TWI438857B - 浮上式基板搬送處理裝置及浮上式基板搬送處理方法 - Google Patents

浮上式基板搬送處理裝置及浮上式基板搬送處理方法 Download PDF

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Publication number
TWI438857B
TWI438857B TW099107296A TW99107296A TWI438857B TW I438857 B TWI438857 B TW I438857B TW 099107296 A TW099107296 A TW 099107296A TW 99107296 A TW99107296 A TW 99107296A TW I438857 B TWI438857 B TW I438857B
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TW
Taiwan
Prior art keywords
substrate
floating
processed
gas
suction
Prior art date
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TW099107296A
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English (en)
Chinese (zh)
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TW201025488A (en
Inventor
山崎剛
稻益壽史
篠崎賢哉
元田公男
Original Assignee
東京威力科創股份有限公司
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Publication of TW201025488A publication Critical patent/TW201025488A/zh
Application granted granted Critical
Publication of TWI438857B publication Critical patent/TWI438857B/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H10P72/0448—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
    • H10P72/3314—
    • H10P72/36—
    • H10P72/78—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Liquid Crystal (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
TW099107296A 2005-07-19 2006-07-18 浮上式基板搬送處理裝置及浮上式基板搬送處理方法 TWI438857B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005208851A JP4553376B2 (ja) 2005-07-19 2005-07-19 浮上式基板搬送処理装置及び浮上式基板搬送処理方法

Publications (2)

Publication Number Publication Date
TW201025488A TW201025488A (en) 2010-07-01
TWI438857B true TWI438857B (zh) 2014-05-21

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
TW099107296A TWI438857B (zh) 2005-07-19 2006-07-18 浮上式基板搬送處理裝置及浮上式基板搬送處理方法
TW095126266A TWI336113B (en) 2005-07-19 2006-07-18 Surfacing type substrate transportation processing apparatus and surfacing type substrate transportation processing method

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW095126266A TWI336113B (en) 2005-07-19 2006-07-18 Surfacing type substrate transportation processing apparatus and surfacing type substrate transportation processing method

Country Status (4)

Country Link
US (1) US7905195B2 (enExample)
JP (1) JP4553376B2 (enExample)
KR (1) KR101100486B1 (enExample)
TW (2) TWI438857B (enExample)

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Also Published As

Publication number Publication date
KR20070011153A (ko) 2007-01-24
TWI336113B (en) 2011-01-11
US7905195B2 (en) 2011-03-15
US20070017442A1 (en) 2007-01-25
KR101100486B1 (ko) 2011-12-29
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TW200731449A (en) 2007-08-16
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