SG148994A1 - Exposure apparatus, exposure method, method for producing device, and optical part - Google Patents

Exposure apparatus, exposure method, method for producing device, and optical part

Info

Publication number
SG148994A1
SG148994A1 SG200808930-2A SG2008089302A SG148994A1 SG 148994 A1 SG148994 A1 SG 148994A1 SG 2008089302 A SG2008089302 A SG 2008089302A SG 148994 A1 SG148994 A1 SG 148994A1
Authority
SG
Singapore
Prior art keywords
exposure
substrate
exposure apparatus
producing device
optical part
Prior art date
Application number
SG200808930-2A
Other languages
English (en)
Inventor
Ryuichi Hoshika
Hitoshi Ishizawa
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of SG148994A1 publication Critical patent/SG148994A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG200808930-2A 2003-12-03 2004-12-03 Exposure apparatus, exposure method, method for producing device, and optical part SG148994A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003404384 2003-12-03
JP2004042496 2004-02-19

Publications (1)

Publication Number Publication Date
SG148994A1 true SG148994A1 (en) 2009-01-29

Family

ID=34656211

Family Applications (3)

Application Number Title Priority Date Filing Date
SG200808930-2A SG148994A1 (en) 2003-12-03 2004-12-03 Exposure apparatus, exposure method, method for producing device, and optical part
SG200808929-4A SG148993A1 (en) 2003-12-03 2004-12-03 Exposure apparatus, exposure method, method for producing device, and optical part
SG2014014955A SG2014014955A (en) 2003-12-03 2004-12-03 Exposure apparatus, exposure method, method for producing device, and optical part

Family Applications After (2)

Application Number Title Priority Date Filing Date
SG200808929-4A SG148993A1 (en) 2003-12-03 2004-12-03 Exposure apparatus, exposure method, method for producing device, and optical part
SG2014014955A SG2014014955A (en) 2003-12-03 2004-12-03 Exposure apparatus, exposure method, method for producing device, and optical part

Country Status (9)

Country Link
US (5) US8054447B2 (de)
EP (4) EP3370115A1 (de)
KR (9) KR101793800B1 (de)
CN (2) CN102163005B (de)
HK (1) HK1089292A1 (de)
IL (4) IL176057A (de)
SG (3) SG148994A1 (de)
TW (6) TWI470371B (de)
WO (1) WO2005055296A1 (de)

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CN102163004A (zh) 2011-08-24
KR20120125563A (ko) 2012-11-15
IL223536A (en) 2015-11-30
TWI596442B (zh) 2017-08-21
SG2014014955A (en) 2014-07-30
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US20140022523A1 (en) 2014-01-23
KR20120115593A (ko) 2012-10-18
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US20150286151A1 (en) 2015-10-08
EP3370115A1 (de) 2018-09-05
IL207788A0 (en) 2011-07-31
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EP3139214B1 (de) 2019-01-30
KR20140053389A (ko) 2014-05-07
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US9182685B2 (en) 2015-11-10
KR101682884B1 (ko) 2016-12-06
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