JP2015515720A - 有機電子素子用基板の製造方法 - Google Patents
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Abstract
Description
シロキサンバインダー(Si(OCH3)4)溶液に平均粒径が約200nmであるTiO2粒子を充分に分散してコーティング液を調剤した。ガラス基材上に製造されたコーティング液を塗布して散乱層を形成した。その後、平均粒径が約10nmである高屈折フィラー(二酸化チタン)が分散されているシロキサンバインダー(乾燥後の屈折率は約1.8)を散乱層上にコーティングして表面が平坦層を形成した。継いで、レーザーを照射してパターニングの幅は、約3mmになるように平坦層と散乱層をパターニングし、発光領域を除外した残りの領域にコーティングされている光抽出層を除去した。具体的には、レーザーを利用して散乱層と平坦層を横方向にパターニングし、更に縦方向にパターニングして四角形状で散乱層と平坦層が残存するように加工した。パターン化された基材層の全面に通常の方式でITO透明電極を全面に形成してパターン化された光学機能性層(散乱層と平坦層)が、例えば、図5のような形態の基板を形成して、発光層を含む有機層と金属電極を順に積層した。その後、封止構造(ガラス缶)を付着して図7に示したような装置を具現した。
レーザーを通じた加工過程を実行しないことの以外は、実施例1と同一に有機発光素子を製造した。
実施例1及び比較例1で各々製造された有機電子素子を対象として発光状態を撮影した。その後、85℃のオーブンで500時間が経た時点で、素子の外観を再撮影した。図9は、比較例1による有機電子素子の初期(a)及び500時間が経た時点(b)で外観を観察した結果である。図10は、実施例1による有機電子素子を85℃のオーブンで500時間放置した後に外観を観察した結果である。図9を参照すれば、比較例1の場合、500時間が経た時点で相対的に暗くなった発光領域がたくさん増加されて、全体的に発光均一度が顕著に低下されていることが分かる。これに比べて、実施例の場合、図10に示したように、500時間が経た時点でも暗くなった発光領域が多くなくて、発光均一度が維持されていることを確認した。
102、201:散乱層
301:光学機能性層
1021:散乱粒子
1022:バインダー
401:電極層、第1の電極層
701:有機層
702:第2の電極層
703、801:封止構造
704:接着剤
802:第2の基板
Claims (15)
- 基材層上に形成された光学機能性層を前記基材層に比べて小さい投影面積を有するようにレーザーで加工する工程を含むことを特徴とする有機電子素子用基板の製造方法。
- 前記光学機能性層は、散乱層であることを特徴とする請求項1に記載の有機電子素子用基板の製造方法。
- 前記散乱層は、散乱粒子を含む層であることを特徴とする請求項2に記載の有機電子素子用基板の製造方法。
- 前記散乱層は、凹凸構造を含む層であることを特徴とする請求項2または3に記載の有機電子素子用基板の製造方法。
- 前記光学機能性層は、湿式コーティング、ゾルゲル、蒸着またはマイクロエンボシング方式で基材層に形成されることを特徴とする請求項1から4の何れか1項に記載の有機電子素子用基板の製造方法。
- 前記光学機能性層は、散乱層及びその散乱層上に形成されている平坦層を含むことを特徴とする請求項1に記載の有機電子素子用基板の製造方法。
- レーザーを前記光学機能性層または前記基材層に向けて照射して加工を実行することを特徴とする請求項1から6の何れか1項に記載の有機電子素子用基板の製造方法。
- スポットレーザーまたはラインビームレーザーを照射して加工を実行することを特徴とする請求項1から7の何れか1項に記載の有機電子素子用基板の製造方法。
- 加工された前記光学機能性層上に前記光学機能性層に比べて広い投影面積を有するように電極層を形成する工程をさらに含むことを特徴とする請求項1から8の何れか1項に記載の有機電子素子用基板の製造方法。
- 前記電極層の投影面積(A)と前記光学機能性層の投影面積(B)の割合(A/B)が1.04以上になるように電極層を形成することを特徴とする請求項9に記載の有機電子素子用基板の製造方法。
- 請求項1から10の何れか1項に記載の製造方法で形成された基板の光学機能性層上に発光層を含む有機層及び第2の電極層を順次形成する工程を含むことを特徴とする有機電子素子の製造方法。
- 前記基板上に前記有機層を形成する前に前記光学機能性層に比べて広い投影面積を有する第1の電極層を形成する工程をさらに含むことを特徴とする請求項11に記載の有機電子素子の製造方法。
- 前記第1の電極層の投影面積(A)と前記光学機能性層の投影面積(B)の割合(A/B)が1.04以上になるように第1の電極層を形成することを特徴とする請求項12に記載の有機電子素子の製造方法。
- 前記第2の電極層を形成した後に封止構造を形成する工程をさらに含むことを特徴とする請求項12または13に記載の有機電子素子の製造方法。
- 基材層上に形成されており、下部に前記光学機能性層が形成されていない前記第1の電極層に接するように前記封止構造を形成することを特徴とする請求項14に記載の有機電子素子の製造方法。
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KR20120030249 | 2012-03-23 | ||
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KR20120084215A KR20130108027A (ko) | 2012-03-23 | 2012-07-31 | 유기전자소자용 기판의 제조방법 |
PCT/KR2013/002462 WO2013141673A1 (ko) | 2012-03-23 | 2013-03-25 | 유기전자소자용 기판의 제조방법 |
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JP2015500368A Active JP6140800B2 (ja) | 2012-03-23 | 2013-03-25 | 有機電子素子用基板 |
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EP (5) | EP2830111B1 (ja) |
JP (5) | JP5973053B2 (ja) |
KR (9) | KR20130108027A (ja) |
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WO2017149733A1 (ja) * | 2016-03-03 | 2017-09-08 | パイオニア株式会社 | 発光装置 |
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US11502551B2 (en) | 2012-07-06 | 2022-11-15 | Energous Corporation | Wirelessly charging multiple wireless-power receivers using different subsets of an antenna array to focus energy at different locations |
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JP6053363B2 (ja) | 2012-07-18 | 2016-12-27 | 三菱日立パワーシステムズ株式会社 | 触媒構造 |
CN104508854B (zh) * | 2012-07-31 | 2017-12-01 | 株式会社Lg化学 | 用于有机电子器件的基板 |
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