JPS54110140A - Plating method - Google Patents
Plating methodInfo
- Publication number
- JPS54110140A JPS54110140A JP1742578A JP1742578A JPS54110140A JP S54110140 A JPS54110140 A JP S54110140A JP 1742578 A JP1742578 A JP 1742578A JP 1742578 A JP1742578 A JP 1742578A JP S54110140 A JPS54110140 A JP S54110140A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- alloy
- layer
- plated
- soldering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
- Coating With Molten Metal (AREA)
Abstract
PURPOSE:To avoid insufficient adherence of plated films at the time of soldering by carrying out electroless Ni plating on Cu(alloy), Ni (alloy), or Cu or Ni plating to above a specific thickness, followed by bright Sn or solder plating on the Ni layer to a predetermined thickness. CONSTITUTION:Cu or Ni plated film 2 is formed on substrate 1, and electroless Ni plating 3 is carried out to above 5mu. In case substrate 1 is made of Cu (alloy)or Ni (alloy), formation of film 2 is unnecessary. Next, bright Sn or solder plated layer 4 is formed on Ni plated layer 3. By this method formation of intermetallic cpds. of Cu or Ni plated layer 2 and solder, e.g. Cu6Sn5, Cu3Sn and Ni3Sn4 can be prevented with Ni layer 3 in the soldering temp. range of 180-250 deg.C. In addn., a product is manufactured which withstands the impact after soldering.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1742578A JPS5937756B2 (en) | 1978-02-17 | 1978-02-17 | Plating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1742578A JPS5937756B2 (en) | 1978-02-17 | 1978-02-17 | Plating method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54110140A true JPS54110140A (en) | 1979-08-29 |
JPS5937756B2 JPS5937756B2 (en) | 1984-09-11 |
Family
ID=11943650
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1742578A Expired JPS5937756B2 (en) | 1978-02-17 | 1978-02-17 | Plating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5937756B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004292944A (en) * | 2003-03-26 | 2004-10-21 | Takahide Ono | Metallic material for electronic component prevented from generation of whisker |
JP2007070731A (en) * | 2005-09-07 | 2007-03-22 | Rohm & Haas Electronic Materials Llc | Metal duplex and method |
US8013428B2 (en) * | 2004-09-28 | 2011-09-06 | Lsi Corporation | Whisker-free lead frames |
-
1978
- 1978-02-17 JP JP1742578A patent/JPS5937756B2/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004292944A (en) * | 2003-03-26 | 2004-10-21 | Takahide Ono | Metallic material for electronic component prevented from generation of whisker |
US8013428B2 (en) * | 2004-09-28 | 2011-09-06 | Lsi Corporation | Whisker-free lead frames |
JP2007070731A (en) * | 2005-09-07 | 2007-03-22 | Rohm & Haas Electronic Materials Llc | Metal duplex and method |
Also Published As
Publication number | Publication date |
---|---|
JPS5937756B2 (en) | 1984-09-11 |
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