TW201234414A - A cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method - Google Patents

A cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method Download PDF

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Publication number
TW201234414A
TW201234414A TW101110471A TW101110471A TW201234414A TW 201234414 A TW201234414 A TW 201234414A TW 101110471 A TW101110471 A TW 101110471A TW 101110471 A TW101110471 A TW 101110471A TW 201234414 A TW201234414 A TW 201234414A
Authority
TW
Taiwan
Prior art keywords
liquid
cleaning
outlet
cleaned
substrate
Prior art date
Application number
TW101110471A
Other languages
English (en)
Chinese (zh)
Inventor
Jong Anthonius Martinus Cornelis Petrus De
Marco Koert Stavenga
Bauke Jansen
Raymond Gerardus Marius Beeren
Kornelis Tijmen Hoekerd
Jansen Hans
Peter Franciscus Wanten
Johannes Wilhelmus Jacobus Leonardus Cuijpers
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW201234414A publication Critical patent/TW201234414A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW101110471A 2007-05-04 2008-04-22 A cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method TW201234414A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US92424407P 2007-05-04 2007-05-04
US11/819,949 US9013672B2 (en) 2007-05-04 2007-06-29 Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method

Publications (1)

Publication Number Publication Date
TW201234414A true TW201234414A (en) 2012-08-16

Family

ID=39938698

Family Applications (2)

Application Number Title Priority Date Filing Date
TW101110471A TW201234414A (en) 2007-05-04 2008-04-22 A cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
TW97114672A TWI385711B (zh) 2007-05-04 2008-04-22 清潔器件、微影裝置及微影裝置清潔方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW97114672A TWI385711B (zh) 2007-05-04 2008-04-22 清潔器件、微影裝置及微影裝置清潔方法

Country Status (5)

Country Link
US (3) US9013672B2 (https=)
JP (7) JP4686571B2 (https=)
KR (2) KR101024566B1 (https=)
CN (1) CN101299133B (https=)
TW (2) TW201234414A (https=)

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