JP2007070731A - 金属デュプレックスおよび方法 - Google Patents
金属デュプレックスおよび方法 Download PDFInfo
- Publication number
- JP2007070731A JP2007070731A JP2006241209A JP2006241209A JP2007070731A JP 2007070731 A JP2007070731 A JP 2007070731A JP 2006241209 A JP2006241209 A JP 2006241209A JP 2006241209 A JP2006241209 A JP 2006241209A JP 2007070731 A JP2007070731 A JP 2007070731A
- Authority
- JP
- Japan
- Prior art keywords
- tin
- nickel
- layer
- phosphorous
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
- C25D5/505—After-treatment of electroplated surfaces by heat-treatment of electroplated tin coatings, e.g. by melting
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/028—Including graded layers in composition or in physical properties, e.g. density, porosity, grain size
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/2919—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29339—Silver [Ag] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45117—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
- H01L2224/45124—Aluminium (Al) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49579—Lead-frames or other flat leads characterised by the materials of the lead frames or layers thereon
- H01L23/49582—Metallic layers on lead frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L24/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01011—Sodium [Na]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01012—Magnesium [Mg]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01014—Silicon [Si]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01015—Phosphorus [P]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01016—Sulfur [S]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01025—Manganese [Mn]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01027—Cobalt [Co]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01028—Nickel [Ni]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0103—Zinc [Zn]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0104—Zirconium [Zr]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01046—Palladium [Pd]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01049—Indium [In]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0105—Tin [Sn]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01051—Antimony [Sb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01052—Tellurium [Te]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01084—Polonium [Po]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01327—Intermediate phases, i.e. intermetallics compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12042—LASER
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19043—Component type being a resistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9265—Special properties
- Y10S428/929—Electrical contact feature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9335—Product by special process
- Y10S428/939—Molten or fused coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12708—Sn-base component
- Y10T428/12722—Next to Group VIII metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
- Y10T428/1291—Next to Co-, Cu-, or Ni-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
【解決手段】方法および物品が開示される。方法は、スズおよびスズ合金表面酸化を抑制し、基体のはんだ付け性を改善するために基体上にニッケルデュプレックス層を堆積させることを対象とする。
【選択図】なし
Description
9つの銅−スズ合金リードフレームを、100g/LのRONACLEAN(商標)CP−100(これは、米国ペンシルベニア州フィラデルフィアのRohm and Haas Companyから入手可能なシリケート含有洗浄組成物である)を含有する洗浄液中、65℃で30秒間、超音波洗浄した。
9つの銅−スズ合金リードフレームを、65℃で30秒間、100g/LのRONACLEAN(商標)CP−100(シリケート含有組成物)を含有する洗浄溶液中で超音波洗浄した。
各リードフレームを10ASDの電流密度で、スズ銅合金メッキ浴中電気メッキして、ニッケルリン層上にスズ銅合金層を形成する以外は、上記の実施例1において開示された工程を繰り返す。スズ銅合金メッキ浴は、50g/Lのスズをメタンスルホン酸スズ(II)として;1g/Lの銅をメタンスルホン酸銅(II)として;160g/Lの遊離メタンスルホン酸、27/gのエトキシル化βナフトール;7g/Lのエトキシル化ビスフェノールA、1g/Lの光沢剤;3g/Lのメタクリル酸;0.8g/Lの細粒化剤および5g/Lの、50000ダルトンの分子量および80%のカルボキシル化度を有し、TRILON ES9300の商品名で販売されているカルボキシメチル化ポリエチレンイミンを含む。
スズ層の代わりに、スズ銀合金層でリードフレームをメッキする以外は、実施例2に記載された工程を繰り返す。各リードフレームは、スズ銀層で、5ASDの電流密度でメッキされる。スズ銀合金浴は、50g/Lのスズをメタンスルホン酸スズとして;1.5g/Lの銀を銀メタンスルホン酸銀として;6g/Lのチオ尿素;200ml/Lのメタンスルホン酸;2g/Lのポリアルコキシレート;0.25g/Lのエチルマルトールおよび0.25g/Lの3−メチル−1,2−シクロペンタノンを含んでいる。
スズ層の代わりに、スズ鉛合金層でリードフレームをメッキする以外は実施例2に記載された工程を繰り返す。各リードフレームは、スズ鉛層で、5ASDの電流密度でメッキされる。スズ鉛合金浴は、メタンスルホン酸スズからの40g/Lのスズ;メタンスルホン酸鉛からの26g/Lの鉛、および200ml/Lのメタンスルホン酸を含んでいる。
Claims (10)
- 基体上にニッケル層を堆積させること、該ニッケル層上にニッケルリン層を堆積させること、及び該ニッケルリン層上にスズもしくはスズ合金層を堆積させることを含む方法。
- スズまたはスズ合金層をリフローする工程をさらに含む、請求項1記載の方法。
- 基体上に1ミクロン〜10ミクロンのニッケル層を堆積させること、該ニッケル層上に0.1ミクロン〜5ミクロンのニッケルリン層を堆積させること、及び該ニッケルリン層上にスズもしくはスズ合金層を堆積させることを含む、方法。
- ニッケルリン層のリン含有量が、0.1重量%〜15重量%である、請求項3記載の方法。
- 基体上のニッケル層、及び該ニッケル層上のニッケルリン層、及び該ニッケルリン層上のスズもしくはスズ合金層を含む物品。
- ニッケルリン層が、0.1重量%〜15重量%のリンを含む、請求項5記載の物品。
- ニッケルリン層が、1重量%〜10重量%のリンを含む、請求項6記載の物品。
- ニッケル層が1ミクロン〜10ミクロンの厚さであり、及びニッケルリン層が0.1ミクロン〜5ミクロンの厚さである、請求項5記載の物品。
- ニッケル層とニッケルリン層との厚さが、2ミクロン〜3ミクロンである請求項5記載の物品。
- 物品が、プリント配線板、リードフレーム、電気コネクター、ウェハバンプ、または受動素子である、請求項5記載の物品。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71457505P | 2005-09-07 | 2005-09-07 | |
US60/714575 | 2005-09-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007070731A true JP2007070731A (ja) | 2007-03-22 |
JP5026031B2 JP5026031B2 (ja) | 2012-09-12 |
Family
ID=37564172
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006241198A Pending JP2007070730A (ja) | 2005-09-07 | 2006-09-06 | 金属デュプレックス及び方法 |
JP2006241209A Expired - Fee Related JP5026031B2 (ja) | 2005-09-07 | 2006-09-06 | スズ層を有する金属デュプレックスの製造方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006241198A Pending JP2007070730A (ja) | 2005-09-07 | 2006-09-06 | 金属デュプレックス及び方法 |
Country Status (8)
Country | Link |
---|---|
US (2) | US20070052105A1 (ja) |
EP (2) | EP1762641A3 (ja) |
JP (2) | JP2007070730A (ja) |
KR (2) | KR20070028266A (ja) |
CN (2) | CN1936094B (ja) |
HK (1) | HK1101603A1 (ja) |
SG (2) | SG131046A1 (ja) |
TW (2) | TWI371797B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013026427A (ja) * | 2011-07-21 | 2013-02-04 | Furukawa Electric Co Ltd:The | 光半導体装置用リードフレーム及びその製造方法 |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4988165B2 (ja) * | 2005-03-11 | 2012-08-01 | 関東化学株式会社 | フォトレジスト剥離液組成物及びフォトレジストの剥離方法 |
US20070052105A1 (en) * | 2005-09-07 | 2007-03-08 | Rohm And Haas Electronic Materials Llc | Metal duplex method |
JP2009521798A (ja) * | 2005-12-24 | 2009-06-04 | ヒュン キュ チョイ, | 半導体パッケージ、その製造方法及びイメージセンサー用の半導体パッケージモジュール |
US8354692B2 (en) * | 2006-03-15 | 2013-01-15 | Infineon Technologies Ag | Vertical semiconductor power switch, electronic component and methods of producing the same |
DE102006032074B3 (de) * | 2006-07-11 | 2007-12-27 | Infineon Technologies Ag | Bauelement und zugehöriger Anschlussdraht |
EP2103712B1 (en) * | 2008-03-20 | 2019-02-13 | ATOTECH Deutschland GmbH | Ni-P layer system and process for its preparation |
US9385449B2 (en) * | 2009-02-16 | 2016-07-05 | Carlisle Interconnect Technologies, Inc. | Terminal/connector having integral oxide breaker element |
TWI447878B (zh) * | 2009-08-28 | 2014-08-01 | Great Team Backend Foundry Inc | 增加通路及降低電阻之電晶體連接結構 |
US9175400B2 (en) * | 2009-10-28 | 2015-11-03 | Enthone Inc. | Immersion tin silver plating in electronics manufacture |
CN101784165B (zh) * | 2010-03-19 | 2014-11-05 | 中兴通讯股份有限公司 | 一种印制电路板耐腐蚀可焊涂层处理方法 |
DE102011102052A1 (de) * | 2011-05-19 | 2012-11-22 | Anke Gmbh & Co. Kg | Netzmittel für elektrolytische Anwendung und dessen Verwendung |
JP6046406B2 (ja) * | 2011-07-26 | 2016-12-14 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | 高温耐性銀コート基体 |
CN102983115B (zh) * | 2012-12-03 | 2015-10-28 | 恒汇电子科技有限公司 | 一种智能卡封装框架 |
CN102978671B (zh) * | 2012-12-03 | 2016-04-13 | 恒汇电子科技有限公司 | 一种智能卡封装框架的电镀方法 |
DE102013105392A1 (de) * | 2013-05-27 | 2014-11-27 | Thyssenkrupp Rasselstein Gmbh | Verfahren zur Beschichtung eines Stahlblechs mit einer Metallschicht |
JP5748019B1 (ja) * | 2014-08-27 | 2015-07-15 | 株式会社オートネットワーク技術研究所 | ピン端子及び端子材料 |
CN107190289A (zh) * | 2017-06-14 | 2017-09-22 | 深圳市呈永鑫精密电路有限公司 | 一种低磁高抗环境性的pcb板及其制备方法 |
Citations (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54110140A (en) * | 1978-02-17 | 1979-08-29 | Mitsubishi Electric Corp | Plating method |
JPH01242798A (ja) * | 1988-03-25 | 1989-09-27 | Nkk Corp | 溶接缶用薄鍍金ぶりきの製造方法及び装置 |
JPH03104896A (ja) * | 1989-09-18 | 1991-05-01 | Kawasaki Steel Corp | 電気錫めつき鋼帯の溶融光輝化処理方法および装置 |
JPH06228790A (ja) * | 1993-02-03 | 1994-08-16 | Kawasaki Steel Corp | 薄目付電気錫めっき鋼帯のリフロー処理方法 |
JPH0741985A (ja) * | 1993-07-29 | 1995-02-10 | Pentel Kk | ニッケル−リン合金めっきの製造方法 |
JP2001040495A (ja) * | 1999-07-28 | 2001-02-13 | Nippon Mining & Metals Co Ltd | プレス破面の耐食性に優れる錫又は錫合金めっき材及びその製造方法 |
JP2002155393A (ja) * | 2000-11-15 | 2002-05-31 | Nippon Mining & Metals Co Ltd | ばね性に優れためっき材 |
JP2002256481A (ja) * | 2001-03-01 | 2002-09-11 | Nisshin Steel Co Ltd | はんだ濡れ性,耐食性に優れた複層めっき鋼板 |
JP2002302790A (ja) * | 2001-04-06 | 2002-10-18 | Ishihara Chem Co Ltd | スズ−銅合金メッキ方法 |
JP2002317295A (ja) * | 2001-04-19 | 2002-10-31 | Furukawa Electric Co Ltd:The | リフロー処理Sn合金めっき材料、それを用いた嵌合型接続端子 |
JP2002339097A (ja) * | 2001-05-11 | 2002-11-27 | Lucent Technol Inc | 近表面をドープしたスズまたはスズ合金で被覆された金属製品 |
JP2003049293A (ja) * | 2001-03-16 | 2003-02-21 | Shipley Co Llc | 錫メッキ |
JP2004307954A (ja) * | 2003-04-08 | 2004-11-04 | Matsushita Electric Works Ltd | めっき形成部材 |
JP2005068445A (ja) * | 2003-08-25 | 2005-03-17 | Dowa Mining Co Ltd | 金属被覆された金属部材 |
JP2005109373A (ja) * | 2003-10-02 | 2005-04-21 | Fuji Electric Device Technology Co Ltd | 半導体装置 |
JP2005154819A (ja) * | 2003-11-25 | 2005-06-16 | Kobe Steel Ltd | 嵌合型接続端子 |
JP2006508252A (ja) * | 2002-11-27 | 2006-03-09 | テクニク・インコーポレーテッド | 電気めっきを行う間の表面酸化の低減 |
JP2006312762A (ja) * | 2005-05-09 | 2006-11-16 | Hirai Seimitsu:Kk | 錫めっき鉄系金属材料 |
Family Cites Families (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4102755A (en) | 1973-06-01 | 1978-07-25 | Langbein-Pfanhauser Werke Ag | Method of and electrolytic bath for the electrodeposition of semibright nickel and nickel-cobalt coatings upon a metal surface |
US4053373A (en) | 1975-07-09 | 1977-10-11 | M & T Chemicals Inc. | Electroplating of nickel, cobalt, nickel-cobalt, nickel-iron, cobalt-iron and nickel-iron-cobalt deposits |
US4049471A (en) | 1976-07-26 | 1977-09-20 | Bell Telephone Laboratories, Incorporated | Technique for stabilizing contact resistance of gold plated electrical contacts |
US4199416A (en) * | 1977-05-03 | 1980-04-22 | Johnson, Matthey & Co., Limited | Composition for the electroplating of gold |
US4186064A (en) | 1977-07-20 | 1980-01-29 | Technic, Inc. | Method and electrolyte for electrodeposition of bright gold and gold alloys |
US4230493A (en) | 1978-09-22 | 1980-10-28 | E. I. Du Pont De Nemours And Company | Gold conductor compositions |
EP0160761B1 (en) | 1984-05-11 | 1989-02-08 | Burlington Industries, Inc. | Amorphous transition metal alloy, thin gold coated, electrical contact |
JPH0684546B2 (ja) * | 1984-10-26 | 1994-10-26 | 京セラ株式会社 | 電子部品 |
US4888574A (en) | 1985-05-29 | 1989-12-19 | 501 Ohmega Electronics, Inc. | Circuit board material and method of making |
US4994155A (en) * | 1988-12-09 | 1991-02-19 | Learonal, Inc. | High speed tin, lead or tin/lead alloy electroplating |
US4880507A (en) * | 1987-12-10 | 1989-11-14 | Learonal, Inc. | Tin, lead or tin/lead alloy electrolytes for high speed electroplating |
US5174887A (en) * | 1987-12-10 | 1992-12-29 | Learonal, Inc. | High speed electroplating of tinplate |
US5235139A (en) * | 1990-09-12 | 1993-08-10 | Macdermid, Incorprated | Method for fabricating printed circuits |
US5164069A (en) | 1990-11-05 | 1992-11-17 | Shipley Company Inc. | Nickel electroplating solution and acetylenic compounds therefor |
US5182172A (en) | 1991-04-18 | 1993-01-26 | Bausch & Lomb Incorporated | Post-plating passivation treatment |
US5491036A (en) * | 1992-03-27 | 1996-02-13 | The Louis Berkman Company | Coated strip |
EP0582411A3 (en) * | 1992-07-31 | 1995-02-22 | Gen Electric | Chemical metallization processes. |
JPH0798996B2 (ja) * | 1992-12-28 | 1995-10-25 | 株式会社八光電機製作所 | 金メッキ処理を施したコネクター用接触子 |
JP3216341B2 (ja) * | 1993-06-29 | 2001-10-09 | ぺんてる株式会社 | 貴金属めっきの製造方法 |
US5492615A (en) * | 1994-11-22 | 1996-02-20 | Learonal Inc. | Cyclodextrin stabilization of organic metal finishing additives in aqueous metal treating baths |
DK172937B1 (da) | 1995-06-21 | 1999-10-11 | Peter Torben Tang | Galvanisk fremgangsmåde til dannelse af belægninger af nikkel, kobalt, nikkellegeringer eller kobaltlegeringer |
US5675177A (en) | 1995-06-26 | 1997-10-07 | Lucent Technologies Inc. | Ultra-thin noble metal coatings for electronic packaging |
JP3217259B2 (ja) | 1996-01-30 | 2001-10-09 | 日本鋼管株式会社 | 高電流密度錫めっき用光沢剤及び高電流密度電解特性に優れた錫めっき浴 |
US5916696A (en) | 1996-06-06 | 1999-06-29 | Lucent Technologies Inc. | Conformable nickel coating and process for coating an article with a conformable nickel coating |
JPH10233121A (ja) * | 1997-02-18 | 1998-09-02 | Hitachi Cable Ltd | リードワイヤ |
JP3667926B2 (ja) * | 1997-03-14 | 2005-07-06 | 株式会社神戸製鋼所 | 金/ニッケル/ニッケル3層めっき銅合金電子部品およびその製造方法 |
US6210556B1 (en) * | 1998-02-12 | 2001-04-03 | Learonal, Inc. | Electrolyte and tin-silver electroplating process |
JP2000077593A (ja) * | 1998-08-27 | 2000-03-14 | Hitachi Cable Ltd | 半導体用リードフレーム |
WO2000015876A1 (fr) | 1998-09-11 | 2000-03-23 | Nippon Mining & Metals Co., Ltd. | Materiau metallique |
JP2000124268A (ja) * | 1998-10-12 | 2000-04-28 | Hitachi Cable Ltd | 半導体装置用テープキャリア |
JP4130508B2 (ja) * | 1999-01-22 | 2008-08-06 | 富士通株式会社 | 半田接合方法及び電子装置の製造方法 |
TW459364B (en) * | 1999-04-28 | 2001-10-11 | Ind Tech Res Inst | Method and structure for strengthening lead frame used for semiconductor |
US6259161B1 (en) * | 1999-06-18 | 2001-07-10 | Mitsubishi Denki Kabushiki Kaisha | Circuit electrode connected to a pattern formed on an organic substrate and method of forming the same |
JP2001274539A (ja) * | 2000-03-28 | 2001-10-05 | Matsushita Electric Works Ltd | 電子デバイス搭載プリント配線板の電極接合方法 |
JP2001355094A (ja) * | 2000-06-13 | 2001-12-25 | Citizen Watch Co Ltd | 装飾被膜を有する基材およびその製造方法 |
EP1167582B1 (en) | 2000-07-01 | 2005-09-14 | Shipley Company LLC | Metal alloy compositions and plating method related thereto |
US6452258B1 (en) | 2000-11-06 | 2002-09-17 | Lucent Technologies Inc. | Ultra-thin composite surface finish for electronic packaging |
JP3910363B2 (ja) * | 2000-12-28 | 2007-04-25 | 富士通株式会社 | 外部接続端子 |
US20020185716A1 (en) | 2001-05-11 | 2002-12-12 | Abys Joseph Anthony | Metal article coated with multilayer finish inhibiting whisker growth |
DE60226196T2 (de) | 2001-05-24 | 2009-05-14 | Shipley Co., L.L.C., Marlborough | Zinn-Plattieren |
US20030025182A1 (en) | 2001-06-22 | 2003-02-06 | Abys Joseph A. | Metal article coated with tin or tin alloy under tensile stress to inhibit whisker growth |
JP4932094B2 (ja) * | 2001-07-02 | 2012-05-16 | 日本リーロナール有限会社 | 無電解金めっき液および無電解金めっき方法 |
JP2003045180A (ja) * | 2001-07-27 | 2003-02-14 | Mitsubishi Electric Corp | 半導体装置 |
JP2003129283A (ja) * | 2001-10-18 | 2003-05-08 | Hitachi Ltd | メッキ処理装置及びそれを用いた半導体装置の製造方法 |
JP4128005B2 (ja) | 2001-12-28 | 2008-07-30 | 日本リーロナール有限会社 | 電気ニッケルめっき液 |
US6780225B2 (en) * | 2002-05-24 | 2004-08-24 | Vitronics Soltec, Inc. | Reflow oven gas management system and method |
JP3989795B2 (ja) * | 2002-08-09 | 2007-10-10 | エヌ・イーケムキャット株式会社 | 電解硬質金めっき液及びそれを用いためっき方法 |
US7306133B2 (en) * | 2003-04-25 | 2007-12-11 | St Assembly Test Services Ltd. | System for fabricating an integrated circuit package on a printed circuit board |
US20050249969A1 (en) * | 2004-05-04 | 2005-11-10 | Enthone Inc. | Preserving solderability and inhibiting whisker growth in tin surfaces of electronic components |
JP4362599B2 (ja) * | 2004-03-05 | 2009-11-11 | Dowaメタルテック株式会社 | 金属部材およびそれを用いた電気接点 |
US20070052105A1 (en) * | 2005-09-07 | 2007-03-08 | Rohm And Haas Electronic Materials Llc | Metal duplex method |
-
2006
- 2006-08-28 US US11/510,883 patent/US20070052105A1/en not_active Abandoned
- 2006-08-28 US US11/511,155 patent/US7615255B2/en not_active Expired - Fee Related
- 2006-09-05 TW TW095132672A patent/TWI371797B/zh not_active IP Right Cessation
- 2006-09-05 TW TW095132673A patent/TWI326717B/zh not_active IP Right Cessation
- 2006-09-06 JP JP2006241198A patent/JP2007070730A/ja active Pending
- 2006-09-06 SG SG200606146-9A patent/SG131046A1/en unknown
- 2006-09-06 SG SG200606141-0A patent/SG131043A1/en unknown
- 2006-09-06 JP JP2006241209A patent/JP5026031B2/ja not_active Expired - Fee Related
- 2006-09-07 CN CN2006101291917A patent/CN1936094B/zh not_active Expired - Fee Related
- 2006-09-07 EP EP06254661A patent/EP1762641A3/en not_active Withdrawn
- 2006-09-07 KR KR1020060086427A patent/KR20070028266A/ko not_active Application Discontinuation
- 2006-09-07 KR KR1020060086422A patent/KR20070028265A/ko not_active Application Discontinuation
- 2006-09-07 CN CNA2006101291921A patent/CN1936095A/zh active Pending
- 2006-09-07 EP EP06254660A patent/EP1762640A3/en not_active Withdrawn
-
2007
- 2007-08-30 HK HK07109440.0A patent/HK1101603A1/xx not_active IP Right Cessation
Patent Citations (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54110140A (en) * | 1978-02-17 | 1979-08-29 | Mitsubishi Electric Corp | Plating method |
JPH01242798A (ja) * | 1988-03-25 | 1989-09-27 | Nkk Corp | 溶接缶用薄鍍金ぶりきの製造方法及び装置 |
JPH03104896A (ja) * | 1989-09-18 | 1991-05-01 | Kawasaki Steel Corp | 電気錫めつき鋼帯の溶融光輝化処理方法および装置 |
JPH06228790A (ja) * | 1993-02-03 | 1994-08-16 | Kawasaki Steel Corp | 薄目付電気錫めっき鋼帯のリフロー処理方法 |
JPH0741985A (ja) * | 1993-07-29 | 1995-02-10 | Pentel Kk | ニッケル−リン合金めっきの製造方法 |
JP2001040495A (ja) * | 1999-07-28 | 2001-02-13 | Nippon Mining & Metals Co Ltd | プレス破面の耐食性に優れる錫又は錫合金めっき材及びその製造方法 |
JP2002155393A (ja) * | 2000-11-15 | 2002-05-31 | Nippon Mining & Metals Co Ltd | ばね性に優れためっき材 |
JP2002256481A (ja) * | 2001-03-01 | 2002-09-11 | Nisshin Steel Co Ltd | はんだ濡れ性,耐食性に優れた複層めっき鋼板 |
JP2003049293A (ja) * | 2001-03-16 | 2003-02-21 | Shipley Co Llc | 錫メッキ |
JP2002302790A (ja) * | 2001-04-06 | 2002-10-18 | Ishihara Chem Co Ltd | スズ−銅合金メッキ方法 |
JP2002317295A (ja) * | 2001-04-19 | 2002-10-31 | Furukawa Electric Co Ltd:The | リフロー処理Sn合金めっき材料、それを用いた嵌合型接続端子 |
JP2002339097A (ja) * | 2001-05-11 | 2002-11-27 | Lucent Technol Inc | 近表面をドープしたスズまたはスズ合金で被覆された金属製品 |
JP2006508252A (ja) * | 2002-11-27 | 2006-03-09 | テクニク・インコーポレーテッド | 電気めっきを行う間の表面酸化の低減 |
JP2004307954A (ja) * | 2003-04-08 | 2004-11-04 | Matsushita Electric Works Ltd | めっき形成部材 |
JP2005068445A (ja) * | 2003-08-25 | 2005-03-17 | Dowa Mining Co Ltd | 金属被覆された金属部材 |
JP2005109373A (ja) * | 2003-10-02 | 2005-04-21 | Fuji Electric Device Technology Co Ltd | 半導体装置 |
JP2005154819A (ja) * | 2003-11-25 | 2005-06-16 | Kobe Steel Ltd | 嵌合型接続端子 |
JP2006312762A (ja) * | 2005-05-09 | 2006-11-16 | Hirai Seimitsu:Kk | 錫めっき鉄系金属材料 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013026427A (ja) * | 2011-07-21 | 2013-02-04 | Furukawa Electric Co Ltd:The | 光半導体装置用リードフレーム及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20070052105A1 (en) | 2007-03-08 |
CN1936094B (zh) | 2011-06-22 |
SG131043A1 (en) | 2007-04-26 |
HK1101603A1 (en) | 2007-10-18 |
EP1762640A3 (en) | 2008-05-21 |
TWI371797B (en) | 2012-09-01 |
JP2007070730A (ja) | 2007-03-22 |
KR20070028265A (ko) | 2007-03-12 |
SG131046A1 (en) | 2007-04-26 |
EP1762641A2 (en) | 2007-03-14 |
TW200717658A (en) | 2007-05-01 |
EP1762640A2 (en) | 2007-03-14 |
CN1936095A (zh) | 2007-03-28 |
TW200714732A (en) | 2007-04-16 |
CN1936094A (zh) | 2007-03-28 |
US20070054138A1 (en) | 2007-03-08 |
TWI326717B (en) | 2010-07-01 |
JP5026031B2 (ja) | 2012-09-12 |
US7615255B2 (en) | 2009-11-10 |
KR20070028266A (ko) | 2007-03-12 |
EP1762641A3 (en) | 2008-05-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5026031B2 (ja) | スズ層を有する金属デュプレックスの製造方法 | |
EP1716949B1 (en) | Immersion method | |
KR102220798B1 (ko) | 주석 또는 주석 합금 도금액 | |
EP1514956B1 (en) | Tin or tin alloy Electroplating on composite substrates | |
JP4812365B2 (ja) | 錫電気めっき液および錫電気めっき方法 | |
JP2007254860A (ja) | めっき膜及びその形成方法 | |
US6677056B2 (en) | Method for producing tin-silver alloy plating film, the tin-silver alloy plating film and lead frame for electronic parts having the plating film | |
EP3284849A1 (en) | Multi-layer electrical contact element | |
JP5288362B2 (ja) | 多層めっき皮膜及びプリント配線板 | |
EP1852525B1 (en) | Palladium plating solution | |
JPH10284667A (ja) | 耐食性、耐酸化性に優れる電気電子機器用部品材料、及びその製造方法 | |
JP2000012762A (ja) | 耐食性に優れる電気電子機器用部品材料、及びその製造方法 | |
JP2003328182A (ja) | ラックレスめっき用スズ−銀合金めっき浴 | |
JP2001185836A (ja) | 配線基板及び配線基板の製造方法及び製造装置 | |
JP2024007404A (ja) | 銀電気めっき組成物及び粗面無光沢銀を電気めっきするための方法 | |
TW202233899A (zh) | 具備Ni電鍍皮膜之鍍敷結構體及含有該鍍敷結構體之引線框 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20090819 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20090819 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20091211 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110922 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111221 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120123 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120418 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120522 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120620 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150629 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |