WO2009017035A1 - 透光性基板、その製造方法、有機ｌｅｄ素子及びその製造方法 - Google Patents

透光性基板、その製造方法、有機ｌｅｄ素子及びその製造方法 Download PDF

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Publication number
WO2009017035A1
WO2009017035A1 PCT/JP2008/063319 JP2008063319W WO2009017035A1 WO 2009017035 A1 WO2009017035 A1 WO 2009017035A1 JP 2008063319 W JP2008063319 W JP 2008063319W WO 2009017035 A1 WO2009017035 A1 WO 2009017035A1
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WIPO (PCT)
Prior art keywords
translucent substrate
led element
organic led
manufacturing
refractive index
Prior art date
Application number
PCT/JP2008/063319
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English (en)
French (fr)
Inventor
Nobuhiro Nakamura
Kazutaka Hayashi
Kenji Imakita
Hiroyuki Okawa
Hidefumi Odaka
Nao Ishibashi
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Asahi Glass Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=40304265&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2009017035(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Asahi Glass Co., Ltd. filed Critical Asahi Glass Co., Ltd.
Priority to JP2009525365A priority Critical patent/JP5195755B2/ja
Priority to CN2008801007265A priority patent/CN101766052B/zh
Priority to EP08791571.6A priority patent/EP2178343B2/en
Priority to US12/333,755 priority patent/US8018140B2/en
Publication of WO2009017035A1 publication Critical patent/WO2009017035A1/ja
Priority to US13/195,146 priority patent/US8427045B2/en

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/854—Arrangements for extracting light from the devices comprising scattering means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/12—Silica-free oxide glass compositions
    • C03C3/16—Silica-free oxide glass compositions containing phosphorus
    • C03C3/21—Silica-free oxide glass compositions containing phosphorus containing titanium, zirconium, vanadium, tungsten or molybdenum
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/08—Frit compositions, i.e. in a powdered or comminuted form containing phosphorus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0033—Means for improving the coupling-out of light from the light guide
    • G02B6/0035—Means for improving the coupling-out of light from the light guide provided on the surface of the light guide or in the bulk of it
    • G02B6/004—Scattering dots or dot-like elements, e.g. microbeads, scattering particles, nanoparticles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/26—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/875—Arrangements for extracting light from the devices
    • H10K59/877—Arrangements for extracting light from the devices comprising scattering means
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/45—Inorganic continuous phases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
    • C03C2217/948—Layers comprising indium tin oxide [ITO]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161—Cap
    • H01L2924/1615—Shape
    • H01L2924/16152—Cap comprising a cavity for hosting the device, e.g. U-shaped cap

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

　取り出し効率を最大で発光光の８０％まで向上した有機ＬＥＤ素子を提供する。 　本発明の電極付き透光性基板は、透光性基板と、透光性基板上に形成され有機ＬＥＤ素子の発光光の波長のうち少なくとも一つの波長において第１の屈折率を有するベース材とベース材内部に位置しベース材と異なる第２の屈折率を有する複数の散乱物質とを備えた散乱層と、散乱層上に形成され第１の屈折率と同じ若しくはより低い第３の屈折率を有する透光性電極とを有し、前記散乱物質の前記散乱層内分布が、前記散乱層内部から前記透光性電極にむかって、小さくなっていることを特徴とする。
PCT/JP2008/063319 2007-07-27 2008-07-24 透光性基板、その製造方法、有機ｌｅｄ素子及びその製造方法 WO2009017035A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2009525365A JP5195755B2 (ja) 2007-07-27 2008-07-24 透光性基板、その製造方法、有機ｌｅｄ素子及びその製造方法
CN2008801007265A CN101766052B (zh) 2007-07-27 2008-07-24 透光性基板、其制造方法、有机led元件及其制造方法
EP08791571.6A EP2178343B2 (en) 2007-07-27 2008-07-24 Translucent substrate, method for manufacturing the translucent substrate and organic led element
US12/333,755 US8018140B2 (en) 2007-07-27 2008-12-12 Translucent substrate, process for producing the same, organic LED element and process for producing the same
US13/195,146 US8427045B2 (en) 2007-07-27 2011-08-01 Translucent substrate, process for producing the same, organic LED element and process for producing the same

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-195797 2007-07-27
JP2007195797 2007-07-27
JP2007241287 2007-09-18
JP2007-241287 2007-09-18

Related Child Applications (1)

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US12/333,755 Continuation-In-Part US8018140B2 (en) 2007-07-27 2008-12-12 Translucent substrate, process for producing the same, organic LED element and process for producing the same

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WO2009017035A1 true WO2009017035A1 (ja) 2009-02-05

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US (2) US8018140B2 (ja)
EP (1) EP2178343B2 (ja)
JP (1) JP5195755B2 (ja)
KR (1) KR101548025B1 (ja)
CN (1) CN101766052B (ja)
TW (1) TWI482527B (ja)
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Cited By (35)

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WO2010084923A1 (ja) * 2009-01-26 2010-07-29 旭硝子株式会社 電子デバイス用基板およびこれを用いた電子デバイス
JP2010198797A (ja) * 2009-02-23 2010-09-09 Nippon Electric Glass Co Ltd 有機ｅｌ素子用ガラス基板及びその製造方法
US20100240516A1 (en) * 2007-12-06 2010-09-23 Asahi Glass Company, Limited Optical glass and preforms for precision press molding and optical elements made by using the glass
CN101867020A (zh) * 2010-06-01 2010-10-20 友达光电股份有限公司 发光元件
WO2011046190A1 (ja) 2009-10-15 2011-04-21 旭硝子株式会社 有機ｌｅｄ素子、有機ｌｅｄ素子の散乱層用のガラスフリット及び有機ｌｅｄ素子の散乱層の製造方法
WO2011046156A1 (ja) 2009-10-15 2011-04-21 旭硝子株式会社 有機ｌｅｄ素子の散乱層用ガラス及びそれを用いた有機ｌｅｄ素子
JP2011215568A (ja) * 2010-03-18 2011-10-27 Vision Development Co Ltd ダイヤモンドを含有する光散乱膜、及びそれを形成する方法
WO2012014812A1 (ja) 2010-07-26 2012-02-02 旭硝子株式会社 有機ｌｅｄ素子の散乱層用ガラス及び有機ｌｅｄ素子
JP2012032441A (ja) * 2010-07-28 2012-02-16 Asahi Glass Co Ltd 照明用光拡散板及びその製造方法
EP2445314A1 (en) * 2009-06-16 2012-04-25 Sumitomo Chemical Company, Limited Light extracting structure
CN102762510A (zh) * 2010-01-22 2012-10-31 法国圣-戈班玻璃公司 在电极涂层下用高指数层涂布的玻璃基材、以及包含所述基材的有机发光装置
CN103025675A (zh) * 2010-07-26 2013-04-03 旭硝子株式会社 无碱保护玻璃组合物及使用该玻璃组合物的光提取构件
JP2013539158A (ja) * 2010-07-16 2013-10-17 エージーシー グラス ユーロップ 有機発光デバイスのための半透明導電性基板
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WO2013178702A1 (fr) 2012-05-29 2013-12-05 Agc Glass Europe Substrat verrier texturé à propriétés optiques améliorées pour dispositif optoélectronique
EP2383236A4 (en) * 2009-01-26 2014-01-01 Asahi Glass Co Ltd GLASS COMPOSITION AND ELEMENT COMPRISING SAID COMPOSITION ON A SUBSTRATE
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JP2014103113A (ja) * 2012-11-20 2014-06-05 Samsung Corning Precision Materials Co Ltd 有機発光素子用基板、その製造方法、及びこれを具備する有機発光装置
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WO2014181641A1 (ja) 2013-05-09 2014-11-13 旭硝子株式会社 透光性基板、有機ｌｅｄ素子、透光性基板の製造方法
JP2015517194A (ja) * 2012-04-26 2015-06-18 オスラム オーエルイーディー ゲゼルシャフト ミット ベシュレンクテル ハフツングＯＳＲＡＭ ＯＬＥＤ ＧｍｂＨ 電磁ビーム用散乱層を作製する方法および電磁ビームを散乱するための散乱層
JP2015518631A (ja) * 2012-03-30 2015-07-02 エルジー・ケム・リミテッド 有機電子素子用基板
JP2015523690A (ja) * 2012-06-14 2015-08-13 サン−ゴバン グラス フランス 有機発光ダイオード（ｏｌｅｄ）素子用積層体、その製造方法、及びこれを備える有機発光ダイオード（ｏｌｅｄ）素子
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JP2016018785A (ja) * 2014-07-08 2016-02-01 ケント ステート ユニバーシティ Ｏｌｅｄの光アウトカップリング向上のための内側及び外側の組み合わせ取り出し層
WO2016043084A1 (ja) * 2014-09-18 2016-03-24 旭硝子株式会社 発光素子および発電素子
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JP2017528399A (ja) * 2014-07-16 2017-09-28 サン−ゴバン グラス フランス 透明拡散性ｏｌｅｄ基材及び該基材の製造方法
JP2018503940A (ja) * 2014-12-01 2018-02-08 サン−ゴバン グラス フランス 透明拡散性ｏｌｅｄ基材及び該基材の製造方法
JP2018512704A (ja) * 2015-02-27 2018-05-17 コーニング インコーポレイテッド ランダムな空隙を含むガラス基体、およびそれを含むディスプレイ装置
KR101863948B1 (ko) 2010-12-20 2018-07-04 삼성전자주식회사 발광 소자 기판과 그 제조 방법, 면발광 소자, 조명 기구 및 백라이트
JP2022534166A (ja) * 2019-03-07 2022-07-28 ビトロ フラット グラス エルエルシー ホウケイ酸塩光取り出し領域

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US10581020B2 (en) * 2011-02-08 2020-03-03 Vitro Flat Glass Llc Light extracting substrate for organic light emitting diode
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EP2178343A1 (en) 2010-04-21
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US8018140B2 (en) 2011-09-13
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