ATE530951T1 - Lichtempfindliche harzzusammensetzung - Google Patents
Lichtempfindliche harzzusammensetzungInfo
- Publication number
- ATE530951T1 ATE530951T1 AT02758358T AT02758358T ATE530951T1 AT E530951 T1 ATE530951 T1 AT E530951T1 AT 02758358 T AT02758358 T AT 02758358T AT 02758358 T AT02758358 T AT 02758358T AT E530951 T1 ATE530951 T1 AT E530951T1
- Authority
- AT
- Austria
- Prior art keywords
- polyol
- carboxylic acid
- resin composition
- photosensitive resin
- pigmented
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title 1
- 229920000642 polymer Polymers 0.000 abstract 2
- 229920005862 polyol Polymers 0.000 abstract 2
- 150000003077 polyols Chemical class 0.000 abstract 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 1
- 125000002843 carboxylic acid group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 230000005670 electromagnetic radiation Effects 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
- C07D295/112—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
- C07D295/135—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Optical Filters (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01810734 | 2001-07-26 | ||
PCT/EP2002/007989 WO2003010602A1 (en) | 2001-07-26 | 2002-07-18 | Photosensitive resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE530951T1 true ATE530951T1 (de) | 2011-11-15 |
Family
ID=8184052
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT02758358T ATE530951T1 (de) | 2001-07-26 | 2002-07-18 | Lichtempfindliche harzzusammensetzung |
Country Status (9)
Country | Link |
---|---|
US (3) | US7247659B2 (de) |
EP (1) | EP1410109B1 (de) |
JP (1) | JP4312598B2 (de) |
KR (1) | KR100908795B1 (de) |
CN (1) | CN1327293C (de) |
AT (1) | ATE530951T1 (de) |
CA (1) | CA2453237A1 (de) |
ES (1) | ES2375471T3 (de) |
WO (1) | WO2003010602A1 (de) |
Families Citing this family (110)
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US7776504B2 (en) * | 2004-02-23 | 2010-08-17 | Nissan Chemical Industries, Ltd. | Dye-containing resist composition and color filter using same |
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KR100714977B1 (ko) * | 2005-07-29 | 2007-05-07 | 한국과학기술원 | 높은 회절 효율 및 낮은 부피 수축율을 갖는 유-무기하이브리드형 광고분자 조성물 |
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TWI428691B (zh) * | 2006-09-25 | 2014-03-01 | Fujifilm Corp | 硬化組成物、彩色濾光片及其製法 |
US20080088759A1 (en) * | 2006-10-02 | 2008-04-17 | Yuka Utsumi | Liquid Crystal Display Device |
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- 2002-07-18 WO PCT/EP2002/007989 patent/WO2003010602A1/en active Application Filing
- 2002-07-18 EP EP02758358A patent/EP1410109B1/de not_active Expired - Lifetime
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- 2002-07-18 CA CA002453237A patent/CA2453237A1/en not_active Abandoned
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Also Published As
Publication number | Publication date |
---|---|
US7247659B2 (en) | 2007-07-24 |
WO2003010602A8 (en) | 2003-08-07 |
KR20040030848A (ko) | 2004-04-09 |
JP2004536352A (ja) | 2004-12-02 |
US20070249748A1 (en) | 2007-10-25 |
KR100908795B1 (ko) | 2009-07-22 |
ES2375471T3 (es) | 2012-03-01 |
US20070259278A1 (en) | 2007-11-08 |
US7556843B2 (en) | 2009-07-07 |
CN1547683A (zh) | 2004-11-17 |
EP1410109A1 (de) | 2004-04-21 |
EP1410109B1 (de) | 2011-10-26 |
US20040192804A1 (en) | 2004-09-30 |
CA2453237A1 (en) | 2003-02-06 |
JP4312598B2 (ja) | 2009-08-12 |
WO2003010602A1 (en) | 2003-02-06 |
CN1327293C (zh) | 2007-07-18 |
US7425585B2 (en) | 2008-09-16 |
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