CN106024028A - 用于热辅助磁记录介质的铱下层 - Google Patents
用于热辅助磁记录介质的铱下层 Download PDFInfo
- Publication number
- CN106024028A CN106024028A CN201610206138.6A CN201610206138A CN106024028A CN 106024028 A CN106024028 A CN 106024028A CN 201610206138 A CN201610206138 A CN 201610206138A CN 106024028 A CN106024028 A CN 106024028A
- Authority
- CN
- China
- Prior art keywords
- iridium
- layer
- lower floor
- alloy
- hamr
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052741 iridium Inorganic materials 0.000 title claims abstract description 64
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 title claims abstract description 59
- 239000000463 material Substances 0.000 claims abstract description 37
- 239000000956 alloy Substances 0.000 claims abstract description 24
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 22
- 230000008021 deposition Effects 0.000 claims abstract description 8
- 150000001875 compounds Chemical class 0.000 claims abstract description 7
- 239000010410 layer Substances 0.000 claims description 106
- 239000000758 substrate Substances 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 16
- 239000011521 glass Substances 0.000 claims description 14
- 239000013078 crystal Substances 0.000 claims description 10
- 229910005335 FePt Inorganic materials 0.000 claims description 8
- 239000010931 gold Substances 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- 239000012790 adhesive layer Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- VMJRMGHWUWFWOB-UHFFFAOYSA-N nickel tantalum Chemical compound [Ni].[Ta] VMJRMGHWUWFWOB-UHFFFAOYSA-N 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 238000010521 absorption reaction Methods 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims description 2
- 239000011358 absorbing material Substances 0.000 claims 2
- XJBVBGUCNBMKIH-UHFFFAOYSA-N alumane;ruthenium Chemical compound [AlH3].[Ru] XJBVBGUCNBMKIH-UHFFFAOYSA-N 0.000 claims 2
- 229910010293 ceramic material Inorganic materials 0.000 claims 2
- HBCZDZWFGVSUDJ-UHFFFAOYSA-N chromium tantalum Chemical compound [Cr].[Ta] HBCZDZWFGVSUDJ-UHFFFAOYSA-N 0.000 claims 2
- ZACYQVZHFIYKMW-UHFFFAOYSA-N iridium titanium Chemical compound [Ti].[Ir] ZACYQVZHFIYKMW-UHFFFAOYSA-N 0.000 claims 2
- JTFPABDTDIMJJU-UHFFFAOYSA-N iridium zirconium Chemical compound [Zr].[Ir] JTFPABDTDIMJJU-UHFFFAOYSA-N 0.000 claims 2
- DZQBLSOLVRLASG-UHFFFAOYSA-N iridium;methane Chemical compound C.[Ir] DZQBLSOLVRLASG-UHFFFAOYSA-N 0.000 claims 2
- 239000007769 metal material Substances 0.000 claims 2
- 229910001260 Pt alloy Inorganic materials 0.000 claims 1
- UYVZCGGFTICJMW-UHFFFAOYSA-N [Ir].[Au] Chemical compound [Ir].[Au] UYVZCGGFTICJMW-UHFFFAOYSA-N 0.000 claims 1
- 238000005984 hydrogenation reaction Methods 0.000 claims 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 abstract description 31
- 239000000395 magnesium oxide Substances 0.000 abstract description 31
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 abstract description 28
- 238000000151 deposition Methods 0.000 abstract description 10
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000004544 sputter deposition Methods 0.000 abstract description 6
- 238000005137 deposition process Methods 0.000 abstract description 3
- 239000002245 particle Substances 0.000 abstract description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 230000008859 change Effects 0.000 description 9
- AVMBSRQXOWNFTR-UHFFFAOYSA-N cobalt platinum Chemical compound [Pt][Co][Pt] AVMBSRQXOWNFTR-UHFFFAOYSA-N 0.000 description 9
- 238000002441 X-ray diffraction Methods 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 229910003321 CoFe Inorganic materials 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 230000004907 flux Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- OQCGPOBCYAOYSD-UHFFFAOYSA-N cobalt palladium Chemical compound [Co].[Co].[Co].[Pd].[Pd] OQCGPOBCYAOYSD-UHFFFAOYSA-N 0.000 description 4
- 229910052681 coesite Inorganic materials 0.000 description 4
- 229910052906 cristobalite Inorganic materials 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 229910010271 silicon carbide Inorganic materials 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 229910052682 stishovite Inorganic materials 0.000 description 4
- 229910052905 tridymite Inorganic materials 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- 229910000952 Be alloy Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 238000005538 encapsulation Methods 0.000 description 3
- 239000008187 granular material Substances 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- 229910001149 41xx steel Inorganic materials 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910019222 CoCrPt Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910018565 CuAl Inorganic materials 0.000 description 2
- 229910003336 CuNi Inorganic materials 0.000 description 2
- 229910016347 CuSn Inorganic materials 0.000 description 2
- 206010019133 Hangover Diseases 0.000 description 2
- 229910001051 Magnalium Inorganic materials 0.000 description 2
- 229910016583 MnAl Inorganic materials 0.000 description 2
- 229910015269 MoCu Inorganic materials 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910001362 Ta alloys Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000003575 carbonaceous material Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 229910000777 cunife Inorganic materials 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000011435 rock Substances 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 239000010944 silver (metal) Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000010415 tropism Effects 0.000 description 2
- 230000005355 Hall effect Effects 0.000 description 1
- 229910000575 Ir alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 241000849798 Nita Species 0.000 description 1
- 230000018199 S phase Effects 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- DTJAVSFDAWLDHQ-UHFFFAOYSA-N [Cr].[Co].[Pt] Chemical compound [Cr].[Co].[Pt] DTJAVSFDAWLDHQ-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000008485 antagonism Effects 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005385 borate glass Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- VLWBWEUXNYUQKJ-UHFFFAOYSA-N cobalt ruthenium Chemical compound [Co].[Ru] VLWBWEUXNYUQKJ-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- WUUZKBJEUBFVMV-UHFFFAOYSA-N copper molybdenum Chemical compound [Cu].[Mo] WUUZKBJEUBFVMV-UHFFFAOYSA-N 0.000 description 1
- WCCJDBZJUYKDBF-UHFFFAOYSA-N copper silicon Chemical compound [Si].[Cu] WCCJDBZJUYKDBF-UHFFFAOYSA-N 0.000 description 1
- XTYUEDCPRIMJNG-UHFFFAOYSA-N copper zirconium Chemical compound [Cu].[Zr] XTYUEDCPRIMJNG-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007850 degeneration Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- RHDUVDHGVHBHCL-UHFFFAOYSA-N niobium tantalum Chemical compound [Nb].[Ta] RHDUVDHGVHBHCL-UHFFFAOYSA-N 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- JWXFFWOSZTYVQD-UHFFFAOYSA-N oxygen(2-) ruthenium(3+) titanium(4+) Chemical compound [O-2].[O-2].[Ti+4].[Ru+3] JWXFFWOSZTYVQD-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 238000011027 product recovery Methods 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000020347 spindle assembly Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73921—Glass or ceramic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
- G11B5/727—Inorganic carbon protective coating, e.g. graphite, diamond like carbon or doped carbon
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
- G11B5/7369—Two or more non-magnetic underlayers, e.g. seed layers or barrier layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
- G11B5/7375—Non-polymeric layer under the lowermost magnetic recording layer for heat-assisted or thermally-assisted magnetic recording [HAMR, TAMR]
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73917—Metallic substrates, i.e. elemental metal or metal alloy substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73923—Organic polymer substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B2005/0002—Special dispositions or recording techniques
- G11B2005/0005—Arrangements, methods or circuits
- G11B2005/0021—Thermally assisted recording using an auxiliary energy source for heating the recording layer locally to assist the magnetization reversal
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Ceramic Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Magnetic Record Carriers (AREA)
Abstract
本发明涉及一种用于热辅助磁记录介质的铱下层。本申请提供了一种热辅助磁记录(HAMR)介质堆栈,其中基于铱(Ir)的材料可以被利用为次级的下层代替被利用在传统的介质堆栈中的氧化镁(MgO)下层。这样的基于铱的材料可以包括,例如,纯铱、基于铱的合金、基于铱的化合物、以及具有分离子的颗粒状的铱层。将铱或者基于铱的材料用作下层,提供了优于使用MgO作为下层的优势。例如,直流(DC)溅射能够被用于沉积介质堆栈层,其中Ir的沉积率明显高于MgO的沉积率,导致较高的制造产量。更进一步地,较小的粒子在基于铱层的沉积过程中被生成,并且基于铱的下层能够作为更好的散热器。更进一步地,沉积在基于铱层上的记录层的晶体形态和结构能够被更好地控制。
Description
背景技术
对于所有类型的衬底,磁记录介质已经开始结合垂直磁记录(PMR)技术,以努力增加面密度。一般地,PMR介质可以被分割成两个初级功能区域:软下层性下层(SUL)和(一个或更多个)磁记录层(RL)。图1说明了部分的传统的PMR盘驱动系统,其具有记录头101,记录磁头101包括拖尾写入极(trailing write pole)102和主导的返回(相反的)极(leading return(opposing)pole)103,返回极103磁性耦合到写入极102。导电的磁化线圈104围绕写入极102的轭(yoke)。相反极103的底部的表面积极大地超过写入极102的尖端的表面积。当磁记录盘105旋转经过记录磁头101时,电流经过线圈104以在写入极102中创造磁通量。磁通量从写入极102经过磁记录盘105,并且越过相反极103记录在PMR层150中。SUL 110能够使磁通量从拖尾写入极102回到具有低阻抗的主导的相反极103。
随着热辅助磁记录(HAMR)介质的出现,硬磁盘驱动器上的面密度能够被延伸超过1.5Tb/in2。可是,超顺磁限制、热稳定性以及可写性问题能够限制使用传统的PMR介质在硬盘驱动器中增加面密度的能力。因此,并且为了支持较高的面密度同时也提供热稳定性,HAMR介质常常用磁性材料或化合物制成,其具有比非HAMR介质(例如,铬钴铂(CoCrPt)合金)的磁晶各向异性(由磁性各向异性常数Ku所表示)大体上更高的磁晶各向异性。具有大体上较高的磁晶各向异性的这样的合金的一个示例是铁-铂(FePt)合金的L10相。原则上,L10FePt的较高的Ku允许晶粒小到2-5nm,以保持热稳定。然而,不像CoCrPt合金,化学地排序的L10FePt的生长需要高于400℃的沉积温度。另外,因为在可用的写入区域的限制,写入辅助机制(例如,HAMR)被需要用于高Ku介质。除此之外,具有SUL的HAMR介质与没有SUL的介质相比典型地具有较宽的磁写入宽度(MWW),从而限制其面密度性能。
因为HAMR介质是由较高稳定性的磁性化合物制成,如上面所述,HAMR介质依赖于热的应用,以完成在磁取向上的改变。HAMR介质短暂地被加热以将其矫顽力减少到低于来自记录头的被应用的磁写入场的矫顽力,也就是,在HAMR介质上的记录位置的温度被升高,以便充分地降低此位置的Ku以允许其磁取向的改变(也就是,记录数据)。这允许较高的介质各向异性以及较小的热稳定晶粒。
附图说明
各种实施例以示例并且非限制的方式在附图中被说明,其中:
图1说明了示例的传统的PMR磁盘驱动器系统;
图2说明了一种示例介质结构的横截面视图,其中传统的MgO下层被使用;
图3说明了根据各种实施例的一种包括基于铱的下层的示例介质结构的横截面视图;
图4说明了图3的包括示例层材料的示例介质结构的横截面视图。
图5A是XRD显微图,描述在基于铱的下层上的FePt的面内(in-plane)XRD图谱;
图5B是XRD显微图,描述在基于铱的下层上的FePt的面外(out-of-plane)XRD图谱;
图6是说明X射线反射性测量的示例图,示出基于铱的下层的不混溶性;
图7是一个示例图表,根据各种实施例说明使用基于铱的下层的影响;
图8是根据各种实施例执行用于制造使用基于铱的下层的HAMR盘的示例过程的流程图;以及
图9说明了一种示例磁盘驱动器,其中根据各种实施例能够实施使用基于铱的下层的HAMR盘。
具体实施方式
在下面的说明中,阐述大量具体细节以提供对本公开的各种实施例的深入理解。然而,这些具体细节不需要被用于实践本公开的各种实施例,这将对本领域技术人员是显而易见的。在其他例子中,为人所熟知的部件或者方法没有被详细地描述,以避免本公开的各种实施例的不必要模糊。
正如先前所提及的,特征(例如,小晶粒尺寸和弱交换耦合)是在极端高密度磁记录介质(HAMR介质是其一个示例)中被期望的。当如磁记录按比例减少时,在提高的温度下降低的HAMR介质的矫顽力为“可写性对抗热稳定性”的基本约束提供了解决方案。一旦“可写性对抗热稳定性”的约束被打破,磁记录密度随着晶粒尺寸按比例减少而被预期增长。因此,HAMR介质(例如,L10FePt)为在室温下稳定的存储提供了足够强的各向异性。这使HAMR介质保持高的热稳定性并且克服超顺磁限制,甚至在晶粒尺寸低于3nm时。这与例如依赖于低温处理的PMR记录介质形成对照,并且因此通常不导致FePt(或铁钯(FePd)或钴铂(CoPt))薄膜具有高度有序的L10结构。
为了在磁记录层中获得所期望的高度垂直的各向异性,磁性晶粒的结晶取向应该被适当的下层选择控制。下层也作为扩散屏障,为了阻挡外部的原子扩散到磁记录层中,外部原子另外也破坏磁记录层的磁性。传统下层的示例是包括氧化镁(MgO)以提供取向控制层并且作为扩散屏障的下层。
图2说明了一种示例介质结构200的横截面视图,其包括传统的MgO下层。应该注意到术语介质结构能够指整个的记录介质堆栈,如根据本文的各个实施例所描述和说明的。
介质结构200可以包括以下构造:衬底202;粘附层204;散热层206;第一下层208;第二下层210;记录层212;覆盖层214;以及润滑层216。衬底202可以是,例如高温玻璃、金属、和/或金属合金材料。在一个实施例中,衬底202能够是圆盘形的或环形的。可以使用的玻璃衬底包括,例如,高温玻璃、含二氧化硅的玻璃(例如,硼硅酸盐玻璃和铝硅酸盐玻璃)。可以使用的金属和金属合金衬底包括,例如,铝(Al)、钽(Ta)、和铝镁(AlMg)衬底,例如镀镍磷(NiP)的AlMg。在可选择的实施例中,其他衬底材料例如聚合物和陶瓷,例如非晶玻璃,可以被使用,还有蓝宝石、石英、硅碱钙石、和碳化硅(SiC)。
粘附层204,其能够是合金材料,例如,如,铌钽合金(Ni-Ta),可以被沉积在衬底202上方。散热层206能够被配置以特别地为HAMR介质促进热传递。根据一个实施例,散热层206可以是银(Ag)、铝(Al)、金(Au)、铜(Cu)、Cr、钼(Mo)、钨(W)、钌钴(RuCo)、铜硅(CuSi)、CuAl、CuNi、铜锡(CuSn)、Ru、铜锆(CuZr)、钼铜(MoCu)、CuFeCo、CuNiFe、银钯(AgPd)、CrRu、CrV、CrW、CrMo、CrNd、Ru-SiO2、钌-二氧化钛(Ru-TiO2)、Ru-CoO、W-SiO2、W-TiO2和W-CoO中的一个或更多个。另外,散热层206可以具有大于100W.m-1.K-1的热导率值。
如先前所提及的,下层208能够是合金,以用于提升磁记录层中适当的/所期望的织构。根据各种实施例,下层(无论是单层的下层,层压的下层,还是多个层压层的下层)可以是具有至少一个添加物的Co或CoFe材料中的一种,至少一个添加物包括Ni、Zr、硼(B)、Ta、W、或Mo。这种Co或CoFe材料也可以具有不同的成分,由于每种(一种或更多种)材料的量被包括在其中,例如,20%到90%的Co、0到60%的Fe、0到20%的Ni、0到20%的Zr、0到15%的B、0到20%的Ta、0到10%的W以及0到10%的Mo。
因此,根据一个实施例,下层208能够是,例如,基于CoFe的合金(如,Co-Fe-Zr-B-W合金)。根据另一个实施例,下层208能够是,例如,Co-Fe-Ta-B合金。
更进一步地,额外的下层材料被选择以至于互扩散不会发生在这些高温时。如以前所讨论的,这个层210能够是,例如,氧化镁(MgO)。MgO由于它的高熔点适于在HAMR介质中使用。MgO的熔点为2852℃,并且因此,能够在HAMR介质的情况下避免互扩散,特别地,抵抗对于HAMR介质的生长/加工和写入所需的温度。此外,MgO显示出极小的衍射衬度,表明甚至在高温(例如,550℃)退火以后MgO仍具有非晶的微观结构。
配置在MgO下层210上方的是记录层212,其可以是,如以前所提到的,L10FePt、FePt、FePd、CoPt或MnAl磁记录层,或者钴铂(CoPt)或钴钯(CoPd)多层合金,其具有预定/优选厚度、粒状结构、小晶粒尺寸、所期望的均匀性、高矫顽力、高磁通量、以及良好的原子排序,将会适合于HAMR介质。其他添加元素可以被加入前面所提到的合金记录层318,包括,例如,Ag、Au、Cu、或Ni。
更进一步地,覆盖层214可以被形成在记录层212的顶部上,例如,以满足摩擦学的要求,例如接触-起-停(CSS)性能和腐蚀防护。能够被用于覆盖层214的材料可以是,例如基于碳的材料,例如氢化的碳或者氮化的碳。
可是,MgO用作下层能够出现某些问题。例如,MgO是具有高电阻率的电绝缘体,因此,这就需要使用射频(RF)溅射,与直流(DC)溅射相比,其能够是非期望的溅射方法,其只可以被用于沉积导电物质。此外,MgO具有低沉积率,导致制造过程中较低的总产品收得率,并且在MgO的沉积过程中,常常能够生成粒子污染。这样的粒子能够破坏记录介质并且很难清理。更进一步地,通过改变沉积条件存在对MgO的晶体形态和结构的较小控制,因为晶体形态和结构是由MgO的固有性质决定的。
因此,各种实施例提供了介质结构,其中基于铱(Ir)的材料可以代替MgO被用作次级的下层。这类基于铱的材料可以包括,例如,纯铱、基于铱的合金、基于铱的化合物、还有具有分离子的颗粒状的铱层。根据各种实施例,能够被使用的基于铱的合金的例子可以包括,例如,IrTi、IrZr、和IrC。
因此,基于铱的材料能够作为取向控制层和扩散屏障,并且避免前面所提到的与MgO的使用有关的问题。例如,Ir是导电金属,从而允许使用DC溅射以沉积Ir或(一种或更多种)基于Ir的材料。应该注意到DC溅射的使用优于RF溅射,因为沉积大多数或所有层材料已经使用DC溅射将它们沉积在介质堆栈上,导致,例如,更有效的和简单的制造工艺,更不用说避免RF溅射的使用通常需要的更精细的控制的能力。铱的沉积率也相当地高,即,不只是MgO的沉积率的8倍,导致制造期间更好的产品收得率。另外,在基于铱的层的沉积过程中生成更少的粒子,并且实际上,与MgO相比,铱/基于铱的下层能够作为更好的散热层。更进一步地,沉积在基于铱的层上的记录层的晶体形态和结构能够通过增加合金元素、增加分离子、形成基于铱的化合物、和改变沉积参数中的至少一种更好地控制。
图3根据各种实施例说明了一种示例介质结构300的横截面视图,其包括基于铱的材料下层。介质结构300可以包括以下构造:衬底302;粘附层304;散热层306;下层308;基于铱的下层310;记录层312;和覆盖层314。衬底302可以是,例如,能够承受例如在近似于400C-750℃范围内的这种温度的高温玻璃、金属、和/或金属合金材料。在一个实施例中,衬底302能够是圆盘形的或环形的。可以被使用的玻璃衬底包括,例如,高温玻璃、含二氧化硅的玻璃(例如,硼酸盐玻璃)。可以被使用的其他的高温金属和金属合金衬底包括,例如,铝镁(AlMg)衬底、镀镍磷(NiP)的AlMg,等等。在可选择的实施例中,其他衬底材料例如聚合物和陶瓷,例如非晶玻璃,可以被使用,还有蓝宝石、石英、硅碱钙石和碳化硅(SiC)。
粘附层304能够是合金材料,例如镍钽合金(Ni-Ta),可以被沉积在衬底302上方。
散热层306能够被配置以特别地为HAMR介质促进热传递。根据一个实施例,散热层206可以是Ag、Al、Au、Cu、Cr、Mo、W、RuCo、CuSi、CuAl、CuNi、CuSn、Ru、CuZr、MoCu、CuFeCo、CuNiFe、AgPd、CrRu、CrV、CrW、CrMo、CrNd、Ru-SiO2、Ru-TiO2、Ru-CoO、W-SiO2、W-TiO2和W-CoO中的一种或更多种。此外,散热层306可以有大于100W.m-1.K-1的热导率值。应该注意到如以前所提到的,传统的PMR设计可依赖于主要为L10的记录介质结构,其中,大约60%到80%的排序是可接受的。换句话说,具有这种结构,必要的各向异性被充分地优化用于写入传统的PMR系统中。可是,在HAMR环境中,其中本文所公开的各种实施例被应用,具有显著更高的“质量”的记录介质(例如,其中出现大约98%或更大的正确取向的晶粒的FePtL10)是期望的。用这个较高的各向异性在记录介质上写入不能用传统的PMR记录介质执行。散热层306被沉积在下层308和纯铱/基于铱的下层310下面,以控制热流动并且保持记录层312中的高的热梯度。在层308至层312中的分离子能够根据它们吸收光和热的能力被选择,以获得高质量的写入和信噪比(SNR)。
下层308能够是单层的下层、层压的下层、或多个层压层的下层,并且可以是体心立方(BCC)下层,例如具有至少一个添加物的Co或CoFe材料中的一种,至少一个添加物包括Ni、Zr、硼(B)、Ta、W或Mo。这样的Co或CoFe材料也可以有不同的成分,由于每个(一种或更多种)材料的量被包括在其中,例如,20%到90%的Co、0到60%的Fe、0到20%的Ni、0到20%的Zr、0到15%的B、0到20%的Ta、0到10%的W、以及0到10%的Mo。在一个实施例中,下层308能够包括Ag层和包括70%的Cr、10%的Zr、10%的W、和10%的Mo的另一个合金层。下层308能够被用于生长具有正确的晶体织构的基于铱的下层310并且在(位)写入过程中作为热敏电阻。
如上面所述,基于铱的下层310能够被沉积在下层308上以作为取向控制层和扩散屏障。应该注意到基于铱的材料被证明是不与例如FePt混溶并且控制FePt磁记录层的(001)取向。
被配置在基于铱的下层310上方的记录层312,其可以是,如以前所提到的,L10FePt、FePt、FePd、CoPt或MnAl磁记录层,或者钴铂(CoPt)或钴钯(CoPd)多层合金,其具有预定/优选厚度、粒状结构、小晶粒尺寸、所期望的均匀性、高矫顽力、高磁通量、以及良好的原子排序,将会适合于HAMR介质。其他添加元素可以被加入前面所提到的合金记录层318,包括,例如,Ag、Au、Cu、或Ni。
更进一步地,覆盖层314可以被形成在记录层212的顶部上,例如,以满足摩擦学的要求,例如接触-起-停(CSS)性能和腐蚀防护。能够被用于覆盖层314的材料可以是,例如基于碳的材料,例如氢化的碳或者氮化的碳。
图4说明了图3的示例介质结构,其包括根据一个实施例使用的特别层的材料。特别地,衬底302可以是N105X玻璃衬底。粘附层304可以包括非晶的NiTa。散热层306可以包括多层,包括非晶的CrTa、(002)RuAl、和(002)W。应该注意到“(002)”的名称是材料各自的结晶取向的表示。
此外,(002)Ag层和(002)Cr70Mo30层能够是第一下层308,并且第二下层310可以是(002)Ir。磁记录层312,如以前所讨论的,可以是(002)FePt。
基于铱的下层控制磁记录层如FePt或CoPt的取向的能力能够通过图5A中所示的面内X射线衍射(XRD)测量被看到。特别地,图5A提供了(110)、(200)和(220)取向的FePt磁记录层的面内XRD的2θ扫描的结果,其中一般地,峰值强度越高,结晶度越好,以及摇摆曲线半峰全宽(FWHM)值越窄,织构越好。在这种情况下,使用铱或基于铱的下层导致良好的FePt织构。还能观察到没有(001)FePt峰值,其暗示所期望的面外取向。作为对比,图5B说明了(001)取向的FePt、(111)和(002)取向的Ir和FePt的示例面外XRD的2θ扫描。如500处所示,在顺序度中没有可感知的改变,并且具有Ir下层的峰值远远高于没有Ir下层的,如(002)Ir和FePt求峰值所示。通过对比,当使用MgO作为下层时,例如,10%的晶粒在面内生长,其不期望用于记录。因此,不存在/存在可忽略的不期望的FePt面内生长。
还应该注意到具有铱/基于铱的下层的FePt不扩散,因此甚至在退火之后保持晶格结构。如图6所说明的,其是Ir-FePt薄膜堆栈的示例X射线反射率的测量,与前退火(线601)相比,超晶格峰值变成更强的后退火(线600),表明Ir和FePt是不混溶的。因此,并且还有,Ir或基于铱的材料将会是合适的扩散屏障。
图7比较了传统的FePt-MgO介质结构700的极向克尔测量中的示例滞回曲线和FePt-Ir介质结构701的滞回曲线。如能够由示例测量理解到,FePt-MgO介质结构的矫顽力接近于7500Oe,并且这不随着使用铱/基于铱的材料代替MgO而改变/减小。即,当与FePt-MgO介质结构比较时,FePt-Ir介质结构的磁特性没有可感知的退化,导致两个介质结构之间接近-同一的磁特性。进一步地,应该注意到使用基于铱的下层能够导致,例如,低于使用由于良好控制织构导致的近于10%的MgO下层时的磁阻率(MR)(表明了难磁化轴(hardaxis)的数量,难磁化轴与FePt层中的面内方向在磁性上一致)。
图8是根据各种实施例说明用于制造HAMR盘的示例过程的流程图。在800,衬底被生成或以其他方式提供。如以前所讨论的,衬底可以是玻璃衬底。在802,粘附层被沉积在衬底上方。在804,散热层被沉积在粘附层上方。在806,第一下层被沉积在散热层上方。在808,第二下层被沉积在第一下层上方,第二下层包括铱或基于铱的下层中的一个。在810,记录层被沉积在下层上方。
应该注意到根据各种实施例使用铱或基于铱的下层能够在(例如,具有分离子)颗粒介质的环境中完成,不需要被畴壁运动限制在钉扎点。此外,各种实施例导致相对光滑的记录介质(不需要额外的化学蚀刻过程),比传统的记录介质的颗粒机械上更稳定的空气隙较少的颗粒,并且不需要考虑磁记录层和驻留在铱/基于铱的下层下方的下层之间的接触。更进一步地,前面所提到的介质结构能够被用于基于BCC的下层材料上,(不仅是,例如,Cu下层上)以控制取向。
图9说明了具有一个或更多个盘902的磁盘驱动器900。盘902驻留在主轴组件904上,主轴组件904被安装到传动箱908。数据可以沿着轨道被存储在盘902的磁记录层中。用磁头910完成数据的读取和写入,其具有读取元件和写入元件二者。写入元件被用于改变盘902的垂直磁记录层的特性。在一个实施例中,磁头910可以具有MR或巨磁阻效应(GMR)元件。在一个替代实施例中,磁头910可以是其他类型的磁头,例如,感应的读取/写入磁头或霍尔效应磁头。在一些实施例中,盘902具有图3和4中所描述的介质结构,并且磁盘驱动器900是热辅助磁记录(HAMR)驱动器并且包含激光源、波导、和近场换能器(未显示)部件。生成和聚焦激光束的技术是本领域所知的,并且因此,不做特别地详细描述。主轴电机(未显示)旋转主轴组件904并且,因此,旋转盘902以将磁头910定位在沿着所期望的盘轨道的特定位置。磁头910相对于盘902的定位可以被位置控制电路906控制。
尽管以上依据各种可效仿的实施例和实施方式进行描述,应该理解到在一个或更多个单独的实施例中所描述的各种特征、方面和功能的适用性没有被限制到它们所被描述的特定实施例中,相反,它们能够被单独或以各种组合应用到本申请的一个或更多个其他实施例中,无论是这样的实施例是否被描述,以及无论这些特征是否作为描述的实施例的一部分被呈现。因此,本申请的宽度和范围不应该被上面所述的任何示例性实施例限制。
此中所使用的术语“在……上方”、“在……下面”、“在……之间”和“在……上”指示一个介质层关于其他层的相对位置。因此,例如,沉积在另一层上方或下面的一层可以与其它层直接地接触或可以具有一个或更多个中间层。另外,沉积在两层之间的一层可以直接地与两个层接触或可以具有一个或更多个中间层。作为对比,在第二层“上”的第一层与该第二层接触。此外,一个层关于其它层的相对位置被提供,假设相对于衬底执行操作,不考虑衬底的绝对取向。
本文件中所使用的术语和短语,以及由此的变化,除非另外明确说明,应该被解释为开放式的而不是限制性的。如前面的示例:术语“包括”应该被解读意思为“包括,但不限于”或类似的;术语“示例”被用于提供讨论中的条目的示例性实例,不是其穷尽性的或限制性的列表;术语“一个(a、an)”应该被解读意思为“至少一个”,“一个或更多个”或类似的;并且形容词例如“传统的”,“惯例的”,“正常的”,“标准的”,“已知的”以及相似意思的术语不应该被解释限制所描述的条目为给定的时间阶段或者给定的时间可用的条目,而相反应该被解读成包含传统的、惯例的、正常的或标准的技术,其现在或在未来的任何时间内可以是可用的或已知的。同样地,如果这个文件指示对本领域技术人员将会是显然的或已知的技术,这样的技术包含那些现在或在未来的任何时间对本领域技术人员是显然的或已知的技术。
扩展的单词和短语的出现例如“一个或更多个”,“至少”,“不限于”或在一些实例中的其他类似的短语不应该被解读意为在不存在这样的扩展短语的实例中意在或者要求比较狭窄的情况。术语“模块”的使用不暗指所描述或要求的组件或功能作为模块的一部分全部被配置在共同的封装中。事实上,模块的任何的或所有的各种组件,无论是控制逻辑还是其他组件,能够被结合在单一封装或分开维护,并且能够进一步被分布在多个组群或封装中或者跨越多个位置。
此外,本文所提出的各种实施例依据可效仿的方框图、流程图和其他说明被描述。正如读过这个文件之后对本领域的一般技术人员会变得明显,被说明的实施例和它们的各种替代方案能够被实施而不限制于所说明的示例。例如,方框图和它们所附的说明不应该被解读为要求特别的结构或配置。
Claims (20)
1.一种热辅助磁记录介质,包括:
衬底;
沉积在所述衬底上方的粘附层;
沉积在所述粘附层上方的散热层;
沉积在所述散热层上方的第一下层;
沉积在所述第一下层上方的第二下层,所述第二下层包括基于铱的材料;以及
磁记录层,所述磁记录层用于通过沉积在所述第二下层上方的热辅助磁记录存储数据。
2.根据权利要求1所述的热辅助磁记录介质,进一步包括沉积在所述磁记录层上方的覆盖层。
3.根据权利要求2所述的热辅助磁记录介质,其中所述覆盖层包括氢化的碳或者氮化的碳中的一种。
4.根据权利要求1所述的热辅助磁记录介质,其中所述第一下层是体心立方材料。
5.根据权利要求1所述的热辅助磁记录介质,其中所述散热层包括002钨W、002钌铝RuAl、和非晶的铬钽CrTa。
6.根据权利要求1所述的热辅助磁记录介质,其中所述粘附层包括非晶的镍-钽Ni-Ta。
7.根据权利要求1所述的热辅助磁记录介质,其中所述衬底包括能够承受至少接近于400℃-750℃的温度的玻璃材料、金属材料、聚合物材料或陶瓷材料中的一种。
8.根据权利要求1所述的热辅助磁记录介质,其中所述磁记录层是包括001铁-铂FePt的合金。
9.根据权利要求1所述的热辅助磁记录介质,其中所述基于铱的材料包括纯铱、基于铱的合金、基于铱的化合物、和具有分离子的颗粒状的铱层中的一种。
10.根据权利要求9所述的热辅助磁记录介质,其中所述基于铱的合金包括铱钛IrTi合金、铱锆IrZr合金、或铱碳IrC合金中的一种。
11.根据权利要求9所述的热辅助磁记录介质,其中所述分离子包括光热吸收材料和热吸收材料中的至少一种。
12.一种方法,包括:
生成或提供衬底;
在所述衬底上方沉积粘附层;
在所述粘附层上方沉积散热层;
在所述散热层上方沉积第一下层;
在所述第一下层上方沉积第二下层,所述第二下层包括铱Ir或基于铱的下层中的一种;以及
在所述第二下层上方沉积记录层。
13.根据权利要求12所述的方法,其中所述衬底包括能够承受至少接近于400℃-750℃的温度的玻璃材料、金属材料、聚合物材料或陶瓷材料中的一种。
14.根据权利要求12所述的方法,其中所述粘附层包括非晶的镍-钽Ni-Ta,并且其中所述散热层包括002钨W、002钌铝RuAl、和非晶的铬钽CrTa。
15.根据权利要求12所述的方法,其中所述磁记录层是热辅助磁记录的记录层,即HAMR的记录层。
16.根据权利要求12所述的方法,其中所述HAMR记录层是包括001铁-铂FePt的合金。
17.根据权利要求16所述的方法,其中所述001铁-铂FePt合金包括具有至少98%的正确的晶粒取向结构的001铁-铂FePt薄膜。
18.根据权利要求12所述的方法,其中所述基于铱的材料包括基于铱的合金、基于铱的化合物、和具有分离子的颗粒状的铱层中的一种。
19.根据权利要求18所述的方法,其中所述基于铱的合金包括铱钛IrTi合金、铱锆IrZr合金、或铱碳IrC合金中的一种。
20.根据权利要求18所述的方法,其中所述分离子包括光吸收材料和热吸收材料中的至少一种。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/674,185 | 2015-03-31 | ||
US14/674,185 US9822441B2 (en) | 2015-03-31 | 2015-03-31 | Iridium underlayer for heat assisted magnetic recording media |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106024028A true CN106024028A (zh) | 2016-10-12 |
CN106024028B CN106024028B (zh) | 2019-04-12 |
Family
ID=57017021
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610206138.6A Active CN106024028B (zh) | 2015-03-31 | 2016-03-31 | 用于热辅助磁记录介质的铱下层 |
Country Status (2)
Country | Link |
---|---|
US (1) | US9822441B2 (zh) |
CN (1) | CN106024028B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG11201405518YA (en) * | 2012-03-22 | 2014-11-27 | Fuji Electric Co Ltd | Magnetic recording medium for heat-assisted magnetic recording |
US10347281B2 (en) | 2015-06-02 | 2019-07-09 | Western Digital Technologies, Inc. | Structures and methods for templated growth of high areal density heat assisted magnetic recording media |
US11437064B1 (en) | 2021-08-06 | 2022-09-06 | Western Digital Technologies, Inc. | Heat-assisted magnetic recording (HAMR) medium with optical-coupling multilayer between the recording layer and heat-sink layer |
US11900978B1 (en) | 2022-08-11 | 2024-02-13 | Western Digital Technologies, Inc. | Magnetic recording medium with underlayer configured to reduce diffusion of titanium into a magnetic recording layer |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1505006A (zh) * | 2002-11-28 | 2004-06-16 | ��ʽ���綫֥ | 垂直磁记录介质、其制造方法以及磁记录-再现装置 |
CN101192419A (zh) * | 2006-11-30 | 2008-06-04 | 株式会社东芝 | 垂直磁记录介质和磁记录/再现设备 |
CN101465130A (zh) * | 2007-12-20 | 2009-06-24 | 株式会社东芝 | 垂直磁记录介质和使用该介质的磁记录/再现装置 |
US20120052330A1 (en) * | 2010-08-26 | 2012-03-01 | Hitachi, Ltd. | Perpendicular magnetic recording medium and manufacturing method of the same |
US20130314815A1 (en) * | 2012-05-23 | 2013-11-28 | Wd Media, Inc. | Underlayers for heat assisted magnetic recording (hamr) media |
Family Cites Families (297)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2874298B2 (ja) | 1990-07-24 | 1999-03-24 | 日本板硝子株式会社 | 磁気記録媒体およびその製造方法 |
US6287429B1 (en) | 1992-10-26 | 2001-09-11 | Hoya Corporation | Magnetic recording medium having an improved magnetic characteristic |
US6099981A (en) | 1993-12-28 | 2000-08-08 | Hoya Corporation | Magnetic recording medium having a lubricant film coated on optimum conditions and method of evaluating the lubricant film |
JPH0850715A (ja) | 1994-01-28 | 1996-02-20 | Komag Inc | 低ノイズ,高い保磁力および優れた方形度を有する磁気記録媒体および磁気記録媒体形成方法 |
US6156404A (en) | 1996-10-18 | 2000-12-05 | Komag, Inc. | Method of making high performance, low noise isotropic magnetic media including a chromium underlayer |
US5855746A (en) | 1996-02-28 | 1999-01-05 | Western Digital Corporation | Buffered nitrogenated carbon overcoat for data recording disks and method for manufacturing the same |
US6309765B1 (en) | 1996-03-25 | 2001-10-30 | Asahi Komag Co., Ltd. | Magnetic recording medium and process for its production |
US6103404A (en) | 1996-06-03 | 2000-08-15 | Komag, Inc. | Laser textured magnetic disk comprising NiNb |
US6117499A (en) | 1997-04-09 | 2000-09-12 | Komag, Inc. | Micro-texture media made by polishing of a selectively irradiated surface |
US6068891A (en) | 1997-08-15 | 2000-05-30 | Komag, Inc. | Method for laser texturing a glass ceramic substrate and the resulting substrate |
US6200441B1 (en) | 1997-08-27 | 2001-03-13 | Western Digital Corporation | Multiple station vacuum deposition apparatus for texturing a substrate using a scanning beam |
US6149696A (en) | 1997-11-06 | 2000-11-21 | Komag, Inc. | Colloidal silica slurry for NiP plated disk polishing |
JP3099790B2 (ja) | 1997-11-17 | 2000-10-16 | 日本電気株式会社 | 垂直磁気記録媒体 |
US6150015A (en) | 1997-12-04 | 2000-11-21 | Komag, Incorporated | Ultra-thin nucleation layer for magnetic thin film media and the method for manufacturing the same |
US6387483B1 (en) | 1997-12-18 | 2002-05-14 | Nec Corporation | Perpendicular magnetic recording medium and manufacturing process therefor |
JP3087715B2 (ja) | 1998-02-19 | 2000-09-11 | 日本電気株式会社 | 磁気ディスク装置 |
US6261681B1 (en) | 1998-03-20 | 2001-07-17 | Asahi Komag Co., Ltd. | Magnetic recording medium |
US6381090B1 (en) | 1998-05-21 | 2002-04-30 | Komag, Incorporated | Hard disk drive head-media system having reduced stiction and low fly height |
US6683754B2 (en) | 1998-05-21 | 2004-01-27 | Komag, Inc. | Hard disk drive head-media system having reduced stiction and low fly height |
US6159076A (en) | 1998-05-28 | 2000-12-12 | Komag, Inc. | Slurry comprising a ligand or chelating agent for polishing a surface |
US6210819B1 (en) | 1998-07-24 | 2001-04-03 | Hmt Technology Corporation | Magnetic recording media having a CrTi underlayer deposited under a substrate bias |
JP3090128B2 (ja) | 1998-08-28 | 2000-09-18 | 日本電気株式会社 | 垂直磁気記録媒体 |
US6571806B2 (en) | 1998-09-04 | 2003-06-03 | Komag, Inc. | Method for drying a substrate |
US6216709B1 (en) | 1998-09-04 | 2001-04-17 | Komag, Inc. | Method for drying a substrate |
US6146737A (en) | 1998-09-18 | 2000-11-14 | Hmt Technology Corporation | Magnetic recording medium having a nitrogen-containing barrier layer |
US6164118A (en) | 1998-09-30 | 2000-12-26 | Komag Incorporated | Calibration disk having discrete bands of calibration bumps |
US6408677B1 (en) | 1998-09-30 | 2002-06-25 | Komag Corporation | Calibration disk having discrete bands of composite roughness |
US6303217B1 (en) | 1998-10-02 | 2001-10-16 | Hmt Technology, Corporation | Longitudinal recording medium with a dual underlayer |
US6358636B1 (en) | 1998-11-05 | 2002-03-19 | Hmt Technology Corporation | Thin overlayer for magnetic recording disk |
US6274063B1 (en) | 1998-11-06 | 2001-08-14 | Hmt Technology Corporation | Metal polishing composition |
US6063248A (en) | 1998-11-12 | 2000-05-16 | Hmt Technology Corporation | Process chamber isolation system in a deposition apparatus |
US6145849A (en) | 1998-11-18 | 2000-11-14 | Komag, Incorporated | Disk processing chuck |
US6299947B1 (en) | 1999-01-20 | 2001-10-09 | Komag, Inc. | Method of forming a magnetic hard disk with elliptical shaped laser bumps |
US6143375A (en) | 1999-01-28 | 2000-11-07 | Komag, Incorporated | Method for preparing a substrate for a magnetic disk |
US6362452B1 (en) | 1999-02-04 | 2002-03-26 | Komag, Inc. | Patterned laser zone texture |
US6403919B1 (en) | 1999-03-01 | 2002-06-11 | Komag, Incorporated | Disk marking system |
SG102651A1 (en) | 1999-03-31 | 2004-03-26 | Hoya Corp | Magnetic recording medium, and thermal stability measuring method and apparatus of magnetic recording medium |
US6086730A (en) | 1999-04-22 | 2000-07-11 | Komag, Incorporated | Method of sputtering a carbon protective film on a magnetic disk with high sp3 content |
US6248395B1 (en) | 1999-05-24 | 2001-06-19 | Komag, Inc. | Mechanical texturing of glass and glass-ceramic substrates |
US6395349B1 (en) | 1999-05-25 | 2002-05-28 | Komag, Inc. | Method of marking disks |
US6548821B1 (en) | 1999-06-21 | 2003-04-15 | Komag, Inc. | Method and apparatus for inspecting substrates |
US6566674B1 (en) | 1999-06-21 | 2003-05-20 | Komag, Inc. | Method and apparatus for inspecting substrates |
US6221119B1 (en) | 1999-07-14 | 2001-04-24 | Komag, Inc. | Slurry composition for polishing a glass ceramic substrate |
US6363599B1 (en) | 1999-08-04 | 2002-04-02 | Komag, Inc. | Method for manufacturing a magnetic disk including a glass substrate |
US6429984B1 (en) | 1999-08-06 | 2002-08-06 | Komag, Inc | Circuit and method for refreshing data recorded at a density sufficiently high to undergo thermal degradation |
US6206765B1 (en) | 1999-08-16 | 2001-03-27 | Komag, Incorporated | Non-rotational dresser for grinding stones |
US6290573B1 (en) | 1999-08-23 | 2001-09-18 | Komag, Incorporated | Tape burnish with monitoring device |
US6664503B1 (en) | 1999-09-07 | 2003-12-16 | Asahi Glass Company, Ltd. | Method for manufacturing a magnetic disk |
US6795274B1 (en) | 1999-09-07 | 2004-09-21 | Asahi Glass Company, Ltd. | Method for manufacturing a substantially circular substrate by utilizing scribing |
US6391213B1 (en) | 1999-09-07 | 2002-05-21 | Komag, Inc. | Texturing of a landing zone on glass-based substrates by a chemical etching process |
US20020060883A1 (en) | 1999-09-21 | 2002-05-23 | Shoji Suzuki | Hard disk drive with load/unload capability |
US6482330B1 (en) | 1999-10-01 | 2002-11-19 | Komag, Inc. | Method for manufacturing a data storage card |
US6283838B1 (en) | 1999-10-19 | 2001-09-04 | Komag Incorporated | Burnishing tape handling apparatus and method |
US6381092B1 (en) | 2000-01-10 | 2002-04-30 | Komag, Inc. | Spacer rings to compensate for disk warpage |
US6482505B1 (en) | 2000-05-11 | 2002-11-19 | Komag, Inc. | Multi-layer texture layer |
US6565719B1 (en) | 2000-06-27 | 2003-05-20 | Komag, Inc. | Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content |
JP2002056522A (ja) | 2000-08-14 | 2002-02-22 | Hoya Corp | 磁気記録媒体及びその製造方法 |
US6730420B1 (en) | 2000-10-31 | 2004-05-04 | Komag, Inc. | Magnetic thin film recording media having extremely low noise and high thermal stability |
US6528124B1 (en) | 2000-12-01 | 2003-03-04 | Komag, Inc. | Disk carrier |
US7019924B2 (en) | 2001-02-16 | 2006-03-28 | Komag, Incorporated | Patterned medium and recording head |
SG108859A1 (en) | 2001-07-03 | 2005-02-28 | Hoya Corp | Magnetic recording medium |
US6778353B1 (en) | 2001-07-25 | 2004-08-17 | Komag, Inc. | Balance ring |
US7099112B1 (en) | 2001-07-25 | 2006-08-29 | Komag, Inc. | Balance ring |
JP3990128B2 (ja) | 2001-09-14 | 2007-10-10 | 株式会社東芝 | 磁気記録装置 |
SG108888A1 (en) | 2001-12-14 | 2005-02-28 | Hoya Corp | Magnetic recording medium |
US6899959B2 (en) | 2002-02-12 | 2005-05-31 | Komag, Inc. | Magnetic media with improved exchange coupling |
JP3912497B2 (ja) | 2002-02-25 | 2007-05-09 | Hoya株式会社 | 磁気記録媒体 |
US6857937B2 (en) | 2002-05-30 | 2005-02-22 | Komag, Inc. | Lapping a head while powered up to eliminate expansion of the head due to heating |
US7119990B2 (en) | 2002-05-30 | 2006-10-10 | Komag, Inc. | Storage device including a center tapped write transducer |
US7054442B2 (en) | 2002-08-02 | 2006-05-30 | Communication System, Inc. | Wall mounted DSL adapter jack with latches for attachment |
SG130014A1 (en) | 2002-09-03 | 2007-03-20 | Hoya Corp | Magnetic recording disk and process for manufacturing thereof |
US6939120B1 (en) | 2002-09-12 | 2005-09-06 | Komag, Inc. | Disk alignment apparatus and method for patterned media production |
US20040132301A1 (en) | 2002-09-12 | 2004-07-08 | Harper Bruce M. | Indirect fluid pressure imprinting |
US6972135B2 (en) | 2002-11-18 | 2005-12-06 | Komag, Inc. | Texturing of magnetic disk substrates |
US7147790B2 (en) | 2002-11-27 | 2006-12-12 | Komag, Inc. | Perpendicular magnetic discrete track recording disk |
US20050036223A1 (en) | 2002-11-27 | 2005-02-17 | Wachenschwanz David E. | Magnetic discrete track recording disk |
JP4074181B2 (ja) | 2002-11-28 | 2008-04-09 | 株式会社東芝 | 垂直磁気記録媒体 |
JP3651681B2 (ja) | 2003-01-29 | 2005-05-25 | Hoya株式会社 | 磁気ディスクおよびその製造方法 |
JP2004247010A (ja) | 2003-02-17 | 2004-09-02 | Hoya Corp | 磁気ディスク |
US7016154B2 (en) | 2003-03-05 | 2006-03-21 | Komag, Inc. | Magnetic recording disk having a safe zone |
DE102004010336A1 (de) | 2003-03-05 | 2004-09-16 | Komag, Inc., San Jose | Magnetische Aufzeichnungsplatte mit Übergangszone |
JP2004319058A (ja) | 2003-03-31 | 2004-11-11 | Hoya Corp | 磁気ディスクの製造方法及び磁気ディスク |
US20040202865A1 (en) | 2003-04-08 | 2004-10-14 | Andrew Homola | Release coating for stamper |
US20040202793A1 (en) | 2003-04-08 | 2004-10-14 | Harper Bruce M. | Dip-spin coater |
US20040209123A1 (en) | 2003-04-17 | 2004-10-21 | Bajorek Christopher H. | Method of fabricating a discrete track recording disk using a bilayer resist for metal lift-off |
US6893748B2 (en) | 2003-05-20 | 2005-05-17 | Komag, Inc. | Soft magnetic film for perpendicular recording disk |
US7166319B2 (en) | 2003-05-28 | 2007-01-23 | Hoya Corporation | Magnetic disk and method of producing the same |
TWI224305B (en) | 2003-07-14 | 2004-11-21 | Po-Cheng Kuo | Heat assisted magnetic recording medium and manufacturing method thereof |
US7006323B1 (en) | 2003-07-18 | 2006-02-28 | Komag, Inc. | Magnetic head for proximity recording |
JP4169663B2 (ja) | 2003-07-25 | 2008-10-22 | Hoya株式会社 | 垂直磁気記録媒体 |
JP4247535B2 (ja) | 2003-11-11 | 2009-04-02 | Hoya株式会社 | ロードアンロード方式用磁気ディスク、ロードアンロード方式用磁気ディスクの製造方法及びロードアンロード方式用磁気ディスクの評価方法 |
US6967798B2 (en) | 2003-12-19 | 2005-11-22 | Komag, Inc. | Magnetic recording disk having DTR patterned CSS zone |
US7632087B2 (en) | 2003-12-19 | 2009-12-15 | Wd Media, Inc. | Composite stamper for imprint lithography |
US20050151283A1 (en) | 2004-01-08 | 2005-07-14 | Bajorek Christopher H. | Method and apparatus for making a stamper for patterning CDs and DVDs |
US20050151282A1 (en) | 2004-01-13 | 2005-07-14 | Harper Bruce M. | Workpiece handler and alignment assembly |
US20050150862A1 (en) | 2004-01-13 | 2005-07-14 | Harper Bruce M. | Workpiece alignment assembly |
US20050151300A1 (en) | 2004-01-13 | 2005-07-14 | Harper Bruce M. | Workpiece isothermal imprinting |
CN101494058B (zh) | 2004-01-14 | 2012-02-08 | 西部数据传媒(新加坡)有限公司 | 磁盘及其制造方法 |
US7686606B2 (en) | 2004-01-20 | 2010-03-30 | Wd Media, Inc. | Imprint embossing alignment system |
US7329114B2 (en) | 2004-01-20 | 2008-02-12 | Komag, Inc. | Isothermal imprint embossing system |
US20050155554A1 (en) | 2004-01-20 | 2005-07-21 | Saito Toshiyuki M. | Imprint embossing system |
US7179549B2 (en) | 2004-01-21 | 2007-02-20 | Komag, Inc. | Magnetic recording medium having novel underlayer structure |
JP4078317B2 (ja) | 2004-02-06 | 2008-04-23 | Hoya株式会社 | 固体表面の評価方法、磁気ディスクの評価方法、磁気ディスクおよびその製造方法 |
JP4407904B2 (ja) | 2004-02-06 | 2010-02-03 | Hoya株式会社 | 磁気ディスクの製造方法 |
US7004827B1 (en) | 2004-02-12 | 2006-02-28 | Komag, Inc. | Method and apparatus for polishing a workpiece |
US7229266B2 (en) | 2004-03-23 | 2007-06-12 | Komag, Inc. | Press die alignment |
US7498062B2 (en) | 2004-05-26 | 2009-03-03 | Wd Media, Inc. | Method and apparatus for applying a voltage to a substrate during plating |
EP1788558B1 (en) | 2004-06-30 | 2013-02-20 | Wd Media (Singapore) Pte. Ltd | Perpendicular magnetic recording disk and process for producing the same |
US7320584B1 (en) | 2004-07-07 | 2008-01-22 | Komag, Inc. | Die set having sealed compliant member |
US7684152B2 (en) | 2004-09-24 | 2010-03-23 | Wd Media, Inc. | Method of mitigating eccentricity in a disk drive with DTR media |
JP4375617B2 (ja) | 2004-09-27 | 2009-12-02 | Hoya株式会社 | 磁気ディスク用潤滑剤の製造方法、磁気ディスク用潤滑剤、磁気ディスクおよび磁気ディスクの製造方法 |
JP4044546B2 (ja) | 2004-09-29 | 2008-02-06 | Hoya株式会社 | 磁気ディスク及びその製造方法 |
JP4534711B2 (ja) * | 2004-10-21 | 2010-09-01 | 富士電機デバイステクノロジー株式会社 | 垂直磁気記録媒体 |
US7301726B1 (en) | 2004-11-04 | 2007-11-27 | Komag, Inc. | Banded LZT CSS zone |
US20060147758A1 (en) | 2005-01-06 | 2006-07-06 | Hong-Sik Jung | Perpendicular magnetic recording medium with magnetically resetable single domain soft magnetic underlayer |
US7521137B2 (en) | 2005-01-12 | 2009-04-21 | Seagate Technology Llc | Patterned thin films and use of such films as thermal control layers in heat assisted magnetic recording media |
US7184139B2 (en) | 2005-01-13 | 2007-02-27 | Komag, Inc. | Test head for optically inspecting workpieces |
US20060181697A1 (en) | 2005-01-13 | 2006-08-17 | Komag, Inc. | Circularly polarized light for optically inspecting workpieces |
US7375362B2 (en) | 2005-01-13 | 2008-05-20 | Wd Media, Inc. | Method and apparatus for reducing or eliminating stray light in an optical test head |
US7425719B2 (en) | 2005-01-13 | 2008-09-16 | Wd Media, Inc. | Method and apparatus for selectively providing data from a test head to a processor |
US7302148B2 (en) | 2005-01-13 | 2007-11-27 | Komag, Inc. | Test head for optically inspecting workpieces |
US7292329B2 (en) | 2005-01-13 | 2007-11-06 | Komag, Inc. | Test head for optically inspecting workpieces comprising a lens for elongating a laser spot on the workpieces |
US7239970B2 (en) | 2005-01-13 | 2007-07-03 | Komag, Inc. | Robotic system for optically inspecting workpieces |
US7305119B2 (en) | 2005-01-13 | 2007-12-04 | Komag, Inc. | Test head for optically inspecting workpieces |
US7161753B2 (en) | 2005-01-28 | 2007-01-09 | Komag, Inc. | Modulation of sidewalls of servo sectors of a magnetic disk and the resultant disk |
US7569490B2 (en) | 2005-03-15 | 2009-08-04 | Wd Media, Inc. | Electrochemical etching |
US20060207890A1 (en) | 2005-03-15 | 2006-09-21 | Norbert Staud | Electrochemical etching |
JP2006268972A (ja) | 2005-03-24 | 2006-10-05 | Hoya Corp | 垂直磁気記録ディスク及びその製造方法 |
US7281920B2 (en) | 2005-03-28 | 2007-10-16 | Komag, Inc. | Die set utilizing compliant gasket |
US7955723B2 (en) | 2005-03-31 | 2011-06-07 | WD Media (Singapore) Pte.Ltd. | Magnetic recording medium substrate and perpendicular magnetic recording medium |
US7910159B2 (en) | 2005-06-03 | 2011-03-22 | Wd Media, Inc. | Radial magnetic field reset system for producing single domain soft magnetic underlayer on perpendicular magnetic recording medium |
JP4928751B2 (ja) | 2005-07-14 | 2012-05-09 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気記録媒体 |
US7862914B2 (en) | 2005-07-26 | 2011-01-04 | Seagate Technology Llc | Heatsink films for magnetic recording media |
JP4410747B2 (ja) | 2005-09-30 | 2010-02-03 | Hoya株式会社 | 磁気記録ディスク用潤滑剤の成分比測定方法および磁気記録ディスクの製造方法 |
JP2007095234A (ja) | 2005-09-30 | 2007-04-12 | Hoya Corp | 磁気記録ディスクおよびその製造方法 |
US7993497B2 (en) | 2005-11-21 | 2011-08-09 | Wd Media (Singapore) Pte. Ltd. | Magnetic disk and magnetic disk manufacturing method |
JP4654339B2 (ja) | 2006-01-23 | 2011-03-16 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気ディスク |
US7314404B2 (en) | 2006-02-13 | 2008-01-01 | Komag, Inc. | Burnishing head |
JP2007257756A (ja) | 2006-03-24 | 2007-10-04 | Hoya Corp | 磁気ディスクの製造方法及び磁気ディスク |
WO2007116812A1 (ja) | 2006-03-29 | 2007-10-18 | Hoya Corporation | 磁気ディスク及びその製造方法 |
JP2007265586A (ja) | 2006-03-30 | 2007-10-11 | Hoya Corp | 磁気ディスク及びその製造方法 |
JPWO2007116813A1 (ja) | 2006-03-30 | 2009-08-20 | Hoya株式会社 | 垂直磁気記録ディスクの製造方法及び垂直磁気記録ディスク |
WO2007114401A1 (ja) | 2006-03-31 | 2007-10-11 | Hoya Corporation | 垂直磁気記録ディスク及びその製造方法 |
WO2007114402A1 (ja) | 2006-03-31 | 2007-10-11 | Hoya Corporation | 垂直磁気記録ディスク及びその製造方法 |
US20090191331A1 (en) | 2006-03-31 | 2009-07-30 | Hoya Corporation | Perpendicular magnetic recording medium manufacturing method |
US20090147401A1 (en) * | 2006-05-08 | 2009-06-11 | Migaku Takahashi | Magnetic recording medium, method of manufacturing the same, and magnetic recording/reproducing apparatus |
US20080026255A1 (en) | 2006-07-28 | 2008-01-31 | Heraeus, Inc. | Alloy and architecture design for heat-assisted magnetic recording |
WO2008030199A1 (en) | 2006-09-08 | 2008-03-13 | Agency For Science, Technology And Research | Chemically ordered perpendicular recording media |
JP2008084432A (ja) | 2006-09-27 | 2008-04-10 | Hoya Corp | 磁気記録媒体、及び磁気記録媒体の製造方法 |
JP5452928B2 (ja) | 2006-09-27 | 2014-03-26 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気記録媒体の製造方法、及び積層体の製造方法 |
JP4993677B2 (ja) | 2006-09-27 | 2012-08-08 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気記録媒体の製造方法 |
US8178480B2 (en) | 2006-09-29 | 2012-05-15 | Wd Media (Singapore) Pte. Ltd. | Lubricant for magnetic disk, process for producing the same, and magnetic disk |
WO2008038664A1 (fr) | 2006-09-29 | 2008-04-03 | Hoya Corporation | Support d'enregistrement magnétique |
SG182153A1 (en) | 2007-02-13 | 2012-07-30 | Wd Media Singapore Pte Ltd | Magnetic recording medium, magnetic recording medium manufacturing method, and magnetic disk |
US7869162B2 (en) | 2007-02-16 | 2011-01-11 | Seagate Technology Llc | Thin film structure with controlled lateral thermal spreading in the thin film |
JP2008269764A (ja) | 2007-03-28 | 2008-11-06 | Hoya Corp | 磁気記録媒体、及び磁気記録媒体の製造方法 |
JP2008276915A (ja) | 2007-03-30 | 2008-11-13 | Hoya Corp | 磁気記録媒体 |
US8309239B2 (en) | 2007-03-30 | 2012-11-13 | Wd Media (Singapore) Pte. Ltd. | Perpendicular magnetic recording medium and method of manufacturing the same |
JP5260510B2 (ja) | 2007-05-30 | 2013-08-14 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気記録媒体および垂直磁気記録媒体の製造方法 |
WO2008149813A1 (ja) | 2007-05-31 | 2008-12-11 | Hoya Corporation | 垂直磁気記録媒体の製造方法 |
JP5183134B2 (ja) | 2007-09-21 | 2013-04-17 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気ディスク及び磁気ディスクの製造方法 |
US8795857B2 (en) | 2007-09-28 | 2014-08-05 | Wd Media (Singapore) Pte. Ltd. | Perpendicular magnetic recording medium and manufacturing method of the same |
WO2009041432A1 (ja) | 2007-09-28 | 2009-04-02 | Hoya Corporation | 磁気ディスク及びその製造方法 |
US8057926B2 (en) | 2007-09-28 | 2011-11-15 | WD Media(Singapore) Pte. Ltd. | Perpendicular magnetic recording medium |
JP5401069B2 (ja) | 2007-10-07 | 2014-01-29 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気記録媒体 |
US9159351B2 (en) | 2007-10-15 | 2015-10-13 | Wd Media (Singapore) Pte. Ltd | Perpendicular magnetic recording medium and method of manufacturing the same |
US7944643B1 (en) | 2007-12-05 | 2011-05-17 | Wd Media, Inc. | Patterns for pre-formatted information on magnetic hard disk media |
US7755861B1 (en) | 2007-12-06 | 2010-07-13 | Western Digital (Fremont), Llc | Method and system for providing a magnetic recording media |
US20090226764A1 (en) | 2008-03-06 | 2009-09-10 | Agency For Science, Technology & Research | Magnetic Recording Medium with Iridum-Manganese Based Intermediate Layer and Method of Manufacturing Same |
US8597723B1 (en) | 2008-03-14 | 2013-12-03 | WD Media, LLC | Perpendicular magnetic recording medium with single domain exchange-coupled soft magnetic underlayer and device incorporating same |
WO2009116412A1 (ja) | 2008-03-17 | 2009-09-24 | Hoya株式会社 | 磁気記録媒体及び磁気記録媒体の製造方法 |
JP5117895B2 (ja) | 2008-03-17 | 2013-01-16 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気記録媒体及びその製造方法 |
JP2009238298A (ja) | 2008-03-26 | 2009-10-15 | Hoya Corp | 垂直磁気記録媒体および垂直磁気記録媒体の製造方法 |
JP2009238299A (ja) | 2008-03-26 | 2009-10-15 | Hoya Corp | 垂直磁気記録媒体および垂直磁気記録媒体の製造方法 |
JP2009245478A (ja) | 2008-03-28 | 2009-10-22 | Hoya Corp | 垂直磁気記録媒体の製造方法および垂直磁気記録媒体 |
JP2009245490A (ja) | 2008-03-29 | 2009-10-22 | Hoya Corp | 垂直磁気記録媒体の製造方法および垂直磁気記録媒体 |
JP5134413B2 (ja) | 2008-03-30 | 2013-01-30 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気ディスク及びその製造方法 |
WO2009123043A1 (ja) | 2008-03-30 | 2009-10-08 | Hoya株式会社 | 磁気ディスク及びその製造方法 |
JP2011034603A (ja) | 2008-03-31 | 2011-02-17 | Hoya Corp | 垂直磁気記録媒体 |
US7944165B1 (en) | 2008-05-02 | 2011-05-17 | Wd Media, Inc. | Inspection system with dual encoders |
US8394243B1 (en) | 2008-07-24 | 2013-03-12 | Wd Media, Inc. | Sputtered cobalt oxide for perpendicular magnetic recording medium with low media noise |
US8871368B2 (en) | 2008-09-16 | 2014-10-28 | Wd Media (Singapore) Pte. Ltd. | Perpendicular magnetic recording medium and process for manufacture thereof |
WO2010032767A1 (ja) | 2008-09-16 | 2010-03-25 | Hoya株式会社 | 垂直磁気記録媒体 |
US7924519B2 (en) | 2008-09-29 | 2011-04-12 | Wd Media, Inc. | Eccentricity determination for a disk |
WO2010038773A1 (ja) | 2008-09-30 | 2010-04-08 | Hoya株式会社 | 磁気ディスク及びその製造方法 |
US8488276B1 (en) | 2008-09-30 | 2013-07-16 | WD Media, LLC | Perpendicular magnetic recording medium with grain isolation magnetic anistropy layer |
WO2010064724A1 (ja) | 2008-12-05 | 2010-06-10 | Hoya株式会社 | 磁気ディスク及びその製造方法 |
WO2010067830A1 (ja) | 2008-12-09 | 2010-06-17 | Hoya株式会社 | 磁気記録媒体および磁気記録媒体の製造方法 |
US8002901B1 (en) | 2009-01-15 | 2011-08-23 | Wd Media, Inc. | Temperature dependent pull speeds for drying of a wet cleaned workpiece |
US8562748B1 (en) | 2009-01-30 | 2013-10-22 | WD Media, LLC | Multiple cleaning processes in a single tank |
US8137517B1 (en) | 2009-02-10 | 2012-03-20 | Wd Media, Inc. | Dual position DC magnetron assembly |
US8163093B1 (en) | 2009-02-11 | 2012-04-24 | Wd Media, Inc. | Cleaning operations with dwell time |
JP2012069173A (ja) | 2009-02-19 | 2012-04-05 | Hoya Corp | 磁気記録媒体 |
US8846137B2 (en) | 2009-02-19 | 2014-09-30 | Wd Media (Singapore) Pte. Ltd. | Method of manufacturing a magnetic disk |
JP5638814B2 (ja) | 2009-02-23 | 2014-12-10 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 片面垂直磁気記録媒体 |
US8171949B1 (en) | 2009-03-06 | 2012-05-08 | Wd Media, Inc. | Fluid flow management |
JP2010250929A (ja) | 2009-03-27 | 2010-11-04 | Wd Media Singapore Pte Ltd | 磁気ディスク用潤滑剤化合物、磁気ディスク及びその製造方法 |
US9558778B2 (en) | 2009-03-28 | 2017-01-31 | Wd Media (Singapore) Pte. Ltd. | Lubricant compound for magnetic disk and magnetic disk |
JP5583997B2 (ja) | 2009-03-30 | 2014-09-03 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気記録媒体 |
US8431258B2 (en) | 2009-03-30 | 2013-04-30 | Wd Media (Singapore) Pte. Ltd. | Perpendicular magnetic recording medium and method of manufacturing the same |
JP5645443B2 (ja) | 2009-03-31 | 2014-12-24 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気記録媒体 |
JP5646865B2 (ja) | 2009-03-31 | 2014-12-24 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気記録媒体および垂直磁気記録媒体の製造方法 |
JP5360892B2 (ja) | 2009-05-24 | 2013-12-04 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気記録媒体の製造方法 |
US20100300884A1 (en) | 2009-05-26 | 2010-12-02 | Wd Media, Inc. | Electro-deposited passivation coatings for patterned media |
US8404056B1 (en) | 2009-05-27 | 2013-03-26 | WD Media, LLC | Process control for a sonication cleaning tank |
US8101054B2 (en) | 2009-05-28 | 2012-01-24 | Wd Media, Inc. | Magnetic particle trapper for a disk sputtering system |
JP5360894B2 (ja) | 2009-06-30 | 2013-12-04 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気記録媒体の製造方法 |
JP2011018426A (ja) | 2009-07-10 | 2011-01-27 | Wd Media Singapore Pte Ltd | 垂直磁気記録媒体の評価方法及び垂直磁気記録媒体の製造方法 |
JP2011021165A (ja) | 2009-07-21 | 2011-02-03 | Wd Media Singapore Pte Ltd | 磁気ディスク用潤滑剤及び磁気ディスク |
WO2011021652A1 (ja) | 2009-08-20 | 2011-02-24 | 昭和電工株式会社 | 熱アシスト磁気記録媒体及び磁気記憶装置 |
US8247095B2 (en) | 2009-08-21 | 2012-08-21 | Western Digital Technologies, Inc. | Energy assisted discrete track media with heat sink |
US8492009B1 (en) | 2009-08-25 | 2013-07-23 | Wd Media, Inc. | Electrochemical etching of magnetic recording layer |
JP5412216B2 (ja) | 2009-09-07 | 2014-02-12 | 昭和電工株式会社 | 熱アシスト磁気記録媒体及び磁気記憶装置 |
US7998912B2 (en) | 2009-09-14 | 2011-08-16 | Wd Media, Inc. | Composite lubricant for hard disk media |
US8206789B2 (en) | 2009-11-03 | 2012-06-26 | Wd Media, Inc. | Glass substrates and methods of annealing the same |
US8402638B1 (en) | 2009-11-06 | 2013-03-26 | Wd Media, Inc. | Press system with embossing foil free to expand for nano-imprinting of recording media |
US8496466B1 (en) | 2009-11-06 | 2013-07-30 | WD Media, LLC | Press system with interleaved embossing foil holders for nano-imprinting of recording media |
US8173282B1 (en) | 2009-12-11 | 2012-05-08 | Wd Media, Inc. | Perpendicular magnetic recording medium with an ordering temperature reducing layer |
US8406918B2 (en) | 2009-12-21 | 2013-03-26 | WD Media, LLC | Master teaching jig |
JP5643508B2 (ja) | 2009-12-28 | 2014-12-17 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気記録媒体の製造方法 |
US8399809B1 (en) | 2010-01-05 | 2013-03-19 | Wd Media, Inc. | Load chamber with heater for a disk sputtering system |
JP5643516B2 (ja) | 2010-01-08 | 2014-12-17 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気記録媒体 |
JP5617112B2 (ja) | 2010-01-14 | 2014-11-05 | 独立行政法人物質・材料研究機構 | 垂直磁気記録媒体及びその製造方法 |
JP5670638B2 (ja) | 2010-01-26 | 2015-02-18 | 昭和電工株式会社 | 熱アシスト磁気記録媒体及び磁気記録再生装置 |
JP5561766B2 (ja) | 2010-02-04 | 2014-07-30 | 昭和電工株式会社 | 熱アシスト磁気記録媒体及び磁気記憶装置 |
CN102163433B (zh) | 2010-02-23 | 2013-12-25 | 昭和电工株式会社 | 热辅助磁记录介质和磁存储装置 |
US8596287B1 (en) | 2010-03-01 | 2013-12-03 | WD Media, LLC | Cross flow tank |
US8218260B2 (en) | 2010-03-05 | 2012-07-10 | Wd Media, Inc. | Processing disks on a spin stand |
US8331056B2 (en) | 2010-03-05 | 2012-12-11 | Wd Media, Inc. | Spin stand comprising a dual disk clamp |
US8125723B1 (en) | 2010-03-05 | 2012-02-28 | Wd Media, Inc. | Predictive characterization of adjacent track erasure in recording media |
US8125724B1 (en) | 2010-03-11 | 2012-02-28 | Wd Media, Inc. | Predictive characterization of adjacent track erasure in recording media |
US8608147B1 (en) | 2010-03-19 | 2013-12-17 | WD Media, LLC | Workpiece carrier |
JP5574414B2 (ja) | 2010-03-29 | 2014-08-20 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気ディスクの評価方法及び磁気ディスクの製造方法 |
JP5570270B2 (ja) | 2010-03-29 | 2014-08-13 | 昭和電工株式会社 | 熱アシスト磁気記録媒体及び磁気記憶装置 |
JP5646199B2 (ja) | 2010-03-31 | 2014-12-24 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気ディスク |
JP5485770B2 (ja) | 2010-03-31 | 2014-05-07 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気ディスク装置 |
JP2011216141A (ja) | 2010-03-31 | 2011-10-27 | Wd Media Singapore Pte Ltd | 垂直磁気ディスクの製造方法 |
JP5916985B2 (ja) | 2010-03-31 | 2016-05-11 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 熱アシスト記録用磁気ディスクへの磁気記録方法 |
US8524052B1 (en) | 2010-04-02 | 2013-09-03 | WD Media, LLC | Cooling shower plate for disk manufacture |
US8397751B1 (en) | 2010-04-15 | 2013-03-19 | Wd Media, Inc. | Vortex reducer |
JP5638281B2 (ja) | 2010-04-30 | 2014-12-10 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気ディスク |
US8591709B1 (en) | 2010-05-18 | 2013-11-26 | WD Media, LLC | Sputter deposition shield assembly to reduce cathode shorting |
JP5645476B2 (ja) | 2010-05-21 | 2014-12-24 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気ディスク |
JP5634749B2 (ja) | 2010-05-21 | 2014-12-03 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気ディスク |
JP2011248966A (ja) | 2010-05-28 | 2011-12-08 | Wd Media (Singapore) Pte. Ltd | 垂直磁気記録媒体 |
JP2011248969A (ja) | 2010-05-28 | 2011-12-08 | Wd Media (Singapore) Pte. Ltd | 垂直磁気ディスク |
JP2011248967A (ja) | 2010-05-28 | 2011-12-08 | Wd Media (Singapore) Pte. Ltd | 垂直磁気ディスクの製造方法 |
JP2011248968A (ja) | 2010-05-28 | 2011-12-08 | Wd Media (Singapore) Pte. Ltd | 垂直磁気ディスク |
JP2011253597A (ja) | 2010-06-03 | 2011-12-15 | Wd Media (Singapore) Pte. Ltd | 垂直磁気記録媒体及びその製造方法 |
US8298609B1 (en) | 2010-06-14 | 2012-10-30 | Wd Media, Inc. | Method and system for interrogating the thickness of a carbon layer |
JP2012003805A (ja) | 2010-06-16 | 2012-01-05 | Wd Media (Singapore) Pte. Ltd | 垂直磁気記録媒体及び磁気ディスク装置 |
JP5743438B2 (ja) | 2010-06-22 | 2015-07-01 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気ディスク用潤滑剤、磁気ディスク及びその製造方法 |
JP2012009086A (ja) | 2010-06-22 | 2012-01-12 | Wd Media (Singapore) Pte. Ltd | 垂直磁気記録媒体及びその製造方法 |
JP5835874B2 (ja) | 2010-06-22 | 2015-12-24 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気ディスクの製造方法 |
JP5807944B2 (ja) | 2010-06-22 | 2015-11-10 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気記録媒体の製造方法 |
US8584687B1 (en) | 2010-06-25 | 2013-11-19 | WD Media, LLC | Sonication cleaning system |
US8551253B2 (en) | 2010-06-29 | 2013-10-08 | WD Media, LLC | Post polish disk cleaning process |
US8517657B2 (en) | 2010-06-30 | 2013-08-27 | WD Media, LLC | Corner chamber with heater |
US8354618B1 (en) | 2010-06-30 | 2013-01-15 | Wd Media, Inc. | Load chamber with dual heaters |
US8404369B2 (en) | 2010-08-03 | 2013-03-26 | WD Media, LLC | Electroless coated disks for high temperature applications and methods of making the same |
US8530065B1 (en) | 2010-08-10 | 2013-09-10 | WD Media, LLC | Composite magnetic recording medium |
US8316668B1 (en) | 2010-09-23 | 2012-11-27 | Wd Media, Inc. | Composite magnetic recording medium |
US8517364B1 (en) | 2010-10-07 | 2013-08-27 | WD Media, LLC | Disk holder with replaceable inserts to retain springs |
JP5127957B2 (ja) * | 2010-11-26 | 2013-01-23 | 株式会社東芝 | 磁気記録媒体、その製造方法、及び磁気記録再生装置 |
US8668953B1 (en) | 2010-12-28 | 2014-03-11 | WD Media, LLC | Annealing process for electroless coated disks for high temperature applications |
US8570844B1 (en) | 2011-02-01 | 2013-10-29 | Western Digital (Fremont), Llc | Absorption enhanced media for energy assisted magnetic recording |
US8743666B1 (en) | 2011-03-08 | 2014-06-03 | Western Digital Technologies, Inc. | Energy assisted magnetic recording medium capable of suppressing high DC readback noise |
US8711499B1 (en) | 2011-03-10 | 2014-04-29 | WD Media, LLC | Methods for measuring media performance associated with adjacent track interference |
US8491800B1 (en) | 2011-03-25 | 2013-07-23 | WD Media, LLC | Manufacturing of hard masks for patterning magnetic media |
US20120251842A1 (en) | 2011-03-31 | 2012-10-04 | Wd Media, Inc. | Low roughness heatsink design for heat assisted magnetic recording media |
US9028985B2 (en) | 2011-03-31 | 2015-05-12 | WD Media, LLC | Recording media with multiple exchange coupled magnetic layers |
JP5815837B2 (ja) | 2011-04-13 | 2015-11-17 | ロールス−ロイス コーポレイション | 金属基材上のイリジウムを含む界面拡散バリア層 |
US8609263B1 (en) | 2011-05-20 | 2013-12-17 | WD Media, LLC | Systems and methods for forming magnetic media with an underlayer |
US8619381B2 (en) | 2011-05-25 | 2013-12-31 | WD Media, LLC | System and method for improving head positioning |
US8834962B2 (en) | 2011-06-03 | 2014-09-16 | WD Media, LLC | Methods for improving the strength of glass substrates |
US8658292B1 (en) | 2011-06-10 | 2014-02-25 | Western Digital Technologies, Inc. | Systems and methods for controlling damping of magnetic media for assisted magnetic recording |
US8956741B1 (en) | 2011-06-30 | 2015-02-17 | WD Media, LLC | Magnetic recording media with small grain size and narrow c-axis dispersion by using dual seed layer with substrate bias |
US8599652B2 (en) | 2011-07-14 | 2013-12-03 | Tdk Corporation | Thermally-assisted magnetic recording medium and magnetic recording/reproducing device using the same |
US8758912B2 (en) | 2011-09-16 | 2014-06-24 | WD Media, LLC | Interlayers for magnetic recording media |
US8556566B1 (en) | 2011-09-30 | 2013-10-15 | WD Media, LLC | Disk stacking method and apparatus |
US8685214B1 (en) | 2011-09-30 | 2014-04-01 | WD Media, LLC | Magnetic shunting pads for optimizing target erosion in sputtering processes |
US8565050B1 (en) | 2011-12-20 | 2013-10-22 | WD Media, LLC | Heat assisted magnetic recording media having moment keeper layer |
US8696404B2 (en) | 2011-12-21 | 2014-04-15 | WD Media, LLC | Systems for recycling slurry materials during polishing processes |
JP5923324B2 (ja) | 2012-01-31 | 2016-05-24 | 昭和電工株式会社 | 熱アシスト磁気記録媒体及び磁気記録再生装置 |
JP5938224B2 (ja) | 2012-02-14 | 2016-06-22 | 昭和電工株式会社 | 磁気記録媒体及び磁気記録再生装置 |
US8605555B1 (en) | 2012-04-19 | 2013-12-10 | WD Media, LLC | Recording media with multiple bi-layers of heatsink layer and amorphous layer for energy assisted magnetic recording system and methods for fabricating the same |
US8674327B1 (en) | 2012-05-10 | 2014-03-18 | WD Media, LLC | Systems and methods for uniformly implanting materials on substrates using directed magnetic fields |
US8509039B1 (en) | 2012-06-28 | 2013-08-13 | HGST Netherlands B.V. | Thermally-assisted recording (TAR) disk with low thermal-conductivity underlayer |
US20140050843A1 (en) | 2012-08-17 | 2014-02-20 | Wd Media, Inc. | Dual single sided sputter chambers with sustaining heater |
JP2014041672A (ja) | 2012-08-22 | 2014-03-06 | Fuji Electric Co Ltd | 熱アシスト記録用磁気記録媒体 |
JP5961490B2 (ja) | 2012-08-29 | 2016-08-02 | 昭和電工株式会社 | 磁気記録媒体及び磁気記録再生装置 |
US9368142B2 (en) | 2012-09-27 | 2016-06-14 | Seagate Technology Llc | Magnetic stack including TiN-X intermediate layer |
US20140151360A1 (en) | 2012-11-30 | 2014-06-05 | Wd Media, Inc. | Heater assembly for disk processing system |
US20140234666A1 (en) | 2013-02-19 | 2014-08-21 | Wd Media, Inc. | Lubricants comprising pfpe terminated with benzene or functional benzene end groups for magnetic recording media structure |
US8787130B1 (en) | 2013-03-15 | 2014-07-22 | WD Media, LLC | Systems and methods for providing heat assisted magnetic recording media configured to couple energy from a near field transducer |
US8787124B1 (en) | 2013-07-30 | 2014-07-22 | WD Media, LLC | Systems and methods for extracting Curie temperature distribution in heat assisted magnetic recording media |
US10347281B2 (en) * | 2015-06-02 | 2019-07-09 | Western Digital Technologies, Inc. | Structures and methods for templated growth of high areal density heat assisted magnetic recording media |
-
2015
- 2015-03-31 US US14/674,185 patent/US9822441B2/en active Active
-
2016
- 2016-03-31 CN CN201610206138.6A patent/CN106024028B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1505006A (zh) * | 2002-11-28 | 2004-06-16 | ��ʽ���綫֥ | 垂直磁记录介质、其制造方法以及磁记录-再现装置 |
CN101192419A (zh) * | 2006-11-30 | 2008-06-04 | 株式会社东芝 | 垂直磁记录介质和磁记录/再现设备 |
CN101465130A (zh) * | 2007-12-20 | 2009-06-24 | 株式会社东芝 | 垂直磁记录介质和使用该介质的磁记录/再现装置 |
US20120052330A1 (en) * | 2010-08-26 | 2012-03-01 | Hitachi, Ltd. | Perpendicular magnetic recording medium and manufacturing method of the same |
US20130314815A1 (en) * | 2012-05-23 | 2013-11-28 | Wd Media, Inc. | Underlayers for heat assisted magnetic recording (hamr) media |
Also Published As
Publication number | Publication date |
---|---|
US20160293195A1 (en) | 2016-10-06 |
US9822441B2 (en) | 2017-11-21 |
CN106024028B (zh) | 2019-04-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8941950B2 (en) | Underlayers for heat assisted magnetic recording (HAMR) media | |
US8173282B1 (en) | Perpendicular magnetic recording medium with an ordering temperature reducing layer | |
JP4292226B1 (ja) | 垂直磁気記録媒体、及びこれを用いた磁気記録再生装置 | |
US7993762B2 (en) | Magnetic thin film and method of manufacturing the same, and various application devices using the same | |
EP1275110B1 (en) | Magnetic recording medium | |
CN104303230B (zh) | 磁记录介质和磁记录再生装置 | |
JP5332676B2 (ja) | 磁気記録媒体 | |
JP2008084413A (ja) | 磁気記録媒体、磁気記録媒体の製造方法及び磁気記録装置 | |
JP2009059431A (ja) | 磁気記録媒体および磁気記録再生装置 | |
CN106024028B (zh) | 用于热辅助磁记录介质的铱下层 | |
JP2005056555A (ja) | ハードディスクドライブのための傾斜媒体 | |
US9542968B1 (en) | Single layer small grain size FePT:C film for heat assisted magnetic recording media | |
JP2002100018A (ja) | 磁気記録媒体及びその製造方法並び磁気記憶装置 | |
JP2006155865A (ja) | 垂直磁気記録媒体および垂直磁気記録再生装置 | |
US8956741B1 (en) | Magnetic recording media with small grain size and narrow c-axis dispersion by using dual seed layer with substrate bias | |
JP6260742B2 (ja) | 磁気記録媒体 | |
US9824711B1 (en) | Soft underlayer for heat assisted magnetic recording media | |
US10276201B1 (en) | Dual phase MgO-X seed layers for heat assisted magnetic recording media | |
JP2009026394A (ja) | 磁気記録媒体及び磁気記録再生装置 | |
US8940418B1 (en) | Dynamic spring media with multiple exchange coupled hard-soft magnetic layers | |
JP2007102833A (ja) | 垂直磁気記録媒体 | |
CN101093673B (zh) | 垂直磁记录媒质 | |
US20160247531A1 (en) | Magnetic storage disc based on exchange-bias | |
JP2007102835A (ja) | 垂直磁気記録媒体 | |
US20190122696A1 (en) | Perpendicular recording media with carbon grain isolation initiation layer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190523 Address after: American California Patentee after: Western Digital Technologies, Inc. Address before: American California Patentee before: Wd Media Inc. |