JPS5349972A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5349972A
JPS5349972A JP12472976A JP12472976A JPS5349972A JP S5349972 A JPS5349972 A JP S5349972A JP 12472976 A JP12472976 A JP 12472976A JP 12472976 A JP12472976 A JP 12472976A JP S5349972 A JPS5349972 A JP S5349972A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
mosic
disconnection
eliminate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12472976A
Other languages
Japanese (ja)
Inventor
Michio Asahina
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP12472976A priority Critical patent/JPS5349972A/en
Publication of JPS5349972A publication Critical patent/JPS5349972A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: To eliminate the short circuit and disconnection and to increase the yield of MOSIC by forming the metal wiring film through a selective wet plating method.
COPYRIGHT: (C)1978,JPO&Japio
JP12472976A 1976-10-18 1976-10-18 Manufacture of semiconductor device Pending JPS5349972A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12472976A JPS5349972A (en) 1976-10-18 1976-10-18 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12472976A JPS5349972A (en) 1976-10-18 1976-10-18 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5349972A true JPS5349972A (en) 1978-05-06

Family

ID=14892652

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12472976A Pending JPS5349972A (en) 1976-10-18 1976-10-18 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5349972A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58166768A (en) * 1982-03-29 1983-10-01 Oki Electric Ind Co Ltd Coating of gate metal film for semiconductor element
JPH05152222A (en) * 1991-03-08 1993-06-18 Motorola Inc Method of forming material layer in semiconductor device using liquid phase deposition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58166768A (en) * 1982-03-29 1983-10-01 Oki Electric Ind Co Ltd Coating of gate metal film for semiconductor element
JPH05152222A (en) * 1991-03-08 1993-06-18 Motorola Inc Method of forming material layer in semiconductor device using liquid phase deposition

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