CN1723541B - 曝光装置和器件制造方法 - Google Patents

曝光装置和器件制造方法 Download PDF

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Publication number
CN1723541B
CN1723541B CN200380105423XA CN200380105423A CN1723541B CN 1723541 B CN1723541 B CN 1723541B CN 200380105423X A CN200380105423X A CN 200380105423XA CN 200380105423 A CN200380105423 A CN 200380105423A CN 1723541 B CN1723541 B CN 1723541B
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CN
China
Prior art keywords
mentioned
substrate
liquid
mentioned substrate
exposure device
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Expired - Fee Related
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CN200380105423XA
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English (en)
Chinese (zh)
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CN1723541A (zh
Inventor
根井正洋
小林直行
荒井大
大和壮一
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Nikon Corp
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Nikon Corp
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    • H10P76/2041—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN200380105423XA 2002-12-10 2003-12-08 曝光装置和器件制造方法 Expired - Fee Related CN1723541B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP357958/2002 2002-12-10
JP2002357958 2002-12-10
JP296491/2003 2003-08-20
JP2003296491 2003-08-20
PCT/JP2003/015666 WO2004053953A1 (ja) 2002-12-10 2003-12-08 露光装置及びデバイス製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201010155625A Division CN101852993A (zh) 2002-12-10 2003-12-08 曝光装置和器件制造方法

Publications (2)

Publication Number Publication Date
CN1723541A CN1723541A (zh) 2006-01-18
CN1723541B true CN1723541B (zh) 2010-06-02

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CN200380105423XA Expired - Fee Related CN1723541B (zh) 2002-12-10 2003-12-08 曝光装置和器件制造方法
CN201010155625A Pending CN101852993A (zh) 2002-12-10 2003-12-08 曝光装置和器件制造方法

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CN201010155625A Pending CN101852993A (zh) 2002-12-10 2003-12-08 曝光装置和器件制造方法

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US (3) US20050219488A1 (enExample)
EP (1) EP1571695A4 (enExample)
JP (1) JP4596077B2 (enExample)
KR (2) KR20120127755A (enExample)
CN (2) CN1723541B (enExample)
AU (1) AU2003289236A1 (enExample)
SG (3) SG157962A1 (enExample)
TW (1) TW200425268A (enExample)
WO (1) WO2004053953A1 (enExample)

Families Citing this family (238)

* Cited by examiner, † Cited by third party
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JP4596077B2 (ja) 2010-12-08
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US8089611B2 (en) 2012-01-03
US7589820B2 (en) 2009-09-15
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