JP4553376B2 - 浮上式基板搬送処理装置及び浮上式基板搬送処理方法 - Google Patents
浮上式基板搬送処理装置及び浮上式基板搬送処理方法 Download PDFInfo
- Publication number
- JP4553376B2 JP4553376B2 JP2005208851A JP2005208851A JP4553376B2 JP 4553376 B2 JP4553376 B2 JP 4553376B2 JP 2005208851 A JP2005208851 A JP 2005208851A JP 2005208851 A JP2005208851 A JP 2005208851A JP 4553376 B2 JP4553376 B2 JP 4553376B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- floating
- processed
- suction
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- H10P72/0448—
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- H10P72/3314—
-
- H10P72/36—
-
- H10P72/78—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Liquid Crystal (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005208851A JP4553376B2 (ja) | 2005-07-19 | 2005-07-19 | 浮上式基板搬送処理装置及び浮上式基板搬送処理方法 |
| US11/486,005 US7905195B2 (en) | 2005-07-19 | 2006-07-14 | Floating-type substrate conveying and processing apparatus |
| TW095126266A TWI336113B (en) | 2005-07-19 | 2006-07-18 | Surfacing type substrate transportation processing apparatus and surfacing type substrate transportation processing method |
| TW099107296A TWI438857B (zh) | 2005-07-19 | 2006-07-18 | 浮上式基板搬送處理裝置及浮上式基板搬送處理方法 |
| KR1020060067297A KR101100486B1 (ko) | 2005-07-19 | 2006-07-19 | 부상식 기판 반송 처리 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005208851A JP4553376B2 (ja) | 2005-07-19 | 2005-07-19 | 浮上式基板搬送処理装置及び浮上式基板搬送処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007027495A JP2007027495A (ja) | 2007-02-01 |
| JP2007027495A5 JP2007027495A5 (enExample) | 2007-07-05 |
| JP4553376B2 true JP4553376B2 (ja) | 2010-09-29 |
Family
ID=37677905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005208851A Expired - Fee Related JP4553376B2 (ja) | 2005-07-19 | 2005-07-19 | 浮上式基板搬送処理装置及び浮上式基板搬送処理方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7905195B2 (enExample) |
| JP (1) | JP4553376B2 (enExample) |
| KR (1) | KR101100486B1 (enExample) |
| TW (2) | TWI438857B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110404717A (zh) * | 2019-06-14 | 2019-11-05 | 上海维誉自动化设备有限公司 | 一种自动喷涂线 |
Families Citing this family (77)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007105455A1 (ja) * | 2006-02-28 | 2007-09-20 | Ulvac, Inc. | ステージ装置 |
| CN101410761A (zh) * | 2006-06-14 | 2009-04-15 | 日本精工株式会社 | 曝光装置 |
| JP5047545B2 (ja) * | 2006-06-30 | 2012-10-10 | 株式会社妙徳 | 浮上搬送ユニット |
| JP4652351B2 (ja) * | 2007-02-02 | 2011-03-16 | 大日本印刷株式会社 | 基板支持装置、基板支持方法 |
| JP4743716B2 (ja) * | 2007-03-06 | 2011-08-10 | 東京エレクトロン株式会社 | 基板処理装置 |
| JP5188759B2 (ja) * | 2007-08-07 | 2013-04-24 | 東京応化工業株式会社 | 塗布装置及び塗布方法 |
| JP2009043829A (ja) * | 2007-08-07 | 2009-02-26 | Tokyo Ohka Kogyo Co Ltd | 塗布装置及び塗布方法 |
| JP4982292B2 (ja) * | 2007-08-07 | 2012-07-25 | 東京応化工業株式会社 | 塗布装置及び塗布方法 |
| JP4942589B2 (ja) * | 2007-08-30 | 2012-05-30 | 東京応化工業株式会社 | 塗布装置及び塗布方法 |
| JP4384686B2 (ja) * | 2007-09-25 | 2009-12-16 | 東京エレクトロン株式会社 | 常圧乾燥装置及び基板処理装置及び基板処理方法 |
| JP4991495B2 (ja) * | 2007-11-26 | 2012-08-01 | 東京エレクトロン株式会社 | 検査用保持部材及び検査用保持部材の製造方法 |
| JP5029486B2 (ja) * | 2008-05-13 | 2012-09-19 | 東京エレクトロン株式会社 | 塗布装置、塗布方法及び記憶媒体 |
| JP5012651B2 (ja) | 2008-05-14 | 2012-08-29 | 東京エレクトロン株式会社 | 塗布装置、塗布方法、塗布、現像装置及び記憶媒体 |
| JP4857312B2 (ja) * | 2008-07-16 | 2012-01-18 | シャープ株式会社 | 基板搬送装置 |
| JP4972618B2 (ja) * | 2008-08-05 | 2012-07-11 | シャープ株式会社 | 基板搬送装置 |
| JP2010037082A (ja) * | 2008-08-07 | 2010-02-18 | Sharp Corp | 基板搬送装置および基板搬送方法 |
| KR101296659B1 (ko) * | 2008-11-14 | 2013-08-14 | 엘지디스플레이 주식회사 | 세정 장치 |
| US20110042874A1 (en) * | 2009-08-20 | 2011-02-24 | Nikon Corporation | Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method |
| JP5573849B2 (ja) * | 2009-08-20 | 2014-08-20 | 株式会社ニコン | 物体処理装置、露光装置及び露光方法、並びにデバイス製造方法 |
| US8699001B2 (en) * | 2009-08-20 | 2014-04-15 | Nikon Corporation | Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method |
| KR101069600B1 (ko) | 2009-09-01 | 2011-10-05 | 주식회사 케이씨텍 | 부상식 기판 코터 장치 및 그 코팅 방법 |
| WO2012119034A2 (en) * | 2011-03-02 | 2012-09-07 | Game Changers, Llc | Method and apparatus for a dynamic air cushion transport system |
| JP4919115B2 (ja) * | 2009-09-24 | 2012-04-18 | 横河電機株式会社 | 放射線検査装置 |
| KR101158267B1 (ko) * | 2009-10-26 | 2012-06-19 | 주식회사 나래나노텍 | 기판 부상 유닛에 사용되는 부상 플레이트, 및 이를 구비한 기판 부상 유닛, 기판 이송 장치 및 코팅 장치 |
| KR101141146B1 (ko) * | 2009-12-30 | 2012-05-02 | 주식회사 케이씨텍 | 기판 반송 방법 |
| KR101099555B1 (ko) * | 2010-01-12 | 2011-12-28 | 세메스 주식회사 | 기판 처리 장치 |
| US20110239231A1 (en) * | 2010-03-23 | 2011-09-29 | International Business Machines Corporation | Migrating electronic document version contents and version metadata as a collection with a single operation |
| JP5465595B2 (ja) * | 2010-05-10 | 2014-04-09 | オイレス工業株式会社 | 非接触搬送装置 |
| EP2388808A1 (de) * | 2010-05-20 | 2011-11-23 | Westfälische Wilhelms-Universität Münster | Berührungsloses Transportsystem |
| US8598538B2 (en) | 2010-09-07 | 2013-12-03 | Nikon Corporation | Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method |
| KR20140004113A (ko) * | 2010-12-24 | 2014-01-10 | 오일레스고교 가부시키가이샤 | 상승류 형성체 및 이 상승류 형성체를 이용한 비접촉 반송장치 |
| JP5663297B2 (ja) * | 2010-12-27 | 2015-02-04 | 東京応化工業株式会社 | 塗布装置 |
| CN102543662B (zh) * | 2010-12-30 | 2016-02-03 | 上海微电子装备有限公司 | 热盘及应用其的硅片加热系统 |
| KR20140031180A (ko) * | 2011-01-14 | 2014-03-12 | 오일레스고교 가부시키가이샤 | 비접촉 반송장치 |
| US9136155B2 (en) * | 2011-11-17 | 2015-09-15 | Lam Research Ag | Method and device for processing wafer shaped articles |
| KR101312364B1 (ko) * | 2011-12-22 | 2013-09-27 | 주식회사 나래나노텍 | 기판 착탈 장치 및 방법, 및 이를 구비한 코팅 장치 및 방법 |
| JP5912642B2 (ja) * | 2012-02-20 | 2016-04-27 | 日本電気硝子株式会社 | ガラス板の搬送装置及びその搬送方法 |
| TWI527747B (zh) * | 2012-02-28 | 2016-04-01 | 炭研軸封精工股份有限公司 | 非接觸吸著盤 |
| KR101423822B1 (ko) * | 2012-06-28 | 2014-07-28 | 세메스 주식회사 | 웨이퍼 이송을 위한 비접촉 척 |
| JP5987528B2 (ja) * | 2012-07-30 | 2016-09-07 | 株式会社タンケンシールセーコウ | 浮上装置 |
| US9387993B2 (en) * | 2012-10-30 | 2016-07-12 | Nissan Motor Co., Ltd. | Conveyor apparatus |
| JP2014218342A (ja) * | 2013-05-09 | 2014-11-20 | オイレス工業株式会社 | 支持用エアプレートおよびその気体流抵抗器 |
| JP6226419B2 (ja) * | 2013-08-22 | 2017-11-08 | オイレス工業株式会社 | 浮上搬送装置 |
| JP6339341B2 (ja) * | 2013-10-11 | 2018-06-06 | 平田機工株式会社 | 処理システム及び処理方法 |
| JP6270114B2 (ja) * | 2013-11-20 | 2018-01-31 | 東レエンジニアリング株式会社 | 基板浮上装置 |
| CN106232867B (zh) * | 2014-04-18 | 2019-01-08 | 株式会社尼康 | 膜形成设备、基板处理设备和装置制造方法 |
| KR102059313B1 (ko) * | 2014-04-30 | 2019-12-24 | 카티바, 인크. | 가스 쿠션 장비 및 기판 코팅 기술 |
| US10332770B2 (en) * | 2014-09-24 | 2019-06-25 | Sandisk Technologies Llc | Wafer transfer system |
| JP6949455B2 (ja) | 2014-12-24 | 2021-10-13 | 株式会社タンケンシールセーコウ | 非接触搬送装置、および非接触吸着盤 |
| JP6712411B2 (ja) * | 2015-03-30 | 2020-06-24 | 株式会社ニコン | 物体搬送装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、物体搬送方法、及び露光方法 |
| KR102584657B1 (ko) * | 2015-03-31 | 2023-10-04 | 가부시키가이샤 니콘 | 노광 장치, 플랫 패널 디스플레이의 제조 방법, 디바이스 제조 방법, 및 노광 방법 |
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| CN113485074A (zh) * | 2016-07-01 | 2021-10-08 | Asml荷兰有限公司 | 用于工作台系统的载物台 |
| JP6854605B2 (ja) * | 2016-08-29 | 2021-04-07 | 株式会社日本製鋼所 | レーザ照射装置、レーザ照射方法、及び半導体装置の製造方法 |
| JP6910518B2 (ja) * | 2016-08-29 | 2021-07-28 | 株式会社日本製鋼所 | レーザ照射装置 |
| JP6917691B2 (ja) * | 2016-10-04 | 2021-08-11 | 株式会社日本製鋼所 | レーザ照射装置、レーザ照射方法、及び半導体装置の製造方法 |
| JP6819373B2 (ja) * | 2017-03-10 | 2021-01-27 | 株式会社Ihi | 浮上装置及びテンション検出装置 |
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| JP6983578B2 (ja) * | 2017-08-25 | 2021-12-17 | 株式会社日本製鋼所 | レーザ照射装置、レーザ照射方法、及び半導体装置の製造方法 |
| WO2019186402A1 (en) * | 2018-03-28 | 2019-10-03 | Biemme Elettrica Di Bertola Massimo | Device for coating, in particular painting, the main surfaces of rigid panels with liquid products |
| JP7034817B2 (ja) * | 2018-04-19 | 2022-03-14 | 株式会社日本製鋼所 | レーザ処理装置及び半導体装置の製造方法 |
| JP7110005B2 (ja) * | 2018-06-20 | 2022-08-01 | キヤノン株式会社 | 基板回転装置、基板回転方法、リソグラフィ装置、および物品製造方法 |
| CN109633939B (zh) * | 2018-12-27 | 2024-04-16 | 苏州精濑光电有限公司 | 一种lcd检测设备 |
| US20200266092A1 (en) * | 2019-02-19 | 2020-08-20 | Corning Incorporated | Apparatuses and methods for non-contact holding and measurement of thin substrates |
| JP7299790B2 (ja) * | 2019-08-05 | 2023-06-28 | 東レエンジニアリング株式会社 | 基板浮上搬送装置及び基板浮上搬送装置の基板位置補正方法 |
| JP7336955B2 (ja) * | 2019-10-10 | 2023-09-01 | 東京エレクトロン株式会社 | 基板処理システム、及び基板処理方法 |
| KR102268617B1 (ko) * | 2019-10-16 | 2021-06-23 | 세메스 주식회사 | 기판 처리 장치 |
| CN113130368B (zh) * | 2021-04-13 | 2024-09-24 | 南京中安半导体设备有限责任公司 | 气浮卡盘及晶圆几何参数测量装置 |
| JP7095166B2 (ja) * | 2020-08-21 | 2022-07-04 | Jswアクティナシステム株式会社 | レーザ照射装置、レーザ照射方法、及び半導体装置の製造方法 |
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-
2005
- 2005-07-19 JP JP2005208851A patent/JP4553376B2/ja not_active Expired - Fee Related
-
2006
- 2006-07-14 US US11/486,005 patent/US7905195B2/en not_active Expired - Fee Related
- 2006-07-18 TW TW099107296A patent/TWI438857B/zh not_active IP Right Cessation
- 2006-07-18 TW TW095126266A patent/TWI336113B/zh not_active IP Right Cessation
- 2006-07-19 KR KR1020060067297A patent/KR101100486B1/ko not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110404717A (zh) * | 2019-06-14 | 2019-11-05 | 上海维誉自动化设备有限公司 | 一种自动喷涂线 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070011153A (ko) | 2007-01-24 |
| TWI336113B (en) | 2011-01-11 |
| US7905195B2 (en) | 2011-03-15 |
| US20070017442A1 (en) | 2007-01-25 |
| KR101100486B1 (ko) | 2011-12-29 |
| JP2007027495A (ja) | 2007-02-01 |
| TW200731449A (en) | 2007-08-16 |
| TW201025488A (en) | 2010-07-01 |
| TWI438857B (zh) | 2014-05-21 |
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