JP4965435B2 - 積層セラミックコンデンサおよびその製法 - Google Patents
積層セラミックコンデンサおよびその製法 Download PDFInfo
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- JP4965435B2 JP4965435B2 JP2007510391A JP2007510391A JP4965435B2 JP 4965435 B2 JP4965435 B2 JP 4965435B2 JP 2007510391 A JP2007510391 A JP 2007510391A JP 2007510391 A JP2007510391 A JP 2007510391A JP 4965435 B2 JP4965435 B2 JP 4965435B2
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- 239000003985 ceramic capacitor Substances 0.000 title claims description 53
- 238000004519 manufacturing process Methods 0.000 title claims description 27
- 239000000843 powder Substances 0.000 claims description 147
- 239000013078 crystal Substances 0.000 claims description 119
- 239000002245 particle Substances 0.000 claims description 115
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims description 38
- 229910002113 barium titanate Inorganic materials 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 37
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 claims description 33
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 33
- 239000011521 glass Substances 0.000 claims description 32
- 229910052788 barium Inorganic materials 0.000 claims description 20
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 19
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 18
- 230000008859 change Effects 0.000 claims description 17
- 239000003990 capacitor Substances 0.000 claims description 16
- 239000010936 titanium Substances 0.000 claims description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 7
- 238000010030 laminating Methods 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 6
- 239000011812 mixed powder Substances 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 claims 1
- 239000010410 layer Substances 0.000 description 79
- 239000011575 calcium Substances 0.000 description 35
- 239000000919 ceramic Substances 0.000 description 33
- 238000010304 firing Methods 0.000 description 30
- 239000012071 phase Substances 0.000 description 26
- 238000012360 testing method Methods 0.000 description 23
- 230000001965 increasing effect Effects 0.000 description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 11
- GHYOCDFICYLMRF-UTIIJYGPSA-N (2S,3R)-N-[(2S)-3-(cyclopenten-1-yl)-1-[(2R)-2-methyloxiran-2-yl]-1-oxopropan-2-yl]-3-hydroxy-3-(4-methoxyphenyl)-2-[[(2S)-2-[(2-morpholin-4-ylacetyl)amino]propanoyl]amino]propanamide Chemical compound C1(=CCCC1)C[C@@H](C(=O)[C@@]1(OC1)C)NC([C@H]([C@@H](C1=CC=C(C=C1)OC)O)NC([C@H](C)NC(CN1CCOCC1)=O)=O)=O GHYOCDFICYLMRF-UTIIJYGPSA-N 0.000 description 10
- 229940125797 compound 12 Drugs 0.000 description 10
- 238000011156 evaluation Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000012298 atmosphere Substances 0.000 description 9
- 238000002156 mixing Methods 0.000 description 7
- 239000000654 additive Substances 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 239000003989 dielectric material Substances 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 230000000996 additive effect Effects 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 5
- 230000015556 catabolic process Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 5
- 238000009413 insulation Methods 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 229910018068 Li 2 O Inorganic materials 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000011258 core-shell material Substances 0.000 description 3
- 230000001186 cumulative effect Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000000921 elemental analysis Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 229910052727 yttrium Inorganic materials 0.000 description 3
- 101100513612 Microdochium nivale MnCO gene Proteins 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 2
- JXDXDSKXFRTAPA-UHFFFAOYSA-N calcium;barium(2+);oxygen(2-);titanium(4+) Chemical compound [O-2].[Ca+2].[Ti+4].[Ba+2] JXDXDSKXFRTAPA-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000007606 doctor blade method Methods 0.000 description 2
- 239000002003 electrode paste Substances 0.000 description 2
- 238000001027 hydrothermal synthesis Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000010405 reoxidation reaction Methods 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910018516 Al—O Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000002847 impedance measurement Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000010532 solid phase synthesis reaction Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
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Description
以下、本発明の一実施形態にかかる積層セラミックコンデンサについて図面を参照して詳細に説明する。図1は、本実施形態にかかる積層セラミックコンデンサを示す概略断面図である。図2は、図1の一点鎖線で囲まれた領域の部分拡大断面図であり、誘電体層を構成する結晶粒子と粒界相を示している。
一方、Mnは還元雰囲気における焼成によって生成するBT結晶粒子9b、BCT結晶粒子9a中の酸素欠陥を補償し、絶縁性および高温負荷寿命を高めることができる。
前記希土類元素としては、La、Ce、Pr、Nd、Sm、Gd、Tb、Dy、Ho、Y、Er、Tm、Yb、Lu、Scのうち少なくとも1種が好ましい。
次に、上記で説明した本実施形態にかかる積層セラミックコンデンサの製法について、図面を参照して詳細に説明する。図5は、本実施形態にかかる積層セラミックコンデンサの製法を示す工程図である。
一方、誘電体層との接合強度を高めるという点および積層セラミックコンデンサの内部応力を高め誘電体層5と内部電極層7間の剥離を防止できるという点でBCT粉末が好ましい。
なお、本実施形態によれば、セラミックグリーンシート21上の内部電極パターン23による段差解消のために、内部電極パターン23の周囲にセラミックパターン25を内部電極パターン23と実質的に同一厚みで形成することが好ましい。セラミックパターン25を構成するセラミック成分は、同時焼成での焼成収縮を同じにするという点で前記誘電体粉末を用いることが好ましい。
一方、内部電極パターン23の最も幅の広い部分においては、サイドマージン部側にはこの内部電極パターンは露出されていない状態で形成される。
積層セラミックコンデンサを以下のようにして作製した。なお、ここで用いるBT粉末およびBCT粉末におけるA/Bサイト比は1.003のものを用いた。また、BTおよびBCT粉末の粒径は0.2〜0.4μmのものを用いた。BT粉末およびBCT粉末へはMg、Y、Mnをそれぞれ被覆したものとした。被覆量はBT粉末100質量部に対して、MgO=0.022質量部、Y2O3=0.122質量部、MnO=0.023質量部とし、BCT粉末100質量部に対して、MgO=0.065質量部、Y2O3=0.37質量部、MnO=0.069質量部とした。
なお、試料No.5は、BCT粉末のA/Bサイト比が1の原料粉末を用いた。
ついで、得られた積層セラミックコンデンサについて、上記試料No.1〜5と同様にしてABT/ABCTを測定した結果、0.8であった。また、濃度勾配は、0.05原子%/nmであった。
次に、これらの積層セラミックコンデンサ(表1中の試料No.1〜7)について、以下の評価を行った。
静電容量および比誘電率ならびに比誘電率の温度特性は、周波数1.0kHz、測定電圧0.5Vrmsの測定条件で行った。比誘電率は、静電容量と内部電極層の有効面積、誘電体層の厚みから算出した。温度特性の温度範囲は−55〜125℃とした。
X7R規格(−55〜125 ℃において静電容量の温度変化率が±15%以内)を満足しているか否かについて判定した。
これらの結果を、表1に併せて示す。
特に、炭酸バリウム粉末の比表面積が12m2/gであり、その添加量が0.2〜0.43質量%である試料No.1〜3、5では、焼成温度が1155〜1200℃の範囲で高温負荷処理前後の抵抗変化率が−0.5%/min.以内であった。
特に、炭酸バリウム粉末の比表面積が12〜14m2/gであり、その添加量が0.43〜0.6質量%である試料No.8、9および11では、高温負荷処理前後の抵抗変化率が−0.5%/min.以内であった。
Claims (8)
- 誘電体層および内部電極層を交互に積層してなるコンデンサ本体を備えた積層セラミックコンデンサであり、前記誘電体層が、複数個の結晶粒子と、該複数個の結晶粒子が隣接して形成された二面間粒界および三重点粒界により構成される粒界相とを有し、前記結晶粒子がABO3として表されるペロブスカイト型のチタン酸バリウム結晶粒子であるとともに、前記結晶粒子を構成するチタン酸バリウムにおけるバリウム側のAサイトと、チタン側のBサイトとのモル比A/Bが1.004≦A/B≦1.005の関係を有し、前記誘電体層は前記チタン酸バリウムを100質量部としたときに、アルミナの含有量が1.2×10 -3 質量部以下であるとともに、前記誘電体層の単位面積当たりの全三重点粒界数のうち5%以上の三重点粒界にSi−Ba−O化合物が形成されていることを特徴とする積層セラミックコンデンサ。
- 前記誘電体層の単位面積当たりにおいて、前記二面間粒界におけるSi濃度C1と、前記三重点粒界におけるSi濃度C2との比(C2/C1)が2以上であることを特徴とする請求項1記載の積層セラミックコンデンサ。
- 前記結晶粒子が、Ca成分濃度の異なるチタン酸バリウム結晶粒子からなることを特徴とする請求項1記載の積層セラミックコンデンサ。
- 前記Ca成分濃度の異なるチタン酸バリウム結晶粒子が、Ca成分濃度が0.2原子%以下のチタン酸バリウム結晶粒子と、Ca成分濃度が0.4原子%以上のチタン酸バリウム結晶粒子とからなり、かつ前記Ca成分濃度が0.4原子%以上のチタン酸バリウム結晶粒子中のバリウムとCaをAサイトとし、チタンをBサイトとしたときに、モル比で1.004≦A/B≦1.005の関係を満足することを特徴とする請求項3記載の積層セラミックコンデンサ。
- 交流インピーダンス法による高温負荷処理前後における誘電体層中の粒界相の抵抗変化率が±0.7%/min.以下であることを特徴とする請求項1記載の積層セラミックコンデンサ。
- 誘電体粉末および有機樹脂を含有するグリーンシートと、内部電極パターンとを交互に積層して構成されたコンデンサ本体成形体を焼成する積層セラミックコンデンサの製法において、
前記誘電体粉末として、Mg、希土類元素およびMnの酸化物が被覆されたAサイトの一部がCaで置換されたペロブスカイト型チタン酸バリウム粉末(BCT粉末)と、Mg、希土類元素およびMnの酸化物が被覆された置換Caを含有していないペロブスカイト型チタン酸バリウム粉末(BT粉末)との混合粉末100質量部に対して、アルミナの含有量が0.1質量%以下のガラス粉末を0.7〜2質量部、比表面積が10〜20m2/gの炭酸バリウムを0.01〜1質量部添加したものを用いることを特徴とする積層セラミックコンデンサの製法。 - 前記ガラスとして、に含まれる前記アルミナの含有量が0.08質量%以下であるものを用いることを特徴とする請求項6記載の積層セラミックコンデンサの製法。
- 前記BCT粉末量をWBCTとし、BT粉末量をWBTとしたときに、比(WBCT/WBT)が0.95〜1.05の範囲とすることを特徴とする請求項6記載の積層セラミックコンデンサの製法。
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