JP2002280301A5 - - Google Patents

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JP2002280301A5
JP2002280301A5 JP2001075376A JP2001075376A JP2002280301A5 JP 2002280301 A5 JP2002280301 A5 JP 2002280301A5 JP 2001075376 A JP2001075376 A JP 2001075376A JP 2001075376 A JP2001075376 A JP 2001075376A JP 2002280301 A5 JP2002280301 A5 JP 2002280301A5
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semiconductor film
barrier layer
forming
manufacturing
concentration
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JP2001075376A
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JP4718700B2 (ja
JP2002280301A (ja
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Priority to JP2001075376A priority Critical patent/JP4718700B2/ja
Priority claimed from JP2001075376A external-priority patent/JP4718700B2/ja
Priority to US10/098,153 priority patent/US7122450B2/en
Publication of JP2002280301A publication Critical patent/JP2002280301A/ja
Priority to US11/580,938 priority patent/US7485553B2/en
Publication of JP2002280301A5 publication Critical patent/JP2002280301A5/ja
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Publication of JP4718700B2 publication Critical patent/JP4718700B2/ja
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JP2001075376A 2001-03-16 2001-03-16 半導体装置の作製方法 Expired - Fee Related JP4718700B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2001075376A JP4718700B2 (ja) 2001-03-16 2001-03-16 半導体装置の作製方法
US10/098,153 US7122450B2 (en) 2001-03-16 2002-03-15 Process for manufacturing a semiconductor device
US11/580,938 US7485553B2 (en) 2001-03-16 2006-10-16 Process for manufacturing a semiconductor device

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Application Number Priority Date Filing Date Title
JP2001075376A JP4718700B2 (ja) 2001-03-16 2001-03-16 半導体装置の作製方法

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JP2002280301A JP2002280301A (ja) 2002-09-27
JP2002280301A5 true JP2002280301A5 (enExample) 2008-02-28
JP4718700B2 JP4718700B2 (ja) 2011-07-06

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JP (1) JP4718700B2 (enExample)

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