JPS5382279A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5382279A
JPS5382279A JP15735676A JP15735676A JPS5382279A JP S5382279 A JPS5382279 A JP S5382279A JP 15735676 A JP15735676 A JP 15735676A JP 15735676 A JP15735676 A JP 15735676A JP S5382279 A JPS5382279 A JP S5382279A
Authority
JP
Japan
Prior art keywords
semiconductor device
production
metal
depositing
electroless plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15735676A
Other languages
Japanese (ja)
Inventor
Nobuo Mukai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP15735676A priority Critical patent/JPS5382279A/en
Publication of JPS5382279A publication Critical patent/JPS5382279A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To eliminate pattern collapse and improve yield by performing etching after depositing a corrosion resistant metal on an metal electroplating layer by electroless plating at the time of forming wirings on a semiconductor device.
COPYRIGHT: (C)1978,JPO&Japio
JP15735676A 1976-12-28 1976-12-28 Production of semiconductor device Pending JPS5382279A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15735676A JPS5382279A (en) 1976-12-28 1976-12-28 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15735676A JPS5382279A (en) 1976-12-28 1976-12-28 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5382279A true JPS5382279A (en) 1978-07-20

Family

ID=15647872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15735676A Pending JPS5382279A (en) 1976-12-28 1976-12-28 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5382279A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63185045A (en) * 1987-01-28 1988-07-30 Mitsui Mining & Smelting Co Ltd Conductive film circuit
JPH0485930A (en) * 1990-07-30 1992-03-18 Fujitsu Ltd Wiring pattern formation method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63185045A (en) * 1987-01-28 1988-07-30 Mitsui Mining & Smelting Co Ltd Conductive film circuit
JPH0485930A (en) * 1990-07-30 1992-03-18 Fujitsu Ltd Wiring pattern formation method

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