TWI336113B - Surfacing type substrate transportation processing apparatus and surfacing type substrate transportation processing method - Google Patents

Surfacing type substrate transportation processing apparatus and surfacing type substrate transportation processing method Download PDF

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Publication number
TWI336113B
TWI336113B TW095126266A TW95126266A TWI336113B TW I336113 B TWI336113 B TW I336113B TW 095126266 A TW095126266 A TW 095126266A TW 95126266 A TW95126266 A TW 95126266A TW I336113 B TWI336113 B TW I336113B
Authority
TW
Taiwan
Prior art keywords
substrate
floating
processed
gas
pedestal
Prior art date
Application number
TW095126266A
Other languages
English (en)
Chinese (zh)
Other versions
TW200731449A (en
Inventor
Tsuyoshi Yamasaki
Toshifumi Inamasu
Kenya Shinozaki
Kimio Motoda
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200731449A publication Critical patent/TW200731449A/zh
Application granted granted Critical
Publication of TWI336113B publication Critical patent/TWI336113B/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3314—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/36—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations using air tracks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Coating Apparatus (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
TW095126266A 2005-07-19 2006-07-18 Surfacing type substrate transportation processing apparatus and surfacing type substrate transportation processing method TWI336113B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005208851A JP4553376B2 (ja) 2005-07-19 2005-07-19 浮上式基板搬送処理装置及び浮上式基板搬送処理方法

Publications (2)

Publication Number Publication Date
TW200731449A TW200731449A (en) 2007-08-16
TWI336113B true TWI336113B (en) 2011-01-11

Family

ID=37677905

Family Applications (2)

Application Number Title Priority Date Filing Date
TW095126266A TWI336113B (en) 2005-07-19 2006-07-18 Surfacing type substrate transportation processing apparatus and surfacing type substrate transportation processing method
TW099107296A TWI438857B (zh) 2005-07-19 2006-07-18 浮上式基板搬送處理裝置及浮上式基板搬送處理方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW099107296A TWI438857B (zh) 2005-07-19 2006-07-18 浮上式基板搬送處理裝置及浮上式基板搬送處理方法

Country Status (4)

Country Link
US (1) US7905195B2 (https=)
JP (1) JP4553376B2 (https=)
KR (1) KR101100486B1 (https=)
TW (2) TWI336113B (https=)

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Also Published As

Publication number Publication date
JP4553376B2 (ja) 2010-09-29
TWI438857B (zh) 2014-05-21
TW201025488A (en) 2010-07-01
KR101100486B1 (ko) 2011-12-29
US7905195B2 (en) 2011-03-15
US20070017442A1 (en) 2007-01-25
JP2007027495A (ja) 2007-02-01
KR20070011153A (ko) 2007-01-24
TW200731449A (en) 2007-08-16

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