JP2017139440A - 炭化珪素半導体装置および炭化珪素半導体装置の製造方法 - Google Patents
炭化珪素半導体装置および炭化珪素半導体装置の製造方法 Download PDFInfo
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- JP2017139440A JP2017139440A JP2016165171A JP2016165171A JP2017139440A JP 2017139440 A JP2017139440 A JP 2017139440A JP 2016165171 A JP2016165171 A JP 2016165171A JP 2016165171 A JP2016165171 A JP 2016165171A JP 2017139440 A JP2017139440 A JP 2017139440A
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- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/30—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having three or more electrodes, e.g. transistors
- H10B63/34—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having three or more electrodes, e.g. transistors of the vertical channel field-effect transistor type
Abstract
【解決手段】トレンチゲート構造の縦型MOSFETにおいて、エピタキシャル成長させたp型炭化珪素層22からなるp型ベース領域4の内部には、チャネルが形成される部分を含むように高濃度インプラ領域13が設けられる。高濃度インプラ領域13は、p型炭化珪素層22へのp型不純物のイオン注入により形成される。高濃度インプラ領域13は、p型のイオン注入により形成され、p型炭化珪素層22よりも高不純物濃度のピーク13aで深さ方向に高低差をもつ山型の不純物濃度プロファイル31を有する。p型ベース領域4には、高濃度インプラ領域13を形成するためのイオン注入により部分的に結晶構造にみだれが生じている。
【選択図】図2
Description
本発明にかかる半導体装置は、シリコンよりもバンドギャップが広い半導体(以下、ワイドバンドギャップ半導体とする)を用いて構成される。ここでは、ワイドバンドギャップ半導体として例えば炭化珪素(SiC)を用いた半導体装置(炭化珪素半導体装置)の構造を例に説明する。図1は、実施の形態1にかかる炭化珪素半導体装置の構造を示す断面図である。図1には、2つの単位セル(素子の機能単位)のみを示し、これらに隣接する他の単位セルを図示省略する(図18においても同様)。図1に示す実施の形態1にかかる炭化珪素半導体装置は、炭化珪素からなる半導体基体(炭化珪素基体:半導体チップ)10のおもて面(p型ベース領域4側の面)側にMOSゲートを備えたMOSFETである。
次に、実施の形態2にかかる炭化珪素半導体装置の製造方法について説明する。図15〜17は、実施の形態2にかかる炭化珪素半導体装置の製造途中の状態を示す断面図である。実施の形態2にかかる炭化珪素半導体装置の構造は、実施の形態1と同様である(図1,2参照)。実施の形態2にかかる炭化珪素半導体装置の製造方法は、p型ベース領域4を形成するための工程が実施の形態1にかかる炭化珪素半導体装置の製造方法と異なる。具体的には、p型ベース領域4となるp型炭化珪素層22(22a,22b)を、高濃度インプラ領域13を形成するためのイオン注入工程を挟んで、2回に分けてエピタキシャル成長させている。
次に、実施の形態3にかかる炭化珪素半導体装置の構造について説明する。図18は、実施の形態3にかかる炭化珪素半導体装置の構造を示す断面図である。実施の形態3にかかる炭化珪素半導体装置が実施の形態1にかかる炭化珪素半導体装置と異なる点は、n型電流拡散領域3とn-型ドリフト領域2との界面よりもドレイン側に達する深さで第1,2p+型領域11,12が設けられている点である。
次に、ドレイン・ソース間でのリーク電流の発生頻度について検証した。図19は、実施例1にかかる炭化珪素半導体装置のドレイン・ソース間でのリーク電流の発生頻度を示す特性図である。図20は、従来例の炭化珪素半導体装置のドレイン・ソース間でのリーク電流の発生頻度を示す特性図である。図19,20の縦軸には1枚の半導体ウエハ面内でのリーク電流の発生頻度を示し、横軸には1枚の半導体ウエハ面内から形成される各製品(半導体チップ)のドレイン・ソース間でのリーク電流Iddsの大きさ(電流値)を示す。図19,20の横軸には、ドレイン・ソース間でのリーク電流Iddsが1×10-8A以下である場合を「〜1×10-8A」と示す。ドレイン・ソース間でのリーク電流Iddsが1×10xAより大きく1×10x+1A以下である場合を「〜1×10x+1A」と示す(x=−8〜−4)。ドレイン・ソース間でのリーク電流Iddsが1×10-3Aよりも大きい場合を「1×10-3A〜」と示す。
次に、ゲート閾値電圧Vthのばらつきについて検証した。図21は、実施例2にかかる炭化珪素半導体装置のゲート閾値電圧Vthのばらつきを示す特性図である。図21の横軸にはチャネルのキャリア濃度のばらつきの標準偏差σを示し、縦軸にはゲート閾値電圧Vth=5Vで設計した場合のゲート閾値電圧Vthのばらつきを示す。上述した実施例および従来例1のゲート閾値電圧Vthのばらつきを測定した結果を図21に示す。
次に、高濃度インプラ領域13のピーク13aの好適な深さ位置について検証した。図22は、比較例1,2の炭化珪素半導体装置のp型ベース領域の条件を示す説明図である。図22の横軸は基体おもて面からの深さであり、縦軸は不純物濃度である。図22において深さ=0μmは、ソース電極(不図示)とn+型ソース領域35との界面である。図23は、比較例1,2の炭化珪素半導体装置のゲート閾値電圧Vthとオン抵抗との関係を示す特性図である。従来例2および比較例1,2において、ゲート閾値電圧Vthとオン抵抗(RonA)との関係をシミュレーションした結果を図23に示す。
次に、実施の形態4において、高濃度インプラ領域13を形成するためのp型不純物のイオン注入によるp型不純物濃度プロファイル31(図2参照)のアニール後の状態について説明する。図25は、図1の要部のp型不純物濃度プロファイルを示す特性図である。図26は、図1の要部のp型不純物濃度プロファイルの条件を示す説明図である。図25には、アニール前のp型不純物濃度プロファイル31(図2と同様)と、アニール後の同部分のp型不純物濃度プロファイル33と、を示す。図26には、アニール後のp型不純物濃度プロファイル33を示す。ここで、アニールとは、高濃度インプラ領域13を形成するためのイオン注入の後、製品完成までに行うすべての熱処理である。
2 n-型ドリフト領域
3 n型電流拡散領域
3a,3b n型部分領域
4,34 p型ベース領域
4a 第1p型ベース部
4b 第2p型ベース部
5,35 n+型ソース領域
5a n+型ソース領域のピーク
6 p++型コンタクト領域
7 トレンチ
8 ゲート絶縁膜
9 ゲート電極
10 炭化珪素基体
11 第1p+型領域
12 第2p+型領域
12a,12b p+型部分領域
13 高濃度インプラ領域
13a 高濃度インプラ領域のピーク
14 層間絶縁膜
15 バリアメタル
16 ソース電極
17 ソースパッド
18 ドレイン電極
21,21a,21b n-型炭化珪素層
22,22a,22b p型炭化珪素層
30a n型不純物濃度プロファイルとp型不純物濃度プロファイルとの交点
30b p型炭化珪素層とn-型炭化珪素層との界面
31 アニール前のp型不純物濃度プロファイル
31a アニール前のp型不純物濃度プロファイルのピーク
31b アニール前のp型不純物濃度プロファイルの下段勾配
32 n型不純物濃度プロファイル
32a n型不純物濃度プロファイルのピーク
33 アニール後のp型不純物濃度プロファイル
33a アニール後のp型不純物濃度プロファイルのピーク
33b アニール後のp型不純物濃度プロファイルの下段勾配
33c アニール後のp型不純物濃度プロファイルの上段勾配
33d アニール後のp型不純物濃度プロファイルの上段勾配と下段勾配との間の不純物濃度点
34a,34c p型ベース領域の第1部分
34b,34d p型ベース領域の第2部分
L チャネル長
t1 高濃度インプラ領域の厚さ
t2 p型ベース領域の厚さ
t3 ゲート絶縁膜の、トレンチの側壁部分の厚さ
Claims (22)
- 炭化珪素基板のおもて面に設けられた第1導電型の第1エピタキシャル成長層と、
前記第1エピタキシャル成長層の、前記炭化珪素基板側に対して反対側に設けられた第2導電型の第2エピタキシャル成長層と、
前記第2エピタキシャル成長層の内部に選択的に設けられた、前記第2エピタキシャル成長層よりも不純物濃度の高い第2導電型の第1半導体領域と、
前記第2エピタキシャル成長層の内部の、前記第1半導体領域よりも浅い位置に選択的に設けられた第1導電型の第2半導体領域と、
前記第2半導体領域、前記第1半導体領域および前記第2エピタキシャル成長層を貫通して前記第1エピタキシャル成長層に達するトレンチと、
前記トレンチの内部にゲート絶縁膜を介して設けられたゲート電極と、
前記第2半導体領域および前記第2エピタキシャル成長層に接する第1電極と、
炭化珪素基板の裏面に設けられた第2電極と、
を備え、
前記第1半導体領域は、前記第2エピタキシャル成長層よりも不純物濃度の高いピークで深さ方向に高低差をもつ山型の第2導電型不純物濃度プロファイルを有することを特徴とする炭化珪素半導体装置。 - 前記第2導電型不純物濃度プロファイルは、前記第2エピタキシャル成長層と前記第1エピタキシャル成長層との境界で不純物濃度が急峻に低下していることを特徴とする請求項1に記載の炭化珪素半導体装置。
- 前記第2導電型不純物濃度プロファイルの不純物濃度の前記ピークは、前記第2エピタキシャル成長層と前記第1エピタキシャル成長層との境界よりも前記第1電極側に位置することを特徴とする請求項1または2に記載の炭化珪素半導体装置。
- 前記第1半導体領域は、前記炭化珪素基板のおもて面に平行な方向に一様に設けられていることを特徴とする請求項1〜3のいずれか一つに記載の炭化珪素半導体装置。
- 前記第1エピタキシャル成長層の内部に、前記第1エピタキシャル成長層よりも不純物濃度の高い第1導電型の第3半導体領域をさらに備え、
前記第3半導体領域は、前記第2エピタキシャル成長層に接し、かつ前記第2エピタキシャル成長層との境界から前記トレンチの底面よりも前記第2電極側に深い位置に達することを特徴とする請求項1〜4のいずれか一つに記載の炭化珪素半導体装置。 - 前記第3半導体領域の内部に選択的に設けられ、前記トレンチの底面を覆う第2導電型の第4半導体領域をさらに備えることを特徴とする請求項5に記載の炭化珪素半導体装置。
- 前記第4半導体領域は、前記トレンチの底面から深さ方向に前記第3半導体領域を貫通することを特徴とする請求項6に記載の炭化珪素半導体装置。
- 隣り合う前記トレンチ間において前記第3半導体領域の内部に、前記第2エピタキシャル成長層に接するように設けられた第2導電型の第5半導体領域をさらに備えることを特徴とする請求項5〜7のいずれか一つに記載の炭化珪素半導体装置。
- 前記第5半導体領域は、深さ方向に前記第3半導体領域を貫通することを特徴とする請求項8に記載の炭化珪素半導体装置。
- 炭化珪素基板のおもて面に第1導電型の第1エピタキシャル成長層を形成する第1工程と、
前記第1エピタキシャル成長層の上に、第2導電型の第2エピタキシャル成長層を形成する第2工程と、
イオン注入により、前記第2エピタキシャル成長層の内部に、前記第2エピタキシャル成長層よりも不純物濃度の高い第2導電型の第1半導体領域を選択的に形成する第3工程と、
前記第2エピタキシャル成長層の内部の、前記第1半導体領域よりも浅い位置に第1導電型の第2半導体領域を選択的に形成する第4工程と、
前記第2半導体領域、前記第1半導体領域および前記第2エピタキシャル成長層を貫通して前記第1エピタキシャル成長層に達するトレンチを形成する第5工程と、
前記トレンチの内部にゲート絶縁膜を介して設けられたゲート電極を形成する第6工程と、
前記第2半導体領域および前記第2エピタキシャル成長層に接する第1電極を形成する第7工程と、
前記炭化珪素基板の裏面に第2電極を形成する第8工程と、
を備え、
前記第3工程では、前記第2エピタキシャル成長層よりも不純物濃度の高いピークで深さ方向に高低差をもつ山型の第2導電型不純物濃度プロファイルを有する前記第1半導体領域を形成することを特徴とする炭化珪素半導体装置の製造方法。 - 前記第3工程では、イオン注入面よりも深い位置に前記第2導電型不純物濃度プロファイルの不純物濃度の前記ピークが形成される加速電圧で前記イオン注入を行うことを特徴とする請求項10に記載の炭化珪素半導体装置の製造方法。
- 前記第3工程の後、前記第4工程の前に、前記第2エピタキシャル成長層の上に第2導電型の第3エピタキシャル成長層を形成する工程をさらに含むことを特徴とする請求項10に記載の炭化珪素半導体装置の製造方法。
- 前記第3工程では、イオン注入面以下の深さ位置に前記第2導電型不純物濃度プロファイルの不純物濃度の前記ピークが形成される加速電圧で前記イオン注入を行うことを特徴とする請求項12に記載の炭化珪素半導体装置の製造方法。
- 前記第3工程では、前記第2エピタキシャル成長層と前記第1エピタキシャル成長層との境界よりも前記第1電極側の深さ位置に前記第2導電型不純物濃度プロファイルの不純物濃度の前記ピークが形成される加速電圧で前記イオン注入を行うことを特徴とする請求項10〜13のいずれか一つに記載の炭化珪素半導体装置の製造方法。
- 前記第2導電型不純物濃度プロファイルは、
前記ピークと、前記第2エピタキシャル成長層と前記第1エピタキシャル成長層との境界と、の間において、前記第1エピタキシャル成長層側に不純物濃度が低下する第1の不純物濃度勾配と、
前記第2エピタキシャル成長層と前記第1エピタキシャル成長層との境界から前記第1エピタキシャル成長層側に不純物濃度が低下する第2の不純物濃度勾配と、を有し、
前記第2の不純物濃度勾配は、前記第1の不純物濃度勾配よりも大きいことを特徴とする請求項2に記載の炭化珪素半導体装置。 - 前記第2導電型不純物濃度プロファイルは、前記第2の不純物濃度勾配により、前記第2エピタキシャル成長層と前記第1エピタキシャル成長層との境界で不純物濃度が急峻に低下していることを特徴とする請求項15に記載の炭化珪素半導体装置。
- 前記第2導電型不純物濃度プロファイルの前記ピークの不純物濃度は、前記第2エピタキシャル成長層の不純物濃度の2倍以上であることを特徴とする請求項1〜9、15、16のいずれか一つに記載の炭化珪素半導体装置。
- 前記ゲート絶縁膜の、少なくとも前記トレンチの側壁に沿った部分の厚さは、50nm以上100nm以下であることを特徴とする請求項17に記載の炭化珪素半導体装置。
- 前記第2導電型不純物濃度プロファイルの前記ピークの不純物濃度は、3×1017atoms/cm3以上5×1017atoms/cm3以下であることを特徴とする請求項18に記載の炭化珪素半導体装置。
- 前記第3工程では、前記第2導電型不純物濃度プロファイルの前記ピークの不純物濃度を、前記第2エピタキシャル成長層の不純物濃度の2倍以上にすることを特徴とする請求項10〜14のいずれか一つに記載の炭化珪素半導体装置の製造方法。
- 前記第6工程では、前記ゲート絶縁膜の、少なくとも前記トレンチの側壁に沿った部分の厚さを50nm以上100nm以下にすることを特徴とする請求項20に記載の炭化珪素半導体装置の製造方法。
- 前記第3工程では、前記第2導電型不純物濃度プロファイルの前記ピークの不純物濃度は、3×1017atoms/cm3以上5×1017atoms/cm3以下にすることを特徴とする請求項21に記載の炭化珪素半導体装置の製造方法。
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JP6115678B1 (ja) | 2017-04-19 |
JP2017139499A (ja) | 2017-08-10 |
US10832914B2 (en) | 2020-11-10 |
DE102016226235A8 (de) | 2017-10-05 |
JP2017139441A (ja) | 2017-08-10 |
US20170221714A1 (en) | 2017-08-03 |
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US20180269064A1 (en) | 2018-09-20 |
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