JP2005093997A5 - - Google Patents

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Publication number
JP2005093997A5
JP2005093997A5 JP2004247632A JP2004247632A JP2005093997A5 JP 2005093997 A5 JP2005093997 A5 JP 2005093997A5 JP 2004247632 A JP2004247632 A JP 2004247632A JP 2004247632 A JP2004247632 A JP 2004247632A JP 2005093997 A5 JP2005093997 A5 JP 2005093997A5
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JP
Japan
Prior art keywords
projection apparatus
lithographic projection
final element
glass plate
quartz glass
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JP2004247632A
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JP2005093997A (ja
JP3946212B2 (ja
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Priority claimed from US10/698,012 external-priority patent/US6954256B2/en
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Claims (6)

  1. 投影システムを使用してパターン化デバイスから基板上にパターンを投影するようになされ、かつ、前記投影システムの最終エレメントと前記基板の間の空間の少なくとも一部に液浸液を充填するための液体供給システムを有し、前記最終エレメントは、前記液浸液と接触する表面に、実質的に前記液浸液に対して不溶性の溶融石英ガラス板を有しているリソグラフィック投影装置。
  2. 前記石英ガラス板の厚さが、50μmから5mmまでの範囲である、請求項1に記載のリソグラフィック投影装置。
  3. 前記石英ガラス板が、接着剤を使用しない接触結合によって前記最終エレメントに結合された、請求項1又は2に記載のリソグラフィック投影装置。
  4. 前記最終エレメントと前記石英ガラス板の継ぎ目の周囲に、液体を漏らさないシールが設けられている、請求項1に記載のリソグラフィック投影装置。
  5. 前記最終エレメントがCaF からなる、請求項1から4までのいずれか一項に記載のリソグラフィック投影装置。
  6. 前記最終エレメントが、いずれもCaF である第1及び第2のコンポーネントからなり、前記投影ビームが前記第1のコンポーネントを通過した後、前記第2のコンポーネントを通過する、請求項1に記載のリソグラフィック投影装置。
JP2004247632A 2003-08-29 2004-08-27 リソグラフィック投影装置 Active JP3946212B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03255377 2003-08-29
US10/698,012 US6954256B2 (en) 2003-08-29 2003-10-31 Gradient immersion lithography

Related Child Applications (1)

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JP2007057545A Division JP4586032B2 (ja) 2003-08-29 2007-03-07 リソグラフィック装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2005093997A JP2005093997A (ja) 2005-04-07
JP2005093997A5 true JP2005093997A5 (ja) 2007-02-15
JP3946212B2 JP3946212B2 (ja) 2007-07-18

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JP2004247632A Active JP3946212B2 (ja) 2003-08-29 2004-08-27 リソグラフィック投影装置
JP2004247771A Pending JP2005079589A (ja) 2003-08-29 2004-08-27 リソグラフィック装置及びデバイス製造方法
JP2008258276A Pending JP2009016871A (ja) 2003-08-29 2008-10-03 リソグラフィック装置及びデバイス製造方法

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JP2004247771A Pending JP2005079589A (ja) 2003-08-29 2004-08-27 リソグラフィック装置及びデバイス製造方法
JP2008258276A Pending JP2009016871A (ja) 2003-08-29 2008-10-03 リソグラフィック装置及びデバイス製造方法

Country Status (5)

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US (2) US6954256B2 (ja)
EP (1) EP1510871B1 (ja)
JP (3) JP3946212B2 (ja)
CN (1) CN100495213C (ja)
SG (1) SG109610A1 (ja)

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