CN101622201B - 含氟基溶剂的溶液的纯化方法 - Google Patents

含氟基溶剂的溶液的纯化方法 Download PDF

Info

Publication number
CN101622201B
CN101622201B CN2008800060429A CN200880006042A CN101622201B CN 101622201 B CN101622201 B CN 101622201B CN 2008800060429 A CN2008800060429 A CN 2008800060429A CN 200880006042 A CN200880006042 A CN 200880006042A CN 101622201 B CN101622201 B CN 101622201B
Authority
CN
China
Prior art keywords
solution
fluorine
water
based solvent
purification process
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2008800060429A
Other languages
English (en)
Chinese (zh)
Other versions
CN101622201A (zh
Inventor
中里大辅
小布施裕美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of CN101622201A publication Critical patent/CN101622201A/zh
Application granted granted Critical
Publication of CN101622201B publication Critical patent/CN101622201B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D11/00—Solvent extraction
    • B01D11/04—Solvent extraction of solutions which are liquid
    • B01D11/0492—Applications, solvents used
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/26—Treatment of water, waste water, or sewage by extraction
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C02F1/281—Treatment of water, waste water, or sewage by sorption using inorganic sorbents
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/40—Devices for separating or removing fatty or oily substances or similar floating material
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C02F2101/12—Halogens or halogen-containing compounds
    • C02F2101/14—Fluorine or fluorine-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Water Treatment By Sorption (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Treatment Of Liquids With Adsorbents In General (AREA)
  • Extraction Or Liquid Replacement (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Detergent Compositions (AREA)
CN2008800060429A 2007-02-23 2008-02-04 含氟基溶剂的溶液的纯化方法 Expired - Fee Related CN101622201B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007044315A JP5085954B2 (ja) 2007-02-23 2007-02-23 フッ素系溶剤含有溶液の精製方法及び精製装置ならびに洗浄装置
JP044315/2007 2007-02-23
PCT/US2008/052896 WO2008103536A1 (en) 2007-02-23 2008-02-04 Purification process of fluorine-based solvent-containing solution

Publications (2)

Publication Number Publication Date
CN101622201A CN101622201A (zh) 2010-01-06
CN101622201B true CN101622201B (zh) 2012-07-11

Family

ID=39710425

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008800060429A Expired - Fee Related CN101622201B (zh) 2007-02-23 2008-02-04 含氟基溶剂的溶液的纯化方法

Country Status (7)

Country Link
US (1) US20100126934A1 (enExample)
EP (1) EP2114831A4 (enExample)
JP (1) JP5085954B2 (enExample)
KR (1) KR101381494B1 (enExample)
CN (1) CN101622201B (enExample)
TW (1) TWI427057B (enExample)
WO (1) WO2008103536A1 (enExample)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5620056B2 (ja) * 2008-10-10 2014-11-05 スリーエム イノベイティブプロパティズカンパニー フッ素系溶剤の精製方法
JP5368131B2 (ja) * 2009-02-20 2013-12-18 大日本スクリーン製造株式会社 溶剤再生装置及びその方法
SG185632A1 (en) * 2010-06-07 2012-12-28 Central Glass Co Ltd Liquid chemical for foaming protecting film
US9607864B2 (en) * 2012-05-23 2017-03-28 Stmicroelectronics, Inc. Dual medium filter for ion and particle filtering during semiconductor processing
CN103730409B (zh) * 2012-10-16 2016-12-28 中芯国际集成电路制造(上海)有限公司 半导体器件的制作方法、清洗方法和清洗系统
JP6149421B2 (ja) * 2013-02-20 2017-06-21 栗田工業株式会社 溶液の供給方法及び供給装置
CN103083998B (zh) * 2013-03-01 2014-12-03 成都广亚科技有限公司 一种溶剂净化装置及其处理方法
US9104104B2 (en) 2013-04-24 2015-08-11 Orthogonal, Inc. Method of patterning a device
EP3024810B1 (en) * 2013-07-25 2018-06-20 3M Innovative Properties Company Nitrogen containing hydrofluoroethers and methods of making same
JP6686883B2 (ja) * 2014-05-30 2020-04-22 Ａｇｃ株式会社 含フッ素重合体の製造方法
JP2016168530A (ja) 2015-03-12 2016-09-23 三井・デュポンフロロケミカル株式会社 フッ素含有溶剤分離方法、フッ素含有溶剤汚染物除去方法、及び装置
WO2017119350A1 (ja) * 2016-01-05 2017-07-13 富士フイルム株式会社 処理液、基板の洗浄方法、及び、半導体デバイスの製造方法
JP6542392B2 (ja) * 2016-01-05 2019-07-10 富士フイルム株式会社 処理液、基板の洗浄方法、および、半導体デバイスの製造方法
KR102027793B1 (ko) * 2016-01-05 2019-10-02 후지필름 가부시키가이샤 처리액, 기판의 세정 방법 및 반도체 디바이스의 제조 방법
WO2018043697A1 (ja) * 2016-09-02 2018-03-08 富士フイルム株式会社 有機溶剤の精製方法および有機溶剤の精製装置
WO2018062470A1 (ja) 2016-09-30 2018-04-05 富士フイルム株式会社 半導体チップの製造方法、キット
JP2018118183A (ja) * 2017-01-23 2018-08-02 光治郎 大川 被洗浄物洗浄装置
WO2019003605A1 (ja) * 2017-06-26 2019-01-03 Ａｇｃ株式会社 真空蒸着用のマスクの洗浄方法及びリンス組成物
WO2019093251A1 (ja) * 2017-11-10 2019-05-16 日本ゼオン株式会社 洗浄溶剤組成物の再生方法および再生装置、並びに、被洗浄物の洗浄方法および洗浄システム
JP7126830B2 (ja) * 2018-01-19 2022-08-29 スリーエム イノベイティブ プロパティズ カンパニー フッ素化液体の再生方法、及び該方法を用いる再生装置
KR20210035800A (ko) * 2018-08-10 2021-04-01 니폰 제온 가부시키가이샤 불소계 용제 함유물의 정제 방법 및 불소계 용제 함유 정제물
CN111100750A (zh) * 2018-10-29 2020-05-05 台境企业股份有限公司 废氟素油的处理方法及系统
CN109365386A (zh) * 2018-12-06 2019-02-22 深圳市盈石科技有限公司 一种净洗装置及其净洗方法
JP2021000603A (ja) * 2019-06-21 2021-01-07 スリーエム イノベイティブ プロパティズ カンパニー フッ素化液体の精製方法、及び該方法を用いる精製装置
WO2021045956A1 (en) * 2019-09-03 2021-03-11 Fujifilm Electronic Materials U.S.A., Inc. Systems and methods for purifying solvents
JP2021041337A (ja) * 2019-09-10 2021-03-18 スリーエム イノベイティブ プロパティズ カンパニー アルコール含有フッ素化液体の再生方法、及び該方法を用いる再生システム
CN111863298B (zh) * 2020-06-10 2022-08-05 中国原子能科学研究院 一种purex流程污溶剂的深度净化方法
CN114284130B (zh) * 2020-09-27 2025-03-21 东莞新科技术研究开发有限公司 去除晶圆表面杂质的方法
WO2022190013A1 (en) * 2021-03-12 2022-09-15 3M Innovative Properties Company Fluorinated fluid conditioning system
CN114560758B (zh) * 2022-02-22 2023-08-18 中船(邯郸)派瑞特种气体股份有限公司 一种电子级九氟丁基甲醚的纯化方法
CN116832582B (zh) * 2023-07-06 2024-03-08 山东众海机械有限公司 一种激光光纤金属切割高压空气提纯的工艺
JP2026525425A (ja) 2023-07-14 2026-07-30 クラロス テクノロジーズ インコーポレイテッド 水溶液からヨウ素を捕捉する方法及びシステム
US12534390B2 (en) 2023-07-14 2026-01-27 Claros Technologies Inc. Methods and systems of nitrate removal in aqueous systems for improved PFAS destruction
US12545601B2 (en) 2023-07-14 2026-02-10 Claros Technologies Inc. Methods and systems of photosensitizer recovery for improved PFAS destruction
WO2026008470A1 (en) 2024-07-02 2026-01-08 Syensqo Specialty Polymers Italy S.p.A. (per)fluoropolyether polymer composition

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5580458A (en) * 1992-07-31 1996-12-03 Sharp Kabushiki Kaisha Method for waste water treatment using calcium carbonate mineral and microorganisms in combination
EP0790293A1 (en) * 1991-02-06 1997-08-20 Asahi Kasei Kogyo Kabushiki Kaisha Lubricant
US6652758B2 (en) * 2000-09-26 2003-11-25 Ionics, Incorporated Simultaneous ammonia and fluoride treatment for wastewater
CN1483679A (zh) * 2003-07-23 2004-03-24 上海三爱富新材料股份有限公司 含氟醚的降解方法和含氟醚废水的处理方法
WO2006009981A1 (en) * 2004-06-21 2006-01-26 Exxonmobil Chemical Patents Inc. Polymeriyation process and reactor system

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54148707A (en) * 1978-05-09 1979-11-21 Mitsubishi Electric Corp Method and apparatus for purification and recovery of freon solvents
US4477354A (en) * 1982-09-07 1984-10-16 Electric Power Research Institute Destruction of polychlorinated biphenyls during solvent distillation
KR910002331B1 (ko) * 1984-12-18 1991-04-20 미쯔비시 주우 고오교오 가부시기가이샤 드라이클리이닝장치와 그 방법
DE3522932A1 (de) * 1985-06-27 1987-01-08 Henkel Kgaa Verfahren zur filtration von flotten in der chemischreinigung und dabei verwendete filterhilfsmittel in form praeparierter schichtsilikate
JPH0271802A (ja) * 1988-09-06 1990-03-12 Terumo Corp 疎水性溶剤の精製方法
JPH0798122B2 (ja) * 1991-07-12 1995-10-25 動力炉・核燃料開発事業団 核燃料サイクルから発生する使用済溶媒の再生方法
JP3290919B2 (ja) * 1997-04-18 2002-06-10 新オオツカ株式会社 洗浄装置
TW499414B (en) * 1999-04-20 2002-08-21 Daikin Ind Ltd Method for recovering fluorine-containing solvents
JP4774138B2 (ja) * 1999-11-09 2011-09-14 株式会社日立グローバルストレージテクノロジーズ 溶剤再生装置
US6908556B2 (en) * 1999-12-02 2005-06-21 The University Of Tulsa Methods for forming microcultures within porous media
JP4501213B2 (ja) * 2000-04-12 2010-07-14 住友化学株式会社 ハロゲン化物イオンの除去方法
JP4070392B2 (ja) * 2000-08-01 2008-04-02 富士通株式会社 フッ素系溶媒の調製方法及び装置ならびに精製方法
JP5129911B2 (ja) * 2001-08-08 2013-01-30 新オオツカ株式会社 水分除去装置
JP2004167416A (ja) * 2002-11-21 2004-06-17 Olympus Corp 水分離方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0790293A1 (en) * 1991-02-06 1997-08-20 Asahi Kasei Kogyo Kabushiki Kaisha Lubricant
US5580458A (en) * 1992-07-31 1996-12-03 Sharp Kabushiki Kaisha Method for waste water treatment using calcium carbonate mineral and microorganisms in combination
US6652758B2 (en) * 2000-09-26 2003-11-25 Ionics, Incorporated Simultaneous ammonia and fluoride treatment for wastewater
CN1483679A (zh) * 2003-07-23 2004-03-24 上海三爱富新材料股份有限公司 含氟醚的降解方法和含氟醚废水的处理方法
WO2006009981A1 (en) * 2004-06-21 2006-01-26 Exxonmobil Chemical Patents Inc. Polymeriyation process and reactor system

Also Published As

Publication number Publication date
WO2008103536A1 (en) 2008-08-28
US20100126934A1 (en) 2010-05-27
EP2114831A1 (en) 2009-11-11
KR101381494B1 (ko) 2014-04-04
TW200900379A (en) 2009-01-01
JP5085954B2 (ja) 2012-11-28
JP2008208048A (ja) 2008-09-11
TWI427057B (zh) 2014-02-21
CN101622201A (zh) 2010-01-06
KR20090122220A (ko) 2009-11-26
EP2114831A4 (en) 2012-12-12

Similar Documents

Publication Publication Date Title
TWI427057B (zh) 用於純化含有以氟為基溶劑之溶液的方法及裝置以及清洗裝置
US20240367116A1 (en) Ligand-modified filter and methods for reducing metals from liquid compositions
CN109195922B (zh) 一种用于从水中去除和浓缩全氟和聚氟烷基物质(pfas)的可持续系统和方法
CN103429322B (zh) Co2移除装置和方法
US6858147B2 (en) Method for the removal of heavy metals from aqueous solution by means of silica as an adsorbent in counter-flow selective dialysis
Johnson et al. Removing forever chemicals via amphiphilic functionalized membranes
JP5717997B2 (ja) テトラアルキルアンモニウム塩水溶液の製造方法
JP2008208048A5 (enExample)
CN100431674C (zh) 处理流体的方法和装置
CN112933660A (zh) 一种离子色谱保护柱再生方法
Okamoto et al. Separation of high-concentration tetramethylammonium hydroxide from photoresist development wastewater using strong acidic cation exchange resin
JP2001153854A (ja) 不純物濃度モニター方法およびシステム
US20180043282A1 (en) Separating method of fluorine-containing solvent, removing method of fluorine-containing solvent contaminant, and apparatus therefore
CN104511451B (zh) 一种核主泵制造过程中所用耗材的清洁度的控制方法及其检测方法
JP2021053547A (ja) 不純物検知装置及び不純物検知方法
Kohyama The filter adsorption mechanism in photoresist materials
JP2006515536A (ja) 化学廃棄物の処理
CN107922218B (zh) 再生丙烯酸树脂的方法
JP2018532574A (ja) 水を精製する方法
CN223439372U (zh) 半导体显影液的过滤系统
Nogami et al. Adsorptivity of silica-supported monoamide resins to U (IV) in nitric acid media
Wu et al. Defect reduction in advanced lithography processes using a new dual functionality filter
TW202540032A (zh) 精製異丙醇的製造方法
CN101119950A (zh) 含氟醇的回收方法
RONEN et al. DEFEAT-PFAS: Detection, Quantification, and Treatment of Per-and Polyfluoroalkyl Substances (PFAS) in Groundwater

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20120711

CF01 Termination of patent right due to non-payment of annual fee