JP2005236285A - 改良された信頼性を有する超低誘電率(k)誘電体を集積化する構造および方法 - Google Patents
改良された信頼性を有する超低誘電率(k)誘電体を集積化する構造および方法 Download PDFInfo
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Abstract
【解決手段】本構造は単一ダマシンまたはデュアル・ダマシン型であることができ、金属障壁層と超低K誘電体の間に高密度の薄膜誘電体層(TDL)を備える。また、後工程相互接続構造の作製方法が開示され、この方法は、(i)超低K誘電体のエッチングされた開口に高密度薄膜誘電体層を生成する方法、および(ii)超低K誘電体を低温チャック上でプロセス・チャンバ中に配置し、封止剤をプロセス・チャンバに加え、さらに活性化ステップを行なう方法を含む。
【選択図】図2
Description
ここで、xは約0.35から約0.45までの範囲にあり、wは0から約0.1までの範囲にあり、yは約0.45から約0.55までの範囲にあり、そしてzは0から約0.2までの範囲にある。
ここで、xは約0.2から約0.3までの範囲にあり、vは0から約0.1までの範囲にあり、wは約0.25から約0.35までの範囲にあり、yは0.1から約0.2までの範囲にあり、そしてzは0から約0.35までの範囲にある。
ここで、xは約0.22から約0.32までの範囲にあり、wは約0.15から約0.3までの範囲にあり、yは約0.3から約0.5までの範囲にあり、そしてzは0から約0.3までの範囲にある。
第1の方法は、例えば、高密度プラズマ(HDP)、ダウンストリームHDP、電子サイクロトロン共鳴(ECR)補助PECVD、プラズマ増強原子層堆積(PEALD)および関連プラズマ・プロセスから選択された堆積プロセスを使用した、薄膜誘電体層の堆積を含む。
薄膜誘電体層を形成する第2の方法では、図1の要素1〜17を含む基板は、約100から約300ケルビン(K)までの温度の冷却ウェーハ・チャック上に配置される。封止剤は、ガスとして、または固体源からの蒸発によりプロセス・チャンバに加えられ、封止剤がウェーハ上に凝縮する。テトラメチルシクロテトラシロキサン、オクタメチルシクロテトラシロキサン、または他の凝縮可能シロキサンのような、Si、C、OおよびHを含む分子を、封止剤として使用することができる。この環状シロキサン化合物は、一般に、標準条件下で液体であり、そして、容易にウェーハ上に凝縮して、一般的に一様な共形の被膜をエッチングされた側壁およびトレンチの底部に形成するので好ましい。
この方法では、多孔質オルガノシリケート・ガラス(OSG)または「多孔質SiCOH」の層間誘電体(ILD)を使用することができ、そしてSiN、SiC、またはSiCNを含む封止層を塗布することができる。この材料の孔は、0.1ナノメートルから10ナノメートルまでの範囲の特徴的な寸法を有する可能性があり、好ましい材料は約0.2ナノメートルから約2ナノメートルまでの平均孔径を含む。
この方法では、多孔質オルガノシリケート・ガラス(OSG)または「多孔質SiCOH」の層間誘電体を使用し、そしてSiN、SiC、またはSiCNを含む薄膜誘電体層(TDL)を塗布する。この材料の孔は、0.1ナノメートルから10ナノメートルまでの範囲の特徴的な寸法を有する可能性があり、好ましい材料は約0.2ナノメートルから約2ナノメートルまでの平均孔径を含む。この方法では、当技術分野で知られている標準の原子層堆積(ALD)方法を使用して、薄膜誘電体層が堆積される。薄膜誘電体層は、SiN、SiCN、AlN、BN、またはSiCBNあるいはこれ等全てで構成され、かつ高密度でなければならない。
2 エッチング停止/障壁層
3 層間誘電体(ILD)
4 ハードマスク
5 ビア開口
7 配線開口
9、11 側壁
13 凹凸
15 孔
17 トレンチの底
22 金属構造体
23 基板
24 ハードマスク層
25 拡散障壁/エッチング停止層
26 超低k誘電体層
28 薄膜誘電体層(TDL)
30 金属/金属窒化物ライナ障壁
34 エッチング停止層
40 支持誘電体
46 エア・ギャップ
Claims (33)
- 後工程(BEOL)の相互接続構造であって、
(a)基板上に設けられた約3までの誘電率を有する超低誘電率(k)(ULK)誘電体および導電性金属構造体と、
(b)前記ULK誘電体と前記導電性金属構造体の間のライナ障壁層と、
(c)前記ライナ障壁層とULK誘電体の間の約5ナノメートルまでの厚さを有する薄膜誘電体層(TDL)とを備え、前記薄膜誘電体層が、密封障壁能力を有する高密度誘電体膜を含み、前記膜が、前記超低k誘電体の材料とは違った材料を含む相互接続構造。 - 前記薄膜誘電体層が、約0.5ナノメートルから約5ナノメートルまでの範囲にある厚さを有する、請求項1に記載の相互接続構造。
- 前記薄膜誘電体層が、共形堆積を示し、かつ基本的に無欠陥である、請求項2に記載の相互接続構造。
- 前記薄膜誘電体層が、約1ナノメートルから約3ナノメートルまでの範囲にある厚さ、および少なくとも約0.5である共形性を有する、請求項1に記載の相互接続構造。
- 前記薄膜誘電体層の材料が、窒化シリコン(SiN)、SiC、SiCH、SiNH、SiCNH、SiCOH、AlN、BN、SiCBN、CN、および前述のものの合金、混合物、および多層から成るグループから選択される、請求項4に記載の相互接続構造。
- (i)式SixOwNyHzの材料であって、xが約0.35から約0.45までの範囲にあり、wが0から約0.1までの範囲にあり、yが約0.45から約0.55までの範囲にあり、そしてzが0から約0.2までの範囲にある材料と、
(ii)式SixOvCwNyHzの材料であって、xが約0.2から約0.3までの範囲にあり、vが0から約0.1までの範囲にあり、wが約0.25から約0.35までの範囲にあり、yが約0.1から約0.2までの範囲にあり、そしてzが0から約0.35までの範囲にある材料と、
(iii)式SixCwOyHzの材料であって、xが約0.22から約0.32までの範囲にあり、wが約0.15から約0.3までの範囲にあり、yが約0.3から約0.5までの範囲にあり、そしてzが0から約0.3までの範囲にある材料と、から成るグループから前記薄膜誘電体層の材料が選択される、請求項5に記載の相互接続構造。 - 前記薄膜誘電体層の材料が、式SixCwNyHzの組成物を含み、ここで、x=約0.25、w=約0.3、y=約0.15、そしてz=約0.3である、請求項6に記載の相互接続構造。
- 前記薄膜誘電体層が、高密度プラズマ(HDP)、ダウンストリームHDP、電子サイクロトロン共鳴(ECR)、プラズマ増強化学的気相堆積(PECVD)、補助PECDV、およびプラズマ増強原子層堆積(PEALD)から成るグループから選択された方法で堆積される、請求項1に記載の相互接続構造。
- 前記ライナ障壁層が、Ta、TaN、Ti、TiN、W、WN、および前述のものの合金、混合物、および多層から成るグループから選択され、前記超低k誘電体が、約1.5から約3.0までの範囲にある誘電率を有するSiCOH材料および多孔質SiCOH材料から成るグループから選択され、さらに、前記導電性金属構造体が、Cu、Al、Ag、Au、W、および前述のものの合金、混合物、および多層から成るグループから選択される、請求項5に記載の相互接続構造。
- 前記ライナ障壁層が、Ta、TaNおよび前述のものの合金、混合物および多層から成るグループから選択され、かつ前記導電性金属構造体がCuを含む、請求項9に記載の相互接続構造。
- 前記超低k誘電体が、約1.5から約3.0までの範囲にある誘電率を有し、かつ前記薄膜誘電体層が、約2.8から約7までの範囲にある誘電率を有する、請求項2に記載の相互接続構造。
- 後工程(BEOL)の相互接続構造を形成する方法であって、
a)基板上に約3までの誘電率を有する超低k(ULK)誘電体を形成するステップと、
b)前記超低k誘電体内に単一ダマシンまたはデュアル・ダマシン用のエッチングされた開口を形成するステップと、
c)約5ナノメートルまでの厚さを有する薄膜誘電体層(TDL)を前記超低k誘電体のエッチングされた開口に生成するステップであって、前記薄膜誘電体層が密封障壁能力を有する高密度膜を含み、前記膜が前記超低k誘電体の材料とは違った材料を含むステップと、
d)前記薄膜誘電体層上にライナ障壁層を形成するステップと、
e)導電性金属を用いて前記エッチングされた開口を充填するステップと、
f)前記構造を平坦化プロセスに掛けるステップとを備える方法。 - 前記薄膜誘電体層が、約0.5ナノメートルから約5ナノメートルまでの範囲にある厚さを有する、請求項12に記載の方法。
- 前記薄膜誘電体層が、共形堆積を示し、かつ基本的に無欠陥である、請求項13に記載の方法。
- 前記薄膜誘電体層が、約1ナノメートルから約3ナノメートルまでの範囲にある厚さ、および少なくとも約0.5である共形性を有する、請求項12に記載の方法。
- 前記薄膜誘電体層の材料が、窒化シリコン(SiN)、SiC、SiCH、SiNH、SiCNH、SiCOH、AlN、BN、SiCBN、CN、および前述のものの合金、混合物、および多層から成るグループから選択される、請求項15に記載の方法。
- (i)式SixOwNyHzの材料であって、xが約0.35から約0.45までの範囲にあり、wが0から約0.1までの範囲にあり、yが約0.45から約0.55までの範囲にあり、そしてzが0から約0.2までの範囲にある材料と、
(ii)式SixOvCwNyHzの材料であって、xが約0.2から約0.3までの範囲にあり、vが0から約0.1までの範囲にあり、wが約0.25から約0.35までの範囲にあり、yが約0.1から約0.2までの範囲にあり、そしてzが0から約0.35までの範囲にある材料と、
(iii)式SixCwOyHzの材料であって、xが約0.22から約0.32までの範囲にあり、wが約0.15から約0.3までの範囲にあり、yが約0.3から約0.5までの範囲にあり、そしてzが0から約0.3までの範囲にある材料と、から成るグループから前記薄膜誘電体層の材料が選択される、請求項16に記載の方法。 - 前記薄膜誘電体層の材料が、式SixCwNyHzの組成物を含み、ここで、x=約0.25、w=約0.3、y=約0.15、そしてz=約0.3である、請求項17に記載の方法。
- 前記薄膜誘電体層が、高密度プラズマ(HDP)、ダウンストリームHDP、電子サイクロトロン共鳴(ECR)、プラズマ増強化学的気相堆積(PECVD)、補助PECVD、およびプラズマ増速原子層堆積(PEALD)から成るグループから選択された方法で堆積される、請求項12に記載の方法。
- 前記ライナ障壁層が、Ta、TaN、Ti、TiN、W、WN、および前述のものの合金、混合物、および多層から成るグループから選択され、前記超低k誘電体が、約1.5から約3.0までの範囲にある誘電率を有するSiCOH材料および多孔質SiCOH材料から成るグループから選択され、さらに、前記導電性金属が、Cu、Al、Ag、Au、W、および前述のものの合金、混合物、および多層から成るグループから選択される、請求項16に記載の方法。
- 前記ライナ障壁層が、Ta、TaNおよび前述のものの合金、混合物および多層から成るグループから選択され、かつ前記導電性金属がCuを含む、請求項20に記載の方法。
- 前記超低k誘電体が、約1.5から約3.0までの範囲にある誘電率を有し、かつ前記薄膜誘電体層が、約2.8から約7までの範囲にある誘電率を有する、請求項13に記載の方法。
- 後工程(BEOL)の相互接続構造を形成する方法であって、
a)基板上に約3までの誘電率を有する超低k(ULK)誘電体を形成するステップと、
b)前記超低k誘電体に単一ダマシンまたはデュアル・ダマシンのエッチングされた開口を形成するステップと、
c)、約−200℃から約25℃までの範囲にある温度の低温チャック上で、前記構造をプロセス・チャンバ中に配置するステップと、
d)前記プロセス・チャンバに封止剤を加えるステップと、
e)活性化ステップを行なうステップとを備える方法。 - 前記活性化ステップは、前記構造が約−200℃から約25℃までの範囲の温度の低温状態にある間に、前記構造を電子ビーム放射またはUV放射に曝すことを含む、請求項23に記載の方法。
- 前記電子ビーム放射が、約10から約1,000マイクロキューリ/cm2の線量を有する約0.5から約100KeVの範囲にある電子エネルギーを、約1秒から約170分の時間、使用する、請求項24に記載の方法。
- 前記活性化ステップが、前記構造を、真空または非酸化反応性の雰囲気中で、約1秒から約170分の間、約300℃から約450℃までの範囲にある温度に加熱することを含む、請求項23に記載の方法。
- 前記非酸化反応性の雰囲気が、水素/アルゴンおよびアンモニアから成るグループから選択される、請求項26に記載の方法。
- 前記活性化ステップは、前記構造が約−200℃から約25℃までの範囲の温度の低温状態にある間に、前記構造をプラズマに曝すことを含む、請求項23に記載の方法。
- 前記プラズマが、H2、N2、NH3、He、Ar、CH4、C2H6、C2H4、C2H2、および前述のものの1つまたは複数の混合物から成るグループから選択された成分を含む、請求項28に記載の方法。
- 前記封止剤が、環状シロキサン化合物を含む、請求項23に記載の方法。
- 前記環状シロキサン化合物が、テトラメチルシクロテトラシロキサン(TMCTS)およびオクタメチルシクロテトラシロキサン(OMCTS)から成るグループから選択され、さらに前記超低k誘電体が、約1.5から約3.0までの範囲にある誘電率を有するSiCOH材料および多孔質SiCOH材料から成るグループから選択される、請求項30に記載の方法。
- 前記封止剤が、NH3とメチルシランまたは高級シランの混合物を含む、請求項23に記載の方法。
- 前記薄膜誘電体層が、エッチング・ツールまたは堆積ツールで堆積される、請求項23に記載の方法。
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TWI402887B (zh) | 2013-07-21 |
US7088003B2 (en) | 2006-08-08 |
TW200539251A (en) | 2005-12-01 |
TW201042706A (en) | 2010-12-01 |
US20050184397A1 (en) | 2005-08-25 |
JP4328725B2 (ja) | 2009-09-09 |
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