USD970566S1 - Sputter target for a physical vapor deposition chamber - Google Patents

Sputter target for a physical vapor deposition chamber Download PDF

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Publication number
USD970566S1
USD970566S1 US29/813,065 US202129813065F USD970566S US D970566 S1 USD970566 S1 US D970566S1 US 202129813065 F US202129813065 F US 202129813065F US D970566 S USD970566 S US D970566S
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vapor deposition
physical vapor
deposition chamber
sputter target
view
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Martin Riker
William Fruchterman
Ilya Lavitsky
Srinivasa Rao Yedla
Kirankumar Neelasandra Savandaiah
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Applied Materials Inc
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Applied Materials Inc
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Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: FRUCHTERMAN, WILLIAM, LAVITSKY, ILYA, SAVANDAIAH, KIRANKUMAR NEELASANDRA, YEDLA, Srinivasa Rao, RIKER, MARTIN
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FIG. 1 is a top isometric view of a sputter target for a physical vapor deposition chamber, according to our novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a right elevation view thereof.
FIG. 5 is a left elevation view thereof.
FIG. 6 is a front elevation view thereof.
FIG. 7 is a back elevation view thereof; and,
FIG. 8 is an enlarged cross-sectional view taken along line 8-8 in FIG. 2.
The dashed lines in FIGS. 1-8 represent unclaimed environment and form no part of the claimed design.

Claims (1)

    CLAIM
  1. We claim the ornamental design for a sputter target for a physical vapor deposition chamber, as shown and described.
US29/813,065 2020-03-23 2021-10-26 Sputter target for a physical vapor deposition chamber Active USD970566S1 (en)

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US29/813,065 USD970566S1 (en) 2020-03-23 2021-10-26 Sputter target for a physical vapor deposition chamber

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USD1104086S1 (en) * 2021-08-21 2025-12-02 Applied Materials, Inc. Gas distribution plate
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