2008-09-11
US20100126934A1 (en) 2010-05-27
EP2114831A4 (en) 2012-12-12
WO2008103536A1 (en) 2008-08-28
TW200900379A (en) 2009-01-01
EP2114831A1 (en) 2009-11-11
CN101622201A (zh) 2010-01-06

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