TW200424767A - Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method - Google Patents
Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method Download PDFInfo
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- TW200424767A TW200424767A TW093103779A TW93103779A TW200424767A TW 200424767 A TW200424767 A TW 200424767A TW 093103779 A TW093103779 A TW 093103779A TW 93103779 A TW93103779 A TW 93103779A TW 200424767 A TW200424767 A TW 200424767A
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- Prior art keywords
- photoresist
- film
- immersion exposure
- liquid immersion
- protective film
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- 238000007654 immersion Methods 0.000 title claims abstract description 112
- 238000000034 method Methods 0.000 title claims abstract description 53
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- 239000007788 liquid Substances 0.000 claims abstract description 156
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- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 210000000689 upper leg Anatomy 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Applications Claiming Priority (4)
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JP2003043394 | 2003-02-20 | ||
JP2003132288 | 2003-05-09 | ||
JP2003195409 | 2003-07-10 | ||
JP2003205001 | 2003-07-31 |
Publications (2)
Publication Number | Publication Date |
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TW200424767A true TW200424767A (en) | 2004-11-16 |
TWI311236B TWI311236B (US20060141400A1-20060629-C00004.png) | 2009-06-21 |
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Family Applications (1)
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TW093103779A TW200424767A (en) | 2003-02-20 | 2004-02-17 | Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method |
Country Status (6)
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- 2004-02-17 TW TW093103779A patent/TW200424767A/zh not_active IP Right Cessation
- 2004-02-20 WO PCT/JP2004/001956 patent/WO2004074937A1/ja active Application Filing
- 2004-02-20 KR KR1020057015228A patent/KR100853063B1/ko not_active IP Right Cessation
- 2004-02-20 JP JP2005502778A patent/JP4437473B2/ja not_active Expired - Lifetime
- 2004-02-20 EP EP04713169A patent/EP1596251A4/en not_active Withdrawn
- 2004-02-20 US US10/546,358 patent/US20060141400A1/en not_active Abandoned
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- 2007-02-06 US US11/702,602 patent/US7371510B2/en not_active Expired - Lifetime
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TWI502278B (zh) * | 2005-07-26 | 2015-10-01 | Fujifilm Corp | 正型光阻組成物及使用它之圖案形成方法 |
US8435718B2 (en) | 2005-10-27 | 2013-05-07 | Jsr Corporation | Upper layer-forming composition and photoresist patterning method |
TWI418942B (zh) * | 2005-10-27 | 2013-12-11 | Jsr Corp | Formation method of upper layer film forming composition and photoresist pattern |
Also Published As
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KR100853063B1 (ko) | 2008-08-19 |
WO2004074937A1 (ja) | 2004-09-02 |
KR20050106441A (ko) | 2005-11-09 |
TWI311236B (US20060141400A1-20060629-C00004.png) | 2009-06-21 |
US20060141400A1 (en) | 2006-06-29 |
JP4437473B2 (ja) | 2010-03-24 |
US7371510B2 (en) | 2008-05-13 |
EP1596251A1 (en) | 2005-11-16 |
US20070134593A1 (en) | 2007-06-14 |
EP1596251A4 (en) | 2009-05-20 |
JPWO2004074937A1 (ja) | 2006-06-01 |
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