BR9915674A - Tântalo de alto grau de pureza e produtos contendo o mesmo como alvos de crepitação - Google Patents

Tântalo de alto grau de pureza e produtos contendo o mesmo como alvos de crepitação

Info

Publication number
BR9915674A
BR9915674A BR9915674-1A BR9915674A BR9915674A BR 9915674 A BR9915674 A BR 9915674A BR 9915674 A BR9915674 A BR 9915674A BR 9915674 A BR9915674 A BR 9915674A
Authority
BR
Brazil
Prior art keywords
high purity
targets
tantalum metal
crackling
tantalum
Prior art date
Application number
BR9915674-1A
Other languages
English (en)
Portuguese (pt)
Inventor
Christopher A Michaluk
Louis E Huber Jr
James D Maguire Jr
Mark N Kawchak
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22738107&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BR9915674(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Cabot Corp filed Critical Cabot Corp
Publication of BR9915674A publication Critical patent/BR9915674A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B34/00—Obtaining refractory metals
    • C22B34/20—Obtaining niobium, tantalum or vanadium
    • C22B34/24—Obtaining niobium or tantalum
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/014—Capacitor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/158—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Powder Metallurgy (AREA)
BR9915674-1A 1998-11-25 1999-11-24 Tântalo de alto grau de pureza e produtos contendo o mesmo como alvos de crepitação BR9915674A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/199,569 US6348113B1 (en) 1998-11-25 1998-11-25 High purity tantalum, products containing the same, and methods of making the same
PCT/US1999/027832 WO2000031310A1 (en) 1998-11-25 1999-11-24 High purity tantalum and products containing the same like sputter targets

Publications (1)

Publication Number Publication Date
BR9915674A true BR9915674A (pt) 2002-01-22

Family

ID=22738107

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9915674-1A BR9915674A (pt) 1998-11-25 1999-11-24 Tântalo de alto grau de pureza e produtos contendo o mesmo como alvos de crepitação

Country Status (15)

Country Link
US (4) US6348113B1 (cg-RX-API-DMAC7.html)
EP (2) EP1137820B2 (cg-RX-API-DMAC7.html)
JP (3) JP4652574B2 (cg-RX-API-DMAC7.html)
KR (1) KR100624630B1 (cg-RX-API-DMAC7.html)
CN (2) CN101407881B (cg-RX-API-DMAC7.html)
AT (1) ATE279542T1 (cg-RX-API-DMAC7.html)
AU (1) AU764689B2 (cg-RX-API-DMAC7.html)
BR (1) BR9915674A (cg-RX-API-DMAC7.html)
CA (1) CA2352336A1 (cg-RX-API-DMAC7.html)
DE (1) DE69921181T3 (cg-RX-API-DMAC7.html)
ID (1) ID29867A (cg-RX-API-DMAC7.html)
MX (1) MXPA01005264A (cg-RX-API-DMAC7.html)
RU (1) RU2233899C2 (cg-RX-API-DMAC7.html)
TW (1) TW530091B (cg-RX-API-DMAC7.html)
WO (1) WO2000031310A1 (cg-RX-API-DMAC7.html)

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EP1137820B2 (en) 2014-03-26
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AU1920400A (en) 2000-06-13
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